ATE440306T1 - Verfahren zur negativ arbeitender bildaufzeichnung - Google Patents
Verfahren zur negativ arbeitender bildaufzeichnungInfo
- Publication number
- ATE440306T1 ATE440306T1 AT00109035T AT00109035T ATE440306T1 AT E440306 T1 ATE440306 T1 AT E440306T1 AT 00109035 T AT00109035 T AT 00109035T AT 00109035 T AT00109035 T AT 00109035T AT E440306 T1 ATE440306 T1 AT E440306T1
- Authority
- AT
- Austria
- Prior art keywords
- image recording
- compound
- recording material
- negative type
- type image
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 abstract 3
- 239000002253 acid Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000000732 arylene group Chemical group 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12298499A JP2000314961A (ja) | 1999-04-28 | 1999-04-28 | ネガ型画像記録材料 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE440306T1 true ATE440306T1 (de) | 2009-09-15 |
Family
ID=14849429
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT00109035T ATE440306T1 (de) | 1999-04-28 | 2000-04-27 | Verfahren zur negativ arbeitender bildaufzeichnung |
Country Status (5)
Country | Link |
---|---|
US (1) | US6416939B1 (de) |
EP (1) | EP1048981B1 (de) |
JP (1) | JP2000314961A (de) |
AT (1) | ATE440306T1 (de) |
DE (1) | DE60042768D1 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69936995T2 (de) * | 1998-03-20 | 2008-05-21 | Nippon Soda Co. Ltd. | Photohärtbare zusammensetzung welche ein iodoniumsalz enthält |
JP2001183816A (ja) * | 1999-12-27 | 2001-07-06 | Fuji Photo Film Co Ltd | ネガ型感熱性平版印刷用原板 |
WO2003065122A1 (en) * | 2002-01-31 | 2003-08-07 | Scandinavian Micro Biodevices A/S | Method of joining a workpiece and a microstructure by light exposure |
JP3850767B2 (ja) * | 2002-07-25 | 2006-11-29 | 富士通株式会社 | レジストパターン厚肉化材料、レジストパターン及びその製造方法、並びに、半導体装置及びその製造方法 |
JP3850772B2 (ja) * | 2002-08-21 | 2006-11-29 | 富士通株式会社 | レジストパターン厚肉化材料、レジストパターンの製造方法、及び半導体装置の製造方法 |
WO2005013011A1 (ja) * | 2003-08-04 | 2005-02-10 | Fujitsu Limited | レジストパターン厚肉化材料、それを用いたレジストパターンの製造方法及び半導体装置の製造方法 |
EP3008518A1 (de) | 2013-06-14 | 2016-04-20 | Agfa Graphics NV | Lithografiedruckplattenvorläufer |
KR102324819B1 (ko) * | 2014-12-12 | 2021-11-11 | 삼성전자주식회사 | 포토레지스트용 고분자, 포토레지스트 조성물, 패턴 형성 방법 및 반도체 장치의 제조 방법 |
KR101877029B1 (ko) * | 2016-05-13 | 2018-07-11 | 영창케미칼 주식회사 | 화학증폭형 네가티브형 포토레지스트 조성물 |
KR101882296B1 (ko) * | 2017-03-28 | 2018-08-02 | 주식회사 트리엘 | 비닐페닐옥시기를 가지는 화합물을 포함하는 포토레지스트 조성물 |
KR102103318B1 (ko) * | 2018-06-07 | 2020-04-22 | 주식회사 트리엘 | 비닐페닐옥시기를 가지는 화합물을 포함하는 포토레지스트 조성물 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL129237C (de) * | 1965-03-11 | |||
US4264703A (en) | 1974-05-02 | 1981-04-28 | General Electric Company | Cationically polymerizable compositions containing photodecomposable aromatic iodonium salts |
US4442197A (en) | 1982-01-11 | 1984-04-10 | General Electric Company | Photocurable compositions |
JPS59147001A (ja) | 1983-02-07 | 1984-08-23 | ゼネラル・エレクトリツク・カンパニイ | 光硬化性組成物 |
JPS59180543A (ja) | 1983-03-31 | 1984-10-13 | Konishiroku Photo Ind Co Ltd | 感光性組成物 |
JP2777388B2 (ja) | 1988-04-15 | 1998-07-16 | 広栄化学工業株式会社 | 重合触媒およびそれを含有する硬化性組成物 |
JPH0368950A (ja) | 1989-08-08 | 1991-03-25 | Canon Inc | 感光性組成物 |
JP3011864B2 (ja) * | 1994-12-09 | 2000-02-21 | 日本ペイント株式会社 | 水現像性感光性樹脂組成物 |
US5658708A (en) | 1995-02-17 | 1997-08-19 | Fuji Photo Film Co., Ltd. | Image recording material |
US6068963A (en) | 1997-01-20 | 2000-05-30 | Fuji Photo Film Co., Ltd. | Negative-type image recording materials |
JP3819997B2 (ja) | 1997-06-20 | 2006-09-13 | 富士写真フイルム株式会社 | ネガ型画像記録材料 |
JP3810538B2 (ja) | 1997-11-28 | 2006-08-16 | 富士写真フイルム株式会社 | ポジ型画像形成材料 |
JP2000305267A (ja) * | 1999-04-22 | 2000-11-02 | Jsr Corp | 感光性樹脂組成物 |
-
1999
- 1999-04-28 JP JP12298499A patent/JP2000314961A/ja active Pending
-
2000
- 2000-04-26 US US09/558,227 patent/US6416939B1/en not_active Expired - Fee Related
- 2000-04-27 DE DE60042768T patent/DE60042768D1/de not_active Expired - Fee Related
- 2000-04-27 EP EP00109035A patent/EP1048981B1/de not_active Expired - Lifetime
- 2000-04-27 AT AT00109035T patent/ATE440306T1/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US6416939B1 (en) | 2002-07-09 |
EP1048981B1 (de) | 2009-08-19 |
EP1048981A1 (de) | 2000-11-02 |
DE60042768D1 (de) | 2009-10-01 |
JP2000314961A (ja) | 2000-11-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |