ATE113667T1 - Verfahren zur partikelentfernung von substratoberflächen. - Google Patents

Verfahren zur partikelentfernung von substratoberflächen.

Info

Publication number
ATE113667T1
ATE113667T1 AT90200193T AT90200193T ATE113667T1 AT E113667 T1 ATE113667 T1 AT E113667T1 AT 90200193 T AT90200193 T AT 90200193T AT 90200193 T AT90200193 T AT 90200193T AT E113667 T1 ATE113667 T1 AT E113667T1
Authority
AT
Austria
Prior art keywords
substrates
coating
coated
vacuum
pvd
Prior art date
Application number
AT90200193T
Other languages
English (en)
Inventor
Horst-Christian Langowski
Original Assignee
Philips & Du Pont Optical
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips & Du Pont Optical filed Critical Philips & Du Pont Optical
Application granted granted Critical
Publication of ATE113667T1 publication Critical patent/ATE113667T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Weting (AREA)
AT90200193T 1989-02-01 1990-01-29 Verfahren zur partikelentfernung von substratoberflächen. ATE113667T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3902862A DE3902862A1 (de) 1989-02-01 1989-02-01 Verfahren zur entfernung von partikeln auf substratoberflaechen

Publications (1)

Publication Number Publication Date
ATE113667T1 true ATE113667T1 (de) 1994-11-15

Family

ID=6373166

Family Applications (1)

Application Number Title Priority Date Filing Date
AT90200193T ATE113667T1 (de) 1989-02-01 1990-01-29 Verfahren zur partikelentfernung von substratoberflächen.

Country Status (6)

Country Link
US (1) US4996078A (de)
EP (1) EP0381278B1 (de)
JP (1) JPH02240254A (de)
AT (1) ATE113667T1 (de)
CA (1) CA2008765A1 (de)
DE (2) DE3902862A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0622627A1 (de) * 1993-04-30 1994-11-02 Applied Materials, Inc. Verfahren und Vorrichtung zum Nachweis von Teilchen auf einem Substrat
CA2130388A1 (en) * 1993-09-23 1995-03-24 Joel L. Williams Process for barrier coating of plastic objects
KR100353774B1 (ko) 1997-05-08 2002-09-27 마츠시타 덴끼 산교 가부시키가이샤 광기록매체의 제조장치 및 제조방법
US6080650A (en) * 1998-02-04 2000-06-27 Texas Instruments Incorporated Method and apparatus for attaching particles to a substrate
FR2885995B1 (fr) * 2005-05-20 2007-07-06 Eurokera Plaque vitroceramique et son procede de fabrication
KR101331213B1 (ko) * 2007-06-05 2013-11-20 삼성디스플레이 주식회사 기판 가공장치
US9358590B2 (en) 2011-03-23 2016-06-07 Sri International Electroadhesive surface cleaner
EP2688690B1 (de) 2011-03-23 2019-10-23 SRI International Aktive elektroadhäsionsreinigung
WO2018089604A1 (en) 2016-11-10 2018-05-17 Corning Incorporated Particle reduction during sputtering deposition

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60141869A (ja) * 1983-12-29 1985-07-26 Nissin Electric Co Ltd 膜形成方法および膜形成装置
DD263084A1 (de) * 1987-07-27 1988-12-21 Akad Wissenschaften Ddr Verfahren zur herstellung homogener und haftfester metallschichten

Also Published As

Publication number Publication date
US4996078A (en) 1991-02-26
DE69013707D1 (de) 1994-12-08
JPH02240254A (ja) 1990-09-25
EP0381278A1 (de) 1990-08-08
EP0381278B1 (de) 1994-11-02
CA2008765A1 (en) 1990-08-01
DE69013707T2 (de) 1995-06-08
DE3902862A1 (de) 1990-08-02

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Legal Events

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