ATE71736T1 - Emissionsmikroskopie-geraet und -methode. - Google Patents

Emissionsmikroskopie-geraet und -methode.

Info

Publication number
ATE71736T1
ATE71736T1 AT88106874T AT88106874T ATE71736T1 AT E71736 T1 ATE71736 T1 AT E71736T1 AT 88106874 T AT88106874 T AT 88106874T AT 88106874 T AT88106874 T AT 88106874T AT E71736 T1 ATE71736 T1 AT E71736T1
Authority
AT
Austria
Prior art keywords
operator
under test
images
device under
difference
Prior art date
Application number
AT88106874T
Other languages
English (en)
Inventor
Paul Esrig
Eliezer Rosengaus
Gelder Ezra Van
Original Assignee
Kla Instr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Instr Corp filed Critical Kla Instr Corp
Application granted granted Critical
Publication of ATE71736T1 publication Critical patent/ATE71736T1/de

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/302—Contactless testing
    • G01R31/308—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/10—Image acquisition modality
    • G06T2207/10056—Microscopic image
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20036—Morphological image processing
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Biochemistry (AREA)
  • Electromagnetism (AREA)
  • Analytical Chemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Chemical & Material Sciences (AREA)
  • Quality & Reliability (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Engineering & Computer Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
AT88106874T 1987-08-31 1988-04-29 Emissionsmikroskopie-geraet und -methode. ATE71736T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/091,682 US4755874A (en) 1987-08-31 1987-08-31 Emission microscopy system
EP88106874A EP0305644B1 (de) 1987-08-31 1988-04-29 Emissionsmikroskopie-Gerät und -Methode

Publications (1)

Publication Number Publication Date
ATE71736T1 true ATE71736T1 (de) 1992-02-15

Family

ID=22229122

Family Applications (1)

Application Number Title Priority Date Filing Date
AT88106874T ATE71736T1 (de) 1987-08-31 1988-04-29 Emissionsmikroskopie-geraet und -methode.

Country Status (5)

Country Link
US (1) US4755874A (de)
EP (1) EP0305644B1 (de)
JP (1) JPH0760846B2 (de)
AT (1) ATE71736T1 (de)
DE (1) DE3867766D1 (de)

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JP2017073548A (ja) * 2015-10-05 2017-04-13 エフイーアイ カンパニー Ｖｌｓｉ装置用の最適波長光子放射顕微鏡 ［関連出願の参照］ 本出願は、２０１５年１０月５日に出願された米国仮出願第６２／２３７，３９９号の優先権利益を主張し、そのすべての内容が本明細書に参考として援用される。［政府許認可権］ 本発明は、空軍研究所（ａｆｒｌ）の契約番号ｆａ８６５０−１１−ｃ−７１０５を介した、アメリカ合衆国国家情報長官官房（ｏｄｎｉ）、情報先端研究プロジェクト活動（ｉａｒｐａ）による支援事業に基づくものである。本明細書に含まれるアイデア及び結果は、本発明者らのアイデア及び結果であり、ｏｄｎｉ、ｉａｒｐａ、ａｆｒｌ又は米国政府の公式承認を必ずしも有するものとして解釈されるべきでない。
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US11543639B2 (en) * 2019-01-29 2023-01-03 Li-Cor, Inc. Macro-micro telecentric scanning systems and methods

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Also Published As

Publication number Publication date
JPS6472540A (en) 1989-03-17
JPH0760846B2 (ja) 1995-06-28
EP0305644A3 (en) 1989-12-06
EP0305644B1 (de) 1992-01-15
EP0305644A2 (de) 1989-03-08
DE3867766D1 (de) 1992-02-27
US4755874A (en) 1988-07-05

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