DE60211672D1 - Ionenstrahlerzeugungsvorrichtung - Google Patents
IonenstrahlerzeugungsvorrichtungInfo
- Publication number
- DE60211672D1 DE60211672D1 DE60211672T DE60211672T DE60211672D1 DE 60211672 D1 DE60211672 D1 DE 60211672D1 DE 60211672 T DE60211672 T DE 60211672T DE 60211672 T DE60211672 T DE 60211672T DE 60211672 D1 DE60211672 D1 DE 60211672D1
- Authority
- DE
- Germany
- Prior art keywords
- axis
- ion beam
- ions
- generating apparatus
- beam generating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/022—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
- H01J27/22—Metal ion sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
- H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/024—Moving components not otherwise provided for
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
- H01J2237/0802—Field ionization sources
- H01J2237/0805—Liquid metal sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1501—Beam alignment means or procedures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1502—Mechanical adjustments
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/304—Controlling tubes
- H01J2237/30433—System calibration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3174—Etching microareas
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Combustion & Propulsion (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Crystallography & Structural Chemistry (AREA)
- Composite Materials (AREA)
- Plasma & Fusion (AREA)
- Electron Sources, Ion Sources (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Physical Vapour Deposition (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0104173A FR2823005B1 (fr) | 2001-03-28 | 2001-03-28 | Dispositif de generation d'un faisceau d'ions et procede de reglage de ce faisceau |
FR0104173 | 2001-03-28 | ||
PCT/FR2002/001041 WO2002078036A2 (fr) | 2001-03-28 | 2002-03-26 | Dispositif de generation d'un faisceau d'ions |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60211672D1 true DE60211672D1 (de) | 2006-06-29 |
DE60211672T2 DE60211672T2 (de) | 2007-05-03 |
Family
ID=8861630
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60211672T Expired - Lifetime DE60211672T2 (de) | 2001-03-28 | 2002-03-26 | Ionenstrahlerzeugungsvorrichtung |
DE60228637T Expired - Lifetime DE60228637D1 (de) | 2001-03-28 | 2002-03-26 | Verfahren zur Regelung eines Ionenstrahls |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60228637T Expired - Lifetime DE60228637D1 (de) | 2001-03-28 | 2002-03-26 | Verfahren zur Regelung eines Ionenstrahls |
Country Status (9)
Country | Link |
---|---|
US (1) | US6864495B2 (de) |
EP (2) | EP1699067B1 (de) |
JP (1) | JP2004527078A (de) |
AT (2) | ATE406665T1 (de) |
CA (1) | CA2442189C (de) |
DE (2) | DE60211672T2 (de) |
ES (2) | ES2313542T3 (de) |
FR (1) | FR2823005B1 (de) |
WO (1) | WO2002078036A2 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4611755B2 (ja) * | 2005-01-13 | 2011-01-12 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡及びその撮像方法 |
EP1752992A1 (de) * | 2005-08-12 | 2007-02-14 | Siemens Aktiengesellschaft | Vorrichtung zur Anpassung mindestens eines Partikelstrahlparameters eines Partikelstrahls einer Partikelbeschleunigeranlage und Partikelbeschleunigeranlage mit einer derartigen Vorrichtung |
CN101461026B (zh) | 2006-06-07 | 2012-01-18 | Fei公司 | 与包含真空室的装置一起使用的滑动轴承 |
WO2010029269A1 (fr) * | 2008-09-15 | 2010-03-18 | Centre National De La Recherche Scientifique (C.N.R.S) | Dispositif de génération d'un faisceau d'ions avec filtre magnétique |
FR2936092B1 (fr) * | 2008-09-15 | 2012-04-06 | Centre Nat Rech Scient | Dispositif de generation d'un faisceau d'ions avec piege cryogenique. |
FR2936091B1 (fr) * | 2008-09-15 | 2010-10-29 | Centre Nat Rech Scient | Dispositif de generation d'un faisceau d'ions avec filtre magnetique. |
US9006688B2 (en) * | 2009-04-08 | 2015-04-14 | Varian Semiconductor Equipment Associates, Inc. | Techniques for processing a substrate using a mask |
US8900982B2 (en) * | 2009-04-08 | 2014-12-02 | Varian Semiconductor Equipment Associates, Inc. | Techniques for processing a substrate |
US9076914B2 (en) * | 2009-04-08 | 2015-07-07 | Varian Semiconductor Equipment Associates, Inc. | Techniques for processing a substrate |
FR3094046B1 (fr) * | 2019-03-18 | 2021-04-23 | Centre Nat Rech Scient | Procédé de contrôle d’un propulseur ionique, et système de propulsion ionique |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4426582A (en) * | 1980-01-21 | 1984-01-17 | Oregon Graduate Center | Charged particle beam apparatus and method utilizing liquid metal field ionization source and asymmetric three element lens system |
JPS5856332A (ja) * | 1981-09-30 | 1983-04-04 | Hitachi Ltd | マスクの欠陥修正方法 |
JPS6062045A (ja) * | 1983-09-14 | 1985-04-10 | Hitachi Ltd | イオンマイクロビ−ム打込み装置 |
JPS6190161A (ja) * | 1984-10-09 | 1986-05-08 | Seiko Instr & Electronics Ltd | 集束イオンビ−ムのビ−ム形状調整方法 |
JPS63305358A (ja) * | 1987-06-05 | 1988-12-13 | Seiko Instr & Electronics Ltd | パターン膜修正方法 |
US5149976A (en) * | 1990-08-31 | 1992-09-22 | Hughes Aircraft Company | Charged particle beam pattern generation apparatus and method |
FR2722333B1 (fr) * | 1994-07-07 | 1996-09-13 | Rech Scient Snrs Centre Nat De | Source d'ions de metaux liquides |
EP0706199B1 (de) | 1994-10-07 | 2003-07-02 | International Business Machines Corporation | Flüssige ionische Zusammensetzungen verwendende Ionenpunktquellen hoher Luminosität |
JP3305553B2 (ja) * | 1995-11-17 | 2002-07-22 | 株式会社荏原製作所 | 高速原子線源 |
US5916424A (en) * | 1996-04-19 | 1999-06-29 | Micrion Corporation | Thin film magnetic recording heads and systems and methods for manufacturing the same |
WO2002025692A1 (en) * | 2000-09-20 | 2002-03-28 | Fei Company | Real time monitoring for simultaneous imaging and exposure in charged particle beam systems |
-
2001
- 2001-03-28 FR FR0104173A patent/FR2823005B1/fr not_active Expired - Lifetime
-
2002
- 2002-03-26 DE DE60211672T patent/DE60211672T2/de not_active Expired - Lifetime
- 2002-03-26 CA CA2442189A patent/CA2442189C/fr not_active Expired - Lifetime
- 2002-03-26 AT AT06100810T patent/ATE406665T1/de not_active IP Right Cessation
- 2002-03-26 ES ES06100810T patent/ES2313542T3/es not_active Expired - Lifetime
- 2002-03-26 ES ES02722381T patent/ES2265496T3/es not_active Expired - Lifetime
- 2002-03-26 EP EP06100810A patent/EP1699067B1/de not_active Expired - Lifetime
- 2002-03-26 WO PCT/FR2002/001041 patent/WO2002078036A2/fr active IP Right Grant
- 2002-03-26 DE DE60228637T patent/DE60228637D1/de not_active Expired - Lifetime
- 2002-03-26 US US10/472,090 patent/US6864495B2/en not_active Expired - Lifetime
- 2002-03-26 JP JP2002575979A patent/JP2004527078A/ja active Pending
- 2002-03-26 AT AT02722381T patent/ATE327570T1/de not_active IP Right Cessation
- 2002-03-26 EP EP02722381A patent/EP1374270B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CA2442189C (fr) | 2014-09-30 |
US6864495B2 (en) | 2005-03-08 |
FR2823005A1 (fr) | 2002-10-04 |
JP2004527078A (ja) | 2004-09-02 |
DE60211672T2 (de) | 2007-05-03 |
FR2823005B1 (fr) | 2003-05-16 |
WO2002078036A2 (fr) | 2002-10-03 |
EP1374270A2 (de) | 2004-01-02 |
EP1699067A2 (de) | 2006-09-06 |
ATE406665T1 (de) | 2008-09-15 |
EP1699067B1 (de) | 2008-08-27 |
EP1699067A3 (de) | 2007-06-06 |
ES2265496T3 (es) | 2007-02-16 |
ATE327570T1 (de) | 2006-06-15 |
EP1374270B1 (de) | 2006-05-24 |
ES2313542T3 (es) | 2009-03-01 |
WO2002078036A3 (fr) | 2002-11-14 |
US20040094725A1 (en) | 2004-05-20 |
CA2442189A1 (fr) | 2002-10-03 |
DE60228637D1 (de) | 2008-10-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |