ATE349286T1 - Zerstäubung eines vorläufers in einen anregungsmittel zur beschichtung eines entfernten substrats - Google Patents
Zerstäubung eines vorläufers in einen anregungsmittel zur beschichtung eines entfernten substratsInfo
- Publication number
- ATE349286T1 ATE349286T1 AT03732642T AT03732642T ATE349286T1 AT E349286 T1 ATE349286 T1 AT E349286T1 AT 03732642 T AT03732642 T AT 03732642T AT 03732642 T AT03732642 T AT 03732642T AT E349286 T1 ATE349286 T1 AT E349286T1
- Authority
- AT
- Austria
- Prior art keywords
- coating
- substrate
- stimulant
- atomization
- precursor
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Physical Vapour Deposition (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB0211354.6A GB0211354D0 (en) | 2002-05-17 | 2002-05-17 | Atomisation of a precursor into an excitation medium for coating a remote substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE349286T1 true ATE349286T1 (de) | 2007-01-15 |
Family
ID=9936882
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT03732642T ATE349286T1 (de) | 2002-05-17 | 2003-05-16 | Zerstäubung eines vorläufers in einen anregungsmittel zur beschichtung eines entfernten substrats |
Country Status (7)
Country | Link |
---|---|
US (1) | US7968154B2 (de) |
EP (1) | EP1506063B1 (de) |
AT (1) | ATE349286T1 (de) |
AU (1) | AU2003239670A1 (de) |
DE (1) | DE60310705D1 (de) |
GB (1) | GB0211354D0 (de) |
WO (1) | WO2003097245A2 (de) |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB0211354D0 (en) | 2002-05-17 | 2002-06-26 | Surface Innovations Ltd | Atomisation of a precursor into an excitation medium for coating a remote substrate |
GB0212848D0 (en) * | 2002-06-01 | 2002-07-17 | Surface Innovations Ltd | Introduction of liquid/solid slurry into an exciting medium |
GB0504384D0 (en) * | 2005-03-03 | 2005-04-06 | Univ Durham | Method for producing a composite coating |
GB0507612D0 (en) | 2005-04-15 | 2005-05-25 | Univ Durham | A method for producing a thiol functionalised surface |
GB0509648D0 (en) | 2005-05-12 | 2005-06-15 | Dow Corning Ireland Ltd | Plasma system to deposit adhesion primer layers |
GB2434369B (en) | 2006-01-20 | 2010-08-25 | P2I Ltd | Plasma coated electrical or electronic devices |
GB2434368B (en) | 2006-01-20 | 2010-08-25 | P2I Ltd | Plasma coated laboratory consumables |
CN101730373B (zh) * | 2008-11-03 | 2012-09-05 | 北京坚润表面材料研究所 | 通过雾态气体放电形成新材料的方法及设备 |
DE102008064134B4 (de) * | 2008-12-19 | 2016-07-21 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Beschichtung von Gegenständen mittels eines Niederdruckplasmas |
US20120089084A1 (en) * | 2009-06-16 | 2012-04-12 | O'keeffe Joe | Wound healing device |
EP2279801B1 (de) * | 2009-07-27 | 2015-01-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Beschichtungsverfahren mit Plasmastrahl und Plasmabeschichtungsvorrichtung |
EP2596688A1 (de) | 2010-07-21 | 2013-05-29 | Dow Corning France | Plasmabehandlung von substraten |
KR20140037097A (ko) | 2011-04-27 | 2014-03-26 | 다우 코닝 프랑스 | 기판의 플라즈마 처리 |
US8852693B2 (en) | 2011-05-19 | 2014-10-07 | Liquipel Ip Llc | Coated electronic devices and associated methods |
EP2532716A1 (de) | 2011-06-10 | 2012-12-12 | Eppendorf AG | Substrat mit hydrophobe Gruppen abstoßenden Oberflächeneigenschaften und Verfahren zu dessen Herstellung |
CN104025719A (zh) | 2011-11-09 | 2014-09-03 | 道康宁法国公司 | 基材的等离子体处理 |
DE102012220986B4 (de) * | 2012-11-16 | 2015-04-02 | Innovent E.V. Technologieentwicklung | Dosiereinheit und ihre Verwendung |
WO2014158796A1 (en) | 2013-03-14 | 2014-10-02 | Dow Corning Corporation | Plasma deposition method |
DE102013222199A1 (de) * | 2013-10-31 | 2015-04-30 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Nieder- und Mitteldruck-Plasmaverfahren zur Oberflächenbeschichtung mittels Percursorzuführung ohne Trägergas |
GB201403558D0 (en) | 2014-02-28 | 2014-04-16 | P2I Ltd | Coating |
EP2985043A1 (de) | 2014-08-14 | 2016-02-17 | Institut d'Investigació Biomèdica de Bellvitge (IDIBELL) | Verfahren zur Herstellung eines medizinischen Geräts und hieraus hergestelltes Gerät |
KR20180016559A (ko) | 2015-06-09 | 2018-02-14 | 피2아이 리미티드 | 전자 또는 전기 장치 상에 코팅을 형성하는 방법 |
AU2016275278A1 (en) | 2015-06-09 | 2018-02-01 | P2I Ltd | Coatings |
US20200032072A1 (en) | 2015-06-09 | 2020-01-30 | P2I Ltd | Coating |
JP6563717B2 (ja) * | 2015-07-10 | 2019-08-21 | 東芝三菱電機産業システム株式会社 | 成膜装置 |
DE102015115167B4 (de) * | 2015-09-09 | 2017-03-30 | Lisa Dräxlmaier GmbH | Formkörper aufweisend eine Funktionsschicht, Verfahren zu seiner Herstellung und seine Verwendung |
WO2017136334A1 (en) | 2016-02-01 | 2017-08-10 | Theradep Technologies Inc. | Systems and methods for delivering therapeutic agents |
US11679412B2 (en) | 2016-06-13 | 2023-06-20 | Gvd Corporation | Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles |
US20170358445A1 (en) | 2016-06-13 | 2017-12-14 | Gvd Corporation | Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles |
CN109308987A (zh) * | 2017-07-26 | 2019-02-05 | 东芝存储器株式会社 | 等离子体处理装置、半导体制造装置及半导体装置的制造方法 |
JP2019029333A (ja) * | 2017-07-26 | 2019-02-21 | 東芝メモリ株式会社 | プラズマ処理装置および半導体装置の製造方法 |
US11690998B2 (en) | 2017-10-31 | 2023-07-04 | Theradep Technologies, Inc. | Methods of treating bacterial infections |
GB2579871B (en) | 2019-02-22 | 2021-07-14 | P2I Ltd | Coatings |
US11898248B2 (en) | 2019-12-18 | 2024-02-13 | Jiangsu Favored Nanotechnology Co., Ltd. | Coating apparatus and coating method |
CN113774363A (zh) | 2020-06-09 | 2021-12-10 | 江苏菲沃泰纳米科技股份有限公司 | 镀膜设备及其镀膜方法 |
Family Cites Families (35)
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US4629604A (en) * | 1983-03-21 | 1986-12-16 | Donald Spector | Multi-aroma cartridge player |
DE3574997D1 (de) * | 1984-03-03 | 1990-02-01 | Stc Plc | Pulsierendes plasmaverfahren. |
US4603030A (en) * | 1984-09-20 | 1986-07-29 | Mccarthy Robert E | Scent-Emitting Systems |
JPS61213221A (ja) * | 1985-03-19 | 1986-09-22 | Japan Synthetic Rubber Co Ltd | プラズマ重合膜の製法 |
US4952024A (en) * | 1986-08-29 | 1990-08-28 | Gale Thomas S | Three-dimensional sight and sound reproduction apparatus for individual use |
FR2653633B1 (fr) * | 1989-10-19 | 1991-12-20 | Commissariat Energie Atomique | Dispositif de traitement chimique assiste par un plasma de diffusion. |
US5185132A (en) | 1989-12-07 | 1993-02-09 | Research Development Corporation Of Japan | Atomspheric plasma reaction method and apparatus therefor |
US5260105A (en) * | 1990-04-17 | 1993-11-09 | Alfred University | Aerosol-plasma deposition of films for electrochemical cells |
US5366770A (en) * | 1990-04-17 | 1994-11-22 | Xingwu Wang | Aerosol-plasma deposition of films for electronic cells |
JPH07118522B2 (ja) * | 1990-10-24 | 1995-12-18 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 基板表面を酸化処理するための方法及び半導体の構造 |
US5609921A (en) * | 1994-08-26 | 1997-03-11 | Universite De Sherbrooke | Suspension plasma spray |
JP3339200B2 (ja) * | 1994-09-28 | 2002-10-28 | ソニー株式会社 | プラズマ発生装置、プラズマ加工方法および薄膜トランジスタの製造方法 |
US5591409A (en) * | 1995-08-15 | 1997-01-07 | Watkins; Carl J. | Providing aromas |
US5876753A (en) * | 1996-04-16 | 1999-03-02 | Board Of Regents, The University Of Texas System | Molecular tailoring of surfaces |
US6329024B1 (en) * | 1996-04-16 | 2001-12-11 | Board Of Regents, The University Of Texas System | Method for depositing a coating comprising pulsed plasma polymerization of a macrocycle |
FR2750622B1 (fr) * | 1996-07-02 | 1998-09-25 | Air Liquide | Procede de traitement de surface par voie seche et dispositif pour la mise en oeuvre d'un tel procede |
US6244575B1 (en) * | 1996-10-02 | 2001-06-12 | Micron Technology, Inc. | Method and apparatus for vaporizing liquid precursors and system for using same |
JPH10250195A (ja) | 1997-03-14 | 1998-09-22 | Canon Inc | 周辺装置 |
CA2294644C (en) | 1997-06-14 | 2009-12-22 | The Secretary Of State For Defence | Surface coatings |
FR2767124B1 (fr) | 1997-08-11 | 1999-10-08 | Yves Brenon | Dispositif de stockage de futs |
US6012647A (en) * | 1997-12-01 | 2000-01-11 | 3M Innovative Properties Company | Apparatus and method of atomizing and vaporizing |
WO1999040758A2 (en) | 1998-01-08 | 1999-08-12 | The University Of Tennessee Research Corporation | Remote exposure of workpieces using a one atmosphere uniform glow discharge plasma |
JP4151862B2 (ja) * | 1998-02-26 | 2008-09-17 | キヤノンアネルバ株式会社 | Cvd装置 |
GB9816077D0 (en) | 1998-07-24 | 1998-09-23 | Secr Defence | Surface coatings |
US6071038A (en) | 1998-09-02 | 2000-06-06 | Strobl, Jr.; Frederick P. | Device for holding paving blocks in position |
JP2000087249A (ja) * | 1998-09-04 | 2000-03-28 | Matsushita Electric Ind Co Ltd | 薄膜形成装置および方法 |
US6174651B1 (en) * | 1999-01-14 | 2001-01-16 | Steag Rtp Systems, Inc. | Method for depositing atomized materials onto a substrate utilizing light exposure for heating |
US6305314B1 (en) * | 1999-03-11 | 2001-10-23 | Genvs, Inc. | Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition |
DE60025914T2 (de) * | 1999-03-12 | 2006-10-19 | Microscent, LLC., Menlo Park | Methoden und vorrichtung zur lokalen zufuhr von parfümierten aerosolen |
US20020129902A1 (en) * | 1999-05-14 | 2002-09-19 | Babayan Steven E. | Low-temperature compatible wide-pressure-range plasma flow device |
US6287643B1 (en) * | 1999-09-30 | 2001-09-11 | Novellus Systems, Inc. | Apparatus and method for injecting and modifying gas concentration of a meta-stable or atomic species in a downstream plasma reactor |
KR100767294B1 (ko) * | 2000-06-23 | 2007-10-16 | 캐논 아네르바 가부시키가이샤 | Cvd장치 |
ES2214444T5 (es) * | 2000-10-04 | 2008-02-16 | Dow Corning Ireland Limited | Metodo y aparato para formar un recubrimiento. |
GB0211354D0 (en) | 2002-05-17 | 2002-06-26 | Surface Innovations Ltd | Atomisation of a precursor into an excitation medium for coating a remote substrate |
US6893978B1 (en) * | 2002-12-03 | 2005-05-17 | Silicon Magnetic Systems | Method for oxidizing a metal layer |
-
2002
- 2002-05-17 GB GBGB0211354.6A patent/GB0211354D0/en not_active Ceased
-
2003
- 2003-05-16 DE DE60310705T patent/DE60310705D1/de not_active Expired - Lifetime
- 2003-05-16 WO PCT/GB2003/002140 patent/WO2003097245A2/en active IP Right Grant
- 2003-05-16 EP EP03732642A patent/EP1506063B1/de not_active Revoked
- 2003-05-16 AT AT03732642T patent/ATE349286T1/de not_active IP Right Cessation
- 2003-05-16 US US10/514,661 patent/US7968154B2/en not_active Expired - Fee Related
- 2003-05-16 AU AU2003239670A patent/AU2003239670A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
AU2003239670A8 (en) | 2003-12-02 |
GB0211354D0 (en) | 2002-06-26 |
US7968154B2 (en) | 2011-06-28 |
WO2003097245A3 (en) | 2004-09-10 |
WO2003097245A2 (en) | 2003-11-27 |
US20060177598A1 (en) | 2006-08-10 |
EP1506063B1 (de) | 2006-12-27 |
AU2003239670A1 (en) | 2003-12-02 |
DE60310705D1 (de) | 2007-02-08 |
EP1506063A2 (de) | 2005-02-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |