ATE180601T1 - Kontrollgerät für eine aus mehreren lasermodulen bestehende laserquelle zur energetischen und räumlichen optimierung während der laserbearbeitung von oberflächen - Google Patents

Kontrollgerät für eine aus mehreren lasermodulen bestehende laserquelle zur energetischen und räumlichen optimierung während der laserbearbeitung von oberflächen

Info

Publication number
ATE180601T1
ATE180601T1 AT96924950T AT96924950T ATE180601T1 AT E180601 T1 ATE180601 T1 AT E180601T1 AT 96924950 T AT96924950 T AT 96924950T AT 96924950 T AT96924950 T AT 96924950T AT E180601 T1 ATE180601 T1 AT E180601T1
Authority
AT
Austria
Prior art keywords
laser
energy
pct
control device
resulting
Prior art date
Application number
AT96924950T
Other languages
English (en)
Inventor
Bruno Godard
Marc Stehle
Original Assignee
Soc D Production Et De Rech Ap
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=9481900&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE180601(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Soc D Production Et De Rech Ap filed Critical Soc D Production Et De Rech Ap
Application granted granted Critical
Publication of ATE180601T1 publication Critical patent/ATE180601T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2316—Cascaded amplifiers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2383—Parallel arrangements

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Recrystallisation Techniques (AREA)
  • Laser Beam Processing (AREA)
AT96924950T 1995-08-11 1996-07-05 Kontrollgerät für eine aus mehreren lasermodulen bestehende laserquelle zur energetischen und räumlichen optimierung während der laserbearbeitung von oberflächen ATE180601T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9509780A FR2737814B1 (fr) 1995-08-11 1995-08-11 Procede et dispositif de commande d'une source laser a plusieurs modules laser pour optimiser le traitement de surface par laser

Publications (1)

Publication Number Publication Date
ATE180601T1 true ATE180601T1 (de) 1999-06-15

Family

ID=9481900

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96924950T ATE180601T1 (de) 1995-08-11 1996-07-05 Kontrollgerät für eine aus mehreren lasermodulen bestehende laserquelle zur energetischen und räumlichen optimierung während der laserbearbeitung von oberflächen

Country Status (9)

Country Link
US (1) US6014401A (de)
EP (1) EP0843909B1 (de)
JP (1) JP4169366B2 (de)
KR (1) KR100416246B1 (de)
AT (1) ATE180601T1 (de)
CA (1) CA2225152C (de)
DE (1) DE69602603T2 (de)
FR (1) FR2737814B1 (de)
WO (1) WO1997007578A1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2737806B1 (fr) * 1995-08-11 1997-09-12 Soc D Production Et De Rech Ap Dispositif et procede de traitement de surface par laser
FR2737786B1 (fr) * 1995-08-11 1997-09-12 Soc D Production Et De Rech Ap Dispositif optique pour homogeneiser un faisceau laser
JP2002289397A (ja) * 2001-03-23 2002-10-04 Takayasu Mochizuki レーザプラズマ発生方法およびそのシステム
JP2003059858A (ja) * 2001-08-09 2003-02-28 Sony Corp レーザアニール装置及び薄膜トランジスタの製造方法
US7097709B2 (en) * 2002-11-27 2006-08-29 Mitsubishi Denki Kabushiki Kaisha Laser annealing apparatus
US7919726B2 (en) * 2002-11-29 2011-04-05 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation apparatus, laser irradiation method, and method for manufacturing a semiconductor device
US7304005B2 (en) * 2003-03-17 2007-12-04 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation apparatus, laser irradiation method, and method for manufacturing a semiconductor device
EP1743405A4 (de) * 2003-07-30 2009-11-11 Tcz Pte Ltd System zur behandlung von oberflächen mit einem hochstabilen gasentladungslaser mit sehr hoher energie
DE102004001276A1 (de) * 2004-01-08 2005-08-04 Mtu Aero Engines Gmbh Verfahren zur Erwärmung von Bauteilen
US20070012665A1 (en) * 2005-07-12 2007-01-18 Hewlett-Packard Development Company Lp Laser ablation
US20110300692A1 (en) * 2008-10-29 2011-12-08 Oerlikon Solar Ag, Trubbach Method for dividing a semiconductor film formed on a substrate into plural regions by multiple laser beam irradiation
US8509272B2 (en) 2009-06-10 2013-08-13 Lee Laser, Inc. Laser beam combining and power scaling device
US9277634B2 (en) 2013-01-17 2016-03-01 Kla-Tencor Corporation Apparatus and method for multiplexed multiple discharge plasma produced sources
JP6363711B2 (ja) * 2014-07-11 2018-07-25 ギガフォトン株式会社 レーザシステム
CN108292595B (zh) 2015-12-25 2022-09-16 极光先进雷射株式会社 激光照射装置
JPWO2019012642A1 (ja) * 2017-07-13 2020-05-07 ギガフォトン株式会社 レーザシステム
KR102324610B1 (ko) * 2019-12-26 2021-11-09 세메스 주식회사 기판 가열 유닛, 기판 처리 장치 및 기판 처리 방법

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4649351A (en) * 1984-10-19 1987-03-10 Massachusetts Institute Of Technology Apparatus and method for coherently adding laser beams
US4648092A (en) * 1985-09-25 1987-03-03 Rockwell International Corporation Phase coupling multiple lasers
EP0308512B1 (de) * 1987-02-24 1994-06-22 Nippon Steel Corporation Gerät zur mattveredelung einer rolle mittels impulslaser
JPH01302881A (ja) * 1988-05-31 1989-12-06 Yoshiaki Arata 大出力エキシマレーザービーム造出法
US5253110A (en) * 1988-12-22 1993-10-12 Nikon Corporation Illumination optical arrangement
DE4009859A1 (de) * 1990-03-28 1991-10-02 Fraunhofer Ges Forschung Verfahren und vorrichtung zur erzeugung von laserstrahlung hoher leistung und guter qualitaet
TW207588B (de) * 1990-09-19 1993-06-11 Hitachi Seisakusyo Kk
IL101471A (en) * 1991-05-01 1995-03-30 Coherent Inc Coupler for laser launch system
ATE155933T1 (de) * 1992-05-06 1997-08-15 Electrox Ltd System zum kombinieren von laserstrahlen
DE4301689A1 (de) * 1993-01-22 1994-07-28 Deutsche Forsch Luft Raumfahrt Leistungsgesteuertes fraktales Lasersystem
US5463200A (en) * 1993-02-11 1995-10-31 Lumonics Inc. Marking of a workpiece by light energy
US5375132A (en) * 1993-05-05 1994-12-20 Coherent, Inc. Solid state laser with interleaved output
EP0700325B1 (de) * 1993-05-19 1997-08-13 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Verfahren zur materialbearbeitung mit diodenstrahlung
US5528612A (en) * 1993-11-19 1996-06-18 The United States Of America As Represented By The Secretary Of The Navy Laser with multiple gain elements
DE4429913C1 (de) * 1994-08-23 1996-03-21 Fraunhofer Ges Forschung Vorrichtung und Verfahren zum Plattieren
FR2737806B1 (fr) * 1995-08-11 1997-09-12 Soc D Production Et De Rech Ap Dispositif et procede de traitement de surface par laser

Also Published As

Publication number Publication date
FR2737814B1 (fr) 1997-09-12
DE69602603T2 (de) 2000-02-24
JP4169366B2 (ja) 2008-10-22
KR100416246B1 (ko) 2004-03-26
WO1997007578A1 (fr) 1997-02-27
DE69602603D1 (de) 1999-07-01
FR2737814A1 (fr) 1997-02-14
JPH11511295A (ja) 1999-09-28
CA2225152C (en) 2007-05-08
EP0843909B1 (de) 1999-05-26
EP0843909A1 (de) 1998-05-27
US6014401A (en) 2000-01-11
CA2225152A1 (en) 1997-02-27
KR19990036245A (ko) 1999-05-25

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