KR840007249A - 과산화수소, 불화수소산 및 금속이온을 함유하는 수용액을 안정화시키는 방법 - Google Patents
과산화수소, 불화수소산 및 금속이온을 함유하는 수용액을 안정화시키는 방법 Download PDFInfo
- Publication number
- KR840007249A KR840007249A KR1019840000032A KR840000032A KR840007249A KR 840007249 A KR840007249 A KR 840007249A KR 1019840000032 A KR1019840000032 A KR 1019840000032A KR 840000032 A KR840000032 A KR 840000032A KR 840007249 A KR840007249 A KR 840007249A
- Authority
- KR
- South Korea
- Prior art keywords
- hydrogen peroxide
- hydrofluoric acid
- metal ions
- containing hydrogen
- hydroxide
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B15/00—Peroxides; Peroxyhydrates; Peroxyacids or salts thereof; Superoxides; Ozonides
- C01B15/01—Hydrogen peroxide
- C01B15/037—Stabilisation by additives
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
- C23F3/04—Heavy metals
- C23F3/06—Heavy metals with acidic solutions
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- ing And Chemical Polishing (AREA)
- Catalysts (AREA)
- Detergent Compositions (AREA)
- Chemical Treatment Of Metals (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (4)
- 수산화알칼리금속 및 수산화암모늄중에서 선택된 1개 이상의 수산화물을 현존하는 산을 모두 중화시키기에 충분하지 않은 양으로 과산화수소, 금속이온 및 부분적으로 염을 형성할 수 있는 불화수소산을 함유하는 수용액에 가함을 특징으로 하는 과산화수소, 금속이온 및 부분적으로 염을 형성할 수 있는 불화수소산을 함유하는 수용액의 안정성을 증가시키기 위한 방법.
- 제1항에 있어서, 상기 수산화물의 양이 용액의 리터당 0.1∼2몰 임을 특징으로 하는 방법.
- 제1항 및 2항중 어느 한 항에 따라, 상기 수산화물을 리터당 5∼150g의 농도의 과산화수소 및 전체 불소로서 표현된 리터당 38g 이상의 농도의 불화수소산을 함유하는 용액에 가함을 특징으로 하는 방법.
- 제1∼3항중 어느 한 항에 방법에 의해 안정화된 과산화수소, 금속이온 및 부분적으로 염을 형성할수 있는 불화수소산을 함유하는 수용액 조성물.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR83/00210 | 1983-01-07 | ||
FR8300210 | 1983-01-07 | ||
FR8300210A FR2539140A1 (fr) | 1983-01-07 | 1983-01-07 | Stabilisation de solutions aqueuses contenant du peroxyde d'hydrogene, de l'acide fluorhydrique et des ions metalliques |
Publications (2)
Publication Number | Publication Date |
---|---|
KR840007249A true KR840007249A (ko) | 1984-12-06 |
KR910009842B1 KR910009842B1 (ko) | 1991-11-30 |
Family
ID=9284771
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019840000032A KR910009842B1 (ko) | 1983-01-07 | 1984-01-06 | 과산화수소, 불화수소산 및 금속이온을 함유하는 수용액을 안정화시키는 방법 |
Country Status (8)
Country | Link |
---|---|
US (1) | US4545918A (ko) |
EP (1) | EP0115450B1 (ko) |
JP (1) | JPS59173279A (ko) |
KR (1) | KR910009842B1 (ko) |
AT (1) | ATE21269T1 (ko) |
CA (1) | CA1222122A (ko) |
DE (2) | DE115450T1 (ko) |
FR (1) | FR2539140A1 (ko) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4754803A (en) * | 1987-02-02 | 1988-07-05 | Phelps Dodge Industries, Inc. | Manufacturing copper rod by casting, hot rolling and chemically shaving and pickling |
US4946520A (en) * | 1987-02-02 | 1990-08-07 | Phelps Dodge Industries, Inc. | Copper rod manufactured by casting, hot rolling and chemically shaving and pickling |
FR2621052A1 (fr) * | 1987-09-25 | 1989-03-31 | Solvay | Bains et procede pour le polissage chimique de surfaces en cuivre ou en alliage de cuivre |
DE3738651A1 (de) * | 1987-11-13 | 1989-05-24 | Wacker Chemitronic | Verfahren zur hydrophilierenden und/oder kittreste entfernenden oberflaechenbehandlung von siliciumscheiben |
US5052421A (en) * | 1988-07-19 | 1991-10-01 | Henkel Corporation | Treatment of aluminum with non-chrome cleaner/deoxidizer system followed by conversion coating |
DE3871143D1 (de) * | 1988-07-28 | 1992-06-17 | Voest Alpine Stahl | Verfahren zur chemischen nachbehandlung von stahlblechoberflaechen. |
US5120605A (en) * | 1988-09-23 | 1992-06-09 | Zuel Company, Inc. | Anti-reflective glass surface |
US4944986A (en) * | 1988-09-23 | 1990-07-31 | Zuel Company | Anti-reflective glass surface |
US5035769A (en) * | 1989-10-04 | 1991-07-30 | The United States Of America As Represented By The United States Department Of Energy | Nondestructive method for chemically machining crucibles or molds from their enclosed ingots and castings |
