AU2001259482A1 - Extreme-uv electrical discharge source - Google Patents

Extreme-uv electrical discharge source

Info

Publication number
AU2001259482A1
AU2001259482A1 AU2001259482A AU5948201A AU2001259482A1 AU 2001259482 A1 AU2001259482 A1 AU 2001259482A1 AU 2001259482 A AU2001259482 A AU 2001259482A AU 5948201 A AU5948201 A AU 5948201A AU 2001259482 A1 AU2001259482 A1 AU 2001259482A1
Authority
AU
Australia
Prior art keywords
extreme
electrical discharge
discharge source
source
electrical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001259482A
Inventor
Neal R. Fornaciari
Richard E. Nygren
Michael A. Ulrickson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EUV LLC
Original Assignee
EUV LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EUV LLC filed Critical EUV LLC
Publication of AU2001259482A1 publication Critical patent/AU2001259482A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
AU2001259482A 2000-06-13 2001-05-03 Extreme-uv electrical discharge source Abandoned AU2001259482A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09594746 2000-06-13
US09/594,746 US6356618B1 (en) 2000-06-13 2000-06-13 Extreme-UV electrical discharge source
PCT/US2001/014461 WO2001097575A1 (en) 2000-06-13 2001-05-03 Extreme-uv electrical discharge source

Publications (1)

Publication Number Publication Date
AU2001259482A1 true AU2001259482A1 (en) 2001-12-24

Family

ID=24380212

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001259482A Abandoned AU2001259482A1 (en) 2000-06-13 2001-05-03 Extreme-uv electrical discharge source

Country Status (3)

Country Link
US (1) US6356618B1 (en)
AU (1) AU2001259482A1 (en)
WO (1) WO2001097575A1 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100504189B1 (en) * 1997-12-31 2005-10-21 매그나칩 반도체 유한회사 Ultraviolet ray generating device and method
US6498832B2 (en) * 2001-03-13 2002-12-24 Euv Llc Electrode configuration for extreme-UV electrical discharge source
US6998785B1 (en) * 2001-07-13 2006-02-14 University Of Central Florida Research Foundation, Inc. Liquid-jet/liquid droplet initiated plasma discharge for generating useful plasma radiation
JP5098126B2 (en) * 2001-08-07 2012-12-12 株式会社ニコン X-ray generator, exposure apparatus, exposure method, and device manufacturing method
US6654446B2 (en) * 2001-09-18 2003-11-25 Euv Llc Capillary discharge source
US6714624B2 (en) * 2001-09-18 2004-03-30 Euv Llc Discharge source with gas curtain for protecting optics from particles
JP2003288998A (en) 2002-03-27 2003-10-10 Ushio Inc Extreme ultraviolet light source
KR20040020585A (en) * 2002-08-31 2004-03-09 최대규 extreme ultraviolet generator using plasma reactor
US6787788B2 (en) * 2003-01-21 2004-09-07 Melissa Shell Electrode insulator materials for use in extreme ultraviolet electric discharge sources
JP2004226244A (en) * 2003-01-23 2004-08-12 Ushio Inc Extreme ultra-violet light source and semiconductor aligner
US7049614B2 (en) * 2003-03-10 2006-05-23 Intel Corporation Electrode in a discharge produced plasma extreme ultraviolet source
US7081992B2 (en) * 2004-01-16 2006-07-25 Euv Llc Condenser optic with sacrificial reflective surface
US7605385B2 (en) * 2004-07-28 2009-10-20 Board of Regents of the University and Community College System of Nevada, on behlaf of the University of Nevada Electro-less discharge extreme ultraviolet light source
US7251263B2 (en) * 2005-05-23 2007-07-31 Colorado State University Research Foundation Capillary discharge x-ray laser
CN102497718A (en) * 2011-11-21 2012-06-13 哈尔滨工业大学 Capillary tube with inner arc wall for discharging plasma EUV (extreme ultraviolet) light source
CN103559993B (en) * 2013-11-20 2015-09-16 哈尔滨工业大学 Prepulsing is isolated inductance and is utilized the capillary discharging soft x-ray laser device of this inductance

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3609434A (en) 1967-07-19 1971-09-28 Nuclear Chicago Corp High-temperature proportional counter and insulator construction therefor
US4937832A (en) * 1989-06-30 1990-06-26 Rocca Jorge J Methods and apparatus for producing soft x-ray laser in a capillary discharge plasma
US5499282A (en) 1994-05-02 1996-03-12 University Of Central Florida Efficient narrow spectral width soft-X-ray discharge sources
US5577092A (en) 1995-01-25 1996-11-19 Kublak; Glenn D. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources
US6031241A (en) 1997-03-11 2000-02-29 University Of Central Florida Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications
US5963616A (en) 1997-03-11 1999-10-05 University Of Central Florida Configurations, materials and wavelengths for EUV lithium plasma discharge lamps

Also Published As

Publication number Publication date
WO2001097575A1 (en) 2001-12-20
US6356618B1 (en) 2002-03-12

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