ATE511209T1 - Vorrichtung zum verlöten von kontakten auf halbleiterchips - Google Patents

Vorrichtung zum verlöten von kontakten auf halbleiterchips

Info

Publication number
ATE511209T1
ATE511209T1 AT02772067T AT02772067T ATE511209T1 AT E511209 T1 ATE511209 T1 AT E511209T1 AT 02772067 T AT02772067 T AT 02772067T AT 02772067 T AT02772067 T AT 02772067T AT E511209 T1 ATE511209 T1 AT E511209T1
Authority
AT
Austria
Prior art keywords
wafer
window
semiconductor chips
chip
soldering contacts
Prior art date
Application number
AT02772067T
Other languages
English (en)
Inventor
Robert Bergmann
Holger Huebner
Original Assignee
Kulicke & Soffa Die Bonding Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kulicke & Soffa Die Bonding Gmbh filed Critical Kulicke & Soffa Die Bonding Gmbh
Application granted granted Critical
Publication of ATE511209T1 publication Critical patent/ATE511209T1/de

Links

Classifications

    • H10W99/00—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00—Soldering, e.g. brazing, or unsoldering
    • B23K1/005—Soldering by means of radiant energy
    • B23K1/0056—Soldering by means of radiant energy soldering by means of beams, e.g. lasers, E.B.
    • H10W72/0711—
    • H10W72/30—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/36—Electric or electronic devices
    • B23K2101/40—Semiconductor devices
    • H10W72/073—
    • H10W72/07336—

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Die Bonding (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
AT02772067T 2001-09-27 2002-09-19 Vorrichtung zum verlöten von kontakten auf halbleiterchips ATE511209T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10147789A DE10147789B4 (de) 2001-09-27 2001-09-27 Vorrichtung zum Verlöten von Kontakten auf Halbleiterchips
PCT/DE2002/003506 WO2003030246A2 (de) 2001-09-27 2002-09-19 Vorrichtung zum verlöten von kontakten auf halbleiterchips

Publications (1)

Publication Number Publication Date
ATE511209T1 true ATE511209T1 (de) 2011-06-15

Family

ID=7700568

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02772067T ATE511209T1 (de) 2001-09-27 2002-09-19 Vorrichtung zum verlöten von kontakten auf halbleiterchips

Country Status (6)

Country Link
US (1) US7389903B2 (de)
EP (1) EP1436827B1 (de)
AT (1) ATE511209T1 (de)
DE (1) DE10147789B4 (de)
TW (1) TWI242822B (de)
WO (1) WO2003030246A2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005029407B4 (de) * 2005-06-24 2008-06-19 Mühlbauer Ag Verfahren und Vorrichtung zum dauerhaften Verbinden integrierter Schaltungen mit einem Substrat
DE102011104219A1 (de) * 2011-06-15 2012-12-20 Osram Opto Semiconductors Gmbh Verfahren zum Bestücken einer Trägerplatte mit zumindest einem Halbleiterchip und Positionierungselement
DE102015106298B4 (de) * 2015-04-24 2017-01-26 Semikron Elektronik Gmbh & Co. Kg Vorrichtung, Verfahren und Anlage zur inhomogenen Abkühlung eines flächigen Gegenstandes
JP6582975B2 (ja) * 2015-12-28 2019-10-02 富士通株式会社 半導体実装装置、半導体実装装置のヘッド及び積層チップの製造方法
CN113664314A (zh) * 2021-08-24 2021-11-19 苏州科韵激光科技有限公司 一种微型led激光修复装置及方法
TWI841311B (zh) * 2023-03-22 2024-05-01 致伸科技股份有限公司 觸控板模組
CN116604129B (zh) * 2023-07-18 2023-11-14 江苏兆威达存储科技有限公司 一种内存条焊接镀敷装置及焊接方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3864728A (en) * 1970-11-20 1975-02-04 Siemens Ag Semiconductor components having bimetallic lead connected thereto
US4099660A (en) * 1975-10-31 1978-07-11 National Semiconductor Corporation Apparatus for and method of shaping interconnect leads
US4320865A (en) * 1980-03-21 1982-03-23 National Semiconductor Corporation Apparatus for attachment of die to heat sink
GB2244374B (en) * 1990-05-22 1994-10-05 Stc Plc Improvements in hybrid circuits
JPH04186696A (ja) * 1990-11-16 1992-07-03 Mitsubishi Electric Corp ボンディング装置
JP2813507B2 (ja) * 1992-04-23 1998-10-22 三菱電機株式会社 ボンディング方法およびボンディング装置
US5434524A (en) * 1992-09-16 1995-07-18 International Business Machines Corporation Method of clocking integrated circuit chips
JP3583462B2 (ja) * 1993-04-05 2004-11-04 フォード モーター カンパニー 電子成分のための微小はんだ付け装置および方法
KR100377981B1 (ko) * 1994-06-07 2003-05-27 텍사스 인스트루먼츠 인코포레이티드 성형화합물큐어링방법
DE19549635B4 (de) * 1995-02-15 2004-12-09 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Verbindung eines flexiblen Substrats mit einem Chip
JP2793528B2 (ja) * 1995-09-22 1998-09-03 インターナショナル・ビジネス・マシーンズ・コーポレイション ハンダ付け方法、ハンダ付け装置
TW359881B (en) 1995-11-08 1999-06-01 Mitsubishi Electric Corp Method of bonding component to substrate and its apparatus, method of bonding semiconductor chip to lead frame and its apparatus
US5668058A (en) * 1995-12-28 1997-09-16 Nec Corporation Method of producing a flip chip
KR100267155B1 (ko) * 1996-09-13 2000-10-16 아끼구사 나오유끼 반도체 장치의 제조 방법 및 제조 장치
JP3330037B2 (ja) * 1996-11-29 2002-09-30 富士通株式会社 チップ部品の接合方法および装置
JPH1154903A (ja) * 1997-07-31 1999-02-26 Fujitsu Ltd リフローソルダリング方法及びリフロー炉
DE19747846A1 (de) * 1997-10-30 1999-05-06 Daimler Benz Ag Bauelement und Verfahren zum Herstellen des Bauelements
US5897341A (en) * 1998-07-02 1999-04-27 Fujitsu Limited Diffusion bonded interconnect
DE19850595C2 (de) * 1998-11-03 2002-07-04 Hahn Schickard Ges Verfahren zum Laserlöten von Halbleiterchips
DE19907276C2 (de) * 1999-02-20 2001-12-06 Bosch Gmbh Robert Verfahren zur Herstellung einer Lötverbindung zwischen einem elektrischen Bauelement und einem Trägersubstrat
JP2000260815A (ja) * 1999-03-10 2000-09-22 Mitsubishi Electric Corp バンプの溶融方法および溶融装置、ならびに半導体装置の製造方法
JP4275806B2 (ja) * 1999-06-01 2009-06-10 株式会社ルネサステクノロジ 半導体素子の実装方法
US6384366B1 (en) * 2000-06-12 2002-05-07 Advanced Micro Devices, Inc. Top infrared heating for bonding operations
US6333253B1 (en) * 2000-08-24 2001-12-25 Advanced Micro Devices, Inc. Pattern-block flux deposition

Also Published As

Publication number Publication date
TWI242822B (en) 2005-11-01
WO2003030246A3 (de) 2003-09-18
US20040240865A1 (en) 2004-12-02
WO2003030246A2 (de) 2003-04-10
EP1436827B1 (de) 2011-05-25
US7389903B2 (en) 2008-06-24
DE10147789A1 (de) 2003-04-10
EP1436827A2 (de) 2004-07-14
DE10147789B4 (de) 2004-04-15

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