ATE213508T1 - Verfahren zur herstellung eines metallischen verbundbands - Google Patents

Verfahren zur herstellung eines metallischen verbundbands

Info

Publication number
ATE213508T1
ATE213508T1 AT98121473T AT98121473T ATE213508T1 AT E213508 T1 ATE213508 T1 AT E213508T1 AT 98121473 T AT98121473 T AT 98121473T AT 98121473 T AT98121473 T AT 98121473T AT E213508 T1 ATE213508 T1 AT E213508T1
Authority
AT
Austria
Prior art keywords
producing
metal composite
composite band
layer
tin
Prior art date
Application number
AT98121473T
Other languages
English (en)
Inventor
Udo Dipl-Ing Adler
Klaus Dipl-Ing Schleicher
Original Assignee
Stolberger Metallwerke Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stolberger Metallwerke Gmbh filed Critical Stolberger Metallwerke Gmbh
Application granted granted Critical
Publication of ATE213508T1 publication Critical patent/ATE213508T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
    • C23C2/08—Tin or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/26—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/34—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the shape of the material to be treated
    • C23C2/36—Elongated material
    • C23C2/40—Plates; Strips
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/30—Electroplating: Baths therefor from solutions of tin
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/46—Electroplating: Baths therefor from solutions of silver

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Non-Insulated Conductors (AREA)
  • Laminated Bodies (AREA)
  • Manufacture Of Alloys Or Alloy Compounds (AREA)
  • Wire Processing (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Coating With Molten Metal (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Manufacture Of Switches (AREA)
  • Continuous Casting (AREA)
AT98121473T 1997-11-26 1998-11-11 Verfahren zur herstellung eines metallischen verbundbands ATE213508T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19752329A DE19752329A1 (de) 1997-11-26 1997-11-26 Verfahren zur Herstellung eines metallischen Verbundbands

Publications (1)

Publication Number Publication Date
ATE213508T1 true ATE213508T1 (de) 2002-03-15

Family

ID=7849831

Family Applications (1)

Application Number Title Priority Date Filing Date
AT98121473T ATE213508T1 (de) 1997-11-26 1998-11-11 Verfahren zur herstellung eines metallischen verbundbands

Country Status (9)

