KR840007249A - 과산화수소, 불화수소산 및 금속이온을 함유하는 수용액을 안정화시키는 방법 - Google Patents

과산화수소, 불화수소산 및 금속이온을 함유하는 수용액을 안정화시키는 방법 Download PDF

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Publication number
KR840007249A
KR840007249A KR1019840000032A KR840000032A KR840007249A KR 840007249 A KR840007249 A KR 840007249A KR 1019840000032 A KR1019840000032 A KR 1019840000032A KR 840000032 A KR840000032 A KR 840000032A KR 840007249 A KR840007249 A KR 840007249A
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South Korea
Prior art keywords
hydrogen peroxide
hydrofluoric acid
metal ions
containing hydrogen
hydroxide
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KR1019840000032A
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English (en)
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KR910009842B1 (ko
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쁘라뤼 크리스티앙
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미쉘 로쉐
소시에떠 아또상
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Publication of KR840007249A publication Critical patent/KR840007249A/ko
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Publication of KR910009842B1 publication Critical patent/KR910009842B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B15/00—Peroxides; Peroxyhydrates; Peroxyacids or salts thereof; Superoxides; Ozonides
    • C01B15/01—Hydrogen peroxide
    • C01B15/037—Stabilisation by additives
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F3/00—Brightening metals by chemical means
    • C23F3/04—Heavy metals
    • C23F3/06—Heavy metals with acidic solutions

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • ing And Chemical Polishing (AREA)
  • Catalysts (AREA)
  • Detergent Compositions (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)

Abstract

내용 없음

Description

과산화수소, 불화수소산 및 금속이온을 함유하는 수용액을 안정화시키는 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (4)

  1. 수산화알칼리금속 및 수산화암모늄중에서 선택된 1개 이상의 수산화물을 현존하는 산을 모두 중화시키기에 충분하지 않은 양으로 과산화수소, 금속이온 및 부분적으로 염을 형성할 수 있는 불화수소산을 함유하는 수용액에 가함을 특징으로 하는 과산화수소, 금속이온 및 부분적으로 염을 형성할 수 있는 불화수소산을 함유하는 수용액의 안정성을 증가시키기 위한 방법.
  2. 제1항에 있어서, 상기 수산화물의 양이 용액의 리터당 0.1∼2몰 임을 특징으로 하는 방법.
  3. 제1항 및 2항중 어느 한 항에 따라, 상기 수산화물을 리터당 5∼150g의 농도의 과산화수소 및 전체 불소로서 표현된 리터당 38g 이상의 농도의 불화수소산을 함유하는 용액에 가함을 특징으로 하는 방법.
  4. 제1∼3항중 어느 한 항에 방법에 의해 안정화된 과산화수소, 금속이온 및 부분적으로 염을 형성할수 있는 불화수소산을 함유하는 수용액 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019840000032A 1983-01-07 1984-01-06 과산화수소, 불화수소산 및 금속이온을 함유하는 수용액을 안정화시키는 방법 KR910009842B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR83/00210 1983-01-07
FR8300210 1983-01-07
FR8300210A FR2539140A1 (fr) 1983-01-07 1983-01-07 Stabilisation de solutions aqueuses contenant du peroxyde d'hydrogene, de l'acide fluorhydrique et des ions metalliques

Publications (2)

Publication Number Publication Date
KR840007249A true KR840007249A (ko) 1984-12-06
KR910009842B1 KR910009842B1 (ko) 1991-11-30

Family

ID=9284771

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019840000032A KR910009842B1 (ko) 1983-01-07 1984-01-06 과산화수소, 불화수소산 및 금속이온을 함유하는 수용액을 안정화시키는 방법

Country Status (8)

Country Link
US (1) US4545918A (ko)
EP (1) EP0115450B1 (ko)
JP (1) JPS59173279A (ko)
KR (1) KR910009842B1 (ko)
AT (1) ATE21269T1 (ko)
CA (1) CA1222122A (ko)
DE (2) DE115450T1 (ko)
FR (1) FR2539140A1 (ko)

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* Cited by examiner, † Cited by third party
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US4754803A (en) * 1987-02-02 1988-07-05 Phelps Dodge Industries, Inc. Manufacturing copper rod by casting, hot rolling and chemically shaving and pickling
US4946520A (en) * 1987-02-02 1990-08-07 Phelps Dodge Industries, Inc. Copper rod manufactured by casting, hot rolling and chemically shaving and pickling
FR2621052A1 (fr) * 1987-09-25 1989-03-31 Solvay Bains et procede pour le polissage chimique de surfaces en cuivre ou en alliage de cuivre
DE3738651A1 (de) * 1987-11-13 1989-05-24 Wacker Chemitronic Verfahren zur hydrophilierenden und/oder kittreste entfernenden oberflaechenbehandlung von siliciumscheiben
US5052421A (en) * 1988-07-19 1991-10-01 Henkel Corporation Treatment of aluminum with non-chrome cleaner/deoxidizer system followed by conversion coating
DE3871143D1 (de) * 1988-07-28 1992-06-17 Voest Alpine Stahl Verfahren zur chemischen nachbehandlung von stahlblechoberflaechen.
US5120605A (en) * 1988-09-23 1992-06-09 Zuel Company, Inc. Anti-reflective glass surface
US4944986A (en) * 1988-09-23 1990-07-31 Zuel Company Anti-reflective glass surface
US5035769A (en) * 1989-10-04 1991-07-30 The United States Of America As Represented By The United States Department Of Energy Nondestructive method for chemically machining crucibles or molds from their enclosed ingots and castings
US5232619A (en) * 1990-10-19 1993-08-03 Praxair S.T. Technology, Inc. Stripping solution for stripping compounds of titanium from base metals
EP0489339B1 (en) * 1990-11-27 1996-04-17 Kabushiki Kaisha Toyota Chuo Kenkyusho Brightening chemical polishing solution for hardened steel article and method of using it
FR2673200A1 (fr) * 1991-02-25 1992-08-28 Ugine Aciers Procede de surdecapage de materiaux en acier tels que les aciers inoxydables et les aciers allies.
US5164018A (en) * 1992-03-18 1992-11-17 Barcelona Jr Russell L Water-spot remover containing hydrofluoric acid, ammonium fluoride, and an alcohol
JPH0647790U (ja) * 1993-10-01 1994-06-28 株式会社日本ピスコ 定流量スピードコントローラ
WO1998056726A1 (en) * 1997-06-13 1998-12-17 Cfmt, Inc. Methods for treating semiconductor wafers
DE19829370C2 (de) * 1997-12-13 2003-07-17 Robert Weicht Mittel zum Reinigen von Kammerfilterpressen
US20050217707A1 (en) * 1998-03-13 2005-10-06 Aegerter Brian K Selective processing of microelectronic workpiece surfaces
US6248704B1 (en) 1999-05-03 2001-06-19 Ekc Technology, Inc. Compositions for cleaning organic and plasma etched residues for semiconductors devices
US6929861B2 (en) 2002-03-05 2005-08-16 Zuel Company, Inc. Anti-reflective glass surface with improved cleanability
EP1793016A1 (de) * 2005-12-01 2007-06-06 Elpochem AG Polier- und Entgratungsmittel für Werkstücke aus Kohlenstoffstahl und Verfahren zum chemischen Polieren und Entgraten
DE102007030957A1 (de) * 2007-07-04 2009-01-08 Siltronic Ag Verfahren zum Reinigen einer Halbleiterscheibe mit einer Reinigungslösung

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1383066A (fr) * 1963-11-12 1964-12-24 Radiotechnique Procédé de polissage chimique de métaux
US3296141A (en) * 1965-03-25 1967-01-03 R O Hull & Company Inc Bright dip compositions for the treatment of steel
FR1472467A (fr) * 1966-03-21 1967-03-10 Hull & Co R O Compositions et procédés de traitement de surfaces métalliques
JPS4829455B1 (ko) * 1967-03-23 1973-09-10
US3841905A (en) * 1970-11-19 1974-10-15 Rbp Chem Corp Method of preparing printed circuit boards with terminal tabs
US3756957A (en) * 1971-03-15 1973-09-04 Furukawa Electric Co Ltd Solutions for chemical dissolution treatment of metallic materials
AT334252B (de) * 1971-06-21 1976-01-10 Swarovski & Co Vorrichtung zum hervorrufen von bewegungsbildern und verfahren zur herstellung
JPS4893542A (ko) * 1972-03-13 1973-12-04

Also Published As

Publication number Publication date
EP0115450B1 (fr) 1986-08-06
US4545918A (en) 1985-10-08
JPS59173279A (ja) 1984-10-01
ATE21269T1 (de) 1986-08-15
FR2539140B1 (ko) 1985-04-12
KR910009842B1 (ko) 1991-11-30
DE115450T1 (de) 1985-01-03
DE3460400D1 (en) 1986-09-11
FR2539140A1 (fr) 1984-07-13
EP0115450A1 (fr) 1984-08-08
JPS639589B2 (ko) 1988-02-29
CA1222122A (fr) 1987-05-26

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