ATE51422T1 - Hochkonzentrierte natriumpermanganatloesung und ihre anwendung beim entgraten und/oder aetzen gedruckter schaltungen. - Google Patents

Hochkonzentrierte natriumpermanganatloesung und ihre anwendung beim entgraten und/oder aetzen gedruckter schaltungen.

Info

Publication number
ATE51422T1
ATE51422T1 AT86302338T AT86302338T ATE51422T1 AT E51422 T1 ATE51422 T1 AT E51422T1 AT 86302338 T AT86302338 T AT 86302338T AT 86302338 T AT86302338 T AT 86302338T AT E51422 T1 ATE51422 T1 AT E51422T1
Authority
AT
Austria
Prior art keywords
solution
permangate
deburring
highly concentrated
printed circuits
Prior art date
Application number
AT86302338T
Other languages
English (en)
Inventor
Gerald Krulik
Original Assignee
Thiokol Morton Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thiokol Morton Inc filed Critical Thiokol Morton Inc
Application granted granted Critical
Publication of ATE51422T1 publication Critical patent/ATE51422T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/002—Etching of the substrate by chemical or physical means by liquid chemical etching
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22—Roughening, e.g. by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0055—After-treatment, e.g. cleaning or desmearing of holes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
    • H05K2203/0793—Aqueous alkaline solution, e.g. for cleaning or etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
    • H05K2203/0796—Oxidant in aqueous solution, e.g. permanganate
AT86302338T 1985-05-31 1986-03-27 Hochkonzentrierte natriumpermanganatloesung und ihre anwendung beim entgraten und/oder aetzen gedruckter schaltungen. ATE51422T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/739,599 US4601783A (en) 1985-05-31 1985-05-31 High concentration sodium permanganate etch batch and its use in desmearing and/or etching printed circuit boards
EP86302338A EP0207587B1 (de) 1985-05-31 1986-03-27 Hochkonzentrierte Natriumpermanganatlösung und ihre Anwendung beim Entgraten und/oder Ätzen gedruckter Schaltungen

Publications (1)

Publication Number Publication Date
ATE51422T1 true ATE51422T1 (de) 1990-04-15

Family

ID=24973020

Family Applications (1)

Application Number Title Priority Date Filing Date
AT86302338T ATE51422T1 (de) 1985-05-31 1986-03-27 Hochkonzentrierte natriumpermanganatloesung und ihre anwendung beim entgraten und/oder aetzen gedruckter schaltungen.

Country Status (15)

Country Link
US (1) US4601783A (de)
EP (1) EP0207587B1 (de)
JP (1) JP2562810B2 (de)
KR (1) KR900003470B1 (de)
AT (1) ATE51422T1 (de)
AU (1) AU580662B2 (de)
BR (1) BR8602230A (de)
CA (1) CA1254493A (de)
DE (2) DE3669896D1 (de)
DK (1) DK255286A (de)
ES (1) ES8801354A1 (de)
IL (1) IL78267A (de)
NO (1) NO166240C (de)
NZ (1) NZ215544A (de)
ZA (1) ZA862433B (de)

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US5019453A (en) * 1985-09-12 1991-05-28 Guerra Richard J Composite material and method of making same
US4935308A (en) * 1985-09-12 1990-06-19 Sanders Associates Composite material and method of making same
US4992335A (en) * 1985-09-12 1991-02-12 Sanders Associates, Inc. Composite material and method of making same
US4781853A (en) * 1986-12-01 1988-11-01 Harris Corp. Method of enhancing silicon etching capability of alkali hydroxide through the addition of positive valence impurity ions
US4940510A (en) * 1987-06-01 1990-07-10 Digital Equipment Corporation Method of etching in the presence of positive photoresist
US5032427A (en) * 1988-04-25 1991-07-16 Macdermid, Incorporated Process for preparation printed circuit through-holes for metallization
WO1989010431A1 (en) * 1988-04-25 1989-11-02 Macdermid, Incorporated Process and composition for preparing printed circuit through-holes for metallization
US4985293A (en) * 1989-08-14 1991-01-15 Eastman Kodak Company Polymer blend for molded circuit boards and other selectively conductive molded devices
US4917761A (en) * 1989-08-14 1990-04-17 Eastman Kodak Company Method of rendering polymeric materials hydrophilic for etching
US4978569A (en) * 1989-08-14 1990-12-18 Eastman Kodak Company Process for preparing selectively metallized articles
US4978422A (en) * 1990-03-20 1990-12-18 Macdermid, Incorporated Method for improving insulation resistance of printed circuits
GB2259812B (en) * 1991-09-06 1996-04-24 Toa Gosei Chem Ind Method for making multilayer printed circuit board having blind holes and resin-coated copper foil used for the method
US5221418A (en) * 1992-02-11 1993-06-22 Macdermid, Incorporated Method for improving the surface insulation resistance of printed circuits
US5286530A (en) * 1993-01-13 1994-02-15 General Electric Company Method for providing adherent metal coatings on cyanate ester polymer surfaces
US5366015A (en) * 1993-11-12 1994-11-22 Halliburton Company Method of cutting high strength materials with water soluble abrasives
US5700518A (en) * 1996-04-26 1997-12-23 Korea Institute Of Science And Technology Fabrication method for diamond-coated cemented carbide cutting tool
US5833759A (en) * 1996-11-08 1998-11-10 W. L. Gore & Associates, Inc. Method for preparing vias for subsequent metallization
US5985040A (en) * 1998-09-21 1999-11-16 Electrochemicals Inc. Permanganate desmear process for printed wiring boards
US6706326B1 (en) * 1999-07-16 2004-03-16 Enthone Inc. Process for plating plastics using a catalytic filler
DE69920892T2 (de) * 1999-07-16 2005-10-27 Enthone-Omi (Benelux) B.V. Verfahren zum Plattieren von Kunstoffen unter Verwendung eines katalitischen Fuellstoffes
US6454868B1 (en) 2000-04-17 2002-09-24 Electrochemicals Inc. Permanganate desmear process for printed wiring boards
WO2006114130A1 (en) * 2005-04-26 2006-11-02 Agilent Technologies, Inc. Enzymes with modified amino acids
US7354870B2 (en) 2005-11-14 2008-04-08 National Research Council Of Canada Process for chemical etching of parts fabricated by stereolithography
WO2009008273A1 (ja) * 2007-07-09 2009-01-15 Sumitomo Metal Mining Co., Ltd. プリント配線基板の製造方法および該製造方法により得られたプリント配線基板
JP2011082374A (ja) * 2009-10-08 2011-04-21 C Uyemura & Co Ltd 中和還元剤及びデスミア方法
JP5330474B2 (ja) * 2011-09-22 2013-10-30 上村工業株式会社 デスミア液及びデスミア処理方法
US8765001B2 (en) 2012-08-28 2014-07-01 Rohm And Haas Electronic Materials Llc Texturing of monocrystalline semiconductor substrates to reduce incident light reflectance
CN109321921A (zh) * 2018-09-28 2019-02-12 东莞优诺电子焊接材料有限公司 一种汽车模具pvd用的退镀液及其制备方法

