AU2001282547A1 - Method of forming optical thin film and optical element provided with optical thin film - Google Patents
Method of forming optical thin film and optical element provided with optical thin filmInfo
- Publication number
- AU2001282547A1 AU2001282547A1 AU2001282547A AU8254701A AU2001282547A1 AU 2001282547 A1 AU2001282547 A1 AU 2001282547A1 AU 2001282547 A AU2001282547 A AU 2001282547A AU 8254701 A AU8254701 A AU 8254701A AU 2001282547 A1 AU2001282547 A1 AU 2001282547A1
- Authority
- AU
- Australia
- Prior art keywords
- thin film
- optical thin
- optical
- element provided
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/284—Halides
- C03C2217/285—Fluorides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/425—Coatings comprising at least one inhomogeneous layer consisting of a porous layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/365—Coating different sides of a glass substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Geochemistry & Mineralogy (AREA)
- Organic Chemistry (AREA)
- Optics & Photonics (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Composite Materials (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Optical Integrated Circuits (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000260248 | 2000-08-30 | ||
JP2000-260248 | 2000-08-30 | ||
PCT/JP2001/007457 WO2002018982A1 (fr) | 2000-08-30 | 2001-08-30 | Formation d'un film optique mince et element optique dote d'un tel film |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001282547A1 true AU2001282547A1 (en) | 2002-03-13 |
Family
ID=18748288
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001282547A Abandoned AU2001282547A1 (en) | 2000-08-30 | 2001-08-30 | Method of forming optical thin film and optical element provided with optical thin film |
Country Status (6)
Country | Link |
---|---|
US (1) | US6870602B2 (fr) |
EP (1) | EP1315005B1 (fr) |
JP (1) | JP4457557B2 (fr) |
AU (1) | AU2001282547A1 (fr) |
DE (1) | DE60130901T2 (fr) |
WO (1) | WO2002018982A1 (fr) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004302112A (ja) * | 2003-03-31 | 2004-10-28 | Nikon Corp | 光学薄膜、光学部材、光学系、及び投影露光装置、並びに光学薄膜の製造方法 |
JP2004302113A (ja) * | 2003-03-31 | 2004-10-28 | Nikon Corp | 反射防止膜、光学部材、光学系及び投影露光装置、並びに反射防止膜の製造方法 |
JP2005031361A (ja) * | 2003-07-11 | 2005-02-03 | Konica Minolta Opto Inc | 光学レンズ及び情報記録再生装置 |
US8149381B2 (en) | 2003-08-26 | 2012-04-03 | Nikon Corporation | Optical element and exposure apparatus |
US7697111B2 (en) * | 2003-08-26 | 2010-04-13 | Nikon Corporation | Optical element and exposure apparatus |
JP2005114400A (ja) * | 2003-10-03 | 2005-04-28 | Nikon Corp | 光学特性の計測方法、反射防止膜、光学系及び投影露光装置 |
US7034923B2 (en) * | 2004-01-21 | 2006-04-25 | Asml Netherlands B.V. | Optical element, lithographic apparatus comprising such optical element and device manufacturing method |
JP5201435B2 (ja) * | 2004-03-30 | 2013-06-05 | 株式会社ニコン | 光学系 |
JP4433390B2 (ja) * | 2004-03-30 | 2010-03-17 | 株式会社ニコン | 反射防止膜並びにこの反射防止膜を有する光学素子及び光学系 |
DE102004027842A1 (de) * | 2004-06-08 | 2006-01-12 | Institut für Neue Materialien Gemeinnützige GmbH | Abrieb- und kratzfeste Beschichtungen mit niedriger Brechzahl auf einem Substrat |
KR101294551B1 (ko) * | 2004-09-16 | 2013-08-07 | 가부시키가이샤 니콘 | 비정질 산화 규소 바인더를 갖는 MgF2 광학 박막, 및그것을 구비하는 광학 소자, 그리고 그 MgF2 광학박막의 제조 방법 |
US8049964B2 (en) * | 2005-06-14 | 2011-11-01 | Carl Zeiss Smt Gmbh | Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element |
JP2007101799A (ja) * | 2005-10-03 | 2007-04-19 | Nippon Sheet Glass Co Ltd | 透過型光学素子 |
JP5127136B2 (ja) * | 2005-12-12 | 2013-01-23 | ステラケミファ株式会社 | フッ化物微粒子の分散液及びその製造方法 |
JP2007187994A (ja) * | 2006-01-16 | 2007-07-26 | Bridgestone Corp | 反射防止膜及び光学フィルター |
WO2008001675A1 (fr) | 2006-06-27 | 2008-01-03 | Nikon Corporation | mince film MULTICOUCHE OPTIQUE, élément optique et procédé de fabrication de mince film multicouche optique |
WO2008062817A1 (fr) | 2006-11-21 | 2008-05-29 | Nikon Corporation | Élément optique et son procédé de fabrication |
JP2008270564A (ja) * | 2007-04-20 | 2008-11-06 | Canon Inc | 露光装置及びデバイス製造方法 |
US20110003143A1 (en) * | 2008-02-25 | 2011-01-06 | Central Glass Company, Limited | Organosol Containing Magnesium Fluoride Hydroxide, and Manufacturing Method Therefor |
JP5751759B2 (ja) | 2009-04-06 | 2015-07-22 | キヤノン株式会社 | 光学用膜の製造方法 |
EP2325675A2 (fr) * | 2009-07-30 | 2011-05-25 | Canon Kabushiki Kaisha | Procédé de production de film optique, film optique et composant optique |
JP5777278B2 (ja) * | 2009-12-01 | 2015-09-09 | キヤノン株式会社 | 光学素子の製造方法 |
JP5340252B2 (ja) | 2010-11-17 | 2013-11-13 | キヤノン株式会社 | 反射防止膜及びその製造方法 |
US9715043B2 (en) | 2011-07-21 | 2017-07-25 | Canon Kabushiki Kaisha | Optical member and method of producing the same |
JP5878429B2 (ja) * | 2012-05-29 | 2016-03-08 | ステラケミファ株式会社 | フッ化マグネシウム粒子、フッ化マグネシウム粒子の製造方法、フッ化マグネシウム粒子分散液、フッ化マグネシウム粒子分散液の製造方法、低屈折率層形成用組成物、低屈折率層形成用組成物の製造方法、低屈折率層付基材及び低屈折率層付基材の製造方法 |
EP2676938A1 (fr) | 2012-06-21 | 2013-12-25 | Nanofluor GmbH | Sol de fluorure de calcium et revêtements de surface optiquement actifs |
EP2708509A1 (fr) | 2012-09-18 | 2014-03-19 | Nanofluor GmbH | Procédé de préparation de solutions de sol de fluorure de magnésium à partir d'alcoxydes comprenant l'ajout de dioxyde de carbone |
EP2708510A1 (fr) | 2012-09-18 | 2014-03-19 | Nanofluor GmbH | Procédé de préparation de solutions de sol de fluorure de magnésium à partir d'alcoxydes comprenant l'ajout de sels de magnésium |
KR20150104133A (ko) * | 2012-12-31 | 2015-09-14 | 나노플루오르 게엠베하 | 마그네슘 플루오라이드 졸 및 이의 유도된 광학 활성 표면 코팅 |
JP2016038537A (ja) * | 2014-08-11 | 2016-03-22 | 旭硝子株式会社 | ワイヤグリッド型偏光子、光源モジュールおよび投射型表示装置 |
JP7275801B2 (ja) * | 2018-04-25 | 2023-05-18 | Agc株式会社 | ガラス基板 |
CN115172379A (zh) * | 2021-04-21 | 2022-10-11 | 长江存储科技有限责任公司 | 三维存储器及其制备方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2601123A (en) * | 1947-04-05 | 1952-06-17 | American Optical Corp | Composition for reducing the reflection of light |
JPH07107563B2 (ja) * | 1986-10-31 | 1995-11-15 | キヤノン株式会社 | 反射防止膜 |
JPH07104442B2 (ja) * | 1989-04-06 | 1995-11-13 | 旭硝子株式会社 | フッ化マグネシウム膜及び低反射膜の製造方法 |
KR920700408A (ko) * | 1989-02-23 | 1992-02-19 | 원본미기재 | MgF₂박막 및 저반사막의 형성 방법 |
JPH05208811A (ja) * | 1992-01-29 | 1993-08-20 | Central Glass Co Ltd | フッ化マグネシウムオルガノゾル溶液の製造方法とこの溶液による膜の形成方法 |
JPH0739747A (ja) * | 1993-07-30 | 1995-02-10 | Asahi Glass Co Ltd | 超微粒子ゾル |
US5518716A (en) * | 1994-03-31 | 1996-05-21 | General Electric Company | Composition and method of preparing microemulsion blends |
JPH07326308A (ja) * | 1994-05-30 | 1995-12-12 | Asahi Glass Co Ltd | 着色薄膜形成用塗布液およびその塗布液により得られる着色薄膜 |
JPH09222503A (ja) * | 1996-02-19 | 1997-08-26 | Fuji Photo Film Co Ltd | 反射防止膜の製造方法および表示装置 |
US5993898A (en) | 1997-05-19 | 1999-11-30 | Nikon Corporation | Fabrication method and structure for multilayer optical anti-reflection coating, and optical component and optical system using multilayer optical anti-reflection coating |
JP2000034575A (ja) * | 1998-03-30 | 2000-02-02 | Minolta Co Ltd | 金属酸化物薄膜およびアレイ状金属酸化物機能性素子の製造法 |
JP3975036B2 (ja) * | 1998-09-22 | 2007-09-12 | 富士フイルム株式会社 | 反射防止膜の製造方法 |
JP3159693B1 (ja) * | 1999-08-30 | 2001-04-23 | 住友特殊金属株式会社 | 耐食性被膜を有する希土類系永久磁石の製造方法 |
JP2001141895A (ja) * | 1999-11-09 | 2001-05-25 | Fuji Photo Film Co Ltd | 放射線像変換パネル |
JP3973330B2 (ja) * | 1999-12-10 | 2007-09-12 | 触媒化成工業株式会社 | 透明被膜付基材、透明被膜形成用塗布液、および表示装置 |
-
2001
- 2001-08-30 JP JP2002523646A patent/JP4457557B2/ja not_active Expired - Lifetime
- 2001-08-30 EP EP01961191A patent/EP1315005B1/fr not_active Expired - Lifetime
- 2001-08-30 DE DE60130901T patent/DE60130901T2/de not_active Expired - Lifetime
- 2001-08-30 WO PCT/JP2001/007457 patent/WO2002018982A1/fr active IP Right Grant
- 2001-08-30 AU AU2001282547A patent/AU2001282547A1/en not_active Abandoned
-
2002
- 2002-08-01 US US10/208,874 patent/US6870602B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP4457557B2 (ja) | 2010-04-28 |
WO2002018982A1 (fr) | 2002-03-07 |
DE60130901T2 (de) | 2008-08-14 |
US20020191168A1 (en) | 2002-12-19 |
DE60130901D1 (de) | 2007-11-22 |
US6870602B2 (en) | 2005-03-22 |
EP1315005A4 (fr) | 2005-09-14 |
EP1315005B1 (fr) | 2007-10-10 |
EP1315005A1 (fr) | 2003-05-28 |
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