Country Link
US (2) US6207035B1 (de)
EP (1) EP0919644B1 (de)
JP (1) JPH11222659A (de)
KR (1) KR19990045402A (de)
AT (1) ATE213508T1 (de)
DE (2) DE19752329A1 (de)
DK (1) DK0919644T3 (de)
ES (1) ES2172851T3 (de)
PT (1) PT919644E (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19752329A1 (de) * 1997-11-26 1999-05-27 Stolberger Metallwerke Gmbh Verfahren zur Herstellung eines metallischen Verbundbands
US6372997B1 (en) * 2000-02-25 2002-04-16 Thermagon, Inc. Multi-layer structure and method for forming a thermal interface with low contact resistance between a microelectronic component package and heat sink
DE10025106A1 (de) * 2000-05-20 2001-11-22 Stolberger Metallwerke Gmbh Elektrisch leitfähiges Metallband und Steckverbinder hieraus
JP3395772B2 (ja) * 2000-11-20 2003-04-14 松下電器産業株式会社 錫−銀合金めっき皮膜の製造方法及び錫−銀合金めっき皮膜及びそれを備えた電子部品用リードフレーム
US20020192492A1 (en) * 2001-05-11 2002-12-19 Abys Joseph Anthony Metal article coated with near-surface doped tin or tin alloy
IL144160A0 (en) * 2001-07-05 2002-05-23 Ika Ind Consulting Ltd A lead-free alloy for use as soldering material
US6924044B2 (en) * 2001-08-14 2005-08-02 Snag, Llc Tin-silver coatings
FI114927B (fi) * 2002-11-07 2005-01-31 Outokumpu Oy Menetelmä hyvän kontaktipinnan muodostamiseksi katodin kannatintankoon ja kannatintanko
US7575665B2 (en) * 2005-04-28 2009-08-18 Delphi Technologies, Inc. Method of reducing corrosion of silver containing surfaces
US20080308300A1 (en) * 2007-06-18 2008-12-18 Conti Mark A Method of manufacturing electrically conductive strips
DE102007047007A1 (de) * 2007-10-01 2009-04-09 Tyco Electronics Amp Gmbh Elektrisches Kontaktelement und ein Verfahren zum Herstellen desselben
US20090283305A1 (en) * 2008-05-15 2009-11-19 Interplex Industries, Inc. Tin-silver compound coating on printed circuit boards
DE102010054539A1 (de) * 2010-12-15 2012-06-21 OTB Oberflächentechnik in Berlin GmbH & Co. KG Verfahren zur Herstellung eines Werkstücks aus Kupfer oder einer Kupferlegierung mit einer Beschichtung
JP5387742B2 (ja) 2012-04-06 2014-01-15 株式会社オートネットワーク技術研究所 めっき部材、コネクタ用めっき端子、めっき部材の製造方法、及びコネクタ用めっき端子の製造方法
DE102012017520A1 (de) 2012-09-05 2014-03-06 Feindrahtwerk Adolf Edelhoff Gmbh & Co. Kg Verfahren zur Zinnbeschichtung eines metallischen Substrats,Verfahren zur Härtung einer Zinnschicht, sowie Draht mit einer Zinnbeschichtung
CN105358741B (zh) * 2013-06-10 2018-04-20 东方镀金株式会社 镀敷叠层体的制造方法及镀敷叠层体
RU2598729C2 (ru) * 2014-09-08 2016-09-27 федеральное государственное бюджетное образовательное учреждение высшего образования "Самарский государственный технический университет" Способ получения покрытия для электрического контакта
DE102018208116A1 (de) * 2018-05-23 2019-11-28 Aurubis Stolberg Gmbh & Co. Kg Kupferband zur Herstellung von elektrischen Kontakten und Verfahren zur Herstellung eines Kupferbandes und Steckverbinder
CN110773719A (zh) * 2019-10-18 2020-02-11 郑州机械研究所有限公司 一种银铜复合带制备方法
DE102020006059A1 (de) 2020-10-05 2022-04-07 Wieland-Werke Aktiengesellschaft Elektrisch leitendes Material mit Beschichtung
CN114540606B (zh) * 2022-03-09 2023-08-11 西部金属材料股份有限公司 一种高硬度钛合金薄板、箔材的制备方法
JP7213390B1 (ja) * 2022-10-24 2023-01-26 松田産業株式会社 銀めっき皮膜及び該銀めっき皮膜を備えた電気接点

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51147191A (en) * 1975-06-12 1976-12-17 Asahi Chem Ind Co Ltd Hall element and its method of manufacturing
GB8719498D0 (en) * 1987-08-18 1987-11-18 Ferranti Plc Seals
US5589280A (en) * 1993-02-05 1996-12-31 Southwall Technologies Inc. Metal on plastic films with adhesion-promoting layer
US5390080A (en) * 1993-05-03 1995-02-14 Motorola Tin-zinc solder connection to a printed circuit board of the like
EP0666342B1 (de) * 1994-02-05 1998-05-06 W.C. Heraeus GmbH Bad zum galvanischen Abscheiden von Silber-Zinn-Legierungen
JP3998731B2 (ja) * 1994-08-10 2007-10-31 三菱伸銅株式会社 通電部材の製造方法
DE19752329A1 (de) * 1997-11-26 1999-05-27 Stolberger Metallwerke Gmbh Verfahren zur Herstellung eines metallischen Verbundbands

Also Published As

Publication number Publication date
EP0919644A1 (de) 1999-06-02
DK0919644T3 (da) 2002-06-10
PT919644E (pt) 2002-07-31
EP0919644B1 (de) 2002-02-20
JPH11222659A (ja) 1999-08-17
US6495001B2 (en) 2002-12-17
US20010004048A1 (en) 2001-06-21
DE19752329A1 (de) 1999-05-27
KR19990045402A (ko) 1999-06-25
ES2172851T3 (es) 2002-10-01
DE59803128D1 (de) 2002-03-28
US6207035B1 (en) 2001-03-27

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Legal Events

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