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US1969678A (en) * 1931-09-25 1934-08-07 Dow Chemical Co Ferric chloride etching solutions
US2908557A (en) * 1957-01-07 1959-10-13 Rca Corp Method of etching copper
US3080323A (en) * 1959-04-07 1963-03-05 Purex Corp Ltd Composition for radioactive decontamination and descaling of cobalt alloys
US3293148A (en) * 1964-02-27 1966-12-20 Hooker Chemical Corp Method of cleaning steel surfaces
NL6606730A (de) * 1965-05-17 1966-11-18
US3457107A (en) * 1965-07-20 1969-07-22 Diversey Corp Method and composition for chemically polishing metals
AT310285B (de) * 1966-02-22 1973-09-25 Photocircuits Corp Verfahren zur Herstellung eines Schichtkörpers für gedruckte Schaltungen
US3425947A (en) * 1966-05-02 1969-02-04 Hooker Chemical Corp Method of treating metal surfaces
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US3506397A (en) * 1967-12-22 1970-04-14 Gen Motors Corp Phosphoric acid recovery from spent plastic conditioner solution
US3652351A (en) * 1970-05-13 1972-03-28 Carus Corp Processes for etching synthetic polymer resins with alkaline alkali metal manganate solutions
US3689303A (en) * 1970-12-21 1972-09-05 Crown City Plating Co Process for electroless plating of abs resins
US3833414A (en) * 1972-09-05 1974-09-03 Gen Electric Aluminide coating removal method
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US4054693A (en) * 1974-11-07 1977-10-18 Kollmorgen Technologies Corporation Processes for the preparation of resinous bodies for adherent metallization comprising treatment with manganate/permanganate composition
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US4073740A (en) * 1975-06-18 1978-02-14 Kollmorgen Technologies Corporation Composition for the activation of resinous bodies for adherent metallization
JPS55153338A (en) * 1979-05-18 1980-11-29 Fujitsu Ltd Surface treatment of semiconductor substrate
DE3110415C2 (de) * 1981-03-18 1983-08-18 Ruwel-Werke Spezialfabrik für Leiterplatten GmbH, 4170 Geldern Verfahren zum Herstellen von Leiterplatten
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US4515829A (en) * 1983-10-14 1985-05-07 Shipley Company Inc. Through-hole plating

Also Published As

Publication number Publication date
ES8801354A1 (es) 1988-01-01
NO166240C (no) 1991-06-19
BR8602230A (pt) 1987-01-13
DK255286A (da) 1986-12-01
US4601783A (en) 1986-07-22
ES555510A0 (es) 1988-01-01
ZA862433B (en) 1986-12-30
KR860009097A (ko) 1986-12-20
DE3669896D1 (de) 1990-05-03
IL78267A (en) 1989-05-15
NO166240B (no) 1991-03-11
AU580662B2 (en) 1989-01-27
JP2562810B2 (ja) 1996-12-11
EP0207587A1 (de) 1987-01-07
IL78267A0 (en) 1986-07-31
NO861299L (no) 1986-12-01
NZ215544A (en) 1989-03-29
DK255286D0 (da) 1986-05-30
KR900003470B1 (ko) 1990-05-19
CA1254493A (en) 1989-05-23
JPS61278597A (ja) 1986-12-09
AU5527086A (en) 1987-01-15
DE207587T1 (de) 1987-10-15
EP0207587B1 (de) 1990-03-28

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
EEIH Change in the person of patent owner
REN Ceased due to non-payment of the annual fee