ATE550692T1 - Ionische fotosäure erzeugende verbindungen mit segmentierten fluorkohlenstoff-kohlenwasserstoff sulfonatanionen - Google Patents

Ionische fotosäure erzeugende verbindungen mit segmentierten fluorkohlenstoff-kohlenwasserstoff sulfonatanionen

Info

Publication number
ATE550692T1
ATE550692T1 AT03777730T AT03777730T ATE550692T1 AT E550692 T1 ATE550692 T1 AT E550692T1 AT 03777730 T AT03777730 T AT 03777730T AT 03777730 T AT03777730 T AT 03777730T AT E550692 T1 ATE550692 T1 AT E550692T1
Authority
AT
Austria
Prior art keywords
segmented
fluorocarbon
generating compounds
sulfonate anions
photoacid generating
Prior art date
Application number
AT03777730T
Other languages
English (en)
Inventor
William Lamanna
Gregory Clark
Richard Flynn
Zai-Ming Qiu
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Application granted granted Critical
Publication of ATE550692T1 publication Critical patent/ATE550692T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Catalysts (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
AT03777730T 2002-11-01 2003-10-10 Ionische fotosäure erzeugende verbindungen mit segmentierten fluorkohlenstoff-kohlenwasserstoff sulfonatanionen ATE550692T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/286,330 US6841333B2 (en) 2002-11-01 2002-11-01 Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions
PCT/US2003/033309 WO2004042473A2 (en) 2002-11-01 2003-10-10 Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions

Publications (1)

Publication Number Publication Date
ATE550692T1 true ATE550692T1 (de) 2012-04-15

Family

ID=32175425

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03777730T ATE550692T1 (de) 2002-11-01 2003-10-10 Ionische fotosäure erzeugende verbindungen mit segmentierten fluorkohlenstoff-kohlenwasserstoff sulfonatanionen

Country Status (7)

Country Link
US (2) US6841333B2 (de)
EP (1) EP1556740B1 (de)
JP (1) JP2006504785A (de)
KR (1) KR101010405B1 (de)
AT (1) ATE550692T1 (de)
AU (1) AU2003286528A1 (de)
WO (1) WO2004042473A2 (de)