US5232619A (en) * | 1990-10-19 | 1993-08-03 | Praxair S.T. Technology, Inc. | Stripping solution for stripping compounds of titanium from base metals |
EP0489339B1 (en) * | 1990-11-27 | 1996-04-17 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Brightening chemical polishing solution for hardened steel article and method of using it |
FR2673200A1 (fr) * | 1991-02-25 | 1992-08-28 | Ugine Aciers | Procede de surdecapage de materiaux en acier tels que les aciers inoxydables et les aciers allies. |
US5164018A (en) * | 1992-03-18 | 1992-11-17 | Barcelona Jr Russell L | Water-spot remover containing hydrofluoric acid, ammonium fluoride, and an alcohol |
JPH0647790U (ja) * | 1993-10-01 | 1994-06-28 | 株式会社日本ピスコ | 定流量スピードコントローラ |
WO1998056726A1 (en) * | 1997-06-13 | 1998-12-17 | Cfmt, Inc. | Methods for treating semiconductor wafers |
DE19829370C2 (de) * | 1997-12-13 | 2003-07-17 | Robert Weicht | Mittel zum Reinigen von Kammerfilterpressen |
US20050217707A1 (en) * | 1998-03-13 | 2005-10-06 | Aegerter Brian K | Selective processing of microelectronic workpiece surfaces |
US6248704B1 (en) | 1999-05-03 | 2001-06-19 | Ekc Technology, Inc. | Compositions for cleaning organic and plasma etched residues for semiconductors devices |
US6929861B2 (en) | 2002-03-05 | 2005-08-16 | Zuel Company, Inc. | Anti-reflective glass surface with improved cleanability |
EP1793016A1 (de) * | 2005-12-01 | 2007-06-06 | Elpochem AG | Polier- und Entgratungsmittel für Werkstücke aus Kohlenstoffstahl und Verfahren zum chemischen Polieren und Entgraten |
DE102007030957A1 (de) * | 2007-07-04 | 2009-01-08 | Siltronic Ag | Verfahren zum Reinigen einer Halbleiterscheibe mit einer Reinigungslösung |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1383066A (fr) * | 1963-11-12 | 1964-12-24 | Radiotechnique | Procédé de polissage chimique de métaux |
US3296141A (en) * | 1965-03-25 | 1967-01-03 | R O Hull & Company Inc | Bright dip compositions for the treatment of steel |
FR1472467A (fr) * | 1966-03-21 | 1967-03-10 | Hull & Co R O | Compositions et procédés de traitement de surfaces métalliques |
JPS4829455B1 (ko) * | 1967-03-23 | 1973-09-10 | ||
US3841905A (en) * | 1970-11-19 | 1974-10-15 | Rbp Chem Corp | Method of preparing printed circuit boards with terminal tabs |
US3756957A (en) * | 1971-03-15 | 1973-09-04 | Furukawa Electric Co Ltd | Solutions for chemical dissolution treatment of metallic materials |
AT334252B (de) * | 1971-06-21 | 1976-01-10 | Swarovski & Co | Vorrichtung zum hervorrufen von bewegungsbildern und verfahren zur herstellung |
JPS4893542A (ko) * | 1972-03-13 | 1973-12-04 |
-
1983
- 1983-01-07 FR FR8300210A patent/FR2539140A1/fr active Granted
- 1983-12-28 US US06/566,479 patent/US4545918A/en not_active Expired - Lifetime
-
1984
- 1984-01-06 JP JP59000360A patent/JPS59173279A/ja active Granted
- 1984-01-06 DE DE198484400020T patent/DE115450T1/de active Pending
- 1984-01-06 CA CA000444853A patent/CA1222122A/fr not_active Expired
- 1984-01-06 EP EP84400020A patent/EP0115450B1/fr not_active Expired
- 1984-01-06 AT AT84400020T patent/ATE21269T1/de not_active IP Right Cessation
- 1984-01-06 KR KR1019840000032A patent/KR910009842B1/ko not_active IP Right Cessation
- 1984-01-06 DE DE8484400020T patent/DE3460400D1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0115450B1 (fr) | 1986-08-06 |
US4545918A (en) | 1985-10-08 |
JPS59173279A (ja) | 1984-10-01 |
ATE21269T1 (de) | 1986-08-15 |
FR2539140B1 (ko) | 1985-04-12 |
KR910009842B1 (ko) | 1991-11-30 |
DE115450T1 (de) | 1985-01-03 |
DE3460400D1 (en) | 1986-09-11 |
FR2539140A1 (fr) | 1984-07-13 |
EP0115450A1 (fr) | 1984-08-08 |
JPS639589B2 (ko) | 1988-02-29 |
CA1222122A (fr) | 1987-05-26 |
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G160 | Decision to publish patent application | ||
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GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 19970825 Year of fee payment: 7 |
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LAPS | Lapse due to unpaid annual fee |