DE602005019527D1 - Verfahren zur Herstellung keramischer Dickschichtelement-Arrays mit feiner Strukturgrösse, hochpräziser Definition und/oder hohen Aspektverhältnissen - Google Patents
Verfahren zur Herstellung keramischer Dickschichtelement-Arrays mit feiner Strukturgrösse, hochpräziser Definition und/oder hohen AspektverhältnissenInfo
- Publication number
- DE602005019527D1 DE602005019527D1 DE602005019527T DE602005019527T DE602005019527D1 DE 602005019527 D1 DE602005019527 D1 DE 602005019527D1 DE 602005019527 T DE602005019527 T DE 602005019527T DE 602005019527 T DE602005019527 T DE 602005019527T DE 602005019527 D1 DE602005019527 D1 DE 602005019527D1
- Authority
- DE
- Germany
- Prior art keywords
- fine structure
- aspect ratios
- film element
- element arrays
- structure size
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000003491 array Methods 0.000 title 1
- 239000000919 ceramic Substances 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 4
- 230000008021 deposition Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229910052594 sapphire Inorganic materials 0.000 abstract 1
- 239000010980 sapphire Substances 0.000 abstract 1
- 238000005245 sintering Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N39/00—Integrated devices, or assemblies of multiple devices, comprising at least one piezoelectric, electrostrictive or magnetostrictive element covered by groups H10N30/00 – H10N35/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/072—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by laminating or bonding of piezoelectric or electrostrictive bodies
- H10N30/073—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by laminating or bonding of piezoelectric or electrostrictive bodies by fusion of metals or by adhesives
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/08—Shaping or machining of piezoelectric or electrostrictive bodies
- H10N30/081—Shaping or machining of piezoelectric or electrostrictive bodies by coating or depositing using masks, e.g. lift-off
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8548—Lead-based oxides
- H10N30/8554—Lead-zirconium titanate [PZT] based
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/43—Electric condenser making
- Y10T29/435—Solid dielectric type
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49163—Manufacturing circuit on or in base with sintering of base
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Ceramic Products (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/017,569 US7401403B2 (en) | 2004-12-20 | 2004-12-20 | Method for forming ceramic thick film element arrays with fine feature size, high-precision definition, and/or high aspect ratios |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602005019527D1 true DE602005019527D1 (de) | 2010-04-08 |
Family
ID=35929662
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602005019527T Active DE602005019527D1 (de) | 2004-12-20 | 2005-12-20 | Verfahren zur Herstellung keramischer Dickschichtelement-Arrays mit feiner Strukturgrösse, hochpräziser Definition und/oder hohen Aspektverhältnissen |
Country Status (4)
Country | Link |
---|---|
US (2) | US7401403B2 (de) |
EP (1) | EP1672712B1 (de) |
JP (2) | JP2006179910A (de) |
DE (1) | DE602005019527D1 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100856326B1 (ko) | 2006-07-19 | 2008-09-03 | 삼성전기주식회사 | 레이저 리프트 오프를 이용한 유전체 박막을 갖는 박막 커패시터 내장된 인쇄회로기판 제조방법, 및 이로부터 제조된 박막 커패시터 내장된 인쇄회로기판 |
US9453289B2 (en) * | 2010-04-13 | 2016-09-27 | Lawrence Livermore National Security, Llc | Methods of three-dimensional electrophoretic deposition for ceramic and cermet applications and systems thereof |
US9062952B2 (en) * | 2011-08-08 | 2015-06-23 | Lawrence Livermore National Security, Llc | Methods and systems for electrophoretic deposition of energetic materials and compositions thereof |
TWI540475B (zh) * | 2014-05-20 | 2016-07-01 | 恆顥科技股份有限公司 | 觸控面板、走線結構及走線結構形成方法 |
JP7497564B2 (ja) * | 2019-07-25 | 2024-06-11 | セイコーエプソン株式会社 | ループヒートパイプ型熱伝導装置 |
CN114497352B (zh) * | 2022-04-06 | 2022-06-24 | 淄博高新技术产业开发区Mems研究院 | 具有微结构阵列的压电材料层及其制备方法和应用 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5580511A (en) * | 1990-01-25 | 1996-12-03 | Dai Nippon Insatsu Kabushiki Kaisha | Method of forming thick film pattern and material for forming thick film pattern |
JP2924664B2 (ja) * | 1994-09-28 | 1999-07-26 | 住友電気工業株式会社 | 微細セラミックス構造体の形成方法 |
US6375880B1 (en) * | 1997-09-30 | 2002-04-23 | The Board Of Trustees Of The Leland Stanford Junior University | Mold shape deposition manufacturing |
US6265139B1 (en) * | 1998-12-30 | 2001-07-24 | Samsung Electro-Mechanics Co., Ltd. | Method for fabricating piezoelectric/electrostrictive ceramic micro actuator using photolithography |
CA2371914A1 (en) * | 1999-05-20 | 2000-11-30 | Russell A. Giordano | Polymer re-inforced anatomically accurate bioactive prostheses |
JP3638473B2 (ja) * | 1999-05-31 | 2005-04-13 | 京セラ株式会社 | インクジェットプリンタヘッドの製造方法 |
JP2001274528A (ja) * | 2000-01-21 | 2001-10-05 | Fujitsu Ltd | 薄膜デバイスの基板間転写方法 |
JP2001261454A (ja) * | 2000-03-23 | 2001-09-26 | Sumitomo Electric Ind Ltd | セラミックス部品の製造方法 |
JP2002075999A (ja) * | 2000-08-31 | 2002-03-15 | Ulvac Japan Ltd | 銅配線パターンの形成方法 |
JP2002134806A (ja) * | 2000-10-19 | 2002-05-10 | Canon Inc | 圧電膜型アクチュエータおよび液体噴射ヘッドとその製造方法 |
JP4387623B2 (ja) * | 2000-12-04 | 2009-12-16 | キヤノン株式会社 | 圧電素子の製造方法 |
US7089635B2 (en) | 2003-02-25 | 2006-08-15 | Palo Alto Research Center, Incorporated | Methods to make piezoelectric ceramic thick film arrays and elements |
US6964201B2 (en) | 2003-02-25 | 2005-11-15 | Palo Alto Research Center Incorporated | Large dimension, flexible piezoelectric ceramic tapes |
US7070669B1 (en) * | 2004-12-20 | 2006-07-04 | Xerox Corporation | Method for forming ceramic thick film element arrays |
-
2004
- 2004-12-20 US US11/017,569 patent/US7401403B2/en not_active Expired - Fee Related
-
2005
- 2005-12-19 JP JP2005364311A patent/JP2006179910A/ja active Pending
- 2005-12-20 DE DE602005019527T patent/DE602005019527D1/de active Active
- 2005-12-20 EP EP05112474A patent/EP1672712B1/de not_active Expired - Fee Related
-
2008
- 2008-06-16 US US12/139,798 patent/US8001666B2/en not_active Expired - Fee Related
-
2013
- 2013-02-25 JP JP2013034240A patent/JP5657044B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1672712A2 (de) | 2006-06-21 |
US20080244884A1 (en) | 2008-10-09 |
JP5657044B2 (ja) | 2015-01-21 |
JP2006179910A (ja) | 2006-07-06 |
JP2013168654A (ja) | 2013-08-29 |
EP1672712B1 (de) | 2010-02-24 |
EP1672712A3 (de) | 2007-09-12 |
US20060130302A1 (en) | 2006-06-22 |
US8001666B2 (en) | 2011-08-23 |
US7401403B2 (en) | 2008-07-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |