ATE406665T1 - Verfahren zur regelung eines ionenstrahls - Google Patents

Verfahren zur regelung eines ionenstrahls

Info

Publication number
ATE406665T1
ATE406665T1 AT06100810T AT06100810T ATE406665T1 AT E406665 T1 ATE406665 T1 AT E406665T1 AT 06100810 T AT06100810 T AT 06100810T AT 06100810 T AT06100810 T AT 06100810T AT E406665 T1 ATE406665 T1 AT E406665T1
Authority
AT
Austria
Prior art keywords
axis
ions
ion beam
controlling
ion
Prior art date
Application number
AT06100810T
Other languages
English (en)
Inventor
Jacques Gierak
Yvon Lagadec
Albert Septier
Original Assignee
Centre Nat Rech Scient
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre Nat Rech Scient filed Critical Centre Nat Rech Scient
Application granted granted Critical
Publication of ATE406665T1 publication Critical patent/ATE406665T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H01J27/22—Metal ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/024—Moving components not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H01J2237/0805—Liquid metal sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1502—Mechanical adjustments
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30433—System calibration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Composite Materials (AREA)
  • Plasma & Fusion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Physical Vapour Deposition (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Drying Of Semiconductors (AREA)
AT06100810T 2001-03-28 2002-03-26 Verfahren zur regelung eines ionenstrahls ATE406665T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0104173A FR2823005B1 (fr) 2001-03-28 2001-03-28 Dispositif de generation d'un faisceau d'ions et procede de reglage de ce faisceau

Publications (1)

Publication Number Publication Date
ATE406665T1 true ATE406665T1 (de) 2008-09-15

Family

ID=8861630

Family Applications (2)

Application Number Title Priority Date Filing Date
AT06100810T ATE406665T1 (de) 2001-03-28 2002-03-26 Verfahren zur regelung eines ionenstrahls
AT02722381T ATE327570T1 (de) 2001-03-28 2002-03-26 Ionenstrahlerzeugungsvorrichtung

Family Applications After (1)

Application Number Title Priority Date Filing Date
AT02722381T ATE327570T1 (de) 2001-03-28 2002-03-26 Ionenstrahlerzeugungsvorrichtung

Country Status (9)

Country Link
US (1) US6864495B2 (de)
EP (2) EP1699067B1 (de)
JP (1) JP2004527078A (de)
AT (2) ATE406665T1 (de)
CA (1) CA2442189C (de)
DE (2) DE60211672T2 (de)
ES (2) ES2313542T3 (de)
FR (1) FR2823005B1 (de)
WO (1) WO2002078036A2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4611755B2 (ja) * 2005-01-13 2011-01-12 株式会社日立ハイテクノロジーズ 走査電子顕微鏡及びその撮像方法
EP1752992A1 (de) * 2005-08-12 2007-02-14 Siemens Aktiengesellschaft Vorrichtung zur Anpassung mindestens eines Partikelstrahlparameters eines Partikelstrahls einer Partikelbeschleunigeranlage und Partikelbeschleunigeranlage mit einer derartigen Vorrichtung
CN101461026B (zh) * 2006-06-07 2012-01-18 Fei公司 与包含真空室的装置一起使用的滑动轴承
FR2936091B1 (fr) * 2008-09-15 2010-10-29 Centre Nat Rech Scient Dispositif de generation d'un faisceau d'ions avec filtre magnetique.
EP2342733B1 (de) 2008-09-15 2017-11-01 Centre National de la Recherche Scientifique (CNRS) Einrichtung zur erzeugung eines ionenstrahls mit cryogenfalle
FR2936092B1 (fr) * 2008-09-15 2012-04-06 Centre Nat Rech Scient Dispositif de generation d'un faisceau d'ions avec piege cryogenique.
US8900982B2 (en) * 2009-04-08 2014-12-02 Varian Semiconductor Equipment Associates, Inc. Techniques for processing a substrate
US9076914B2 (en) * 2009-04-08 2015-07-07 Varian Semiconductor Equipment Associates, Inc. Techniques for processing a substrate
US9006688B2 (en) * 2009-04-08 2015-04-14 Varian Semiconductor Equipment Associates, Inc. Techniques for processing a substrate using a mask
FR3094046B1 (fr) * 2019-03-18 2021-04-23 Centre Nat Rech Scient Procédé de contrôle d’un propulseur ionique, et système de propulsion ionique

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4426582A (en) * 1980-01-21 1984-01-17 Oregon Graduate Center Charged particle beam apparatus and method utilizing liquid metal field ionization source and asymmetric three element lens system
JPS5856332A (ja) * 1981-09-30 1983-04-04 Hitachi Ltd マスクの欠陥修正方法
JPS6062045A (ja) * 1983-09-14 1985-04-10 Hitachi Ltd イオンマイクロビ−ム打込み装置
JPS6190161A (ja) * 1984-10-09 1986-05-08 Seiko Instr & Electronics Ltd 集束イオンビ−ムのビ−ム形状調整方法
JPS63305358A (ja) * 1987-06-05 1988-12-13 Seiko Instr & Electronics Ltd パターン膜修正方法
US5149976A (en) * 1990-08-31 1992-09-22 Hughes Aircraft Company Charged particle beam pattern generation apparatus and method
FR2722333B1 (fr) * 1994-07-07 1996-09-13 Rech Scient Snrs Centre Nat De Source d'ions de metaux liquides
EP0706199B1 (de) 1994-10-07 2003-07-02 International Business Machines Corporation Flüssige ionische Zusammensetzungen verwendende Ionenpunktquellen hoher Luminosität
JP3305553B2 (ja) * 1995-11-17 2002-07-22 株式会社荏原製作所 高速原子線源
US5916424A (en) * 1996-04-19 1999-06-29 Micrion Corporation Thin film magnetic recording heads and systems and methods for manufacturing the same
JP2004510295A (ja) * 2000-09-20 2004-04-02 エフ・イ−・アイ・カンパニー 荷電粒子ビームシステムにおける同時の映像化と照射のためのリアルタイムモニタリング

Also Published As

Publication number Publication date
EP1699067A3 (de) 2007-06-06
WO2002078036A2 (fr) 2002-10-03
JP2004527078A (ja) 2004-09-02
EP1699067A2 (de) 2006-09-06
ATE327570T1 (de) 2006-06-15
EP1699067B1 (de) 2008-08-27
ES2313542T3 (es) 2009-03-01
CA2442189C (fr) 2014-09-30
EP1374270B1 (de) 2006-05-24
DE60211672T2 (de) 2007-05-03
EP1374270A2 (de) 2004-01-02
CA2442189A1 (fr) 2002-10-03
WO2002078036A3 (fr) 2002-11-14
US20040094725A1 (en) 2004-05-20
ES2265496T3 (es) 2007-02-16
DE60211672D1 (de) 2006-06-29
FR2823005B1 (fr) 2003-05-16
FR2823005A1 (fr) 2002-10-04
DE60228637D1 (de) 2008-10-09
US6864495B2 (en) 2005-03-08

Similar Documents

Publication Publication Date Title
ATE308751T1 (de) Vorrichtung und verfahren zur dreidimensionalen ionenspeicherung unter atmosphärendruck
EP2043131A3 (de) Verfahren zur Herstellung von winzigen Proben
EP1213744A3 (de) Ionenimplantierungs-Vorrichtungen und -Verfahren
EP2360711A3 (de) Ionenquelle und verfahren für die maldi-massenspektrometrie
DE60228637D1 (de) Verfahren zur Regelung eines Ionenstrahls
TW350974B (en) Method and apparatus for ion beam neutralization
EP1253587A3 (de) Optisches Plattengerät und Verfahren zum Verarbeiten von optischen Platten
EP2418674A3 (de) Ionquellen, Systeme und Verfahren
WO2006021958A3 (en) Directed multi-deflected ion beam milling of a work piece and determining and controlling extent thereof
EP1024343A3 (de) Rotierendes Laserbeleuchtungssystem
EP1209737A3 (de) Verfahren zur Herstellung von Proben
WO2006133041A3 (en) Beam stop and beam tuning methods
ATE278500T1 (de) Verfahren zum bearbeiten von werkstücken mittels mehrerer laserstrahlen
TW200503042A (en) A hybrid magnetic/electrostatic deflector for ion implantation systems
ATE371180T1 (de) Verfahren zur bearbeitung einer masse mittels laserbestrahlung und steuersystem dafür
WO2004057638A3 (en) Method and apparatus for aerodynamic ion focusing
ATE392797T1 (de) Vorrichtung zur vorbeschleunigung von ionenstrahlen zur verwendung in einem schwerionenstrahlanwendungssystem
AU2003234484A8 (en) Sputter coating apparatus including ion beam source(s), and corresponding method
EP0874283A3 (de) Optischer Belichtungsapparat und optisches Reinigungsverfahren
WO2007019118A3 (en) Systems, control subsystems, and methods for projecting an electron beam onto a specimen
EP1024519A3 (de) Ionenimplantierung mittels konischer, magnetischer Abtastung
EP1662541A3 (de) Raumladungskompensierungsvorrichtung für einem Ionenstrahl und Ionen- Implantationssystem mit einem solchen
EP1220288A3 (de) Flugzeitmassenspektrometer-Ionenoptik
ATE417254T1 (de) Verfahren und vorrichtung zum optischen abtasten eines fahrzeugrades
WO2002037158A3 (en) Cytological imaging systems and methods

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties