ATE402482T1 - Verfahren und vorrichtung zum ezr plasmaaufbringen von textilienschichten aus kohlenstoff-nanofasern und textilienschichten dazu - Google Patents

Verfahren und vorrichtung zum ezr plasmaaufbringen von textilienschichten aus kohlenstoff-nanofasern und textilienschichten dazu

Info

Publication number
ATE402482T1
ATE402482T1 AT00949577T AT00949577T ATE402482T1 AT E402482 T1 ATE402482 T1 AT E402482T1 AT 00949577 T AT00949577 T AT 00949577T AT 00949577 T AT00949577 T AT 00949577T AT E402482 T1 ATE402482 T1 AT E402482T1
Authority
AT
Austria
Prior art keywords
web
substrate
textile layers
nanotubes
deposition chamber
Prior art date
Application number
AT00949577T
Other languages
English (en)
Inventor
Marc Delaunay
Marie-Noelle Semeria
Original Assignee
Commissariat Energie Atomique
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat Energie Atomique filed Critical Commissariat Energie Atomique
Application granted granted Critical
Publication of ATE402482T1 publication Critical patent/ATE402482T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/842—Manufacture, treatment, or detection of nanostructure for carbon nanotubes or fullerenes
    • Y10S977/843—Gas phase catalytic growth, i.e. chemical vapor deposition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/842—Manufacture, treatment, or detection of nanostructure for carbon nanotubes or fullerenes
    • Y10S977/844—Growth by vaporization or dissociation of carbon source using a high-energy heat source, e.g. electric arc, laser, plasma, e-beam

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
  • Luminescent Compositions (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
  • Inorganic Fibers (AREA)
  • Treatment Of Fiber Materials (AREA)
AT00949577T 1999-07-01 2000-06-29 Verfahren und vorrichtung zum ezr plasmaaufbringen von textilienschichten aus kohlenstoff-nanofasern und textilienschichten dazu ATE402482T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9908473A FR2795906B1 (fr) 1999-07-01 1999-07-01 Procede et dispositif de depot par plasma a la resonance cyclotron electronique de couches de tissus de nonofibres de carbone et couches de tissus ainsi obtenus

Publications (1)

Publication Number Publication Date
ATE402482T1 true ATE402482T1 (de) 2008-08-15

Family

ID=9547580

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00949577T ATE402482T1 (de) 1999-07-01 2000-06-29 Verfahren und vorrichtung zum ezr plasmaaufbringen von textilienschichten aus kohlenstoff-nanofasern und textilienschichten dazu

Country Status (7)

Country Link
US (1) US6787200B1 (de)
EP (1) EP1192637B1 (de)
JP (1) JP2003504512A (de)
AT (1) ATE402482T1 (de)
DE (1) DE60039604D1 (de)
FR (1) FR2795906B1 (de)
WO (1) WO2001003158A1 (de)

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JP3851167B2 (ja) * 2000-02-16 2006-11-29 フラーレン インターナショナル コーポレイション 効率的な電子電界放出のためのダイヤモンド／カーボンナノチューブ構造体
FR2815954B1 (fr) * 2000-10-27 2003-02-21 Commissariat Energie Atomique Procede et dispositif de depot par plasma a la resonance cyclotron electronique de nanotubes de carbone monoparois et nanotubes ainsi obtenus
JP2002146533A (ja) * 2000-11-06 2002-05-22 Mitsubishi Electric Corp 炭素薄体、炭素薄体形成方法および電界放出型電子源
FR2833935B1 (fr) * 2001-12-26 2004-01-30 Commissariat Energie Atomique Procede de fabrication d'au moins un nanotube entre deux elements electriquement conducteurs et dispositif pour mettre en oeuvre un tel procede
CA2584508A1 (en) 2002-05-09 2003-11-09 Institut National De La Recherche Scientifique Method for producing single-wall carbon nanotubes
KR100928970B1 (ko) * 2007-08-06 2009-11-26 재단법인 포항산업과학연구원 제3의 원소가 첨가된 다이아몬드상 탄소박막의 제조방법
JP5321576B2 (ja) * 2009-12-25 2013-10-23 株式会社豊田中央研究所 配向性非晶質炭素膜およびその形成方法
CN102194623B (zh) 2010-03-17 2013-11-20 清华大学 透射电镜微栅的制备方法
CN102194633B (zh) * 2010-03-17 2013-08-28 清华大学 透射电镜微栅
CN102315058B (zh) * 2010-07-07 2013-12-11 清华大学 透射电镜微栅及其制备方法
RU2480858C2 (ru) * 2011-07-22 2013-04-27 Учреждение Российской академии наук Институт прикладной физики РАН Сильноточный источник многозарядных ионов на основе плазмы электронно-циклотронного резонансного разряда, удерживаемой в открытой магнитной ловушке
RU2478562C1 (ru) * 2011-08-11 2013-04-10 Государственное образовательное учреждение высшего профессионального образования "Владимирский государственный университет имени Александра Григорьевича и Николая Григорьевича Столетовых" (ВлГУ) Способ получения волокон в электрическом однородном поле
TWI458678B (zh) * 2011-12-30 2014-11-01 Ind Tech Res Inst 石墨烯層的形成方法
CN104466324B (zh) * 2014-11-14 2017-07-07 华中科技大学 一种电子回旋共振加热毫米波发射器
RU2595785C2 (ru) * 2014-12-23 2016-08-27 Федеральное государственное бюджетное учреждение науки Институт ядерной физики им. Г.И. Будкера Сибирского отделения РАН (ИЯФ СО РАН) Газовая обдирочная мишень

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US5433788A (en) * 1987-01-19 1995-07-18 Hitachi, Ltd. Apparatus for plasma treatment using electron cyclotron resonance
JPH0672306B2 (ja) * 1987-04-27 1994-09-14 株式会社半導体エネルギー研究所 プラズマ処理装置およびプラズマ処理方法
JP2564895B2 (ja) * 1988-06-28 1996-12-18 株式会社島津製作所 プラズマ処理装置
US5370765A (en) * 1989-03-09 1994-12-06 Applied Microwave Plasma Concepts, Inc. Electron cyclotron resonance plasma source and method of operation
JP2962631B2 (ja) * 1993-03-29 1999-10-12 積水化学工業株式会社 ダイヤモンド状炭素薄膜の製造方法
JP2526782B2 (ja) * 1993-05-14 1996-08-21 日本電気株式会社 炭素繊維とその製造方法
WO1997020620A1 (en) * 1995-12-07 1997-06-12 The Regents Of The University Of California Improvements in method and apparatus for isotope enhancement in a plasma apparatus
JP2737736B2 (ja) * 1996-01-12 1998-04-08 日本電気株式会社 カーボン単層ナノチューブの製造方法
JP4128628B2 (ja) * 1996-05-15 2008-07-30 ハイピリオン カタリシス インターナショナル インコーポレイテッド 堅い多孔質炭素構造体及びその製造方法
JPH10203810A (ja) * 1997-01-21 1998-08-04 Canon Inc カーボンナノチューブの製法
EP1015384B1 (de) * 1997-03-07 2005-07-13 William Marsh Rice University Kohlenstofffasern ausgehend von einwandigen kohlenstoffnanoröhren
JP3441923B2 (ja) * 1997-06-18 2003-09-02 キヤノン株式会社 カーボンナノチューブの製法
DE19740389A1 (de) * 1997-09-05 1999-03-11 Henning Kanzow Verfahren zur Herstellung von Kohlenstoff-Nanofasern, Kohlenstoff-Nanopartikeln und Fullerenen
JPH11116218A (ja) * 1997-10-17 1999-04-27 Osaka Gas Co Ltd 単層ナノチューブの製造方法
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FR2780601B1 (fr) * 1998-06-24 2000-07-21 Commissariat Energie Atomique Procede de depot par plasma a la resonance cyclotron electronique de couches de carbone emetteur d'electrons sous l'effet d'un champ electrique applique
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TW452604B (en) * 1999-01-11 2001-09-01 Shih Han Jang Process for synthesizing one-dimensional nanosubstances by electron cyclotron resonance chemical vapor deposition
US6420092B1 (en) * 1999-07-14 2002-07-16 Cheng-Jer Yang Low dielectric constant nanotube
FR2815954B1 (fr) * 2000-10-27 2003-02-21 Commissariat Energie Atomique Procede et dispositif de depot par plasma a la resonance cyclotron electronique de nanotubes de carbone monoparois et nanotubes ainsi obtenus

Also Published As

Publication number Publication date
FR2795906B1 (fr) 2001-08-17
JP2003504512A (ja) 2003-02-04
WO2001003158A1 (fr) 2001-01-11
US6787200B1 (en) 2004-09-07
FR2795906A1 (fr) 2001-01-05
EP1192637A1 (de) 2002-04-03
DE60039604D1 (de) 2008-09-04
EP1192637B1 (de) 2008-07-23

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