ATE327570T1 - Ionenstrahlerzeugungsvorrichtung - Google Patents

Ionenstrahlerzeugungsvorrichtung

Info

Publication number
ATE327570T1
ATE327570T1 AT02722381T AT02722381T ATE327570T1 AT E327570 T1 ATE327570 T1 AT E327570T1 AT 02722381 T AT02722381 T AT 02722381T AT 02722381 T AT02722381 T AT 02722381T AT E327570 T1 ATE327570 T1 AT E327570T1
Authority
AT
Austria
Prior art keywords
axis
ion beam
ions
generating device
beam generating
Prior art date
Application number
AT02722381T
Other languages
English (en)
Inventor
Jacques Gierak
Yvon Lagadec
Albert Septier
Original Assignee
Centre Nat Rech Scient
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre Nat Rech Scient filed Critical Centre Nat Rech Scient
Application granted granted Critical
Publication of ATE327570T1 publication Critical patent/ATE327570T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H01J27/22—Metal ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/024—Moving components not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H01J2237/0805—Liquid metal sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1502—Mechanical adjustments
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30433—System calibration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
AT02722381T 2001-03-28 2002-03-26 Ionenstrahlerzeugungsvorrichtung ATE327570T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0104173A FR2823005B1 (fr) 2001-03-28 2001-03-28 Dispositif de generation d'un faisceau d'ions et procede de reglage de ce faisceau

Publications (1)

Publication Number Publication Date
ATE327570T1 true ATE327570T1 (de) 2006-06-15

Family

ID=8861630

Family Applications (2)

Application Number Title Priority Date Filing Date
AT06100810T ATE406665T1 (de) 2001-03-28 2002-03-26 Verfahren zur regelung eines ionenstrahls
AT02722381T ATE327570T1 (de) 2001-03-28 2002-03-26 Ionenstrahlerzeugungsvorrichtung

Family Applications Before (1)

Application Number Title Priority Date Filing Date
AT06100810T ATE406665T1 (de) 2001-03-28 2002-03-26 Verfahren zur regelung eines ionenstrahls

Country Status (9)

Country Link
US (1) US6864495B2 (de)
EP (2) EP1699067B1 (de)
JP (1) JP2004527078A (de)
AT (2) ATE406665T1 (de)
CA (1) CA2442189C (de)
DE (2) DE60211672T2 (de)
ES (2) ES2313542T3 (de)
FR (1) FR2823005B1 (de)
WO (1) WO2002078036A2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4611755B2 (ja) * 2005-01-13 2011-01-12 株式会社日立ハイテクノロジーズ 走査電子顕微鏡及びその撮像方法
EP1752992A1 (de) * 2005-08-12 2007-02-14 Siemens Aktiengesellschaft Vorrichtung zur Anpassung mindestens eines Partikelstrahlparameters eines Partikelstrahls einer Partikelbeschleunigeranlage und Partikelbeschleunigeranlage mit einer derartigen Vorrichtung
CN101461026B (zh) * 2006-06-07 2012-01-18 Fei公司 与包含真空室的装置一起使用的滑动轴承
FR2936091B1 (fr) * 2008-09-15 2010-10-29 Centre Nat Rech Scient Dispositif de generation d'un faisceau d'ions avec filtre magnetique.
EP2342733B1 (de) 2008-09-15 2017-11-01 Centre National de la Recherche Scientifique (CNRS) Einrichtung zur erzeugung eines ionenstrahls mit cryogenfalle
FR2936092B1 (fr) * 2008-09-15 2012-04-06 Centre Nat Rech Scient Dispositif de generation d'un faisceau d'ions avec piege cryogenique.
US8900982B2 (en) * 2009-04-08 2014-12-02 Varian Semiconductor Equipment Associates, Inc. Techniques for processing a substrate
US9076914B2 (en) * 2009-04-08 2015-07-07 Varian Semiconductor Equipment Associates, Inc. Techniques for processing a substrate
US9006688B2 (en) * 2009-04-08 2015-04-14 Varian Semiconductor Equipment Associates, Inc. Techniques for processing a substrate using a mask
FR3094046B1 (fr) * 2019-03-18 2021-04-23 Centre Nat Rech Scient Procédé de contrôle d’un propulseur ionique, et système de propulsion ionique

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4426582A (en) * 1980-01-21 1984-01-17 Oregon Graduate Center Charged particle beam apparatus and method utilizing liquid metal field ionization source and asymmetric three element lens system
JPS5856332A (ja) * 1981-09-30 1983-04-04 Hitachi Ltd マスクの欠陥修正方法
JPS6062045A (ja) * 1983-09-14 1985-04-10 Hitachi Ltd イオンマイクロビ−ム打込み装置
JPS6190161A (ja) * 1984-10-09 1986-05-08 Seiko Instr & Electronics Ltd 集束イオンビ−ムのビ−ム形状調整方法
JPS63305358A (ja) * 1987-06-05 1988-12-13 Seiko Instr & Electronics Ltd パターン膜修正方法
US5149976A (en) * 1990-08-31 1992-09-22 Hughes Aircraft Company Charged particle beam pattern generation apparatus and method
FR2722333B1 (fr) * 1994-07-07 1996-09-13 Rech Scient Snrs Centre Nat De Source d'ions de metaux liquides
EP0706199B1 (de) 1994-10-07 2003-07-02 International Business Machines Corporation Flüssige ionische Zusammensetzungen verwendende Ionenpunktquellen hoher Luminosität
JP3305553B2 (ja) * 1995-11-17 2002-07-22 株式会社荏原製作所 高速原子線源
US5916424A (en) * 1996-04-19 1999-06-29 Micrion Corporation Thin film magnetic recording heads and systems and methods for manufacturing the same
JP2004510295A (ja) * 2000-09-20 2004-04-02 エフ・イ−・アイ・カンパニー 荷電粒子ビームシステムにおける同時の映像化と照射のためのリアルタイムモニタリング

Also Published As

Publication number Publication date
EP1699067A3 (de) 2007-06-06
WO2002078036A2 (fr) 2002-10-03
JP2004527078A (ja) 2004-09-02
EP1699067A2 (de) 2006-09-06
EP1699067B1 (de) 2008-08-27
ATE406665T1 (de) 2008-09-15
ES2313542T3 (es) 2009-03-01
CA2442189C (fr) 2014-09-30
EP1374270B1 (de) 2006-05-24
DE60211672T2 (de) 2007-05-03
EP1374270A2 (de) 2004-01-02
CA2442189A1 (fr) 2002-10-03
WO2002078036A3 (fr) 2002-11-14
US20040094725A1 (en) 2004-05-20
ES2265496T3 (es) 2007-02-16
DE60211672D1 (de) 2006-06-29
FR2823005B1 (fr) 2003-05-16
FR2823005A1 (fr) 2002-10-04
DE60228637D1 (de) 2008-10-09
US6864495B2 (en) 2005-03-08

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