ATE524824T1 - Verfahren zur wiederherstellung der ätzrate und der ätzeinheitlichkeit bei siliziumelektrodenanordnungen - Google Patents

Verfahren zur wiederherstellung der ätzrate und der ätzeinheitlichkeit bei siliziumelektrodenanordnungen

Info

Publication number
ATE524824T1
ATE524824T1 AT05854136T AT05854136T ATE524824T1 AT E524824 T1 ATE524824 T1 AT E524824T1 AT 05854136 T AT05854136 T AT 05854136T AT 05854136 T AT05854136 T AT 05854136T AT E524824 T1 ATE524824 T1 AT E524824T1
Authority
AT
Austria
Prior art keywords
restoring
uniformity
etch rate
silicon electrode
electrode arrangements
Prior art date
Application number
AT05854136T
Other languages
English (en)
Inventor
Tuochuan Huang
Daxing Ren
Hong Shih
Catherine Zhou
Chun Yan
Enrico Magni
Bi Yen
Jerome Hubacek
Dae Lim
Dougyong Sung
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Application granted granted Critical
Publication of ATE524824T1 publication Critical patent/ATE524824T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32605—Removable or replaceable electrodes or electrode systems
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0421—Apparatus for fluid treatment for etching for drying etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/003—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods using material which dissolves or changes phase after the treatment, e.g. ice, CO2
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Chemical Vapour Deposition (AREA)
  • Weting (AREA)
  • Cleaning By Liquid Or Steam (AREA)
AT05854136T 2004-12-23 2005-12-15 Verfahren zur wiederherstellung der ätzrate und der ätzeinheitlichkeit bei siliziumelektrodenanordnungen ATE524824T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/019,729 US7442114B2 (en) 2004-12-23 2004-12-23 Methods for silicon electrode assembly etch rate and etch uniformity recovery
PCT/US2005/045361 WO2006071544A2 (en) 2004-12-23 2005-12-15 Methods for silicon electrode assembly etch rate and etch uniformity recovery

Publications (1)

Publication Number Publication Date
ATE524824T1 true ATE524824T1 (de) 2011-09-15

Family

ID=36610172

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05854136T ATE524824T1 (de) 2004-12-23 2005-12-15 Verfahren zur wiederherstellung der ätzrate und der ätzeinheitlichkeit bei siliziumelektrodenanordnungen

Country Status (8)

Country Link
US (1) US7442114B2 (de)
EP (1) EP1848597B1 (de)
JP (1) JP5059620B2 (de)
KR (1) KR101264448B1 (de)
CN (1) CN101137461A (de)
AT (1) ATE524824T1 (de)
TW (1) TWI385723B (de)
WO (1) WO2006071544A2 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7854820B2 (en) * 2006-10-16 2010-12-21 Lam Research Corporation Upper electrode backing member with particle reducing features
US8702866B2 (en) 2006-12-18 2014-04-22 Lam Research Corporation Showerhead electrode assembly with gas flow modification for extended electrode life
US7767028B2 (en) * 2007-03-14 2010-08-03 Lam Research Corporation Cleaning hardware kit for composite showerhead electrode assemblies for plasma processing apparatuses
US8171877B2 (en) * 2007-03-14 2012-05-08 Lam Research Corporation Backside mounted electrode carriers and assemblies incorporating the same
US7578889B2 (en) * 2007-03-30 2009-08-25 Lam Research Corporation Methodology for cleaning of surface metal contamination from electrode assemblies
US8221552B2 (en) * 2007-03-30 2012-07-17 Lam Research Corporation Cleaning of bonded silicon electrodes
US8292698B1 (en) 2007-03-30 2012-10-23 Lam Research Corporation On-line chamber cleaning using dry ice blasting
US7736441B2 (en) * 2007-10-09 2010-06-15 Lam Research Corporation Cleaning fixtures and methods of cleaning electrode assembly plenums
US8075701B2 (en) * 2008-06-30 2011-12-13 Lam Research Corporation Processes for reconditioning multi-component electrodes
US8276604B2 (en) * 2008-06-30 2012-10-02 Lam Research Corporation Peripherally engaging electrode carriers and assemblies incorporating the same
US8075703B2 (en) * 2008-12-10 2011-12-13 Lam Research Corporation Immersive oxidation and etching process for cleaning silicon electrodes
US20100140222A1 (en) * 2008-12-10 2010-06-10 Sun Jennifer Y Filled polymer composition for etch chamber component
SG181424A1 (en) * 2009-12-18 2012-07-30 Lam Res Corp Methodology for cleaning of surface metal contamination from an upper electrode used in a plasma chamber
CN102420132B (zh) * 2011-05-26 2013-12-04 上海华力微电子有限公司 一种去除NiPt金属硅化物的方法
US9396912B2 (en) 2011-10-31 2016-07-19 Lam Research Corporation Methods for mixed acid cleaning of showerhead electrodes
CN102969256B (zh) * 2012-11-12 2015-06-17 上海华力微电子有限公司 蚀刻机台上电极黑硅的侦测方法
US8893702B2 (en) * 2013-02-20 2014-11-25 Lam Research Corporation Ductile mode machining methods for hard and brittle components of plasma processing apparatuses
US10391526B2 (en) 2013-12-12 2019-08-27 Lam Research Corporation Electrostatic chuck cleaning fixture
JP5944883B2 (ja) * 2013-12-18 2016-07-05 東京エレクトロン株式会社 粒子逆流防止部材及び基板処理装置
CN108231572A (zh) * 2016-12-21 2018-06-29 有研半导体材料有限公司 一种用于硅电极腐蚀的方法
US11776822B2 (en) * 2018-05-29 2023-10-03 Applied Materials, Inc. Wet cleaning of electrostatic chuck
EP3879604B1 (de) * 2018-11-09 2024-10-16 Grinergy Co.,Ltd. Oberflächenbehandlungsverfahren für lithium-metall-negativelektrode
CN109262377B (zh) * 2018-11-15 2019-09-03 首都师范大学 用于钝化CsI(TI)晶体表面缺陷的抛光工艺
CN111900070A (zh) * 2020-07-16 2020-11-06 上海富乐德智能科技发展有限公司 半导体高阶制程蚀刻装置硅部件的再生清洗和返修方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63156661A (ja) * 1986-12-18 1988-06-29 Fujitsu Ltd ウエ−ハ研磨装置
US5622875A (en) * 1994-05-06 1997-04-22 Kobe Precision, Inc. Method for reclaiming substrate from semiconductor wafers
JPH08274069A (ja) * 1995-03-30 1996-10-18 Sumitomo Sitix Corp プラズマエッチング装置用シリコン電極装置
US6004400A (en) * 1997-07-09 1999-12-21 Phillip W. Bishop Carbon dioxide cleaning process
US6284345B1 (en) * 1997-12-08 2001-09-04 Washington University Designer particles of micron and submicron dimension
US6073577A (en) * 1998-06-30 2000-06-13 Lam Research Corporation Electrode for plasma processes and method for manufacture and use thereof
US6276997B1 (en) * 1998-12-23 2001-08-21 Shinhwa Li Use of chemical mechanical polishing and/or poly-vinyl-acetate scrubbing to restore quality of used semiconductor wafers
JP2000334798A (ja) * 1999-05-31 2000-12-05 Aoki Technical Laboratory Inc コア型を可動自在に備えた型締装置の油圧回路
JP4554011B2 (ja) * 1999-08-10 2010-09-29 ルネサスエレクトロニクス株式会社 半導体集積回路装置の製造方法
US6399499B1 (en) 1999-09-14 2002-06-04 Jeong Gey Lee Method for fabricating an electrode of a plasma chamber
JP4145457B2 (ja) * 2000-02-08 2008-09-03 信越化学工業株式会社 プラズマエッチング装置用電極板
AU2001286453A1 (en) 2000-08-11 2002-02-25 Chem Trace Corporation System and method for cleaning semiconductor fabrication equipment parts
US6656894B2 (en) 2000-12-07 2003-12-02 Ashland Inc. Method for cleaning etcher parts
US7008874B2 (en) * 2000-12-19 2006-03-07 Memc Electronics Materials, Inc. Process for reclaiming semiconductor wafers and reclaimed wafers
US20020127853A1 (en) * 2000-12-29 2002-09-12 Hubacek Jerome S. Electrode for plasma processes and method for manufacture and use thereof
JP4456769B2 (ja) * 2001-02-02 2010-04-28 川崎マイクロエレクトロニクス株式会社 フロロカーボン系プラズマ生成用シリコン製電極の洗浄方法およびこれを利用した半導体装置の製造方法
JP3876167B2 (ja) 2002-02-13 2007-01-31 川崎マイクロエレクトロニクス株式会社 洗浄方法および半導体装置の製造方法
US20040003828A1 (en) 2002-03-21 2004-01-08 Jackson David P. Precision surface treatments using dense fluids and a plasma
US20030221702A1 (en) 2002-05-28 2003-12-04 Peebles Henry C. Process for cleaning and repassivating semiconductor equipment parts
US6838012B2 (en) * 2002-10-31 2005-01-04 Lam Research Corporation Methods for etching dielectric materials
JP2004307253A (ja) * 2003-04-07 2004-11-04 New Japan Radio Co Ltd 半導体基板の製造方法
US6761625B1 (en) * 2003-05-20 2004-07-13 Intel Corporation Reclaiming virgin test wafers

Also Published As

Publication number Publication date
CN101137461A (zh) 2008-03-05
JP5059620B2 (ja) 2012-10-24
TW200641991A (en) 2006-12-01
JP2008525205A (ja) 2008-07-17
EP1848597A4 (de) 2010-04-14
KR20070089246A (ko) 2007-08-30
KR101264448B1 (ko) 2013-05-14
TWI385723B (zh) 2013-02-11
WO2006071544A2 (en) 2006-07-06
US20060138081A1 (en) 2006-06-29
EP1848597B1 (de) 2011-09-14
US7442114B2 (en) 2008-10-28
WO2006071544A3 (en) 2007-08-16
EP1848597A2 (de) 2007-10-31

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