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6147205A (en) * 1995-12-15 2000-11-14 Affymetrix, Inc. Photocleavable protecting groups and methods for their use
US20110028350A1 (en) * 1995-12-15 2011-02-03 Affymetrix, Inc. Photocleavable protecting groups
US7176114B2 (en) * 2000-06-06 2007-02-13 Simon Fraser University Method of depositing patterned films of materials using a positive imaging process
AU2001292142A1 (en) * 2000-09-11 2002-03-22 Affymetrix, Inc. Photocleavable protecting groups
TWI246525B (en) * 2001-11-06 2006-01-01 Wako Pure Chem Ind Ltd Hybrid onium salt
KR100582275B1 (ko) * 2002-11-06 2006-05-23 삼성코닝 주식회사 플라즈마 디스플레이 패널용 필터 및, 그것의 제조 방법
US7169530B2 (en) * 2003-10-02 2007-01-30 Matsushita Electric Industrial Co., Ltd. Polymer compound, resist material and pattern formation method
US7449573B2 (en) * 2004-02-16 2008-11-11 Fujifilm Corporation Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition
WO2005082596A1 (en) * 2004-02-23 2005-09-09 3M Innovative Properties Company Method of molding for microneedle arrays
US7393627B2 (en) * 2004-03-16 2008-07-01 Cornell Research Foundation, Inc. Environmentally friendly photoacid generators (PAGs) with no perfluorooctyl sulfonates (PFOS)
JP3978216B2 (ja) * 2004-05-27 2007-09-19 松下電器産業株式会社 レジスト材料及びパターン形成方法
US20050271974A1 (en) * 2004-06-08 2005-12-08 Rahman M D Photoactive compounds
US7547775B2 (en) 2004-12-31 2009-06-16 Affymetrix, Inc. Parallel preparation of high fidelity probes in an array format
US8338093B2 (en) * 2004-12-31 2012-12-25 Affymetrix, Inc. Primer array synthesis and validation
JP4452632B2 (ja) * 2005-01-24 2010-04-21 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
JP4562537B2 (ja) * 2005-01-28 2010-10-13 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
JP4816921B2 (ja) * 2005-04-06 2011-11-16 信越化学工業株式会社 新規スルホン酸塩及びその誘導体、光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
TWI332122B (en) * 2005-04-06 2010-10-21 Shinetsu Chemical Co Novel sulfonate salts and derivatives, photoacid generators, resist compositions and patterning process
JP4724465B2 (ja) 2005-05-23 2011-07-13 富士フイルム株式会社 感光性組成物及び該感光性組成物を用いたパターン形成方法
JP2007003619A (ja) * 2005-06-21 2007-01-11 Fujifilm Holdings Corp 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いる化合物
US7521170B2 (en) * 2005-07-12 2009-04-21 Az Electronic Materials Usa Corp. Photoactive compounds
JP4695941B2 (ja) * 2005-08-19 2011-06-08 富士フイルム株式会社 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法
US7654637B2 (en) * 2005-09-30 2010-02-02 Lexmark International, Inc Photoimageable nozzle members and methods relating thereto
US7678528B2 (en) * 2005-11-16 2010-03-16 Az Electronic Materials Usa Corp. Photoactive compounds
US20070129273A1 (en) * 2005-12-07 2007-06-07 Clark Philip G In situ fluoride ion-generating compositions and uses thereof
US8426101B2 (en) * 2005-12-21 2013-04-23 Fujifilm Corporation Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition
US7951601B2 (en) * 2005-12-28 2011-05-31 Affymetrix, Inc. Oxide layers on silicon substrates for effective confocal laser microscopy
US7618683B2 (en) * 2006-01-12 2009-11-17 Fujifilm Corporation Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate
JP2007293250A (ja) * 2006-03-27 2007-11-08 Fujifilm Corp ポジ型レジスト組成物およびそれを用いたパターン形成方法
WO2007124092A2 (en) 2006-04-21 2007-11-01 Cornell Research Foundation, Inc. Photoacid generator compounds and compositions
GB2439734A (en) 2006-06-30 2008-01-09 Peter Andrew Reath Bennett Coating for a lithographic precursor and use thereof
TWI412888B (zh) * 2006-08-18 2013-10-21 Sumitomo Chemical Co 適合作為酸產生劑之鹽及含有該鹽之化學放大型正光阻組成物
TWI402249B (zh) * 2006-08-22 2013-07-21 Sumitomo Chemical Co 適合作為酸產生劑之鹽及含有該鹽之化學放大型正型光阻組成物
US7390613B1 (en) * 2006-12-04 2008-06-24 Az Electronic Materials Usa Corp. Photoactive compounds
US7491482B2 (en) * 2006-12-04 2009-02-17 Az Electronic Materials Usa Corp. Photoactive compounds
US20080187868A1 (en) * 2007-02-07 2008-08-07 Munirathna Padmanaban Photoactive Compounds
KR20110133065A (ko) * 2007-02-15 2011-12-09 샌트랄 글래스 컴퍼니 리미티드 광산발생제용 화합물 및 이를 사용한 레지스트 조성물, 패턴 형성방법
WO2008132966A1 (ja) * 2007-04-17 2008-11-06 Tokyo Ohka Kogyo Co., Ltd. 化合物、酸発生剤、レジスト組成物およびレジストパターン形成方法
JP5238216B2 (ja) * 2007-04-17 2013-07-17 東京応化工業株式会社 化合物、酸発生剤、レジスト組成物およびレジストパターン形成方法
US7651830B2 (en) * 2007-06-01 2010-01-26 3M Innovative Properties Company Patterned photoacid etching and articles therefrom
JP5205027B2 (ja) * 2007-07-18 2013-06-05 東京応化工業株式会社 化合物の製造方法
JP4925954B2 (ja) * 2007-07-20 2012-05-09 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
US8292402B2 (en) * 2008-02-13 2012-10-23 Lexmark International, Inc. Photoimageable dry film formulation
US8163461B2 (en) * 2008-04-09 2012-04-24 Cornell Research Foundation, Inc. Photoacid generator compounds and compositions
JP2010094028A (ja) * 2008-10-14 2010-04-30 Ulvac Japan Ltd 表面修飾基板、表面修飾基板の製造方法及び表面修飾基板の製造システム
JP2010094029A (ja) * 2008-10-14 2010-04-30 Ulvac Japan Ltd 表面修飾基板、表面修飾基板の製造方法及び表面修飾基板の製造システム
JP5520515B2 (ja) * 2009-04-15 2014-06-11 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP5658534B2 (ja) * 2009-11-10 2015-01-28 住友化学株式会社 レジスト組成物
JP5851688B2 (ja) * 2009-12-31 2016-02-03 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 感光性組成物
JP5756672B2 (ja) * 2010-04-27 2015-07-29 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 光酸発生剤およびこれを含むフォトレジスト
KR101219723B1 (ko) * 2010-09-07 2013-01-08 (주) 에스엠씨 설포늄 염 및 이의 제조방법
JP2012136507A (ja) 2010-11-15 2012-07-19 Rohm & Haas Electronic Materials Llc 塩基反応性光酸発生剤およびこれを含むフォトレジスト
KR101229312B1 (ko) 2011-01-03 2013-02-04 금호석유화학 주식회사 술포늄 화합물, 광산발생제 및 이의 제조방법
KR101229314B1 (ko) 2011-02-07 2013-02-04 금호석유화학 주식회사 광산발생제, 이의 제조 방법 및 이를 포함하는 레지스트 조성물
KR101332316B1 (ko) 2011-02-07 2013-11-22 금호석유화학 주식회사 광산발생제, 이의 제조 방법 및 이를 포함하는 레지스트 조성물
US8728715B2 (en) 2012-01-13 2014-05-20 Funai Electric Co., Ltd. Non-photosensitive siloxane coating for processing hydrophobic photoimageable nozzle plate
JP6195552B2 (ja) * 2014-02-21 2017-09-13 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、及び、パターン形成方法、並びに、これらを用いた電子デバイスの製造方法
US10345700B2 (en) 2014-09-08 2019-07-09 International Business Machines Corporation Negative-tone resist compositions and multifunctional polymers therein
US9926476B2 (en) * 2016-04-22 2018-03-27 Addison Clear Wave Coatings Inc. Dual cure epoxy adhesives
SG11202006176YA (en) * 2018-01-12 2020-07-29 Fujifilm Corp Chemical solution and method for treating substrate
JP7297442B2 (ja) * 2018-12-27 2023-06-26 キヤノン株式会社 微細構造体の製造方法及び液体吐出ヘッドの製造方法
CN109799291B (zh) * 2018-12-27 2021-06-01 通标标准技术服务有限公司 测定样品中全氟化合物的方法

Family Cites Families (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE295421C (de)
US2732398A (en) 1953-01-29 1956-01-24 cafiicfzsojk
US3708296A (en) 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
US4250311A (en) 1974-05-02 1981-02-10 General Electric Company P, As, and Sb hexafluoride onium salts as photoinitiators
GB1512981A (en) 1974-05-02 1978-06-01 Gen Electric Curable epoxide compositions
US4058400A (en) 1974-05-02 1977-11-15 General Electric Company Cationically polymerizable compositions containing group VIa onium salts
US4264703A (en) 1974-05-02 1981-04-28 General Electric Company Cationically polymerizable compositions containing photodecomposable aromatic iodonium salts
US4216288A (en) 1978-09-08 1980-08-05 General Electric Company Heat curable cationically polymerizable compositions and method of curing same with onium salts and reducing agents
US4304705A (en) 1980-01-02 1981-12-08 Minnesota Mining And Manufacturing Company Radiation-curable polymers containing pendant unsaturated peptide groups derived from azlactone polymers
JPS5710651A (en) 1980-06-23 1982-01-20 Asahi Denka Kogyo Kk Coating material composition
US4329478A (en) 1981-01-30 1982-05-11 Minnesota Mining And Manufacturing Company Cyclic perfluoroaliphaticdisulfonic acid anhydrides
US4423197A (en) 1981-12-01 1983-12-27 Minnesota Mining And Manufacturing Company Cyclic perfluoroaliphatic-disulfonic acid anhydrides and sulfonamide derivatives thereof
EP0094914B1 (de) 1982-05-19 1986-09-24 Ciba-Geigy Ag Photopolymerisation mittels organometallischer Salze
EP0094915B1 (de) 1982-05-19 1987-01-21 Ciba-Geigy Ag Härtbare, Metallocenkomplexe enthaltende Zusammensetzungen, daraus erhältliche aktivierte Vorstufen und deren Verwendung
US5089536A (en) 1982-11-22 1992-02-18 Minnesota Mining And Manufacturing Company Energy polmerizable compositions containing organometallic initiators
US5073476A (en) 1983-05-18 1991-12-17 Ciba-Geigy Corporation Curable composition and the use thereof
US4503211A (en) 1984-05-31 1985-03-05 Minnesota Mining And Manufacturing Co. Epoxy resin curing agent, process and composition
US4677137A (en) 1985-05-31 1987-06-30 Minnesota Mining And Manufacturing Company Supported photoinitiator
ES2039691T3 (es) 1987-06-05 1993-10-01 Ciba-Geigy Ag Mezclas polimerizables cationicamente, que contienen endurecedores seleccionados.
US4920182A (en) 1987-12-18 1990-04-24 Ciba-Geigy Corporation Epoxy resin compositions containing polyester flexibilizer and metallocene complex initiator
US4933377A (en) 1988-02-29 1990-06-12 Saeva Franklin D Novel sulfonium salts and the use thereof as photoinitiators
US4985340A (en) 1988-06-01 1991-01-15 Minnesota Mining And Manufacturing Company Energy curable compositions: two component curing agents
US5215860A (en) 1988-08-19 1993-06-01 Minnesota Mining And Manufacturing Company Energy-curable cyanate compositions
US5084586A (en) 1990-02-12 1992-01-28 Minnesota Mining And Manufacturing Company Novel initiators for cationic polymerization
US5124417A (en) 1990-02-12 1992-06-23 Minnesota Mining And Manufacturing Company Initiators for cationic polymerization
DD295421A5 (de) 1990-06-19 1991-10-31 Humboldt-Universitaet Zu Berlin,Direktorat Fuer Forschung,De Positiv arbeitender photokopierlack mit chemischer verstaerkung
US5143785A (en) 1990-08-20 1992-09-01 Minnesota Mining And Manufacturing Company Cyanate ester adhesives for electronic applications
US5627292A (en) * 1992-02-21 1997-05-06 Centre National De La Recherche Scientifique Monomers derived from perhalogenated sultones and polymers obtained from these monomers
US5413785A (en) * 1993-01-27 1995-05-09 New England Deaconess Hospital Corp. Methodology employing lactobacillus GG for reduction of plasma endotoxin levels circulating in-vivo
KR100230971B1 (ko) 1994-01-28 1999-11-15 가나가와 지히로 술포늄 염 및 레지스트 조성물 (Sulfonium Salt and Resist Composition)
JP2964874B2 (ja) 1994-06-10 1999-10-18 信越化学工業株式会社 化学増幅ポジ型レジスト材料
US5554664A (en) 1995-03-06 1996-09-10 Minnesota Mining And Manufacturing Company Energy-activatable salts with fluorocarbon anions
US5688884A (en) 1995-08-31 1997-11-18 E. I. Du Pont De Nemours And Company Polymerization process
US5731364A (en) 1996-01-24 1998-03-24 Shipley Company, L.L.C. Photoimageable compositions comprising multiple arylsulfonium photoactive compounds
TWI250379B (en) 1998-08-07 2006-03-01 Az Electronic Materials Japan Chemical amplified radiation-sensitive composition which contains onium salt and generator
KR20010040187A (ko) 1999-10-28 2001-05-15 무네유키 가코우 포지티브 포토레지스트 조성물
JP4023086B2 (ja) 1999-12-27 2007-12-19 和光純薬工業株式会社 スルホニウム塩化合物
US6723483B1 (en) * 1999-12-27 2004-04-20 Wako Pure Chemical Industries, Ltd. Sulfonium salt compounds
US6749987B2 (en) * 2000-10-20 2004-06-15 Fuji Photo Film Co., Ltd. Positive photosensitive composition
JP4262402B2 (ja) * 2000-10-20 2009-05-13 富士フイルム株式会社 ポジ型レジスト組成物
US6849374B2 (en) 2000-11-03 2005-02-01 Shipley Company, L.L.C. Photoacid generators and photoresists comprising same
JP3837066B2 (ja) * 2000-12-15 2006-10-25 サンアプロ株式会社 スルホニウム塩の製造方法
JP2002236364A (ja) * 2001-02-08 2002-08-23 Fuji Photo Film Co Ltd 電子線又はｘ線用ネガ型レジスト組成物
JP2002255930A (ja) * 2001-03-01 2002-09-11 Fuji Photo Film Co Ltd 光酸発生化合物、及びポジ型レジスト組成物
JP2002265436A (ja) * 2001-03-08 2002-09-18 Fuji Photo Film Co Ltd ポジ型レジスト組成物
WO2002082185A1 (en) 2001-04-05 2002-10-17 Arch Specialty Chemicals, Inc. Perfluoroalkylsulfonic acid compounds for photoresists
CN1916760B (zh) 2001-06-29 2010-10-13 Jsr株式会社 酸发生剂、磺酸、磺酸衍生物及辐射敏感树脂组合物

Also Published As

Publication number Publication date
US20050158655A1 (en) 2005-07-21
EP1556740A2 (de) 2005-07-27
KR20050071645A (ko) 2005-07-07
AU2003286528A1 (en) 2004-06-07
JP2006504785A (ja) 2006-02-09
US7078444B2 (en) 2006-07-18
US20040087690A1 (en) 2004-05-06
KR101010405B1 (ko) 2011-01-21
AU2003286528A8 (en) 2004-06-07
WO2004042473A2 (en) 2004-05-21
US6841333B2 (en) 2005-01-11
WO2004042473A3 (en) 2004-07-01
EP1556740B1 (de) 2012-03-21

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