ATE538404T1 - Optisches system, objektivtubus; belichtungssystem und bauelemente- herstellungsverfahren - Google Patents

Optisches system, objektivtubus; belichtungssystem und bauelemente- herstellungsverfahren

Info

Publication number
ATE538404T1
ATE538404T1 AT05795711T AT05795711T ATE538404T1 AT E538404 T1 ATE538404 T1 AT E538404T1 AT 05795711 T AT05795711 T AT 05795711T AT 05795711 T AT05795711 T AT 05795711T AT E538404 T1 ATE538404 T1 AT E538404T1
Authority
AT
Austria
Prior art keywords
optical element
optical system
rigid body
optical
drive mechanisms
Prior art date
Application number
AT05795711T
Other languages
English (en)
Inventor
Mitsuo Ishikawa
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of ATE538404T1 publication Critical patent/ATE538404T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1827—Motorised alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Eyeglasses (AREA)
AT05795711T 2004-10-26 2005-10-24 Optisches system, objektivtubus; belichtungssystem und bauelemente- herstellungsverfahren ATE538404T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004311482 2004-10-26
PCT/JP2005/019495 WO2006046507A1 (ja) 2004-10-26 2005-10-24 光学装置、鏡筒、露光装置、及びデバイスの製造方法

Publications (1)

Publication Number Publication Date
ATE538404T1 true ATE538404T1 (de) 2012-01-15

Family

ID=36227746

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05795711T ATE538404T1 (de) 2004-10-26 2005-10-24 Optisches system, objektivtubus; belichtungssystem und bauelemente- herstellungsverfahren

Country Status (8)

Country Link
US (1) US7692884B2 (de)
EP (1) EP1806610B1 (de)
JP (1) JP4893310B2 (de)
KR (1) KR101249598B1 (de)
CN (1) CN101048690A (de)
AT (1) ATE538404T1 (de)
TW (1) TWI409516B (de)
WO (1) WO2006046507A1 (de)

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DE102004025832A1 (de) * 2004-05-24 2005-12-22 Carl Zeiss Smt Ag Optikmodul für ein Objektiv
DE102006038455A1 (de) * 2006-08-16 2008-02-21 Carl Zeiss Smt Ag Optisches System für die Halbleiterlithographie
US7898204B2 (en) * 2007-01-05 2011-03-01 Active Precision, Inc. High-speed substrate manipulator
EP1950594A1 (de) 2007-01-17 2008-07-30 Carl Zeiss SMT AG Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik
DE102007047109A1 (de) * 2007-10-01 2009-04-09 Carl Zeiss Smt Ag Optisches System, insbesondere Projektionsobjektiv der Mikrolithographie
DE102008033340B3 (de) 2008-07-16 2010-04-08 Carl Zeiss Smt Ag Abbildende Optik
KR100930832B1 (ko) * 2009-03-26 2009-12-10 삼성탈레스 주식회사 광학 부재 정렬 장치
JP2012524988A (ja) * 2009-04-27 2012-10-18 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置および方法
CN103038690B (zh) * 2010-07-30 2016-08-03 卡尔蔡司Smt有限责任公司 成像光学系统以及具有该类型成像光学系统的用于微光刻的投射曝光设备
JP6309765B2 (ja) * 2010-12-20 2018-04-11 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子を取り付ける配置構成
NL2009902A (en) 2011-12-27 2013-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
CN102540386B (zh) * 2012-02-07 2013-09-18 中国科学院光电技术研究所 一种动镜弹性支撑装置
DE102012202170A1 (de) * 2012-02-14 2013-06-13 Carl Zeiss Smt Gmbh Positionsmanipulator für ein optisches Bauelement
US10586625B2 (en) 2012-05-14 2020-03-10 Asml Netherlands B.V. Vacuum chamber arrangement for charged particle beam generator
WO2014010274A1 (ja) * 2012-07-13 2014-01-16 株式会社ニコン 基板処理装置、及びデバイス製造方法
JP6051640B2 (ja) * 2012-07-19 2016-12-27 コニカミノルタ株式会社 光学部材の保持構造、光学装置及び画像形成装置
CN104076612B (zh) * 2013-03-27 2016-04-20 上海微电子装备有限公司 重载荷柔性支撑装置
CN103676065B (zh) * 2013-10-31 2016-01-06 中国科学院上海光学精密机械研究所 大口径透镜的调整固定装置
NL2013814B1 (en) 2013-11-14 2016-05-10 Mapper Lithography Ip Bv Multi-electrode vacuum arrangement.
DE102014218969A1 (de) 2014-09-22 2016-04-28 Carl Zeiss Smt Gmbh Optische Anordnung einer mikrolithographischen Projektionsbelichtungsanlage
WO2017207016A1 (en) * 2016-05-30 2017-12-07 Carl Zeiss Smt Gmbh Optical imaging arrangement with a piezoelectric device
CN109212712B (zh) * 2017-07-07 2022-03-29 台湾东电化股份有限公司 驱动机构
US10678018B2 (en) * 2017-10-23 2020-06-09 Magna Electronics Inc. Camera for vehicle vision system with replaceable lens
DE102018200178A1 (de) * 2018-01-08 2019-01-10 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit reduzierter parasitärer Deformation von Komponenten
DE102018200956A1 (de) * 2018-01-22 2018-12-27 Carl Zeiss Smt Gmbh Optisches Element zur Strahlführung von Abbildungslicht bei der Projektionslithographie
DE102018200954A1 (de) * 2018-01-22 2019-07-25 Carl Zeiss Smt Gmbh Optisches Element zur Strahlführung von Abbildungslicht bei der Projektionslithographie
EP3896488A4 (de) * 2018-12-18 2022-01-12 SZ DJI Technology Co., Ltd. Lasermessvorrichtung und unbemanntes luftfahrzeug
JP7297555B2 (ja) * 2019-06-27 2023-06-26 キヤノン株式会社 調整方法及び保持装置
CN110703454B (zh) * 2019-09-02 2021-11-02 中国航空工业集团公司洛阳电光设备研究所 一种不对称透镜的装调方法
CN110794546A (zh) * 2019-11-24 2020-02-14 北京长峰科威光电技术有限公司 一种六轴并联压电致动镜框姿态自动调节系统及方法
DE102019219274A1 (de) * 2019-12-10 2021-01-21 Carl Zeiss Smt Gmbh Spiegel für eine Projektionsbelichtungsanlage, Projektionsoptik und Projektionsbelichtungsanlage für die Halbleitertechnologie
CN113204095A (zh) * 2021-04-30 2021-08-03 长光卫星技术有限公司 一种适用于空间相机的轻质量多功能次镜支撑结构
CN115980962A (zh) * 2022-11-30 2023-04-18 中国科学院长春光学精密机械与物理研究所 一种聚光结构、装置以及系统
DE102023212554A1 (de) 2023-12-12 2025-01-23 Carl Zeiss Smt Gmbh Baugruppe für eine optische Komponente

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US6043863A (en) 1996-11-14 2000-03-28 Nikon Corporation Holder for reflecting member and exposure apparatus having the same
JPH10256147A (ja) * 1997-03-13 1998-09-25 Nikon Corp 露光装置
JPH11315883A (ja) * 1998-04-30 1999-11-16 Canon Inc 除振装置、露光装置およびデバイス製造方法
JPH11345761A (ja) 1998-05-29 1999-12-14 Nikon Corp 走査型露光装置
AU5653699A (en) * 1999-09-20 2001-04-24 Nikon Corporation Parallel link mechanism, exposure system and method of manufacturing the same, and method of manufacturing devices
JP2002267907A (ja) * 2001-03-14 2002-09-18 Canon Inc 光学要素支持方法、光学系の調整方法、露光装置の調整方法、光学要素支持装置、光学系および露光装置
KR20030056817A (ko) * 2001-12-28 2003-07-04 삼성전기주식회사 광픽업 액츄에이터
JP2004034101A (ja) 2002-07-04 2004-02-05 Kawasaki Heavy Ind Ltd スキンパスミルの制御方法およびスキンパスミル
CN100462762C (zh) * 2002-07-31 2009-02-18 佳能株式会社 保持器,曝光装置及设备的制造方法
JP2004138926A (ja) 2002-10-21 2004-05-13 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2004253105A (ja) * 2003-02-21 2004-09-09 Noritoshi Yomoda 情報記録読取装置における情報検出ヘッド駆動機構
JP3944095B2 (ja) * 2003-02-26 2007-07-11 キヤノン株式会社 保持装置
JP2004343101A (ja) * 2003-04-25 2004-12-02 Canon Inc 駆動機構、それを有する露光装置、デバイスの製造方法
US7760452B2 (en) 2003-04-25 2010-07-20 Canon Kabushiki Kaisha Driving apparatus, optical system, exposure apparatus and device fabrication method
JP4649136B2 (ja) * 2003-07-31 2011-03-09 キヤノン株式会社 アクチュエータ、露光装置及びデバイス製造方法
EP1725910A2 (de) * 2004-02-25 2006-11-29 Carl Zeiss SMT AG Vorrichtung, die aus mindestens einem optischen element besteht

Also Published As

Publication number Publication date
EP1806610A4 (de) 2010-09-29
EP1806610A1 (de) 2007-07-11
TW200630659A (en) 2006-09-01
US20080055756A1 (en) 2008-03-06
JP4893310B2 (ja) 2012-03-07
TWI409516B (zh) 2013-09-21
US7692884B2 (en) 2010-04-06
KR20070063503A (ko) 2007-06-19
EP1806610B1 (de) 2011-12-21
KR101249598B1 (ko) 2013-04-01
JPWO2006046507A1 (ja) 2008-05-22
WO2006046507A1 (ja) 2006-05-04
CN101048690A (zh) 2007-10-03

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