KR930014869A - 본딩와이어 검사장치 - Google Patents
본딩와이어 검사장치 Download PDFInfo
- Publication number
- KR930014869A KR930014869A KR1019920022047A KR920022047A KR930014869A KR 930014869 A KR930014869 A KR 930014869A KR 1019920022047 A KR1019920022047 A KR 1019920022047A KR 920022047 A KR920022047 A KR 920022047A KR 930014869 A KR930014869 A KR 930014869A
- Authority
- KR
- South Korea
- Prior art keywords
- bonding wire
- inspection device
- photoelectric conversion
- wire inspection
- conversion element
- Prior art date
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- 238000007689 inspection Methods 0.000 title claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 6
- 238000003384 imaging method Methods 0.000 claims description 5
- 230000003287 optical effect Effects 0.000 claims description 5
- 238000005286 illumination Methods 0.000 claims 4
- 230000001678 irradiating effect Effects 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 1
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
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Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 1실시예에 의한 본딩와이어 검사장치의 구성을 나타내는 개략 설명도.
제2도는 제1도의 개략 정면도.
제3도는 광전변환 소자의 초점 맞추기와 광선 각도의 설명도.
제4도는 결상렌즈군의 결상레벨과, 결상(화각 ; 畵角 )사이즈 설명도.
제5도는 종래의 본딩와이어 검사장치의 구성도.
제6도는 와이어 본딩된 반도체 장치의 평면도.
제7도는 제5도의 정면도.
제8도는 본딩와이어의 확대정면 설명도.
제9도는 제7도의 평면도.
* 도면의 주요부분에 대한 부호의 설명
6 : 시료 20 : 광학계
30 : 수직조명수단 40 : CCD카메라
40a : 광전변환소자 41 : XYZ테이블
42 : X테이블 45 : Y테이블
48 : Z테이블 60 : 결상레벨
Claims (2)
- 검사대상을 위쪽에 설치된 광학계와, 검사대상물에 조명을 조사하는 조명수단과, 상기 광학계의 결상레벨에 설치된 광전변환소자와, 이 광전변환소자만을 XY방향으로 이동시키는 XY테이블을 구비한 것을 특징으로 하는 본딩와이어 검사장치.
- 검사대상물 위쪽에 설치된 광학계와, 검사대상물에 조명을 조사하는 조명수단과, 상기 광학계의 결상레벨에 설치된 광전변환소자와, 이 광전변환소자만을 XYZ방향으로 이동시키는 XYZ테이블을 구비한 것을 특징으로 하는 본딩와이어 검사장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP91-349754 | 1991-12-10 | ||
JP3349754A JP2990550B2 (ja) | 1991-12-10 | 1991-12-10 | ボンデイングワイヤ検査装置 |
Publications (2)
Publication Number | Publication Date |
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KR930014869A true KR930014869A (ko) | 1993-07-23 |
KR960005093B1 KR960005093B1 (ko) | 1996-04-20 |
Family
ID=18405878
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1019920022047A KR960005093B1 (ko) | 1991-12-10 | 1992-11-23 | 본딩와이어 검사장치 |
Country Status (3)
Country | Link |
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US (1) | US5293217A (ko) |
JP (1) | JP2990550B2 (ko) |
KR (1) | KR960005093B1 (ko) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3005781B2 (ja) * | 1992-08-04 | 2000-02-07 | 株式会社新川 | ワイヤボンデイング装置のモータ制御回路 |
JP3370547B2 (ja) * | 1997-03-17 | 2003-01-27 | 株式会社新川 | ボンディングワイヤ高さ検査装置 |
US6545541B2 (en) * | 2001-05-29 | 2003-04-08 | Ericsson Inc. | Power amplifier embedded cell bias detection, methods of detecting bias in power amplifiers and systems utilizing embedded cell bias detection |
JP6450700B2 (ja) * | 2016-03-29 | 2019-01-09 | Ckd株式会社 | 基板検査装置 |
CN111279462B (zh) * | 2017-10-26 | 2023-07-14 | 株式会社新川 | 接合装置 |
CN110108713A (zh) * | 2019-04-26 | 2019-08-09 | 武汉精立电子技术有限公司 | 一种表面异物缺陷快速过滤方法及系统 |
CN114353687A (zh) * | 2020-10-14 | 2022-04-15 | 亿美设备私人有限公司 | 交叠接合连线的弧高度测量 |
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Publication number | Priority date | Publication date | Assignee | Title |
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US2731878A (en) * | 1956-01-24 | sherwin | ||
US4373817A (en) * | 1978-05-22 | 1983-02-15 | Nanometrics Incorporated | Computerized micromeasuring system and method therefor |
US4872052A (en) * | 1986-12-03 | 1989-10-03 | View Engineering, Inc. | Semiconductor device inspection system |
JPH0666370B2 (ja) * | 1987-04-14 | 1994-08-24 | 株式会社東芝 | 半導体デバイス用外観検査装置 |
US5030008A (en) * | 1988-10-11 | 1991-07-09 | Kla Instruments, Corporation | Method and apparatus for the automated analysis of three-dimensional objects |
JPH07111998B2 (ja) * | 1989-08-18 | 1995-11-29 | 株式会社東芝 | ワイヤボンディング検査装置 |
-
1991
- 1991-12-10 JP JP3349754A patent/JP2990550B2/ja not_active Expired - Fee Related
-
1992
- 1992-11-23 KR KR1019920022047A patent/KR960005093B1/ko not_active IP Right Cessation
- 1992-12-10 US US07/988,731 patent/US5293217A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2990550B2 (ja) | 1999-12-13 |
JPH05160234A (ja) | 1993-06-25 |
US5293217A (en) | 1994-03-08 |
KR960005093B1 (ko) | 1996-04-20 |
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