ATE301866T1 - Verfahren zur herstellung von material zur herstellung von isolierenden filmen - Google Patents
Verfahren zur herstellung von material zur herstellung von isolierenden filmenInfo
- Publication number
- ATE301866T1 ATE301866T1 AT01100925T AT01100925T ATE301866T1 AT E301866 T1 ATE301866 T1 AT E301866T1 AT 01100925 T AT01100925 T AT 01100925T AT 01100925 T AT01100925 T AT 01100925T AT E301866 T1 ATE301866 T1 AT E301866T1
- Authority
- AT
- Austria
- Prior art keywords
- producing
- insulating film
- curable composition
- polymer compound
- composition
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K13/00—Use of mixtures of ingredients not covered by one single of the preceding main groups, each of these compounds being essential
- C08K13/02—Organic and inorganic ingredients
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/32—Post-polymerisation treatment
- C08G77/34—Purification
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/42—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes polyesters; polyethers; polyacetals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/44—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
- H01B3/442—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from aromatic vinyl compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/46—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes silicones
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Paints Or Removers (AREA)
- Formation Of Insulating Films (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000007385A JP2001089661A (ja) | 1999-07-16 | 2000-01-17 | 硬化性組成物およびその製造方法 |
JP2000175684A JP3669250B2 (ja) | 2000-06-12 | 2000-06-12 | 膜形成用組成物の製造方法およびそれにより得られる膜形成用組成物 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE301866T1 true ATE301866T1 (de) | 2005-08-15 |
Family
ID=26583602
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT01100925T ATE301866T1 (de) | 2000-01-17 | 2001-01-16 | Verfahren zur herstellung von material zur herstellung von isolierenden filmen |
Country Status (6)
Country | Link |
---|---|
US (1) | US6642352B2 (de) |
EP (1) | EP1117102B1 (de) |
KR (1) | KR100677782B1 (de) |
AT (1) | ATE301866T1 (de) |
DE (1) | DE60112481T2 (de) |
TW (1) | TWI275606B (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002285086A (ja) * | 2001-03-26 | 2002-10-03 | Jsr Corp | 膜形成用組成物、膜の形成方法およびシリカ系膜 |
KR101227664B1 (ko) * | 2002-01-31 | 2013-01-29 | 도소 가부시키가이샤 | 유기실란화합물을 포함하여 구성되는 절연막용 재료, 그 제조방법 및 반도체장치 |
US7122880B2 (en) | 2002-05-30 | 2006-10-17 | Air Products And Chemicals, Inc. | Compositions for preparing low dielectric materials |
JP2004165613A (ja) * | 2002-06-03 | 2004-06-10 | Shipley Co Llc | 電子デバイスの製造 |
US7655365B2 (en) * | 2002-07-01 | 2010-02-02 | Dai Nippon Printing Co., Ltd. | Wettability variable substrate and wettability variable layer forming composition |
WO2004019134A1 (ja) * | 2002-08-22 | 2004-03-04 | Daikin Industries, Ltd. | 剥離液 |
US20070106056A1 (en) * | 2003-03-28 | 2007-05-10 | Pi R&D Co., Ltd. | Crosslinked polyimide, composition comprising the same and method for producing the same |
US20050260420A1 (en) * | 2003-04-01 | 2005-11-24 | Collins Martha J | Low dielectric materials and methods for making same |
US7462678B2 (en) * | 2003-09-25 | 2008-12-09 | Jsr Corporation | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film |
US20050089642A1 (en) * | 2003-10-28 | 2005-04-28 | Rohm And Haas Electronic Materials, L.L.C. | Dielectric materials preparation |
JP2005133060A (ja) * | 2003-10-29 | 2005-05-26 | Rohm & Haas Electronic Materials Llc | 多孔性材料 |
JP4894153B2 (ja) * | 2005-03-23 | 2012-03-14 | 株式会社アルバック | 多孔質膜の前駆体組成物及びその調製方法、多孔質膜及びその作製方法、並びに半導体装置 |
DE102005060649A1 (de) * | 2005-12-19 | 2007-06-21 | Wacker Chemie Ag | Vernetzbare Massen auf der Basis von Organosiliciumverbindungen |
JP5030478B2 (ja) * | 2006-06-02 | 2012-09-19 | 株式会社アルバック | 多孔質膜の前駆体組成物及びその調製方法、多孔質膜及びその作製方法、並びに半導体装置 |
JP2008013623A (ja) * | 2006-07-04 | 2008-01-24 | Shin Etsu Chem Co Ltd | 光関連デバイス封止用樹脂組成物およびその硬化物 |
WO2010050491A1 (ja) * | 2008-10-31 | 2010-05-06 | 宇部興産株式会社 | ポリイミド前駆体溶液組成物 |
CN105584149A (zh) * | 2012-01-20 | 2016-05-18 | 旭化成株式会社 | 树脂组合物、层积体、多层印刷线路板和多层柔性线路板及其制造方法 |
KR101925740B1 (ko) * | 2012-06-26 | 2018-12-05 | 미쯔비시 케미컬 주식회사 | 고분자 화합물의 제조 방법 및 고분자 화합물 |
JP6526894B1 (ja) * | 2018-09-20 | 2019-06-05 | 日東電工株式会社 | 分離膜 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2802820A (en) | 1953-02-18 | 1957-08-13 | Atlas Powder Co | Condensation products of secondary hexityl amines, formaldehyde and phenols |
US2839506A (en) | 1953-11-16 | 1958-06-17 | American Cyanamid Co | Antistatic treatment for hydrophobic synthetic fiber-containing materials |
CA1044537A (en) | 1973-05-09 | 1978-12-19 | Amf Incorporated | Filter medium and process |
GB2098590B (en) * | 1979-03-01 | 1983-08-03 | Amf Inc | Filter aid |
US4684697A (en) * | 1985-04-30 | 1987-08-04 | Ppg Industries, Inc. | Compositions based on silane hydrolyzates and vinyl polymers containing hydrolyzable silyl groups |
JPS6317486A (ja) | 1986-07-09 | 1988-01-25 | 沖電気工業株式会社 | サンゴ型イルミネ−シヨン体の製造方法 |
US5236970A (en) * | 1987-02-05 | 1993-08-17 | Allergan, Inc. | Optically clear reinforced silicone elastomers of high optical refractive index and improved mechanical properties for use in intraocular lenses |
US5212050A (en) * | 1988-11-14 | 1993-05-18 | Mier Randall M | Method of forming a permselective layer |
US5128041A (en) * | 1991-05-15 | 1992-07-07 | Pall Corporation | Microporous membrane, method of manufacture, and method of use |
JPH06287303A (ja) * | 1993-03-31 | 1994-10-11 | Hitachi Chem Co Ltd | 高純度ラダーシリコーンポリマ溶液の製造法及び塗布液 |
JP3363051B2 (ja) * | 1997-02-21 | 2003-01-07 | 丸善石油化学株式会社 | ビニルフェノール系重合体の金属除去法 |
TW420770B (en) * | 1998-09-22 | 2001-02-01 | Mitsui Chemicals Inc | Pellicle film, method of preparing the same and exposure method |
EP1058274B1 (de) * | 1999-06-04 | 2005-07-27 | JSR Corporation | Beschichtungszusammensetzung für die Filmherstellung und Material für isolierenden Schichten |
US6410150B1 (en) * | 1999-09-29 | 2002-06-25 | Jsr Corporation | Composition for film formation, method of film formation, and insulating film |
-
2001
- 2001-01-15 KR KR1020010002139A patent/KR100677782B1/ko not_active IP Right Cessation
- 2001-01-16 AT AT01100925T patent/ATE301866T1/de not_active IP Right Cessation
- 2001-01-16 DE DE60112481T patent/DE60112481T2/de not_active Expired - Lifetime
- 2001-01-16 EP EP01100925A patent/EP1117102B1/de not_active Expired - Lifetime
- 2001-01-17 TW TW090101057A patent/TWI275606B/zh not_active IP Right Cessation
- 2001-01-17 US US09/760,784 patent/US6642352B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE60112481T2 (de) | 2006-05-18 |
US6642352B2 (en) | 2003-11-04 |
DE60112481D1 (de) | 2005-09-15 |
US20010009936A1 (en) | 2001-07-26 |
TWI275606B (en) | 2007-03-11 |
KR100677782B1 (ko) | 2007-02-05 |
KR20010086345A (ko) | 2001-09-10 |
EP1117102B1 (de) | 2005-08-10 |
EP1117102A3 (de) | 2002-05-22 |
EP1117102A2 (de) | 2001-07-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |