ATE246157T1 - Verwendung einer gegen fluor-plasma beständigen keramik aus aluminiumoxid und verfahren zu ihrer herstellung - Google Patents

Verwendung einer gegen fluor-plasma beständigen keramik aus aluminiumoxid und verfahren zu ihrer herstellung

Info

Publication number
ATE246157T1
ATE246157T1 AT96302520T AT96302520T ATE246157T1 AT E246157 T1 ATE246157 T1 AT E246157T1 AT 96302520 T AT96302520 T AT 96302520T AT 96302520 T AT96302520 T AT 96302520T AT E246157 T1 ATE246157 T1 AT E246157T1
Authority
AT
Austria
Prior art keywords
producing
same
aluminum oxide
oxide ceramic
fluorine plasma
Prior art date
Application number
AT96302520T
Other languages
English (en)
Inventor
Anand Gupta
S Ravi Tirunelveli
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of ATE246157T1 publication Critical patent/ATE246157T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/10—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
    • C04B35/111—Fine ceramics
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Pressure Vessels And Lids Thereof (AREA)
AT96302520T 1995-04-18 1996-04-10 Verwendung einer gegen fluor-plasma beständigen keramik aus aluminiumoxid und verfahren zu ihrer herstellung ATE246157T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/424,772 US6083451A (en) 1995-04-18 1995-04-18 Method of producing a polycrystalline alumina ceramic which is resistant to a fluorine-comprising plasma

Publications (1)

Publication Number Publication Date
ATE246157T1 true ATE246157T1 (de) 2003-08-15

Family

ID=23683801

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96302520T ATE246157T1 (de) 1995-04-18 1996-04-10 Verwendung einer gegen fluor-plasma beständigen keramik aus aluminiumoxid und verfahren zu ihrer herstellung

Country Status (5)

Country Link
US (2) US6083451A (de)
EP (1) EP0738697B1 (de)
JP (2) JP3930920B2 (de)
AT (1) ATE246157T1 (de)
DE (1) DE69629231T2 (de)

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* Cited by examiner, † Cited by third party
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JP3035582B2 (ja) * 1996-12-26 2000-04-24 日本特殊陶業株式会社 アルミナ質焼結体
TW579372B (en) 1998-07-29 2004-03-11 Sumitomo Chemical Co Process for producing alumina sintered body
JP4213790B2 (ja) * 1998-08-26 2009-01-21 コバレントマテリアル株式会社 耐プラズマ部材およびそれを用いたプラズマ処理装置
JP2003533010A (ja) * 1999-09-30 2003-11-05 ラム リサーチ コーポレーション 前処理を行なったガス整流板
US6296716B1 (en) 1999-10-01 2001-10-02 Saint-Gobain Ceramics And Plastics, Inc. Process for cleaning ceramic articles
JP2004131215A (ja) * 2002-10-09 2004-04-30 Ushio Inc 帯状ワークの搬送装置
JP2005281054A (ja) * 2004-03-29 2005-10-13 Kyocera Corp 酸化アルミニウム質焼結体及びその製造方法並びにこれを用いた半導体、液晶製造装置部材
US7135426B2 (en) * 2004-05-25 2006-11-14 Applied Materials, Inc. Erosion resistant process chamber components
US20050274396A1 (en) * 2004-06-09 2005-12-15 Hong Shih Methods for wet cleaning quartz surfaces of components for plasma processing chambers
US20050284573A1 (en) 2004-06-24 2005-12-29 Egley Fred D Bare aluminum baffles for resist stripping chambers
JP2006128485A (ja) * 2004-10-29 2006-05-18 Asm Japan Kk 半導体処理装置
US20060166159A1 (en) 2005-01-25 2006-07-27 Norbert Abels Laser shaping of green metal body used in manufacturing an orthodontic bracket
US20060163774A1 (en) * 2005-01-25 2006-07-27 Norbert Abels Methods for shaping green bodies and articles made by such methods
US20060228889A1 (en) * 2005-03-31 2006-10-12 Edelberg Erik A Methods of removing resist from substrates in resist stripping chambers
CN103208439B (zh) * 2012-01-17 2016-11-23 游利 一种用于半导体介质刻蚀机的气体分配加热器的制作方法
US20140097752A1 (en) * 2012-10-09 2014-04-10 Varian Semiconductor Equipment Associates, Inc. Inductively Coupled Plasma ION Source Chamber with Dopant Material Shield
US9790596B1 (en) 2013-01-30 2017-10-17 Kyocera Corporation Gas nozzle and plasma device employing same

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JP2581174B2 (ja) * 1987-08-27 1997-02-12 住友化学工業株式会社 透光性多結晶アルミナの製造方法
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Also Published As

Publication number Publication date
JPH092864A (ja) 1997-01-07
JP2007055896A (ja) 2007-03-08
JP5127196B2 (ja) 2013-01-23
EP0738697B1 (de) 2003-07-30
US6083451A (en) 2000-07-04
DE69629231D1 (de) 2003-09-04
DE69629231T2 (de) 2004-04-15
US6638886B1 (en) 2003-10-28
JP3930920B2 (ja) 2007-06-13
EP0738697A1 (de) 1996-10-23

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