ATE32956T1 - Photopolymerisierbare zusammensetzungen, daraus hergestellte produkte und verfahren zur herstellung dieser produkte. - Google Patents
Photopolymerisierbare zusammensetzungen, daraus hergestellte produkte und verfahren zur herstellung dieser produkte.Info
- Publication number
- ATE32956T1 ATE32956T1 AT84303664T AT84303664T ATE32956T1 AT E32956 T1 ATE32956 T1 AT E32956T1 AT 84303664 T AT84303664 T AT 84303664T AT 84303664 T AT84303664 T AT 84303664T AT E32956 T1 ATE32956 T1 AT E32956T1
- Authority
- AT
- Austria
- Prior art keywords
- products
- processes
- making
- made therefrom
- photopolymerizable compositions
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/118—Initiator containing with inhibitor or stabilizer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymerisation Methods In General (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/501,199 US4539286A (en) | 1983-06-06 | 1983-06-06 | Flexible, fast processing, photopolymerizable composition |
EP84303664A EP0128014B2 (de) | 1983-06-06 | 1984-05-31 | Photopolymerisierbare Zusammensetzungen, daraus hergestellte Produkte und Verfahren zur Herstellung dieser Produkte |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE32956T1 true ATE32956T1 (de) | 1988-03-15 |
Family
ID=23992505
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT84303664T ATE32956T1 (de) | 1983-06-06 | 1984-05-31 | Photopolymerisierbare zusammensetzungen, daraus hergestellte produkte und verfahren zur herstellung dieser produkte. |
Country Status (17)
Country | Link |
---|---|
US (1) | US4539286A (de) |
EP (1) | EP0128014B2 (de) |
JP (1) | JPS6011840A (de) |
KR (1) | KR870000750B1 (de) |
AR (1) | AR242045A1 (de) |
AT (1) | ATE32956T1 (de) |
AU (1) | AU566653B2 (de) |
BR (1) | BR8402712A (de) |
CA (1) | CA1213092A (de) |
DE (1) | DE3469809D1 (de) |
DK (1) | DK277284A (de) |
ES (2) | ES8608268A1 (de) |
IL (1) | IL72040A (de) |
NO (1) | NO169923C (de) |
NZ (1) | NZ208262A (de) |
PT (1) | PT78695B (de) |
ZA (1) | ZA843909B (de) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NZ212161A (en) * | 1984-06-08 | 1988-06-30 | Ishikawa Katsukiyo | Photo-polymerisable composition and printing plate prepared therefrom |
US4876384A (en) * | 1985-04-22 | 1989-10-24 | Diamond Shamrock Chemicals Co. | Radiation-hardenable diluents |
US5110889A (en) * | 1985-11-13 | 1992-05-05 | Diamond Shamrock Chemical Co. | Radiation hardenable compositions containing low viscosity diluents |
DE3540480A1 (de) * | 1985-11-15 | 1987-05-21 | Hoechst Ag | Durch strahlung polymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen |
AU587876B2 (en) * | 1985-11-15 | 1989-08-31 | Hoechst Aktiengesellschaft | Radiation-polymerizable mixture, recording material prepared from it and process for the production of relief recordings |
DE3706561A1 (de) * | 1987-02-28 | 1988-09-08 | Basf Ag | Lichtempfindliches aufzeichnungsmaterial mit erhoehter flexibilitaet |
US4902605A (en) * | 1987-07-24 | 1990-02-20 | Eastman Kodak Company | Photoresist composition comprising cyclohexyleneoxyalkyl acrylates |
EP0321618B1 (de) * | 1987-12-22 | 1993-02-17 | Daicel Chemical Industries, Ltd. | Lichtempfindliche härtbare Zusammensetzungen |
DE3808951A1 (de) * | 1988-03-17 | 1989-10-05 | Basf Ag | Photopolymerisierbare, zur herstellung von druckformen geeignete druckplatte |
DE3808952A1 (de) * | 1988-03-17 | 1989-10-05 | Basf Ag | Lichtempfindliche, photopolymerisierbare druckplatte |
US4819489A (en) * | 1988-05-09 | 1989-04-11 | Rca Licensing Corp. | Device and method for testing the adherence of a coating layer to a material |
US4912019A (en) * | 1988-05-31 | 1990-03-27 | E. I. Du Pont De Nemours And Company | Photosensitive aqueous developable ceramic coating composition |
DE3844451A1 (de) * | 1988-12-31 | 1990-07-05 | Basf Ag | Photopolymerisierbares system |
US4985343A (en) * | 1989-02-09 | 1991-01-15 | Mitsubishi Rayon Co., Ltd. | Crosslinking-curable resin composition |
CA2025198A1 (en) * | 1989-10-25 | 1991-04-26 | Daniel F. Varnell | Liquid solder mask composition |
US5217847A (en) * | 1989-10-25 | 1993-06-08 | Hercules Incorporated | Liquid solder mask composition |
JP2782909B2 (ja) * | 1990-04-05 | 1998-08-06 | 日本油脂株式会社 | 光重合性樹脂組成物 |
US5068168A (en) * | 1990-12-20 | 1991-11-26 | Monsanto Company | Styrene/maleates terpolymers |
CA2076727A1 (en) * | 1991-08-30 | 1993-03-01 | Richard T. Mayes | Alkaline-etch resistant dry film photoresist |
US5332650A (en) * | 1991-09-06 | 1994-07-26 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive composition |
JPH07235755A (ja) * | 1994-02-25 | 1995-09-05 | Hitachi Ltd | プリント配線基板の製法 |
CA2158915A1 (en) | 1994-09-30 | 1996-03-31 | Dekai Loo | Liquid photoimageable resist |
US6004725A (en) * | 1997-12-01 | 1999-12-21 | Morton International, Inc. | Photoimageable compositions |
US5922509A (en) * | 1998-03-18 | 1999-07-13 | Morton International, Inc. | Photoimageable compositions having improved stripping properties in aqueous alkaline solutions |
WO2000052529A1 (fr) * | 1999-03-03 | 2000-09-08 | Hitachi Chemical Company, Ltd. | Composition de resine photosensible, element photosensible contenant cette derniere, procede de fabrication d'un motif de resine et procede de fabrication de cartes de circuits imprimes |
AU2003213432A1 (en) * | 2002-03-12 | 2003-09-22 | Asahi Kasei Kabushiki Kaisha | Photosensitive resin composition and use thereof |
US7342075B2 (en) * | 2002-10-31 | 2008-03-11 | Basf Corporation | Carbamate functional addition polymers and method for their preparation |
US8236485B2 (en) * | 2002-12-20 | 2012-08-07 | Advanced Technology Materials, Inc. | Photoresist removal |
WO2008025508A1 (en) * | 2006-08-30 | 2008-03-06 | Stichting Dutch Polymer Institute | Process for preparing a polymeric relief structure |
WO2008032674A1 (fr) * | 2006-09-13 | 2008-03-20 | Hitachi Chemical Company, Ltd. | Composition de résine photosensible, élément photosensible, procédé servant à former une impression de réserve et procédé servant à produire des cartes de câblage imprimé |
CN102799070B (zh) * | 2012-08-27 | 2014-03-05 | 珠海市能动科技光学产业有限公司 | 双层涂布的负性光致抗蚀干膜 |
JP2018074102A (ja) | 2016-11-04 | 2018-05-10 | 富士通株式会社 | 電子装置 |
Family Cites Families (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA614181A (en) * | 1961-02-07 | J. Mcgraw William | Photopolymerizable compositions, elements and processes | |
CA750324A (en) * | 1967-01-10 | R. Celeste Jack | Photopolymerizable compositions and elements | |
BE525225A (de) * | 1951-08-20 | |||
US2690968A (en) * | 1952-10-04 | 1954-10-05 | Powers Chemco Inc | Development of diazo and azide sensitized colloids |
BE537117A (de) * | 1954-04-05 | |||
US2852379A (en) * | 1955-05-04 | 1958-09-16 | Eastman Kodak Co | Azide resin photolithographic composition |
