ATE321106T1 - Cmp systeme und verfahren zur verwendung von aminoenthaltenden polymerisaten - Google Patents

Cmp systeme und verfahren zur verwendung von aminoenthaltenden polymerisaten

Info

Publication number
ATE321106T1
ATE321106T1 AT03731907T AT03731907T ATE321106T1 AT E321106 T1 ATE321106 T1 AT E321106T1 AT 03731907 T AT03731907 T AT 03731907T AT 03731907 T AT03731907 T AT 03731907T AT E321106 T1 ATE321106 T1 AT E321106T1
Authority
AT
Austria
Prior art keywords
amino
methods
amine
containing polymers
functional groups
Prior art date
Application number
AT03731907T
Other languages
English (en)
Inventor
Kevin J Moeggenborg
Isaac K Cherian
Vlasta Brusic
Original Assignee
Cabot Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Microelectronics Corp filed Critical Cabot Microelectronics Corp
Application granted granted Critical
Publication of ATE321106T1 publication Critical patent/ATE321106T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Polyamides (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
AT03731907T 2002-01-18 2003-01-13 Cmp systeme und verfahren zur verwendung von aminoenthaltenden polymerisaten ATE321106T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/051,241 US7004819B2 (en) 2002-01-18 2002-01-18 CMP systems and methods utilizing amine-containing polymers

Publications (1)

Publication Number Publication Date
ATE321106T1 true ATE321106T1 (de) 2006-04-15

Family

ID=21970141

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03731907T ATE321106T1 (de) 2002-01-18 2003-01-13 Cmp systeme und verfahren zur verwendung von aminoenthaltenden polymerisaten

Country Status (9)

Country Link
US (1) US7004819B2 (de)
EP (1) EP1465957B1 (de)
JP (2) JP4579545B2 (de)
KR (1) KR100948225B1 (de)
CN (2) CN100412152C (de)
AT (1) ATE321106T1 (de)
DE (1) DE60304181T2 (de)
TW (1) TWI278498B (de)
WO (1) WO2003062338A1 (de)

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Also Published As

Publication number Publication date
CN1620488A (zh) 2005-05-25
JP2009285828A (ja) 2009-12-10
CN101318309A (zh) 2008-12-10
US20030139116A1 (en) 2003-07-24
DE60304181D1 (de) 2006-05-11
CN101318309B (zh) 2010-07-14
EP1465957A1 (de) 2004-10-13
DE60304181T2 (de) 2006-12-28
TWI278498B (en) 2007-04-11
JP5378906B2 (ja) 2013-12-25
TW200302244A (en) 2003-08-01
CN100412152C (zh) 2008-08-20
KR100948225B1 (ko) 2010-03-18
JP2005515646A (ja) 2005-05-26
US7004819B2 (en) 2006-02-28
WO2003062338A1 (en) 2003-07-31
EP1465957B1 (de) 2006-03-22
JP4579545B2 (ja) 2010-11-10
KR20040081458A (ko) 2004-09-21

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