ATE407097T1 - Mikroelektromechanische siliziumcarbidbauteile mit elektronischen schaltungen - Google Patents

Mikroelektromechanische siliziumcarbidbauteile mit elektronischen schaltungen

Info

Publication number
ATE407097T1
ATE407097T1 AT03744229T AT03744229T ATE407097T1 AT E407097 T1 ATE407097 T1 AT E407097T1 AT 03744229 T AT03744229 T AT 03744229T AT 03744229 T AT03744229 T AT 03744229T AT E407097 T1 ATE407097 T1 AT E407097T1
Authority
AT
Austria
Prior art keywords
silicon carbide
microelectromechanical
electronic circuits
etch rate
substrate
Prior art date
Application number
AT03744229T
Other languages
English (en)
Inventor
Kevin Kornegay
Andrew Ryan Atwell
Mihaela Balseanu
Jon Duster
Eskinder Hailu
Ce Li
Original Assignee
Cornell Res Foundation Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cornell Res Foundation Inc filed Critical Cornell Res Foundation Inc
Application granted granted Critical
Publication of ATE407097T1 publication Critical patent/ATE407097T1/de

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00222Integrating an electronic processing unit with a micromechanical structure
    • B81C1/00246Monolithic integration, i.e. micromechanical structure and electronic processing unit are integrated on the same substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/07Integrating an electronic processing unit with a micromechanical structure
    • B81C2203/0707Monolithic integration, i.e. the electronic processing unit is formed on or in the same substrate as the micromechanical structure
    • B81C2203/0735Post-CMOS, i.e. forming the micromechanical structure after the CMOS circuit

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Micromachines (AREA)
  • Ceramic Products (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Pressure Sensors (AREA)
  • Electrodes Of Semiconductors (AREA)
AT03744229T 2002-03-08 2003-03-07 Mikroelektromechanische siliziumcarbidbauteile mit elektronischen schaltungen ATE407097T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US36261802P 2002-03-08 2002-03-08

Publications (1)

Publication Number Publication Date
ATE407097T1 true ATE407097T1 (de) 2008-09-15

Family

ID=27805204

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03744229T ATE407097T1 (de) 2002-03-08 2003-03-07 Mikroelektromechanische siliziumcarbidbauteile mit elektronischen schaltungen

Country Status (8)

Country Link
US (2) US7170141B2 (de)
EP (1) EP1487738B1 (de)
JP (1) JP2005519778A (de)
CN (1) CN1652995A (de)
AT (1) ATE407097T1 (de)
AU (1) AU2003231965A1 (de)
DE (1) DE60323344D1 (de)
WO (1) WO2003076330A2 (de)

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WO2003076330A2 (en) * 2002-03-08 2003-09-18 Cornell Research Foundation, Inc. Silicon carbide microelectromechanical devices with electronic circuitry
US7307425B2 (en) * 2003-11-18 2007-12-11 Halliburton Energy Services, Inc. Receiver electronics proximate antenna
US8154092B2 (en) 2004-08-09 2012-04-10 Case Western Reserve University Silicon carbide MEMS structures and methods of forming the same
US7616013B2 (en) * 2004-11-11 2009-11-10 Brigham Young University Micromechanical positional state sensing apparatus method and system
ES2299298B1 (es) * 2005-07-21 2009-04-01 Universitat Autonoma De Barcelona Procedimiento de integracion monolitica de materiales de alta calidad mecanica con circuitos integrados para aplicaciones mems/nems.
US7780865B2 (en) * 2006-03-31 2010-08-24 Applied Materials, Inc. Method to improve the step coverage and pattern loading for dielectric films
US7601651B2 (en) * 2006-03-31 2009-10-13 Applied Materials, Inc. Method to improve the step coverage and pattern loading for dielectric films
US20070287301A1 (en) * 2006-03-31 2007-12-13 Huiwen Xu Method to minimize wet etch undercuts and provide pore sealing of extreme low k (k<2.5) dielectrics
TWI308800B (en) * 2006-10-26 2009-04-11 Ind Tech Res Inst Method for making thin film transistor and structure of the same
US8044755B2 (en) * 2008-04-09 2011-10-25 National Semiconductor Corporation MEMS power inductor
US7705411B2 (en) * 2008-04-09 2010-04-27 National Semiconductor Corporation MEMS-topped integrated circuit with a stress relief layer
US8897470B2 (en) * 2009-07-31 2014-11-25 Macronix International Co., Ltd. Method of fabricating integrated semiconductor device with MOS, NPN BJT, LDMOS, pre-amplifier and MEMS unit
CN103430308B (zh) 2010-12-01 2017-02-15 康奈尔大学 用于电且机械连接的单片集成晶体管和mems/nems器件的结构和方法
US8754421B2 (en) 2012-02-24 2014-06-17 Raytheon Company Method for processing semiconductors using a combination of electron beam and optical lithography
JP6712650B2 (ja) * 2016-12-14 2020-06-24 株式会社日立製作所 半導体装置およびその製造方法並びにセンサ

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US5165283A (en) * 1991-05-02 1992-11-24 Kulite Semiconductor Products, Inc. High temperature transducers and methods of fabricating the same employing silicon carbide
US6034001A (en) * 1991-10-16 2000-03-07 Kulite Semiconductor Products, Inc. Method for etching of silicon carbide semiconductor using selective etching of different conductivity types
US5465249A (en) * 1991-11-26 1995-11-07 Cree Research, Inc. Nonvolatile random access memory device having transistor and capacitor made in silicon carbide substrate
US6344663B1 (en) * 1992-06-05 2002-02-05 Cree, Inc. Silicon carbide CMOS devices
US5303594A (en) * 1992-08-11 1994-04-19 Kulite Semiconductor Products, Inc. Pressure transducer utilizing diamond piezoresistive sensors and silicon carbide force collector
US5454915A (en) * 1992-10-06 1995-10-03 Kulite Semiconductor Products, Inc. Method of fabricating porous silicon carbide (SiC)
US5298767A (en) * 1992-10-06 1994-03-29 Kulite Semiconductor Products, Inc. Porous silicon carbide (SiC) semiconductor device
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US5614678A (en) * 1996-02-05 1997-03-25 Kulite Semiconductor Products, Inc. High pressure piezoresistive transducer
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Also Published As

Publication number Publication date
AU2003231965A1 (en) 2003-09-22
EP1487738B1 (de) 2008-09-03
WO2003076330A2 (en) 2003-09-18
WO2003076330A3 (en) 2004-08-19
US7170141B2 (en) 2007-01-30
AU2003231965A8 (en) 2003-09-22
EP1487738A2 (de) 2004-12-22
DE60323344D1 (de) 2008-10-16
CN1652995A (zh) 2005-08-10
US7615788B2 (en) 2009-11-10
JP2005519778A (ja) 2005-07-07
US20080093605A1 (en) 2008-04-24
US20040077164A1 (en) 2004-04-22

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