DE60328680D1 - Aufbringen eines beschichtungsmaterials auf ein substrat - Google Patents

Aufbringen eines beschichtungsmaterials auf ein substrat

Info

Publication number
DE60328680D1
DE60328680D1 DE60328680T DE60328680T DE60328680D1 DE 60328680 D1 DE60328680 D1 DE 60328680D1 DE 60328680 T DE60328680 T DE 60328680T DE 60328680 T DE60328680 T DE 60328680T DE 60328680 D1 DE60328680 D1 DE 60328680D1
Authority
DE
Germany
Prior art keywords
substrate
coating
applying
coating material
exciting medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60328680T
Other languages
English (en)
Inventor
Luke Ward
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Surface Innovations Ltd
Original Assignee
Surface Innovations Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=9937972&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE60328680(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Surface Innovations Ltd filed Critical Surface Innovations Ltd
Application granted granted Critical
Publication of DE60328680D1 publication Critical patent/DE60328680D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Colloid Chemistry (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
DE60328680T 2002-06-01 2003-05-30 Aufbringen eines beschichtungsmaterials auf ein substrat Expired - Lifetime DE60328680D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0212848.6A GB0212848D0 (en) 2002-06-01 2002-06-01 Introduction of liquid/solid slurry into an exciting medium
PCT/GB2003/002377 WO2003101621A2 (en) 2002-06-01 2003-05-30 Application of a coating forming material onto at least one substrate

Publications (1)

Publication Number Publication Date
DE60328680D1 true DE60328680D1 (de) 2009-09-17

Family

ID=9937972

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60328680T Expired - Lifetime DE60328680D1 (de) 2002-06-01 2003-05-30 Aufbringen eines beschichtungsmaterials auf ein substrat

Country Status (7)

Country Link
US (1) US8029872B2 (de)
EP (1) EP1509332B2 (de)
AT (1) ATE438463T1 (de)
AU (1) AU2003246887A1 (de)
DE (1) DE60328680D1 (de)
GB (1) GB0212848D0 (de)
WO (1) WO2003101621A2 (de)

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GB0507612D0 (en) 2005-04-15 2005-05-25 Univ Durham A method for producing a thiol functionalised surface
GB2434368B (en) 2006-01-20 2010-08-25 P2I Ltd Plasma coated laboratory consumables
GB2434369B (en) 2006-01-20 2010-08-25 P2I Ltd Plasma coated electrical or electronic devices
KR100766771B1 (ko) 2006-06-05 2007-10-12 주식회사 케이씨텍 초음파 장치를 구비한 플라즈마 장치 및 그 표면처리 방법
ITMI20070350A1 (it) * 2007-02-23 2008-08-24 Univ Milano Bicocca Metodo di lavorazine a plasma atmosferico per il trattamento dei materiali
JP5425547B2 (ja) * 2008-07-31 2014-02-26 キヤノンアネルバ株式会社 基板処理装置、及び磁気記録媒体の製造方法
JP2013538288A (ja) 2010-07-21 2013-10-10 ダウ コーニング フランス 基板のプラズマ処理
KR20140037097A (ko) 2011-04-27 2014-03-26 다우 코닝 프랑스 기판의 플라즈마 처리
GB201112404D0 (en) 2011-07-19 2011-08-31 Surface Innovations Ltd Method
EP2707535A2 (de) 2011-05-05 2014-03-19 Surface Innovations Limited Produkt zur freisetzung von wirkstoffen
US8852693B2 (en) 2011-05-19 2014-10-07 Liquipel Ip Llc Coated electronic devices and associated methods
EP2532716A1 (de) 2011-06-10 2012-12-12 Eppendorf AG Substrat mit hydrophobe Gruppen abstoßenden Oberflächeneigenschaften und Verfahren zu dessen Herstellung
GB201112447D0 (en) 2011-07-20 2011-08-31 Surface Innovations Ltd Method
US20140248444A1 (en) 2011-11-09 2014-09-04 Centre National De La Recherche Scientifique Plasma Treatment Of Substrates
DE102013222199A1 (de) * 2013-10-31 2015-04-30 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Nieder- und Mitteldruck-Plasmaverfahren zur Oberflächenbeschichtung mittels Percursorzuführung ohne Trägergas
WO2015088920A1 (en) 2013-12-13 2015-06-18 The North Face Apparel Corp. Plasma treatments for coloration of textiles
GB201403558D0 (en) 2014-02-28 2014-04-16 P2I Ltd Coating
EP2985043A1 (de) 2014-08-14 2016-02-17 Institut d'Investigació Biomèdica de Bellvitge (IDIBELL) Verfahren zur Herstellung eines medizinischen Geräts und hieraus hergestelltes Gerät
US10421876B2 (en) 2015-06-09 2019-09-24 P2I Ltd Coatings
AU2016275277A1 (en) 2015-06-09 2018-02-01 P2I Ltd Coating
WO2016198855A1 (en) 2015-06-09 2016-12-15 P2I Ltd Method for forming a coating on an electronic or electrical device
US11679412B2 (en) 2016-06-13 2023-06-20 Gvd Corporation Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles
US20170358445A1 (en) 2016-06-13 2017-12-14 Gvd Corporation Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles
GB2579871B (en) * 2019-02-22 2021-07-14 P2I Ltd Coatings
US11898248B2 (en) 2019-12-18 2024-02-13 Jiangsu Favored Nanotechnology Co., Ltd. Coating apparatus and coating method
CN113774363A (zh) 2020-06-09 2021-12-10 江苏菲沃泰纳米科技股份有限公司 镀膜设备及其镀膜方法
CN113285049B (zh) * 2021-05-27 2022-05-06 电子科技大学 一种超声喷涂制备三氧化钨高光提取效率oled外光提取层的方法

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US5260105A (en) * 1990-04-17 1993-11-09 Alfred University Aerosol-plasma deposition of films for electrochemical cells
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US6329024B1 (en) † 1996-04-16 2001-12-11 Board Of Regents, The University Of Texas System Method for depositing a coating comprising pulsed plasma polymerization of a macrocycle
FR2750622B1 (fr) * 1996-07-02 1998-09-25 Air Liquide Procede de traitement de surface par voie seche et dispositif pour la mise en oeuvre d'un tel procede
US6001426A (en) 1996-07-25 1999-12-14 Utron Inc. High velocity pulsed wire-arc spray
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ATE317290T1 (de) * 1999-03-12 2006-02-15 Microscent Llc Methoden und vorrichtung zur lokalen zufuhr von parfümierten aerosolen
US6287643B1 (en) * 1999-09-30 2001-09-11 Novellus Systems, Inc. Apparatus and method for injecting and modifying gas concentration of a meta-stable or atomic species in a downstream plasma reactor
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ES2214444T5 (es) 2000-10-04 2008-02-16 Dow Corning Ireland Limited Metodo y aparato para formar un recubrimiento.
GB0211354D0 (en) 2002-05-17 2002-06-26 Surface Innovations Ltd Atomisation of a precursor into an excitation medium for coating a remote substrate

Also Published As

Publication number Publication date
US8029872B2 (en) 2011-10-04
AU2003246887A8 (en) 2003-12-19
WO2003101621A3 (en) 2004-03-04
EP1509332A2 (de) 2005-03-02
US20050227018A1 (en) 2005-10-13
ATE438463T1 (de) 2009-08-15
GB0212848D0 (en) 2002-07-17
AU2003246887A1 (en) 2003-12-19
EP1509332B1 (de) 2009-08-05
EP1509332B2 (de) 2013-04-03
WO2003101621A2 (en) 2003-12-11

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Legal Events

Date Code Title Description
8363 Opposition against the patent