CN102497718A - Capillary tube with inner arc wall for discharging plasma EUV (extreme ultraviolet) light source - Google Patents
Capillary tube with inner arc wall for discharging plasma EUV (extreme ultraviolet) light source Download PDFInfo
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- CN102497718A CN102497718A CN2011103718585A CN201110371858A CN102497718A CN 102497718 A CN102497718 A CN 102497718A CN 2011103718585 A CN2011103718585 A CN 2011103718585A CN 201110371858 A CN201110371858 A CN 201110371858A CN 102497718 A CN102497718 A CN 102497718A
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Abstract
The invention relates to a capillary tube for a discharging plasma EUV (extreme ultraviolet) light source, in particular to a capillary tube with an inner arc wall for a discharging plasma EUV light source, which solves the problem of low collecting efficiency of an optic collecting system due to the fact that the inner walls of existing capillary tubes are cylindrical. The capillary tube made of aluminum oxide has an axial symmetric structure, the section of the side wall of the capillary tube is arc, and the diameter of the narrowest portion of the inner side wall of the capillary tube ranges from 2mm to 5mm. The capillary tube is applicable to the discharging plasma EUV light source.
Description
Technical field
The present invention relates to a kind of discharge plasma EUV light source and use capillary.
Background technology
Discharge plasma EUV light source is meant and adopts the Xe medium; Under capillary discharging Z constriction mechanism, obtain radiant light and output that wavelength is 13.5nm (2% bandwidth), said wavelength is that the radiant light of 13.5nm (2% bandwidth) can be realized 22nm even littler photoetching line.In the capillary discharging process; High voltage can make in the capillary and form one deck Xe plasma sheath along inner surface wall, through the heavy current of plasma, receives the self-field effect during main pulse discharge; Produce powerful Lorentz force, make radially constriction (being referred to as the Z constriction) of plasma.
In the process of plasma compression; Plasma receives repulsive force, ohmic heating simultaneously, makes plasma temperature raise, and collision Xe ion produces the Xe ion of higher valence state; Plasma compression hour reaches 300 μ m to radius, can realize the output of EUV radiant light this moment.
Plasma compression during to least radius the plasma in the capillary be a very thin plasma column; Each fine step in this plasma column all can be considered a point-source of light; This point-source of light will to around radiation EUV radiant light uniformly in the 4 π solid angle scopes, the EUV radiant light that capillary discharging forms is through follow-up extreme ultraviolet optics gathering system; Be imaged on intermediate focus (IF) point, thereby realize 13.5nm (2% bandwidth) the radiant light output of the certain power of IF point.
Capillary mainly plays the effect of confined plasma compression in EUV photoetching light source, the plasma that discharge is formed is even, thereby realizes stable EUV radiant light output.But then, conventional capillary tube inner wall is cylindrical (as shown in Figure 1), and the EUV radiant light of homogeneous radiation in 4 π solid angle scopes that it can make that plasma resonance produces has the overwhelming majority to be blocked by capillary wall.The radiant light extreme ultraviolet optics gathering system of comparing in the 4 π solid angle scopes can only be collected wherein very little a part of EUV radiant light, and this just causes the collection optical system collection efficiency to reduce, thereby has also reduced IF point 13.5nm (2% bandwidth) radiant light power.
Summary of the invention
The present invention is to be the cylindrical problem that causes the collection optical system collection efficiency to reduce in order to solve existing inwall capillaceous, is that the discharge plasma EUV light source of circular arc is used capillary thereby a kind of inwall is provided.
Inwall is that the discharge plasma EUV light source of circular arc is used capillary, and capillary is an axially symmetric structure, and said madial wall capillaceous cross section is inwardly protruded circular arc.The madial wall capillaceous diameter at narrow place is 2mm to 5mm.Material capillaceous is an alundum (Al.
Beneficial effect: the present invention has overcome present discharge plasma EUV light source can only adopt columnar structured technological prejudice with capillary.The present invention adopts the circular arc interior wall construction, can realize the good constraint of article on plasma body, keeps the stability of EUV radiant light; Simultaneously, the present invention has bigger optical collection efficient, has improved IF point 13.5nm (2% bandwidth) radiant light power; Thereby of the present inventionly can select different arc radius to realize different EUV radiant light collection efficiencies according to actual needs.
Description of drawings
The existing discharge plasma EUV light source of Fig. 1 is used the capillary pipe structure sketch map; Fig. 2 is a structural representation of the present invention; Fig. 3 is in the different angles scope, the present invention and existing EUV radiant light collection efficiency comparison diagram capillaceous, and abscissa is a collection angle among the figure, ordinate is a collection efficiency; Wherein, be positioned at the top curve be EUV radiant light collection efficiency curve capillaceous of the present invention; The curve that is positioned at the below is existing EUV radiant light collection efficiency curve capillaceous.
Embodiment
Embodiment one, combination Fig. 2 explain this embodiment, and inwall is that the discharge plasma EUV light source of circular arc is used capillary, and capillary is an axially symmetric structure, and said madial wall capillaceous cross section is inwardly protruded circular arc.
Capillary tube inner wall of the present invention is an arc-shaped structure; Because electric current during actual discharge is because skin effect will be along tube wall to axial compression; This moment, the effect of contraction of tube wall made plasma can keep good homogeneous property; The capillary of new construction has under the condition of good restrictive effect maintaining article on plasma body compression, also has bigger EUV radiant light collection efficiency simultaneously, thereby can obtain more powerful IF point 13.5nm (2% bandwidth) radiant light power.
Capillary of the present invention has the following advantages: 1, capillary of the present invention can be realized the good constraint of article on plasma body, keeps the stability of EUV radiant light; 2, capillary of the present invention has bigger optical collection efficient, has improved IF point 13.5nm (2% bandwidth) radiant light power; 3, the radius of capillary tube inner wall circular arc of the present invention can be processed according to actual conditions, thereby selects different arc radius to realize different EUV radiant light collection efficiencies.
Embodiment two, this embodiment and embodiment one described inwall are that the discharge plasma EUV light source of circular arc is with difference capillaceous, the madial wall of capillary 1 the diameter at narrow place for being 2mm to 5mm.
In this execution mode, the cross-sectional diameter of capillary 1 is 18mm, and the length of capillary 1 is 12mm.This execution mode is a preferred embodiment.Through experiment, in the different angles scope, this execution mode is as shown in Figure 3 with existing EUV radiant light collection efficiency contrast capillaceous, and abscissa is a collection angle among the figure, and ordinate is a collection efficiency; Wherein, be positioned at the top curve be EUV radiant light collection efficiency curve capillaceous of the present invention; The curve that is positioned at the below is existing EUV radiant light collection efficiency curve capillaceous.
Can know that from Fig. 3 with respect to the capillary of routine, the capillary of this execution mode has bigger optical collection efficient.
Embodiment three, this embodiment and embodiment one or two described inwalls are that the discharge plasma EUV light source of circular arc is that with difference capillaceous the material of capillary 1 is an alundum (Al.
Material capillaceous adopts alundum (Al in this execution mode, and Stability Analysis of Structures capillaceous guarantees that the optical collection efficient of capillary 1 is unaffected.
Claims (3)
1. inwall is that the discharge plasma EUV light source of circular arc is used capillary, and it is characterized in that: capillary (1) is an axially symmetric structure, and the madial wall cross section of said capillary (1) is inwardly protruded circular arc.
2. the discharge plasma EUV light source that inwall according to claim 1 is a circular arc is used capillary, and the madial wall that it is characterized in that capillary (1) diameter at narrow place is 2mm to 5mm.
3. the discharge plasma EUV light source that inwall according to claim 1 and 2 is a circular arc is used capillary, and the material that it is characterized in that capillary (1) is an alundum (Al.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103718585A CN102497718A (en) | 2011-11-21 | 2011-11-21 | Capillary tube with inner arc wall for discharging plasma EUV (extreme ultraviolet) light source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103718585A CN102497718A (en) | 2011-11-21 | 2011-11-21 | Capillary tube with inner arc wall for discharging plasma EUV (extreme ultraviolet) light source |
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| Publication Number | Publication Date |
|---|---|
| CN102497718A true CN102497718A (en) | 2012-06-13 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011103718585A Pending CN102497718A (en) | 2011-11-21 | 2011-11-21 | Capillary tube with inner arc wall for discharging plasma EUV (extreme ultraviolet) light source |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6232613B1 (en) * | 1997-03-11 | 2001-05-15 | University Of Central Florida | Debris blocker/collector and emission enhancer for discharge sources |
| CN1306673A (en) * | 1997-12-31 | 2001-08-01 | 中佛罗里达大学 | Discharge lamp source appts and method |
| US6356618B1 (en) * | 2000-06-13 | 2002-03-12 | Euv Llc | Extreme-UV electrical discharge source |
| US20030053593A1 (en) * | 2001-09-18 | 2003-03-20 | Bender Iii Howard Albert | Capillary discharge source |
| US20040119394A1 (en) * | 2002-12-19 | 2004-06-24 | Klebanoff Leonard E. | Method and apparatus for debris mitigation for an electrical discharge source |
| CN1820556A (en) * | 2003-06-27 | 2006-08-16 | 法国原子能委员会 | Method and device for producing extreme ultravoilet radiation or soft X-ray radiation |
-
2011
- 2011-11-21 CN CN2011103718585A patent/CN102497718A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6232613B1 (en) * | 1997-03-11 | 2001-05-15 | University Of Central Florida | Debris blocker/collector and emission enhancer for discharge sources |
| CN1306673A (en) * | 1997-12-31 | 2001-08-01 | 中佛罗里达大学 | Discharge lamp source appts and method |
| US6356618B1 (en) * | 2000-06-13 | 2002-03-12 | Euv Llc | Extreme-UV electrical discharge source |
| US20030053593A1 (en) * | 2001-09-18 | 2003-03-20 | Bender Iii Howard Albert | Capillary discharge source |
| US20040119394A1 (en) * | 2002-12-19 | 2004-06-24 | Klebanoff Leonard E. | Method and apparatus for debris mitigation for an electrical discharge source |
| CN1820556A (en) * | 2003-06-27 | 2006-08-16 | 法国原子能委员会 | Method and device for producing extreme ultravoilet radiation or soft X-ray radiation |
Non-Patent Citations (2)
| Title |
|---|
| C. H. ZHANG ET AL.: "Xenon discharge-produced plasma radiation source for EUV lithography", 《IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS》 * |
| 张兴强 等: "毛细管放电EUVL光源演示装置", 《湖北汽车工业学院学报》 * |
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Application publication date: 20120613 |