ATE21269T1 - Stabilisierung von waessrigen loesungen,die wasserstoffperoxid, fluorwasserstoff und metallionen enthalten. - Google Patents

Stabilisierung von waessrigen loesungen,die wasserstoffperoxid, fluorwasserstoff und metallionen enthalten.

Info

Publication number
ATE21269T1
ATE21269T1 AT84400020T AT84400020T ATE21269T1 AT E21269 T1 ATE21269 T1 AT E21269T1 AT 84400020 T AT84400020 T AT 84400020T AT 84400020 T AT84400020 T AT 84400020T AT E21269 T1 ATE21269 T1 AT E21269T1
Authority
AT
Austria
Prior art keywords
metal ions
aqueous solutions
solutions containing
stabilization
hydrogen peroxide
Prior art date
Application number
AT84400020T
Other languages
English (en)
Inventor
Christian Pralus
Original Assignee
Atochem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atochem filed Critical Atochem
Application granted granted Critical
Publication of ATE21269T1 publication Critical patent/ATE21269T1/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B15/00Peroxides; Peroxyhydrates; Peroxyacids or salts thereof; Superoxides; Ozonides
    • C01B15/01Hydrogen peroxide
    • C01B15/037Stabilisation by additives
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/02Cleaning or pickling metallic material with solutions or molten salts with acid solutions
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/10Etching compositions
    • C23F1/14Aqueous compositions
    • C23F1/16Acidic compositions
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F3/00Brightening metals by chemical means
    • C23F3/04Heavy metals
    • C23F3/06Heavy metals with acidic solutions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • ing And Chemical Polishing (AREA)
  • Catalysts (AREA)
  • Detergent Compositions (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Chemical Treatment Of Metals (AREA)
AT84400020T 1983-01-07 1984-01-06 Stabilisierung von waessrigen loesungen,die wasserstoffperoxid, fluorwasserstoff und metallionen enthalten. ATE21269T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8300210A FR2539140A1 (fr) 1983-01-07 1983-01-07 Stabilisation de solutions aqueuses contenant du peroxyde d'hydrogene, de l'acide fluorhydrique et des ions metalliques
EP84400020A EP0115450B1 (de) 1983-01-07 1984-01-06 Stabilisierung von wässrigen Lösungen,die Wasserstoffperoxid, Fluorwasserstoff und Metallionen enthalten

Publications (1)

Publication Number Publication Date
ATE21269T1 true ATE21269T1 (de) 1986-08-15

Family

ID=9284771

Family Applications (1)

Application Number Title Priority Date Filing Date
AT84400020T ATE21269T1 (de) 1983-01-07 1984-01-06 Stabilisierung von waessrigen loesungen,die wasserstoffperoxid, fluorwasserstoff und metallionen enthalten.

Country Status (8)

Country Link
US (1) US4545918A (de)
EP (1) EP0115450B1 (de)
JP (1) JPS59173279A (de)
KR (1) KR910009842B1 (de)
AT (1) ATE21269T1 (de)
CA (1) CA1222122A (de)
DE (2) DE3460400D1 (de)
FR (1) FR2539140A1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4946520A (en) * 1987-02-02 1990-08-07 Phelps Dodge Industries, Inc. Copper rod manufactured by casting, hot rolling and chemically shaving and pickling
US4754803A (en) * 1987-02-02 1988-07-05 Phelps Dodge Industries, Inc. Manufacturing copper rod by casting, hot rolling and chemically shaving and pickling
FR2621052A1 (fr) * 1987-09-25 1989-03-31 Solvay Bains et procede pour le polissage chimique de surfaces en cuivre ou en alliage de cuivre
DE3738651A1 (de) * 1987-11-13 1989-05-24 Wacker Chemitronic Verfahren zur hydrophilierenden und/oder kittreste entfernenden oberflaechenbehandlung von siliciumscheiben
US5052421A (en) * 1988-07-19 1991-10-01 Henkel Corporation Treatment of aluminum with non-chrome cleaner/deoxidizer system followed by conversion coating
ES2033017T3 (es) * 1988-07-28 1993-03-01 Voest-Alpine Stahl Linz Gmbh Procedimiento para el tratamiento de chapas de acero cincadas electroliticamente en un lado.
US5120605A (en) * 1988-09-23 1992-06-09 Zuel Company, Inc. Anti-reflective glass surface
US4944986A (en) * 1988-09-23 1990-07-31 Zuel Company Anti-reflective glass surface
US5035769A (en) * 1989-10-04 1991-07-30 The United States Of America As Represented By The United States Department Of Energy Nondestructive method for chemically machining crucibles or molds from their enclosed ingots and castings
US5232619A (en) * 1990-10-19 1993-08-03 Praxair S.T. Technology, Inc. Stripping solution for stripping compounds of titanium from base metals
EP0489339B1 (de) * 1990-11-27 1996-04-17 Kabushiki Kaisha Toyota Chuo Kenkyusho Lösung zur chemischen Polierung und Glanzerzeugung für gehärtete Stahlkörper und Verfahren zu deren Verwendung
FR2673200A1 (fr) * 1991-02-25 1992-08-28 Ugine Aciers Procede de surdecapage de materiaux en acier tels que les aciers inoxydables et les aciers allies.
US5164018A (en) * 1992-03-18 1992-11-17 Barcelona Jr Russell L Water-spot remover containing hydrofluoric acid, ammonium fluoride, and an alcohol
JPH0647790U (ja) * 1993-10-01 1994-06-28 株式会社日本ピスコ 定流量スピードコントローラ
WO1998056726A1 (en) * 1997-06-13 1998-12-17 Cfmt, Inc. Methods for treating semiconductor wafers
DE19829370C2 (de) * 1997-12-13 2003-07-17 Robert Weicht Mittel zum Reinigen von Kammerfilterpressen
US20050217707A1 (en) * 1998-03-13 2005-10-06 Aegerter Brian K Selective processing of microelectronic workpiece surfaces
US6248704B1 (en) 1999-05-03 2001-06-19 Ekc Technology, Inc. Compositions for cleaning organic and plasma etched residues for semiconductors devices
US6929861B2 (en) 2002-03-05 2005-08-16 Zuel Company, Inc. Anti-reflective glass surface with improved cleanability
EP1793016A1 (de) * 2005-12-01 2007-06-06 Elpochem AG Polier- und Entgratungsmittel für Werkstücke aus Kohlenstoffstahl und Verfahren zum chemischen Polieren und Entgraten
DE102007030957A1 (de) * 2007-07-04 2009-01-08 Siltronic Ag Verfahren zum Reinigen einer Halbleiterscheibe mit einer Reinigungslösung

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1383066A (fr) * 1963-11-12 1964-12-24 Radiotechnique Procédé de polissage chimique de métaux
US3296141A (en) * 1965-03-25 1967-01-03 R O Hull & Company Inc Bright dip compositions for the treatment of steel
FR1472467A (fr) * 1966-03-21 1967-03-10 Hull & Co R O Compositions et procédés de traitement de surfaces métalliques
JPS4829455B1 (de) * 1967-03-23 1973-09-10
US3841905A (en) * 1970-11-19 1974-10-15 Rbp Chem Corp Method of preparing printed circuit boards with terminal tabs
US3756957A (en) * 1971-03-15 1973-09-04 Furukawa Electric Co Ltd Solutions for chemical dissolution treatment of metallic materials
AT334252B (de) * 1971-06-21 1976-01-10 Swarovski & Co Vorrichtung zum hervorrufen von bewegungsbildern und verfahren zur herstellung
JPS4893542A (de) * 1972-03-13 1973-12-04

Also Published As

Publication number Publication date
FR2539140B1 (de) 1985-04-12
KR910009842B1 (ko) 1991-11-30
CA1222122A (fr) 1987-05-26
US4545918A (en) 1985-10-08
DE3460400D1 (en) 1986-09-11
EP0115450B1 (de) 1986-08-06
EP0115450A1 (de) 1984-08-08
KR840007249A (ko) 1984-12-06
DE115450T1 (de) 1985-01-03
FR2539140A1 (fr) 1984-07-13
JPS639589B2 (de) 1988-02-29
JPS59173279A (ja) 1984-10-01

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee