ATE371951T1 - Konfigurierbare vakuumanlage - Google Patents

Konfigurierbare vakuumanlage

Info

Publication number
ATE371951T1
ATE371951T1 AT01939323T AT01939323T ATE371951T1 AT E371951 T1 ATE371951 T1 AT E371951T1 AT 01939323 T AT01939323 T AT 01939323T AT 01939323 T AT01939323 T AT 01939323T AT E371951 T1 ATE371951 T1 AT E371951T1
Authority
AT
Austria
Prior art keywords
filament
vacuum
vacuum chamber
table assembly
filament power
Prior art date
Application number
AT01939323T
Other languages
English (en)
Inventor
Jerry Kidd
Craig Harrington
Daniel Hopkins
Original Assignee
Basic Resources Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basic Resources Inc filed Critical Basic Resources Inc
Application granted granted Critical
Publication of ATE371951T1 publication Critical patent/ATE371951T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Materials For Medical Uses (AREA)
  • External Artificial Organs (AREA)
AT01939323T 2000-05-22 2001-05-22 Konfigurierbare vakuumanlage ATE371951T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/578,166 US6521104B1 (en) 2000-05-22 2000-05-22 Configurable vacuum system and method

Publications (1)

Publication Number Publication Date
ATE371951T1 true ATE371951T1 (de) 2007-09-15

Family

ID=24311716

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01939323T ATE371951T1 (de) 2000-05-22 2001-05-22 Konfigurierbare vakuumanlage

Country Status (12)

Country Link
US (2) US6521104B1 (de)
EP (2) EP1855305A1 (de)
JP (2) JP2004514785A (de)
KR (1) KR100817764B1 (de)
CN (2) CN1800442A (de)
AT (1) ATE371951T1 (de)
AU (3) AU2001264853B2 (de)
CA (1) CA2410352A1 (de)
DE (1) DE60130209T2 (de)
ES (1) ES2292595T3 (de)
MX (1) MXPA02011505A (de)
WO (1) WO2001090437A2 (de)

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US6521104B1 (en) * 2000-05-22 2003-02-18 Basic Resources, Inc. Configurable vacuum system and method
US6503379B1 (en) * 2000-05-22 2003-01-07 Basic Research, Inc. Mobile plating system and method
US20050277918A1 (en) * 2003-03-07 2005-12-15 Baylis Medical Company Inc. Electrosurgical cannula
US20030180450A1 (en) * 2002-03-22 2003-09-25 Kidd Jerry D. System and method for preventing breaker failure
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US7013884B2 (en) * 2004-03-17 2006-03-21 Masonry Technology Incorporated Dust collection system for a masonry saw
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KR100977613B1 (ko) 2008-03-26 2010-08-23 한전케이피에스 주식회사 고온용 부품의 윤활코팅장치
CN102548510B (zh) * 2008-10-29 2015-04-01 捷迈骨科手术产品公司 具有可拆卸固定件的间隔件模具
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US10304665B2 (en) 2011-09-07 2019-05-28 Nano-Product Engineering, LLC Reactors for plasma-assisted processes and associated methods
US9761424B1 (en) 2011-09-07 2017-09-12 Nano-Product Engineering, LLC Filtered cathodic arc method, apparatus and applications thereof
DE102011113563A1 (de) * 2011-09-19 2013-03-21 Oerlikon Trading Ag, Trübbach Karussellschlitten für Vakuumbehandlungsanlage
KR20140101600A (ko) * 2013-02-12 2014-08-20 삼성디스플레이 주식회사 기판 이송 장치
US10196951B2 (en) * 2016-05-31 2019-02-05 Boiler Tube Company Of America Selective catalytic reactor (SCR) door systems
CN107723675A (zh) * 2017-11-17 2018-02-23 东莞颠覆产品设计有限公司 物理气相沉积设备和物理气相沉积方法
DE102018103321A1 (de) * 2018-02-14 2019-08-14 Iwis Motorsysteme Gmbh & Co. Kg Verfahren zur Herstellung von Hartstoffschichten
CN108435714B (zh) * 2018-04-12 2023-08-29 环维电子(上海)有限公司 一种新型干冰清洗底座及其清洗方法
CN109852935B (zh) * 2019-04-15 2023-08-22 浙江世宏实业有限公司 一种用于化妆品管的镀彩装置

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Also Published As

Publication number Publication date
AU2005202627A1 (en) 2005-07-07
US6905582B2 (en) 2005-06-14
CN1451171A (zh) 2003-10-22
JP2004514785A (ja) 2004-05-20
EP1287545B1 (de) 2007-08-29
WO2001090437A3 (en) 2002-05-30
US6521104B1 (en) 2003-02-18
ES2292595T3 (es) 2008-03-16
AU6485301A (en) 2001-12-03
DE60130209D1 (de) 2007-10-11
CN100576416C (zh) 2009-12-30
CN1800442A (zh) 2006-07-12
KR100817764B1 (ko) 2008-04-01
AU2001264853B2 (en) 2005-09-15
EP1855305A1 (de) 2007-11-14
DE60130209T2 (de) 2008-07-31
EP1287545A2 (de) 2003-03-05
AU2005202627B2 (en) 2008-03-13
JP2005344212A (ja) 2005-12-15
WO2001090437A2 (en) 2001-11-29
US20030159926A1 (en) 2003-08-28
CA2410352A1 (en) 2001-11-29
KR20030091651A (ko) 2003-12-03
MXPA02011505A (es) 2004-09-10

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