ATE489330T1 - Verfahren zur herstellung von fluorgas - Google Patents

Verfahren zur herstellung von fluorgas

Info

Publication number
ATE489330T1
ATE489330T1 AT05787668T AT05787668T ATE489330T1 AT E489330 T1 ATE489330 T1 AT E489330T1 AT 05787668 T AT05787668 T AT 05787668T AT 05787668 T AT05787668 T AT 05787668T AT E489330 T1 ATE489330 T1 AT E489330T1
Authority
AT
Austria
Prior art keywords
fluorine gas
gas
metal fluoride
valence metal
producing
Prior art date
Application number
AT05787668T
Other languages
English (en)
Inventor
Masakazu Oka
Tomoyuki Fukuyo
Junichi Torisu
Original Assignee
Showa Denko Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko Kk filed Critical Showa Denko Kk
Application granted granted Critical
Publication of ATE489330T1 publication Critical patent/ATE489330T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • C01B7/20—Fluorine
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J7/00—Apparatus for generating gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B01J19/248—Reactors comprising multiple separated flow channels
    • B01J19/2495—Net-type reactors
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
    • B01J2219/00076—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements inside the reactor
    • B01J2219/00085—Plates; Jackets; Cylinders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y10T137/0324—With control of flow by a condition or characteristic of a fluid
    • Y10T137/0329—Mixing of plural fluids of diverse characteristics or conditions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/6416—With heating or cooling of the system
    • Y10T137/6525—Air heated or cooled [fan, fins, or channels]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/6416—With heating or cooling of the system
    • Y10T137/6606—With electric heating element
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87571—Multiple inlet with single outlet
    • Y10T137/87652—With means to promote mixing or combining of plural fluids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Glass Compositions (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Drying Of Semiconductors (AREA)
AT05787668T 2004-09-24 2005-09-22 Verfahren zur herstellung von fluorgas ATE489330T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004277382 2004-09-24
PCT/JP2005/018065 WO2006033474A1 (en) 2004-09-24 2005-09-22 Process for producing fluorine gas

Publications (1)

Publication Number Publication Date
ATE489330T1 true ATE489330T1 (de) 2010-12-15

Family

ID=38357480

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05787668T ATE489330T1 (de) 2004-09-24 2005-09-22 Verfahren zur herstellung von fluorgas

Country Status (10)

Country Link
US (1) US7572428B2 (de)
EP (1) EP1848662B1 (de)
JP (1) JP4828185B2 (de)
KR (1) KR101199130B1 (de)
CN (1) CN101027248B (de)
AT (1) ATE489330T1 (de)
DE (1) DE602005025023D1 (de)
RU (1) RU2397143C2 (de)
TW (1) TWI385121B (de)
WO (1) WO2006033474A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200932681A (en) * 2007-12-11 2009-08-01 Solvay Fluor Gmbh Method for preparing manganese tetrafluoride
US20110097253A1 (en) * 2009-10-27 2011-04-28 Fluoromer Llc Fluorine purification
JP6792158B2 (ja) 2016-02-09 2020-11-25 セントラル硝子株式会社 フッ素化合物ガスの精製方法
JP6867581B2 (ja) 2016-02-09 2021-04-28 セントラル硝子株式会社 フッ素ガスの精製方法
JP6678489B2 (ja) * 2016-03-28 2020-04-08 東京エレクトロン株式会社 基板処理装置
JP7527237B2 (ja) * 2021-04-01 2024-08-02 東京エレクトロン株式会社 ガス供給装置、ガス供給方法、および基板処理装置
WO2025041699A1 (ja) * 2023-08-23 2025-02-27 セントラル硝子株式会社 精製含フッ素ガス組成物の製造方法、半導体デバイスの製造方法、エッチング装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3989808A (en) * 1975-07-28 1976-11-02 The United States Of America As Represented By The United States Energy Research And Development Administration Method of preparing pure fluorine gas
US4284617A (en) * 1979-11-30 1981-08-18 The United States Of America As Represented By The Secretary Of The Navy Solid compositions for generation fluorine and gaseous fluorine compounds
US4292287A (en) * 1980-04-24 1981-09-29 The United States Of America As Represented By The United States Department Of Energy Method for directly recovering fluorine from gas streams
US4506140A (en) * 1982-11-15 1985-03-19 Armstrong Richard M Electric immersion heater assembly having an isolated terminal box
SU1432001A1 (ru) 1986-11-12 1988-10-23 Московский химико-технологический институт им.Д.И.Менделеева Способ получени чистого газообразного фтора
GB9011535D0 (en) 1990-05-23 1990-07-11 Oxford Lasers Ltd Gas management system
US6609540B1 (en) * 1999-06-24 2003-08-26 Showa Denko Kabushiki Kaisha Method and apparatus for supplying fluorine gas
US6911563B2 (en) * 2001-01-05 2005-06-28 National Institute Of Advanced Industrial Science Reaction method utilizing diaphram type catalyst and apparatus therefor
JP4145081B2 (ja) * 2001-06-29 2008-09-03 昭和電工株式会社 高純度フッ素ガスおよびその製造方法並びにその用途
US6955801B2 (en) * 2001-06-29 2005-10-18 Showa Denka K.K. High-purity fluorine gas, production and use thereof, and method for analyzing trace impurities in high-purity fluorine gas
JP4230169B2 (ja) * 2002-05-13 2009-02-25 セントラル硝子株式会社 フッ素の発生方法
RU2221739C1 (ru) 2002-12-20 2004-01-20 Закрытое акционерное общество "АСТОР ЭЛЕКТРОНИКС" Способ получения фтора

Also Published As

Publication number Publication date
DE602005025023D1 (de) 2011-01-05
RU2007115200A (ru) 2008-10-27
JP2006117509A (ja) 2006-05-11
TW200628403A (en) 2006-08-16
CN101027248A (zh) 2007-08-29
JP4828185B2 (ja) 2011-11-30
EP1848662B1 (de) 2010-11-24
RU2397143C2 (ru) 2010-08-20
KR20070061891A (ko) 2007-06-14
CN101027248B (zh) 2010-06-16
EP1848662A1 (de) 2007-10-31
US20080102021A1 (en) 2008-05-01
TWI385121B (zh) 2013-02-11
US7572428B2 (en) 2009-08-11
WO2006033474A1 (en) 2006-03-30
KR101199130B1 (ko) 2012-11-09

Similar Documents

Publication Publication Date Title
ATE513606T1 (de) Verfahren zur erzeugung von gereinigtem erdgas aus wasser und kohlendioxid enthaltendem erdgas
Föll et al. Macroporous semiconductors
DE502007004113D1 (de) Verfahren zur Reinigung von Polysilicium-Bruch
Shutov et al. Ductile damage model for metal forming simulations including refined description of void nucleation
ATE376451T1 (de) Verfahren zur erzeugung einer emulsion durch verwendung einer mikrokanalverfahrentechnologie
ATE489330T1 (de) Verfahren zur herstellung von fluorgas
EP2023376A3 (de) Ätzende Behandlungsverfahren für Substratoberflächen und Kammeroberflächen
UA95259C2 (ru) Азеотропная или близкая к азеотропной композиция, содержащая 2,3,3,3-тетрафторпропен и фторид водорода, и способы отделения, получения и очищения 2,3,3,3-нетрафторпропена
ATE489333T1 (de) Reaktor und verfahren zur herstellung von silizium
RU2016125516A (ru) Компонент на кремниевой основе, имеющий по меньшей мере одну фаску, и способ его изготовления
ATE556988T1 (de) Verfahren zur herstellung von stabförmigem polysilicium mit verbesserter brucheigenschaft
CN102712462A (zh) 二氟化氙蚀刻工艺中的改进的选择性
ATE509859T1 (de) Verpackung mit teilweise aufschäumbarer flüssigkeit und verfahren zur herstellung einer aufgeschäumten flüssigkeit
ATE541072T1 (de) Verfahren zur herstellung eines beschichtungsfilms aus kristallinem titanoxid durch elektrolytisches anodisieren
Wang et al. Asymmetric gravity–capillary solitary waves on deep water
ATE282466T1 (de) Zersetzung von fluorhaltigen verbindungen
WO2008120642A1 (ja) 1,2,3,4－テトラクロロヘキサフルオロブタンの製造方法および精製方法
DE502004001880D1 (de) Verfahren zur Herstellung von Chlorsilanen
DE60239339D1 (de) Verfahren zur herstellung einer passivierten oberfläche
Defforge et al. Scalloping removal on DRIE via using low concentrated alkaline solutions at low temperature
DE60300144D1 (de) Verfahren zur Herstellung von Al-Sinterlegierung
ATE509890T1 (de) Verfahren zur herstellung von stickstofftrifluorid
WO2003054247A2 (en) Cleaning gas composition for semiconductor production equipment and cleaning method using the gas
JP2002115083A5 (de)
CN107251235B (zh) 用于生产太阳能电池的方法

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties