ATE209265T1 - Verfahren zur herstellung von siliziumkarbidkristall mit geringem widerstand - Google Patents

Verfahren zur herstellung von siliziumkarbidkristall mit geringem widerstand

Info

Publication number
ATE209265T1
ATE209265T1 AT98920338T AT98920338T ATE209265T1 AT E209265 T1 ATE209265 T1 AT E209265T1 AT 98920338 T AT98920338 T AT 98920338T AT 98920338 T AT98920338 T AT 98920338T AT E209265 T1 ATE209265 T1 AT E209265T1
Authority
AT
Austria
Prior art keywords
silicon carbide
nitrogen
pressure
furnace
low resistance
Prior art date
Application number
AT98920338T
Other languages
English (en)
Inventor
Donovan L Barrett
Richard H Hopkins
James P Mchugh
Hudson Mcdonald Hobgood
Original Assignee
Northrop Grumman Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Northrop Grumman Corp filed Critical Northrop Grumman Corp
Application granted granted Critical
Publication of ATE209265T1 publication Critical patent/ATE209265T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/002—Controlling or regulating
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/36—Carbides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/931—Silicon carbide semiconductor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Carbon And Carbon Compounds (AREA)
AT98920338T 1997-05-08 1998-05-08 Verfahren zur herstellung von siliziumkarbidkristall mit geringem widerstand ATE209265T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/852,972 US5937317A (en) 1997-05-08 1997-05-08 Method of making a low resistivity silicon carbide boule
PCT/US1998/009386 WO1998050605A1 (en) 1997-05-08 1998-05-08 Method of making a low resistivity silicon carbide boule

Publications (1)

Publication Number Publication Date
ATE209265T1 true ATE209265T1 (de) 2001-12-15

Family

ID=25314688

Family Applications (1)

Application Number Title Priority Date Filing Date
AT98920338T ATE209265T1 (de) 1997-05-08 1998-05-08 Verfahren zur herstellung von siliziumkarbidkristall mit geringem widerstand

Country Status (5)

Country Link
US (1) US5937317A (de)
EP (1) EP0979319B1 (de)
AT (1) ATE209265T1 (de)
DE (1) DE69803283T2 (de)
WO (1) WO1998050605A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6514338B2 (en) * 1999-12-27 2003-02-04 Showa Denko Kabushiki Kaisha Method and apparatus for producing silicon carbide single crystal
US6507046B2 (en) * 2001-05-11 2003-01-14 Cree, Inc. High-resistivity silicon carbide substrate for semiconductor devices with high break down voltage
US7563321B2 (en) * 2004-12-08 2009-07-21 Cree, Inc. Process for producing high quality large size silicon carbide crystals
WO2007038710A2 (en) * 2005-09-28 2007-04-05 Ii-Vi Incorporated Intra-cavity gettering of nitrogen in sic crystal growth
WO2008039914A2 (en) * 2006-09-27 2008-04-03 Ii-Vi Incorporated Sic single crystals with reduced dislocation density grown by step-wise periodic perturbation technique

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL87348C (de) * 1954-03-19 1900-01-01
US4866005A (en) * 1987-10-26 1989-09-12 North Carolina State University Sublimation of silicon carbide to produce large, device quality single crystals of silicon carbide
JPH05178698A (ja) * 1991-12-27 1993-07-20 Sharp Corp 炭化珪素バルク単結晶の製造装置及び製造方法
JP2795574B2 (ja) * 1992-02-04 1998-09-10 シャープ株式会社 炭化珪素体の製造方法
US5433167A (en) * 1992-02-04 1995-07-18 Sharp Kabushiki Kaisha Method of producing silicon-carbide single crystals by sublimation recrystallization process using a seed crystal
JP3128179B2 (ja) * 1992-11-24 2001-01-29 シャープ株式会社 ｎ型炭化珪素単結晶の製造方法
JPH0977594A (ja) * 1995-09-11 1997-03-25 Nippon Steel Corp 低抵抗単結晶炭化珪素の製造方法

Also Published As

Publication number Publication date
DE69803283T2 (de) 2002-07-18
WO1998050605A1 (en) 1998-11-12
DE69803283D1 (de) 2002-02-21
EP0979319A1 (de) 2000-02-16
US5937317A (en) 1999-08-10
EP0979319B1 (de) 2001-11-21

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Legal Events

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