ATE538404T1 - Optisches system, objektivtubus; belichtungssystem und bauelemente- herstellungsverfahren - Google Patents
Optisches system, objektivtubus; belichtungssystem und bauelemente- herstellungsverfahrenInfo
- Publication number
- ATE538404T1 ATE538404T1 AT05795711T AT05795711T ATE538404T1 AT E538404 T1 ATE538404 T1 AT E538404T1 AT 05795711 T AT05795711 T AT 05795711T AT 05795711 T AT05795711 T AT 05795711T AT E538404 T1 ATE538404 T1 AT E538404T1
- Authority
- AT
- Austria
- Prior art keywords
- optical element
- optical system
- rigid body
- optical
- drive mechanisms
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title abstract 8
- 238000004519 manufacturing process Methods 0.000 title 1
- 230000007246 mechanism Effects 0.000 abstract 4
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
- G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
- G02B7/1827—Motorised alignment
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70766—Reaction force control means, e.g. countermass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Eyeglasses (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004311482 | 2004-10-26 | ||
PCT/JP2005/019495 WO2006046507A1 (ja) | 2004-10-26 | 2005-10-24 | 光学装置、鏡筒、露光装置、及びデバイスの製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE538404T1 true ATE538404T1 (de) | 2012-01-15 |
Family
ID=36227746
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT05795711T ATE538404T1 (de) | 2004-10-26 | 2005-10-24 | Optisches system, objektivtubus; belichtungssystem und bauelemente- herstellungsverfahren |
Country Status (8)
Country | Link |
---|---|
US (1) | US7692884B2 (de) |
EP (1) | EP1806610B1 (de) |
JP (1) | JP4893310B2 (de) |
KR (1) | KR101249598B1 (de) |
CN (1) | CN101048690A (de) |
AT (1) | ATE538404T1 (de) |
TW (1) | TWI409516B (de) |
WO (1) | WO2006046507A1 (de) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004025832A1 (de) * | 2004-05-24 | 2005-12-22 | Carl Zeiss Smt Ag | Optikmodul für ein Objektiv |
DE102006038455A1 (de) * | 2006-08-16 | 2008-02-21 | Carl Zeiss Smt Ag | Optisches System für die Halbleiterlithographie |
US7898204B2 (en) * | 2007-01-05 | 2011-03-01 | Active Precision, Inc. | High-speed substrate manipulator |
EP1950594A1 (de) | 2007-01-17 | 2008-07-30 | Carl Zeiss SMT AG | Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik |
DE102007047109A1 (de) * | 2007-10-01 | 2009-04-09 | Carl Zeiss Smt Ag | Optisches System, insbesondere Projektionsobjektiv der Mikrolithographie |
DE102008033340B3 (de) | 2008-07-16 | 2010-04-08 | Carl Zeiss Smt Ag | Abbildende Optik |
KR100930832B1 (ko) * | 2009-03-26 | 2009-12-10 | 삼성탈레스 주식회사 | 광학 부재 정렬 장치 |
US20120044471A1 (en) * | 2009-04-27 | 2012-02-23 | Asml Netherlands B.V. | Lithographic Apparatus and Method |
WO2012013241A1 (en) * | 2010-07-30 | 2012-02-02 | Carl Zeiss Smt Gmbh | Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type |
WO2012084675A1 (en) * | 2010-12-20 | 2012-06-28 | Carl Zeiss Smt Gmbh | Arrangement for mounting an optical element |
NL2009902A (en) * | 2011-12-27 | 2013-07-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
CN102540386B (zh) * | 2012-02-07 | 2013-09-18 | 中国科学院光电技术研究所 | 一种动镜弹性支撑装置 |
DE102012202170A1 (de) * | 2012-02-14 | 2013-06-13 | Carl Zeiss Smt Gmbh | Positionsmanipulator für ein optisches Bauelement |
US10586625B2 (en) | 2012-05-14 | 2020-03-10 | Asml Netherlands B.V. | Vacuum chamber arrangement for charged particle beam generator |
KR101880792B1 (ko) * | 2012-07-13 | 2018-07-20 | 가부시키가이샤 니콘 | 기판 처리 장치 및 디바이스 제조 방법 |
JP6051640B2 (ja) * | 2012-07-19 | 2016-12-27 | コニカミノルタ株式会社 | 光学部材の保持構造、光学装置及び画像形成装置 |
CN104076612B (zh) * | 2013-03-27 | 2016-04-20 | 上海微电子装备有限公司 | 重载荷柔性支撑装置 |
CN103676065B (zh) * | 2013-10-31 | 2016-01-06 | 中国科学院上海光学精密机械研究所 | 大口径透镜的调整固定装置 |
CN108962708A (zh) | 2013-11-14 | 2018-12-07 | 迈普尔平版印刷Ip有限公司 | 电极堆栈布置 |
DE102014218969A1 (de) | 2014-09-22 | 2016-04-28 | Carl Zeiss Smt Gmbh | Optische Anordnung einer mikrolithographischen Projektionsbelichtungsanlage |
WO2017207016A1 (en) * | 2016-05-30 | 2017-12-07 | Carl Zeiss Smt Gmbh | Optical imaging arrangement with a piezoelectric device |
CN109212712B (zh) * | 2017-07-07 | 2022-03-29 | 台湾东电化股份有限公司 | 驱动机构 |
US10678018B2 (en) * | 2017-10-23 | 2020-06-09 | Magna Electronics Inc. | Camera for vehicle vision system with replaceable lens |
DE102018200178A1 (de) * | 2018-01-08 | 2019-01-10 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage mit reduzierter parasitärer Deformation von Komponenten |
DE102018200956A1 (de) * | 2018-01-22 | 2018-12-27 | Carl Zeiss Smt Gmbh | Optisches Element zur Strahlführung von Abbildungslicht bei der Projektionslithographie |
DE102018200954A1 (de) * | 2018-01-22 | 2019-07-25 | Carl Zeiss Smt Gmbh | Optisches Element zur Strahlführung von Abbildungslicht bei der Projektionslithographie |
EP3896488A4 (de) * | 2018-12-18 | 2022-01-12 | SZ DJI Technology Co., Ltd. | Lasermessvorrichtung und unbemanntes luftfahrzeug |
JP7297555B2 (ja) * | 2019-06-27 | 2023-06-26 | キヤノン株式会社 | 調整方法及び保持装置 |
CN110703454B (zh) * | 2019-09-02 | 2021-11-02 | 中国航空工业集团公司洛阳电光设备研究所 | 一种不对称透镜的装调方法 |
CN110794546A (zh) * | 2019-11-24 | 2020-02-14 | 北京长峰科威光电技术有限公司 | 一种六轴并联压电致动镜框姿态自动调节系统及方法 |
DE102019219274A1 (de) * | 2019-12-10 | 2021-01-21 | Carl Zeiss Smt Gmbh | Spiegel für eine Projektionsbelichtungsanlage, Projektionsoptik und Projektionsbelichtungsanlage für die Halbleitertechnologie |
CN113204095A (zh) * | 2021-04-30 | 2021-08-03 | 长光卫星技术有限公司 | 一种适用于空间相机的轻质量多功能次镜支撑结构 |
CN115980962A (zh) * | 2022-11-30 | 2023-04-18 | 中国科学院长春光学精密机械与物理研究所 | 一种聚光结构、装置以及系统 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6043863A (en) | 1996-11-14 | 2000-03-28 | Nikon Corporation | Holder for reflecting member and exposure apparatus having the same |
JPH10256147A (ja) * | 1997-03-13 | 1998-09-25 | Nikon Corp | 露光装置 |
JPH11315883A (ja) * | 1998-04-30 | 1999-11-16 | Canon Inc | 除振装置、露光装置およびデバイス製造方法 |
JPH11345761A (ja) | 1998-05-29 | 1999-12-14 | Nikon Corp | 走査型露光装置 |
AU5653699A (en) * | 1999-09-20 | 2001-04-24 | Nikon Corporation | Parallel link mechanism, exposure system and method of manufacturing the same, and method of manufacturing devices |
JP2002267907A (ja) * | 2001-03-14 | 2002-09-18 | Canon Inc | 光学要素支持方法、光学系の調整方法、露光装置の調整方法、光学要素支持装置、光学系および露光装置 |
KR20030056817A (ko) * | 2001-12-28 | 2003-07-04 | 삼성전기주식회사 | 광픽업 액츄에이터 |
JP2004034101A (ja) | 2002-07-04 | 2004-02-05 | Kawasaki Heavy Ind Ltd | スキンパスミルの制御方法およびスキンパスミル |
KR20050033621A (ko) * | 2002-07-31 | 2005-04-12 | 캐논 가부시끼가이샤 | 리테이너, 노광장치 및 디바이스 제조방법 |
JP2004138926A (ja) | 2002-10-21 | 2004-05-13 | Nikon Corp | 投影光学系および該投影光学系を備えた露光装置 |
JP2004253105A (ja) * | 2003-02-21 | 2004-09-09 | Noritoshi Yomoda | 情報記録読取装置における情報検出ヘッド駆動機構 |
JP3944095B2 (ja) * | 2003-02-26 | 2007-07-11 | キヤノン株式会社 | 保持装置 |
JP2004343101A (ja) * | 2003-04-25 | 2004-12-02 | Canon Inc | 駆動機構、それを有する露光装置、デバイスの製造方法 |
US7760452B2 (en) | 2003-04-25 | 2010-07-20 | Canon Kabushiki Kaisha | Driving apparatus, optical system, exposure apparatus and device fabrication method |
JP4649136B2 (ja) * | 2003-07-31 | 2011-03-09 | キヤノン株式会社 | アクチュエータ、露光装置及びデバイス製造方法 |
JP2007528125A (ja) * | 2004-02-25 | 2007-10-04 | カール ツァイス エスエムテー アクチェンゲゼルシャフト | 少なくとも一つの光学部品で構成される機器 |
-
2005
- 2005-10-24 CN CNA200580036490XA patent/CN101048690A/zh active Pending
- 2005-10-24 KR KR1020077004007A patent/KR101249598B1/ko active IP Right Grant
- 2005-10-24 WO PCT/JP2005/019495 patent/WO2006046507A1/ja active Application Filing
- 2005-10-24 EP EP05795711A patent/EP1806610B1/de active Active
- 2005-10-24 AT AT05795711T patent/ATE538404T1/de active
- 2005-10-24 JP JP2006543129A patent/JP4893310B2/ja active Active
- 2005-10-24 US US11/666,166 patent/US7692884B2/en active Active
- 2005-10-25 TW TW094137266A patent/TWI409516B/zh active
Also Published As
Publication number | Publication date |
---|---|
TW200630659A (en) | 2006-09-01 |
US7692884B2 (en) | 2010-04-06 |
EP1806610B1 (de) | 2011-12-21 |
TWI409516B (zh) | 2013-09-21 |
US20080055756A1 (en) | 2008-03-06 |
CN101048690A (zh) | 2007-10-03 |
KR101249598B1 (ko) | 2013-04-01 |
JPWO2006046507A1 (ja) | 2008-05-22 |
KR20070063503A (ko) | 2007-06-19 |
WO2006046507A1 (ja) | 2006-05-04 |
JP4893310B2 (ja) | 2012-03-07 |
EP1806610A1 (de) | 2007-07-11 |
EP1806610A4 (de) | 2010-09-29 |
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