ATE364235T1 - Verfahren zur formung von mikrostrukturen auf einem substrat unter verwendung einer form - Google Patents

Verfahren zur formung von mikrostrukturen auf einem substrat unter verwendung einer form

Info

Publication number
ATE364235T1
ATE364235T1 AT02763435T AT02763435T ATE364235T1 AT E364235 T1 ATE364235 T1 AT E364235T1 AT 02763435 T AT02763435 T AT 02763435T AT 02763435 T AT02763435 T AT 02763435T AT E364235 T1 ATE364235 T1 AT E364235T1
Authority
AT
Austria
Prior art keywords
coating
mold
substrate
curable material
optionally
Prior art date
Application number
AT02763435T
Other languages
English (en)
Inventor
Raymond Chiu
Kenneth Dillon
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Application granted granted Critical
Publication of ATE364235T1 publication Critical patent/ATE364235T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20Constructional details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/24Manufacture or joining of vessels, leading-in conductors or bases
    • H01J9/241Manufacture or joining of vessels, leading-in conductors or bases the vessel being for a flat panel display
    • H01J9/242Spacers between faceplate and backplate
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/008Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
    • C03C17/009Mixtures of organic and inorganic materials, e.g. ormosils and ormocers
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/40Coatings comprising at least one inhomogeneous layer
    • C03C2217/43Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/44Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
    • C03C2217/45Inorganic continuous phases
    • C03C2217/452Glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/40Coatings comprising at least one inhomogeneous layer
    • C03C2217/43Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475Inorganic materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2211/00Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
    • H01J2211/20Constructional details
    • H01J2211/34Vessels, containers or parts thereof, e.g. substrates
    • H01J2211/36Spacers, barriers, ribs, partitions or the like

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Composite Materials (AREA)
  • Manufacturing & Machinery (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Chemical Vapour Deposition (AREA)
AT02763435T 2001-10-09 2002-08-09 Verfahren zur formung von mikrostrukturen auf einem substrat unter verwendung einer form ATE364235T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/975,385 US7033534B2 (en) 2001-10-09 2001-10-09 Method for forming microstructures on a substrate using a mold

Publications (1)

Publication Number Publication Date
ATE364235T1 true ATE364235T1 (de) 2007-06-15

Family

ID=25522973

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02763435T ATE364235T1 (de) 2001-10-09 2002-08-09 Verfahren zur formung von mikrostrukturen auf einem substrat unter verwendung einer form

Country Status (11)

Country Link
US (2) US7033534B2 (de)
EP (1) EP1449228B1 (de)
JP (1) JP2005505900A (de)
KR (1) KR20040064265A (de)
CN (1) CN1565040A (de)
AT (1) ATE364235T1 (de)
AU (1) AU2002327444A1 (de)
CA (1) CA2462088A1 (de)
DE (1) DE60220539T2 (de)
TW (1) TWI272631B (de)
WO (1) WO2003032353A2 (de)

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US6761607B2 (en) * 2000-01-11 2004-07-13 3M Innovative Properties Company Apparatus, mold and method for producing substrate for plasma display panel
US7176492B2 (en) * 2001-10-09 2007-02-13 3M Innovative Properties Company Method for forming ceramic microstructures on a substrate using a mold and articles formed by the method
KR100450832B1 (ko) * 2002-07-15 2004-10-12 엘지전자 주식회사 모세관 몰딩법에 의한 플라즈마 디스플레이 소자의 격벽제조방법 및 그것의 페이스트 조성물
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WO2005007591A1 (ja) * 2003-07-18 2005-01-27 Asahi Glass Company, Limited 無鉛ガラス、電極被覆用ガラス粉末およびプラズマディスプレイ装置
US7288013B2 (en) * 2003-10-31 2007-10-30 3M Innovative Properties Company Method of forming microstructures on a substrate and a microstructured assembly used for same
JP2005193473A (ja) * 2004-01-06 2005-07-21 Three M Innovative Properties Co 転写用成形型及びその製造方法ならびに微細構造体の製造方法
WO2007013876A1 (en) * 2004-08-26 2007-02-01 3M Innovative Properties Company Method of forming microstructures with a template
KR20070055506A (ko) * 2004-08-26 2007-05-30 쓰리엠 이노베이티브 프로퍼티즈 컴파니 롤러 상에 제공되는 분리형 몰드로 미세 구조물을 형성하는방법
US20060043638A1 (en) * 2004-08-26 2006-03-02 3M Innovative Properties Company Method of forming microstructures with multiple discrete molds
KR20070088296A (ko) * 2004-12-21 2007-08-29 아사히 가라스 가부시키가이샤 전극 피복용 유리
US7478791B2 (en) 2005-04-15 2009-01-20 3M Innovative Properties Company Flexible mold comprising cured polymerizable resin composition
KR20070005126A (ko) * 2005-07-05 2007-01-10 엘지전자 주식회사 플라즈마 디스플레이 패널
US20070018363A1 (en) * 2005-07-20 2007-01-25 3M Innovative Properties Company Methods of aligning mold and articles
US20070018348A1 (en) * 2005-07-20 2007-01-25 3M Innovative Properties Company Aligned mold comprising support
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US20070126158A1 (en) * 2005-12-01 2007-06-07 3M Innovative Properties Company Method of cleaning polymeric mold
JP2007157517A (ja) * 2005-12-06 2007-06-21 Fujitsu Hitachi Plasma Display Ltd プラズマディスプレイ装置
KR101225283B1 (ko) * 2005-12-30 2013-01-22 엘지디스플레이 주식회사 평판 표시 장치 및 그 제조 방법
WO2008027658A1 (en) * 2006-09-01 2008-03-06 3M Innovative Properties Company Method of making display component with curable paste composition
US20080093776A1 (en) * 2006-10-05 2008-04-24 3M Innovative Properties Company Method of molding ultraviolet cured microstructures and molds
EP2131243B1 (de) * 2008-06-02 2015-07-01 ASML Netherlands B.V. Lithografische Vorrichtung und Verfahren zur Positionskalibrierung eines Trägertisches
US8833430B2 (en) * 2008-06-26 2014-09-16 President And Fellows Of Harvard College Versatile high aspect ratio actuatable nanostructured materials through replication
EP2826754A4 (de) * 2012-03-16 2015-12-30 Jx Nippon Oil & Energy Corp Herstellungsverfahren und herstellungsvorrichtung für optisches substrat mit konkav-konvex-muster anhand einer filmförmigen form und herstellungsverfahren für eine vorrichtung mit einem optischen substrat
DE102017102609A1 (de) 2016-02-09 2017-08-10 Comprisetec Gmbh Verbindung von Bauteilen mittels Oberflächenstrukturen
DE102017115704A1 (de) 2016-07-12 2018-04-12 Comprisetec Gmbh Bauteil zur reversiblen adhäsiven Anhaftung an einer glatten Fläche, Bausatz und Fertigungsverfahren
CN112599479A (zh) * 2020-12-10 2021-04-02 深圳市华星光电半导体显示技术有限公司 显示面板及其制作方法
CN113696321B (zh) * 2021-11-01 2022-01-28 佛山市高明贝斯特陶瓷有限公司 一种基于数码布料的陶瓷制品生产系统

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US7176492B2 (en) 2001-10-09 2007-02-13 3M Innovative Properties Company Method for forming ceramic microstructures on a substrate using a mold and articles formed by the method

Also Published As

Publication number Publication date
US20060066007A1 (en) 2006-03-30
DE60220539D1 (de) 2007-07-19
AU2002327444A1 (en) 2003-04-22
US7033534B2 (en) 2006-04-25
CN1565040A (zh) 2005-01-12
US20030098528A1 (en) 2003-05-29
CA2462088A1 (en) 2003-04-17
EP1449228B1 (de) 2007-06-06
WO2003032353A2 (en) 2003-04-17
KR20040064265A (ko) 2004-07-16
TWI272631B (en) 2007-02-01
EP1449228A2 (de) 2004-08-25
DE60220539T2 (de) 2008-02-21
JP2005505900A (ja) 2005-02-24
WO2003032353A3 (en) 2004-06-10

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