ATE160015T1 - Anordnung und verfahren zur optischen untersuchung von gegenständen - Google Patents

Anordnung und verfahren zur optischen untersuchung von gegenständen

Info

Publication number
ATE160015T1
ATE160015T1 AT94102147T AT94102147T ATE160015T1 AT E160015 T1 ATE160015 T1 AT E160015T1 AT 94102147 T AT94102147 T AT 94102147T AT 94102147 T AT94102147 T AT 94102147T AT E160015 T1 ATE160015 T1 AT E160015T1
Authority
AT
Austria
Prior art keywords
axis
objective lens
light
article
illuminating system
Prior art date
Application number
AT94102147T
Other languages
English (en)
Inventor
Yigal Katzir
Moshe Finarov
Original Assignee
Orbotech Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orbotech Ltd filed Critical Orbotech Ltd
Application granted granted Critical
Publication of ATE160015T1 publication Critical patent/ATE160015T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Ultra Sonic Daignosis Equipment (AREA)
  • Holo Graphy (AREA)
  • Microscoopes, Condenser (AREA)
AT94102147T 1993-02-12 1994-02-11 Anordnung und verfahren zur optischen untersuchung von gegenständen ATE160015T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL10470893A IL104708A (en) 1993-02-12 1993-02-12 Device and method for optical inspection of items

Publications (1)

Publication Number Publication Date
ATE160015T1 true ATE160015T1 (de) 1997-11-15

Family

ID=11064521

Family Applications (1)

Application Number Title Priority Date Filing Date
AT94102147T ATE160015T1 (de) 1993-02-12 1994-02-11 Anordnung und verfahren zur optischen untersuchung von gegenständen

Country Status (6)

Country Link
US (1) US5450201A (de)
EP (1) EP0610945B1 (de)
JP (1) JPH06250092A (de)
AT (1) ATE160015T1 (de)
DE (1) DE69406563T2 (de)
IL (1) IL104708A (de)

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US5608526A (en) * 1995-01-19 1997-03-04 Tencor Instruments Focused beam spectroscopic ellipsometry method and system
US6734967B1 (en) 1995-01-19 2004-05-11 Kla-Tencor Technologies Corporation Focused beam spectroscopic ellipsometry method and system
DE19708036C2 (de) * 1997-02-27 2000-06-29 Gunther Elender Ellipsometrisches Mikroskop
US6483580B1 (en) 1998-03-06 2002-11-19 Kla-Tencor Technologies Corporation Spectroscopic scatterometer system
DE19827175C1 (de) 1998-06-18 2000-01-27 Leica Microsystems Analysator-Einschub für ein Polarisationsmikroskop
US6020966A (en) * 1998-09-23 2000-02-01 International Business Machines Corporation Enhanced optical detection of minimum features using depolarization
US6132044A (en) * 1998-11-20 2000-10-17 Luxottica Leasing S.P.A Filter for a special purpose lens and method of making filter
JP3645523B2 (ja) * 1999-08-06 2005-05-11 サーモ エレクトロン コーポレイション−ポイント オブ ケア エンド ラピッド ダイアグノスティックス 薄膜による光の減衰に基づく分析結合アッセイ用装置
DE10008073B4 (de) * 2000-02-22 2005-09-01 Nanofocus Materialtechnik Gmbh Polarisationsinterferometrisches Mikroskop
US6552783B1 (en) 2000-06-28 2003-04-22 Teradyne, Inc. Optical system
US7167583B1 (en) 2000-06-28 2007-01-23 Landrex Technologies Co., Ltd. Image processing system for use with inspection systems
US6750968B2 (en) * 2000-10-03 2004-06-15 Accent Optical Technologies, Inc. Differential numerical aperture methods and device
US7079245B2 (en) * 2000-12-14 2006-07-18 Mitsubishi Denki Kabushiki Kaisha Method and apparatus for detecting gap of liquid-crystal panel and apparatus therefor
FR2818376B1 (fr) * 2000-12-18 2003-03-28 Centre Nat Rech Scient Dispositif de visualisation bidimensionnelle ellipsometrique d'un echantillon, procede de visualisation et procede de mesure ellipsometrique avec resolution spatiale
US6870896B2 (en) 2000-12-28 2005-03-22 Osmic, Inc. Dark-field phase contrast imaging
US6804324B2 (en) * 2001-03-01 2004-10-12 Osmo, Inc. X-ray phase contrast imaging using a fabry-perot interferometer concept
US6700658B2 (en) 2001-10-05 2004-03-02 Electro Scientific Industries, Inc. Method and apparatus for circuit pattern inspection
US6862491B2 (en) * 2002-05-22 2005-03-01 Applied Materials Israel, Ltd. System and method for process variation monitor
DE10222785B4 (de) * 2002-05-23 2004-12-16 Wendlandt, Erhard Verfahren und Vorrichtung zur Probenuntersuchung
US6949115B2 (en) * 2003-10-14 2005-09-27 Southland Instruments, Inc. Polarized light analyzer
CN100485312C (zh) * 2004-03-11 2009-05-06 Icos视检系统有限公司 用于波前控制和改进的3d测量的方法和装置
IL162199A (en) * 2004-05-27 2008-04-13 Nova Measuring Instr Ltd Optical measurements of articles with periodic patterns
US7515253B2 (en) * 2005-01-12 2009-04-07 Kla-Tencor Technologies Corporation System for measuring a sample with a layer containing a periodic diffracting structure
JP4625716B2 (ja) * 2005-05-23 2011-02-02 株式会社日立ハイテクノロジーズ 欠陥検査装置及び欠陥検査方法
US7567344B2 (en) * 2006-05-12 2009-07-28 Corning Incorporated Apparatus and method for characterizing defects in a transparent substrate
JP5248052B2 (ja) * 2006-10-11 2013-07-31 日東電工株式会社 光学フィルムを有するシート状製品の欠点検査装置、その検査データ処理装置、その切断装置及びその製造システム
JP5065059B2 (ja) * 2008-01-08 2012-10-31 オリンパス株式会社 顕微鏡
JP5035904B2 (ja) * 2008-02-13 2012-09-26 国立大学法人名古屋大学 膜厚分布測定装置
US8462328B2 (en) 2008-07-22 2013-06-11 Orbotech Ltd. Efficient telecentric optical system (ETOS)
DE102009053908A1 (de) 2009-11-20 2011-05-26 Hönig, Dirk, Dr. Reflexionsmikroskop
US9035673B2 (en) 2010-01-25 2015-05-19 Palo Alto Research Center Incorporated Method of in-process intralayer yield detection, interlayer shunt detection and correction
US9404872B1 (en) * 2011-06-29 2016-08-02 Kla-Tencor Corporation Selectably configurable multiple mode spectroscopic ellipsometry
TWI477766B (zh) 2012-12-18 2015-03-21 Ind Tech Res Inst 檢測裝置以及檢測方法
JP6128902B2 (ja) * 2013-03-08 2017-05-17 株式会社ミツトヨ 形状測定装置
JP2014191057A (ja) * 2013-03-26 2014-10-06 Toppan Printing Co Ltd Ｉｔｏパターンの撮像装置及び撮像方法
KR101414255B1 (ko) * 2013-03-29 2014-07-01 에스엔유 프리시젼 주식회사 Ｔｓｖ 측정장치 및 측정방법
AU2014348371B2 (en) * 2013-11-15 2019-11-07 Mikroscan Technologies, Inc. Geological scanner
DE102014114013B4 (de) * 2014-09-26 2024-03-21 Carl Zeiss Meditec Ag Medizinisch optisches Beobachtungsgerät und Verfahren zur Kontrastierung von polarisationsdrehendem Gewebe
WO2016069794A1 (en) * 2014-10-28 2016-05-06 Mikroscan Technologies, Inc. Microdissection viewing system
CN104503072B (zh) * 2014-12-23 2017-09-26 成都西图科技有限公司 偏光显微镜的自动偏光装置及其使用方法
NL2019089B1 (en) * 2017-06-17 2018-12-24 Acad Medisch Ct Polarization microscope
US10720354B2 (en) * 2018-08-28 2020-07-21 Axcelis Technologies, Inc. System and method for aligning light-transmitting birefringent workpieces
CN114371148B (zh) * 2022-01-19 2022-11-08 之江实验室 一种基于零椭偏暗场照明的散射干涉成像系统及方法

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US2409407A (en) * 1943-02-22 1946-10-15 Bausch & Lomb Reflecting element for polarized light
US3614195A (en) * 1969-11-10 1971-10-19 Bausch & Lomb Retardation compensator plate for a polarizing microscope
US3637280A (en) * 1970-05-12 1972-01-25 Jenoptik Jena Gmbh Devices for high-contrast imaging of phase objects in incident-light microscopy
JPH0820358B2 (ja) * 1986-03-03 1996-03-04 オリンパス光学工業株式会社 光学的記録媒体用基盤の屈折率の測定装置
US4906844A (en) * 1988-08-12 1990-03-06 Rockwell International Corporation Phase sensitive optical monitor for thin film deposition
US4866264A (en) * 1988-10-31 1989-09-12 Northrop Corporation Method and apparatus for measuring non-reciprocal loss of thin magnetic films and magnetic mirrors
US4999014A (en) * 1989-05-04 1991-03-12 Therma-Wave, Inc. Method and apparatus for measuring thickness of thin films
US5042951A (en) * 1989-09-19 1991-08-27 Therma-Wave, Inc. High resolution ellipsometric apparatus
DE4017935A1 (de) * 1990-06-05 1991-12-12 Leonhardt Klaus Prof Dr Mikro-ellipso-profilometrie
IL96483A (en) * 1990-11-27 1995-07-31 Orbotech Ltd Optical inspection method and apparatus
ATE169400T1 (de) * 1991-01-11 1998-08-15 Rudolph Res Corp Gleichzeitiges vielfach-winkel/vielfach- wellenlängen ellipsometer und methode

Also Published As

Publication number Publication date
EP0610945B1 (de) 1997-11-05
EP0610945A1 (de) 1994-08-17
JPH06250092A (ja) 1994-09-09
DE69406563T2 (de) 1998-03-05
DE69406563D1 (de) 1997-12-11
IL104708A0 (en) 1993-06-10
IL104708A (en) 1995-12-31
US5450201A (en) 1995-09-12

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