ATE233131T1 - System zum reinigen von halbleiterscheiben mit megasonischer wanderwelle - Google Patents

System zum reinigen von halbleiterscheiben mit megasonischer wanderwelle

Info

Publication number
ATE233131T1
ATE233131T1 AT99307796T AT99307796T ATE233131T1 AT E233131 T1 ATE233131 T1 AT E233131T1 AT 99307796 T AT99307796 T AT 99307796T AT 99307796 T AT99307796 T AT 99307796T AT E233131 T1 ATE233131 T1 AT E233131T1
Authority
AT
Austria
Prior art keywords
megasonic
wave
cleaning semiconductor
semiconductor discs
cleaning
Prior art date
Application number
AT99307796T
Other languages
English (en)
Inventor
Hiroyuki Akatsu
Soichi Nadahara
Original Assignee
Ibm
Toshiba Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm, Toshiba Kk filed Critical Ibm
Application granted granted Critical
Publication of ATE233131T1 publication Critical patent/ATE233131T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0416—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Cleaning By Liquid Or Steam (AREA)
AT99307796T 1998-11-10 1999-10-04 System zum reinigen von halbleiterscheiben mit megasonischer wanderwelle ATE233131T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/189,429 US6021789A (en) 1998-11-10 1998-11-10 Wafer cleaning system with progressive megasonic wave

Publications (1)

Publication Number Publication Date
ATE233131T1 true ATE233131T1 (de) 2003-03-15

Family

ID=22697291

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99307796T ATE233131T1 (de) 1998-11-10 1999-10-04 System zum reinigen von halbleiterscheiben mit megasonischer wanderwelle

Country Status (5)

Country Link
US (1) US6021789A (de)
EP (1) EP1000673B1 (de)
JP (1) JP2000150440A (de)
AT (1) ATE233131T1 (de)
DE (1) DE69905538T2 (de)

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US6202658B1 (en) 1998-11-11 2001-03-20 Applied Materials, Inc. Method and apparatus for cleaning the edge of a thin disc
DE10030718A1 (de) * 2000-06-23 2002-01-10 Univ Ilmenau Tech Verfahren und Vorrichtung zum Reinigen von Gegenständen mit Schallwellen
US7451774B2 (en) * 2000-06-26 2008-11-18 Applied Materials, Inc. Method and apparatus for wafer cleaning
AU2001270205A1 (en) * 2000-06-26 2002-01-08 Applied Materials, Inc. Method and apparatus for wafer cleaning
US6763378B1 (en) * 2000-10-12 2004-07-13 International Business Machines Corporation Synchronous TCP/IP port monitor for enhanced computer system security
US7105985B2 (en) * 2001-04-23 2006-09-12 Product Systems Incorporated Megasonic transducer with focused energy resonator
US6928751B2 (en) * 2001-06-12 2005-08-16 Goldfinger Technologies, Llc Megasonic cleaner and dryer system
US7100304B2 (en) * 2001-06-12 2006-09-05 Akrion Technologies, Inc. Megasonic cleaner and dryer
US20030015494A1 (en) * 2001-07-20 2003-01-23 Seagate Technology Llc Single layer resist lift-off process and apparatus for submicron structures
KR100927493B1 (ko) * 2001-11-02 2009-11-17 프로덕트 시스템즈 인코포레이티드 방사출력 메가소닉 변환기
US7185661B2 (en) * 2002-05-06 2007-03-06 Akrion Technologies, Inc. Reciprocating megasonic probe
US6880560B2 (en) * 2002-11-18 2005-04-19 Techsonic Substrate processing apparatus for processing substrates using dense phase gas and sonic waves
WO2004112093A2 (en) * 2003-06-06 2004-12-23 P.C.T. Systems, Inc. Method and apparatus to process substrates with megasonic energy
AU2003903660A0 (en) * 2003-07-16 2003-07-31 Soniclean Pty Ltd A space adaptable ultrasonic cleaning apparatus
NZ543157A (en) * 2003-10-22 2008-09-26 Soniclean Pty Ltd An improved active wine barrel
WO2005039788A1 (en) * 2003-10-22 2005-05-06 Soniclean Pty Ltd An apparatus and method for cleaning and recycling water used in cleaning of barrels
WO2006010997A1 (en) * 2004-07-16 2006-02-02 Darren Miles Bates An apparatus and method of ultrasonic cleaning
US7418525B2 (en) * 2004-10-29 2008-08-26 International Business Machines Corporation Shared simultaneously-connected removable drives and servers each housing an I/O controller which maintains an uninterrupted protocol connection
US7958899B2 (en) * 2007-08-21 2011-06-14 Dainippon Screen Mfg. Co., Ltd. Substrate cleaning apparatus and substrate cleaning method
DE102007040851A1 (de) 2007-08-29 2009-03-05 Wacker Chemie Ag Verfahren zum Reinigen von polykristallinem Silicium
US8051863B2 (en) * 2007-10-18 2011-11-08 Lam Research Corporation Methods of and apparatus for correlating gap value to meniscus stability in processing of a wafer surface by a recipe-controlled meniscus
KR20120018296A (ko) * 2009-03-31 2012-03-02 에이씨엠 리서치 (상하이) 인코포레이티드 반도체 웨이퍼 세정 방법 및 장치
CN101927242B (zh) * 2009-06-25 2014-08-20 盛美半导体设备（上海）有限公司 半导体硅片的清洗方法和装置
US8539969B2 (en) * 2010-07-30 2013-09-24 Sematech, Inc. Gigasonic brush for cleaning surfaces
EP2973560B1 (de) * 2013-03-14 2019-03-13 Koolance, Inc. Reiniger für phonographenschallplatten
US10345211B2 (en) 2016-03-28 2019-07-09 Hemlock Semiconductor Operations Llc Method of determining a concentration of a material not dissolved by silicon etchants contaminating a product

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US3117768A (en) * 1960-11-21 1964-01-14 Branson Instr Ultrasonic transducers
US4064885A (en) * 1976-10-26 1977-12-27 Branson Ultrasonics Corporation Apparatus for cleaning workpieces by ultrasonic energy
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JPH025538A (ja) * 1988-06-24 1990-01-10 Fujitsu Ltd モールド金型及び樹脂封止型半導体装置の製造方法
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JPH04500033A (ja) * 1989-05-17 1992-01-09 ミンスキ　ラディオテフニチェスキ　インスティテュト 液体媒体内の物品を超音波加工するための装置
JPH0319337A (ja) * 1989-06-16 1991-01-28 Mitsubishi Electric Corp ウエハ異物除去装置
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JP2877216B2 (ja) * 1992-10-02 1999-03-31 東京エレクトロン株式会社 洗浄装置
US5383484A (en) * 1993-07-16 1995-01-24 Cfmt, Inc. Static megasonic cleaning system for cleaning objects
US5368054A (en) * 1993-12-17 1994-11-29 International Business Machines Corporation Ultrasonic jet semiconductor wafer cleaning apparatus
US5626913A (en) * 1994-03-09 1997-05-06 Tokyo Electron Limited Resist processing method and apparatus
JP2830733B2 (ja) * 1994-03-25 1998-12-02 日本電気株式会社 電解水生成方法および電解水生成機構
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TW355815B (en) * 1996-05-28 1999-04-11 Canon Kasei Kk Cleaning methods of porous surface and semiconductor surface

Also Published As

Publication number Publication date
DE69905538T2 (de) 2003-11-20
EP1000673A2 (de) 2000-05-17
DE69905538D1 (de) 2003-04-03
JP2000150440A (ja) 2000-05-30
US6021789A (en) 2000-02-08
EP1000673A3 (de) 2000-09-20
EP1000673B1 (de) 2003-02-26

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties