ATE328365T1 - Asymmetrische stromversorgungseinheiten für bipolare elektrostatische halter und deren verfahren - Google Patents

Asymmetrische stromversorgungseinheiten für bipolare elektrostatische halter und deren verfahren

Info

Publication number
ATE328365T1
ATE328365T1 AT98911954T AT98911954T ATE328365T1 AT E328365 T1 ATE328365 T1 AT E328365T1 AT 98911954 T AT98911954 T AT 98911954T AT 98911954 T AT98911954 T AT 98911954T AT E328365 T1 ATE328365 T1 AT E328365T1
Authority
AT
Austria
Prior art keywords
power supply
node
resistive element
voltage power
balanced voltage
Prior art date
Application number
AT98911954T
Other languages
German (de)
English (en)
Inventor
Charles P Ross
Canfeng Lai
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Application granted granted Critical
Publication of ATE328365T1 publication Critical patent/ATE328365T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • H10P72/722—Details of electrostatic chucks
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T279/00—Chucks or sockets
    • Y10T279/23—Chucks or sockets with magnetic or electrostatic means

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
AT98911954T 1997-03-26 1998-03-24 Asymmetrische stromversorgungseinheiten für bipolare elektrostatische halter und deren verfahren ATE328365T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/824,104 US5835335A (en) 1997-03-26 1997-03-26 Unbalanced bipolar electrostatic chuck power supplies and methods thereof

Publications (1)

Publication Number Publication Date
ATE328365T1 true ATE328365T1 (de) 2006-06-15

Family

ID=25240591

Family Applications (1)

Application Number Title Priority Date Filing Date
AT98911954T ATE328365T1 (de) 1997-03-26 1998-03-24 Asymmetrische stromversorgungseinheiten für bipolare elektrostatische halter und deren verfahren

Country Status (8)

Country Link
US (1) US5835335A (https=)
EP (1) EP0970517B1 (https=)
JP (1) JP4169792B2 (https=)
KR (1) KR100538599B1 (https=)
AT (1) ATE328365T1 (https=)
DE (1) DE69834716T2 (https=)
TW (1) TW432464B (https=)
WO (1) WO1998043291A1 (https=)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5953200A (en) * 1998-02-05 1999-09-14 Vlsi Technology, Inc. Multiple pole electrostatic chuck with self healing mechanism for wafer clamping
US6346428B1 (en) * 1998-08-17 2002-02-12 Tegal Corporation Method and apparatus for minimizing semiconductor wafer arcing during semiconductor wafer processing
US6361645B1 (en) 1998-10-08 2002-03-26 Lam Research Corporation Method and device for compensating wafer bias in a plasma processing chamber
US6188564B1 (en) * 1999-03-31 2001-02-13 Lam Research Corporation Method and apparatus for compensating non-uniform wafer processing in plasma processing chamber
KR20010007406A (ko) * 1999-06-17 2001-01-26 조셉 제이. 스위니 정전 처크에 의해 발생한 정전력 균형을 맞추는 방법 및장치
TW454320B (en) * 2000-05-12 2001-09-11 Siliconware Precision Industries Co Ltd Semiconductor devices with heat-dissipation stiffener and manufacturing method thereof
JP2003115442A (ja) * 2001-10-04 2003-04-18 Nikon Corp 荷電粒子線露光装置におけるレチクル又はウエハの静電チャック方法
US6898065B2 (en) * 2002-07-26 2005-05-24 Brad Mays Method and apparatus for operating an electrostatic chuck in a semiconductor substrate processing system
US7026174B2 (en) * 2002-09-30 2006-04-11 Lam Research Corporation Method for reducing wafer arcing
WO2004112123A1 (ja) * 2003-06-17 2004-12-23 Creative Technology Corporation 双極型静電チャック
JP2005182494A (ja) * 2003-12-19 2005-07-07 Mitsubishi Electric Corp 電流増幅回路およびそれを備える液晶表示装置
US20120140362A1 (en) * 2010-12-02 2012-06-07 Mathew Robins Method of Operating a Heating Element for Underfloor Heating
US9076831B2 (en) * 2011-11-04 2015-07-07 Lam Research Corporation Substrate clamping system and method for operating the same
US10236202B2 (en) * 2013-11-11 2019-03-19 Diablo Capital, Inc. System and method for adhering a semiconductive wafer to a mobile electrostatic carrier through a vacuum
US9754809B2 (en) * 2013-11-11 2017-09-05 Western Alliance Bank Tri-modal carrier for a semiconductive wafer
CN104715988B (zh) * 2013-12-17 2017-05-24 中微半导体设备(上海)有限公司 等离子体处理装置及其基片直流偏置电压测量方法
EP3399545B1 (en) * 2017-05-04 2021-09-29 Meyer Burger (Germany) GmbH Substrate treatment system
JP6933097B2 (ja) * 2017-11-13 2021-09-08 オムロン株式会社 電源システム、電源装置の動作状態表示法、およびプログラム
CN112635381B (zh) * 2019-10-08 2022-03-22 长鑫存储技术有限公司 控制方法、控制系统及半导体制造设备
GB202310034D0 (en) * 2023-06-30 2023-08-16 Spts Technologies Ltd Plasma etching method and apparatus