US2893868A (en) * | 1955-08-22 | 1959-07-07 | Du Pont | Polymerizable compositions |
NL218803A (de) * | 1956-07-09 | |||
GB835849A (en) * | 1957-04-26 | 1960-05-25 | Du Pont | Photopolymerisable compositions and uses thereof |
NL120741C (de) * | 1958-05-21 | |||
BE626525A (de) * | 1959-08-05 | |||
US3024180A (en) * | 1959-08-17 | 1962-03-06 | Du Pont | Photopolymerizable elements |
BE639767A (de) * | 1962-11-13 | |||
US3388995A (en) * | 1964-08-10 | 1968-06-18 | Gen Aniline & Film Corp | Photopolymer offset printing plates |
US3440047A (en) * | 1964-08-10 | 1969-04-22 | Gen Aniline & Film Corp | Photopolymer offset printing plates of the etch type |
US3495987A (en) * | 1965-09-03 | 1970-02-17 | Du Pont | Photopolymerizable products |
US3458311A (en) * | 1966-06-27 | 1969-07-29 | Du Pont | Photopolymerizable elements with solvent removable protective layers |
DE1572153B2 (de) * | 1966-06-27 | 1971-07-22 | E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) | Fotopolymerisierbares aufzeichnungsmaterial |
GB1180846A (en) * | 1967-08-08 | 1970-02-11 | Agfa Gevaert Nv | Photopolymerisation of Ethylenically Unsaturated Organic Compounds |
DE1296975B (de) * | 1967-11-09 | 1969-06-04 | Kalle Ag | Lichtempfindliches Gemisch |
GB1188921A (en) * | 1968-01-31 | 1970-04-22 | Du Pont | Photopolymerizable Elements |
US3547651A (en) * | 1968-04-02 | 1970-12-15 | Du Pont | Photopolymerizable compositions containing organometal compounds |
US3708296A (en) * | 1968-08-20 | 1973-01-02 | American Can Co | Photopolymerization of epoxy monomers |
US3616367A (en) * | 1968-11-25 | 1971-10-26 | Du Pont | Photopolymerizable acrylic compositions containing rearrangeable ultraviolet stabilizer precursors |
DE1817107C3 (de) * | 1968-12-27 | 1980-09-11 | Hoechst Ag, 6000 Frankfurt | Vorsensibilisierte MehrmetaU-Offsetdruckplatte |
JPS4818563B1 (de) * | 1969-03-07 | 1973-06-07 | ||
US3695877A (en) * | 1969-08-13 | 1972-10-03 | Teijin Ltd | Photopolymerizable resin compositions |
US3850770A (en) * | 1969-10-24 | 1974-11-26 | Kansai Paint Co Ltd | Radiation curable compositions from acrylurethane resins |
US3622334A (en) * | 1969-12-31 | 1971-11-23 | Du Pont | Photopolymerizable compositions and elements containing heterocyclic nitrogen-containing compounds |
DE2027467C3 (de) * | 1970-06-04 | 1974-08-15 | Kalle Ag, 6202 Wiesbaden-Biebrich | Photopolymerisierbare Kopiermasse |
DE2039861C3 (de) * | 1970-08-11 | 1973-12-13 | Kalle Ag, 6202 Wiesbaden-Biebrich | Photopolymensierbare Kopier masse |
BE772251A (fr) * | 1970-09-07 | Kalle Ag | Composes photopolymerisables | |
US3660088A (en) * | 1970-09-16 | 1972-05-02 | Grace W R & Co | Photo-resist process |
US3796578A (en) * | 1970-12-26 | 1974-03-12 | Asahi Chemical Ind | Photopolymerizable compositions and elements containing addition polymerizable polymeric compounds |
DE2064080C3 (de) * | 1970-12-28 | 1983-11-03 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Gemisch |
US3718473A (en) * | 1971-01-27 | 1973-02-27 | Du Pont | Photopolymerizable elements containing hydro philic colloids and polymerizable monomers for making gravure printing plate resists |
US3887450A (en) * | 1971-02-04 | 1975-06-03 | Dynachem Corp | Photopolymerizable compositions containing polymeric binding agents |
US3833384A (en) * | 1972-04-26 | 1974-09-03 | Eastman Kodak Co | Photopolymerizable compositions and elements and uses thereof |
US3867153A (en) * | 1972-09-11 | 1975-02-18 | Du Pont | Photohardenable element |
US3953309A (en) * | 1972-12-14 | 1976-04-27 | Dynachem Corporation | Polymerization compositions and processes having polymeric binding agents |
JPS5632614B2 (de) * | 1973-02-13 | 1981-07-29 | ||
DE2429636C3 (de) * | 1973-06-28 | 1986-05-07 | Teijin Ltd., Osaka | Lichtempfindliche Harzmasse |
DE2363806B2 (de) * | 1973-12-21 | 1979-05-17 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Gemisch |
US4097417A (en) * | 1974-05-02 | 1978-06-27 | National Starch And Chemical Corporation | Photocurable electroconductive coating composition |
ZA757984B (en) * | 1974-10-04 | 1976-12-29 | Dynachem Corp | Polymers for aqueous processed photoresists |
JPS5492723A (en) * | 1977-12-30 | 1979-07-23 | Somar Mfg | Photosensitive material and use |
US4239849A (en) * | 1978-06-19 | 1980-12-16 | Dynachem Corporation | Polymers for aqueous processed photoresists |
JPS5633640A (en) * | 1979-08-28 | 1981-04-04 | Arai Tokuji | Photopolymerizable photosensitive resin composition and photosensitive sheet structure containing layer of such composition |
-
1983
- 1983-06-06 US US06/501,199 patent/US4539286A/en not_active Expired - Lifetime
-
1984
- 1984-05-23 CA CA000454898A patent/CA1213092A/en not_active Expired
- 1984-05-23 NZ NZ208262A patent/NZ208262A/en unknown
- 1984-05-23 ZA ZA843909A patent/ZA843909B/xx unknown
- 1984-05-25 AU AU28726/84A patent/AU566653B2/en not_active Ceased
- 1984-05-31 DE DE8484303664T patent/DE3469809D1/de not_active Expired
- 1984-05-31 AT AT84303664T patent/ATE32956T1/de not_active IP Right Cessation
- 1984-05-31 EP EP84303664A patent/EP0128014B2/de not_active Expired - Lifetime
- 1984-06-01 AR AR84296821A patent/AR242045A1/es active
- 1984-06-04 NO NO842237A patent/NO169923C/no unknown
- 1984-06-04 DK DK277284A patent/DK277284A/da not_active Application Discontinuation
- 1984-06-05 BR BR8402712A patent/BR8402712A/pt not_active IP Right Cessation
- 1984-06-05 ES ES533132A patent/ES8608268A1/es not_active Expired
- 1984-06-05 PT PT78695A patent/PT78695B/pt not_active IP Right Cessation
- 1984-06-05 IL IL72040A patent/IL72040A/xx unknown
- 1984-06-05 KR KR1019840003143A patent/KR870000750B1/ko not_active IP Right Cessation
- 1984-06-06 JP JP59116337A patent/JPS6011840A/ja active Granted
-
1985
- 1985-09-13 ES ES546967A patent/ES8606775A1/es not_active Expired
Also Published As
Publication number | Publication date |
---|---|
US4539286A (en) | 1985-09-03 |
ES8608268A1 (es) | 1986-06-01 |
NO169923C (no) | 1992-08-19 |
BR8402712A (pt) | 1985-05-14 |
ES8606775A1 (es) | 1986-04-16 |
EP0128014A3 (en) | 1985-05-29 |
EP0128014A2 (de) | 1984-12-12 |
NZ208262A (en) | 1986-10-08 |
PT78695A (pt) | 1985-01-01 |
DK277284A (da) | 1984-12-07 |
PT78695B (en) | 1986-07-11 |
KR870000750B1 (ko) | 1987-04-13 |
ES546967A0 (es) | 1986-04-16 |
ZA843909B (en) | 1984-12-24 |
NO842237L (no) | 1984-12-07 |
AU2872684A (en) | 1984-12-13 |
DK277284D0 (da) | 1984-06-04 |
JPS6011840A (ja) | 1985-01-22 |
KR850000496A (ko) | 1985-02-27 |
JPH0422508B2 (de) | 1992-04-17 |
IL72040A0 (en) | 1984-10-31 |
AR242045A1 (es) | 1993-02-26 |
EP0128014B1 (de) | 1988-03-09 |
DE3469809D1 (en) | 1988-04-14 |
CA1213092A (en) | 1986-10-21 |
EP0128014B2 (de) | 1991-08-21 |
AU566653B2 (en) | 1987-10-29 |
ES533132A0 (es) | 1986-06-01 |
NO169923B (no) | 1992-05-11 |
IL72040A (en) | 1988-03-31 |
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