ATE365382T1 - Halbleiterstruktur für infrarotbereich und herstellungsverfahren - Google Patents

Halbleiterstruktur für infrarotbereich und herstellungsverfahren

Info

Publication number
ATE365382T1
ATE365382T1 AT02026698T AT02026698T ATE365382T1 AT E365382 T1 ATE365382 T1 AT E365382T1 AT 02026698 T AT02026698 T AT 02026698T AT 02026698 T AT02026698 T AT 02026698T AT E365382 T1 ATE365382 T1 AT E365382T1
Authority
AT
Austria
Prior art keywords
active zone
base layer
semiconductor structure
production process
conductivity type
Prior art date
Application number
AT02026698T
Other languages
English (en)
Inventor
George Cirlin
Viatchesla Egorov
Vadim Dr Talalaev
Peter Werner
Nikolai Zakharov
Original Assignee
Max Planck Gesellschaft
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Max Planck Gesellschaft filed Critical Max Planck Gesellschaft
Application granted granted Critical
Publication of ATE365382T1 publication Critical patent/ATE365382T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26—Materials of the light emitting region
    • H01L33/34—Materials of the light emitting region containing only elements of Group IV of the Periodic Table
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/04—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
    • H01L33/06—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Led Devices (AREA)
  • Recrystallisation Techniques (AREA)
  • Light Receiving Elements (AREA)
AT02026698T 2002-11-29 2002-11-29 Halbleiterstruktur für infrarotbereich und herstellungsverfahren ATE365382T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02026698A EP1424736B1 (de) 2002-11-29 2002-11-29 Halbleiterstruktur für Infrarotbereich und Herstellungsverfahren

Publications (1)

Publication Number Publication Date
ATE365382T1 true ATE365382T1 (de) 2007-07-15

Family

ID=32241315

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02026698T ATE365382T1 (de) 2002-11-29 2002-11-29 Halbleiterstruktur für infrarotbereich und herstellungsverfahren

Country Status (4)

Country Link
US (1) US7119358B2 (de)
EP (1) EP1424736B1 (de)
AT (1) ATE365382T1 (de)
DE (1) DE60220803T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004001823B3 (de) * 2004-01-08 2005-09-01 Humboldt-Universität Zu Berlin Licht emittierende Halbleitervorrichtungen mit veränderbarer Emissionswellenlänge
US7247546B2 (en) * 2004-08-05 2007-07-24 International Business Machines Corporation Method of forming strained silicon materials with improved thermal conductivity
FR2874285B1 (fr) * 2004-08-13 2006-10-13 Commissariat Energie Atomique Procede de realisation d'empilements d'ilots de materiau semi-conducteur encapsules dans un autre materiau semi-conducteur
US20060043395A1 (en) * 2004-08-26 2006-03-02 National Inst Of Adv Industrial Science And Tech Semiconductor light-emitting element and method of producing the same
WO2006125272A1 (en) * 2005-05-27 2006-11-30 Newsouth Innovations Pty Limited Resonant defect enhancement of current transport in semiconducting superlattices
US20070154637A1 (en) * 2005-12-19 2007-07-05 Rohm And Haas Electronic Materials Llc Organometallic composition
DE112011101530B4 (de) 2010-04-30 2021-03-25 Trustees Of Boston University Verfahren zur Herstellung einer optischen Vorrichtung
KR20140032342A (ko) * 2010-10-11 2014-03-14 유디 홀딩스, 엘엘씨 초격자 양자우물 적외선 감지기
US8879598B2 (en) 2011-08-11 2014-11-04 Sensor Electronic Technology, Inc. Emitting device with compositional and doping inhomogeneities in semiconductor layers
US10411156B2 (en) 2011-08-11 2019-09-10 Sensor Electronic Technology, Inc. Device with transparent and higher conductive regions in lateral cross section of semiconductor layer
US9385271B2 (en) 2011-08-11 2016-07-05 Sensor Electronic Technology, Inc. Device with transparent and higher conductive regions in lateral cross section of semiconductor layer
US8787418B2 (en) 2011-08-11 2014-07-22 Sensor Electronic Technology, Inc. Emitting device with compositional and doping inhomogeneities in semiconductor layers
US9595634B2 (en) 2011-08-11 2017-03-14 Sensor Electronic Technology, Inc. Device with transparent and higher conductive regions in lateral cross section of semiconductor layer
US8723189B1 (en) * 2012-01-06 2014-05-13 Trustees Of Boston University Ultraviolet light emitting diode structures and methods of manufacturing the same
DE102015108402B4 (de) 2015-05-28 2021-03-18 Infineon Technologies Ag Halbleiterbauelemente, ein Fluidsensor und ein Verfahren zum Bilden eines Halbleiterbauelements
KR102553841B1 (ko) 2017-07-19 2023-07-10 삼성전자주식회사 광전 변환 소자, 광 센서
KR102629160B1 (ko) * 2018-01-29 2024-01-29 어플라이드 머티어리얼스, 인코포레이티드 광학 디바이스 향상을 위한 습윤 층들

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4679061A (en) * 1985-06-14 1987-07-07 American Telephone And Telegraph Company, At&T Bell Laboratories Superlattice photoconductor
DE3852180T2 (de) * 1987-12-23 1995-04-06 British Telecomm Halbleiterheterostruktur.
US5198682A (en) * 1991-11-12 1993-03-30 Hughes Aircraft Company Multiple quantum well superlattice infrared detector with graded conductive band
US5399880A (en) * 1993-08-10 1995-03-21 At&T Corp. Phototransistor with quantum well base structure
US5917195A (en) * 1995-02-17 1999-06-29 B.A. Painter, Iii Phonon resonator and method for its production
US6403975B1 (en) 1996-04-09 2002-06-11 Max-Planck Gesellschaft Zur Forderung Der Wissenschafteneev Semiconductor components, in particular photodetectors, light emitting diodes, optical modulators and waveguides with multilayer structures grown on silicon substrates
US6154475A (en) * 1997-12-04 2000-11-28 The United States Of America As Represented By The Secretary Of The Air Force Silicon-based strain-symmetrized GE-SI quantum lasers
FR2812763B1 (fr) * 2000-08-04 2002-11-01 St Microelectronics Sa Formation de boites quantiques
DE10207952A1 (de) 2002-02-25 2003-09-04 Max Planck Gesellschaft Verfahren zur Erzeugung von porösem Material mit periodischer Porenanordnung
US6621841B1 (en) * 2002-04-23 2003-09-16 The United States Of America As Represented By The Secretary Of The Air Force Phonon-pumped semiconductor lasers

Also Published As

Publication number Publication date
US20040140531A1 (en) 2004-07-22
EP1424736B1 (de) 2007-06-20
US7119358B2 (en) 2006-10-10
DE60220803D1 (de) 2007-08-02
EP1424736A1 (de) 2004-06-02
DE60220803T2 (de) 2008-03-06

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Legal Events

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