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4692836A (en) * 1983-10-31 1987-09-08 Toshiba Kikai Kabushiki Kaisha Electrostatic chucks
DE3705866A1 (de) * 1987-02-24 1988-09-01 Siemens Ag Schaltungsanordnung zum erzeugen von symmetrischen ausgangsspannungen
JP2779950B2 (ja) * 1989-04-25 1998-07-23 東陶機器株式会社 静電チャックの電圧印加方法および電圧印加装置
DE69103915T2 (de) * 1990-01-25 1995-05-11 Applied Materials Inc Elektrostatische Klemmvorrichtung und Verfahren.
US5325261A (en) * 1991-05-17 1994-06-28 Unisearch Limited Electrostatic chuck with improved release
US5557215A (en) * 1993-05-12 1996-09-17 Tokyo Electron Limited Self-bias measuring method, apparatus thereof and electrostatic chucking apparatus
US5467249A (en) * 1993-12-20 1995-11-14 International Business Machines Corporation Electrostatic chuck with reference electrode
US5463525A (en) * 1993-12-20 1995-10-31 International Business Machines Corporation Guard ring electrostatic chuck
US5535507A (en) * 1993-12-20 1996-07-16 International Business Machines Corporation Method of making electrostatic chuck with oxide insulator
US5812361A (en) * 1996-03-29 1998-09-22 Lam Research Corporation Dynamic feedback electrostatic wafer chuck
US5708250A (en) * 1996-03-29 1998-01-13 Lam Resarch Corporation Voltage controller for electrostatic chuck of vacuum plasma processors

Also Published As

Publication number Publication date
EP0970517B1 (en) 2006-05-31
EP0970517A1 (en) 2000-01-12
JP2001525123A (ja) 2001-12-04
DE69834716D1 (de) 2006-07-06
KR20010005710A (ko) 2001-01-15
US5835335A (en) 1998-11-10
JP4169792B2 (ja) 2008-10-22
WO1998043291A1 (en) 1998-10-01
TW432464B (en) 2001-05-01
KR100538599B1 (ko) 2005-12-22
DE69834716T2 (de) 2007-05-03

Similar Documents

Publication Publication Date Title
ATE328365T1 (de) Asymmetrische stromversorgungseinheiten für bipolare elektrostatische halter und deren verfahren
JP3564228B2 (ja) 電源バランス回路
KR890004500A (ko) 출력버퍼
JPS61230411A (ja) 電気回路
EP0348918A3 (en) D/a converter
KR900012420A (ko) 전압차 변환용 비교기
TW358262B (en) Circuit arrangement
KR100259349B1 (ko) 백바이어스 전압레벨 검출기
DE3672511D1 (de) Integrierte verstaerkerschaltung.
KR910013689A (ko) 상호 콘덕턴스 증폭기
ES2177319T3 (es) Circuito electronico.
KR900019348A (ko) 전자회로
CN217484780U (zh) 一种恒流输出电路
JPS5914816Y2 (ja) 定電流回路
SU1046747A1 (ru) Стабилизатор напр жени посто нного тока
JPS6118457Y2 (https=)
JPH0435776Y2 (https=)
JPS58207119A (ja) 電流源回路
JPH06347493A (ja) 交流電圧信号の整流用回路装置
SU1307538A1 (ru) Дифференциальный усилитель
KR900010781A (ko) Bicmos 양(+)공급 전압기준회로
WO1997020220A1 (en) Method and apparatus for determining electrical impedance
JPS57154965A (en) Constant current source type filter having self-bias function
JPS5851786A (ja) 直流モ−タの速度制御装置
JPH0216042B2 (https=)

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties