BR9611887A - Processo para bombardear lítio e para produzir um alvo de bombardeamento alvo e conjunto - Google Patents

Processo para bombardear lítio e para produzir um alvo de bombardeamento alvo e conjunto

Info

Publication number
BR9611887A
BR9611887A BR9611887A BR9611887A BR9611887A BR 9611887 A BR9611887 A BR 9611887A BR 9611887 A BR9611887 A BR 9611887A BR 9611887 A BR9611887 A BR 9611887A BR 9611887 A BR9611887 A BR 9611887A
Authority
BR
Brazil
Prior art keywords
bombing
lithium
target
producing
khz
Prior art date
Application number
BR9611887A
Other languages
English (en)
Inventor
Stephen C Schulz
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24268620&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=BR9611887(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of BR9611887A publication Critical patent/BR9611887A/pt

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3485—Sputtering using pulsed power to the target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Secondary Cells (AREA)
BR9611887A 1995-12-05 1996-12-05 Processo para bombardear lítio e para produzir um alvo de bombardeamento alvo e conjunto BR9611887A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/567,781 US5830336A (en) 1995-12-05 1995-12-05 Sputtering of lithium
PCT/US1996/019408 WO1997020962A1 (en) 1995-12-05 1996-12-05 Sputtering of lithium

Publications (1)

Publication Number Publication Date
BR9611887A true BR9611887A (pt) 1999-02-17

Family

ID=24268620

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9611887A BR9611887A (pt) 1995-12-05 1996-12-05 Processo para bombardear lítio e para produzir um alvo de bombardeamento alvo e conjunto

Country Status (11)

Country Link
US (2) US5830336A (pt)
EP (1) EP0865513B1 (pt)
JP (1) JP4059302B2 (pt)
KR (1) KR19990071940A (pt)
AT (1) ATE372399T1 (pt)
AU (1) AU703062B2 (pt)
BR (1) BR9611887A (pt)
CA (1) CA2238319C (pt)
DE (1) DE69637232T2 (pt)
ES (1) ES2293652T3 (pt)
WO (1) WO1997020962A1 (pt)

Families Citing this family (121)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5830336A (en) * 1995-12-05 1998-11-03 Minnesota Mining And Manufacturing Company Sputtering of lithium
US6051117A (en) * 1996-12-12 2000-04-18 Eltech Systems, Corp. Reticulated metal article combining small pores with large apertures
US6744060B2 (en) 1997-05-12 2004-06-01 Cymer, Inc. Pulse power system for extreme ultraviolet and x-ray sources
US6815700B2 (en) 1997-05-12 2004-11-09 Cymer, Inc. Plasma focus light source with improved pulse power system
DE19735803B4 (de) * 1997-08-18 2006-10-19 Werner Prof. Dr. Weppner Elektrode-Elektrolyt-Anordnung, Verfahren zur Herstellung einer Elektrode-Elektrolyt-Anordnung und Verwendung einer Elektrode-Elektrolyt-Anordnung
JP2000073164A (ja) * 1998-08-28 2000-03-07 Showa Alum Corp スパッタリング用バッキングプレート
DE19948839A1 (de) * 1999-10-11 2001-04-12 Bps Alzenau Gmbh Leitende transparente Schichten und Verfahren zu ihrer Herstellung
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
US7180081B2 (en) * 2000-06-09 2007-02-20 Cymer, Inc. Discharge produced plasma EUV light source
US7346093B2 (en) * 2000-11-17 2008-03-18 Cymer, Inc. DUV light source optical element improvements
US7372056B2 (en) * 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7598509B2 (en) * 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7439530B2 (en) * 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7378673B2 (en) * 2005-02-25 2008-05-27 Cymer, Inc. Source material dispenser for EUV light source
US7405416B2 (en) * 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
US7465946B2 (en) * 2004-03-10 2008-12-16 Cymer, Inc. Alternative fuels for EUV light source
US7088758B2 (en) 2001-07-27 2006-08-08 Cymer, Inc. Relax gas discharge laser lithography light source
US6709958B2 (en) * 2001-08-30 2004-03-23 Micron Technology, Inc. Integrated circuit device and fabrication using metal-doped chalcogenide materials
US7042615B2 (en) * 2002-05-17 2006-05-09 The Regents Of The University Of California Electrochromic devices based on lithium insertion
US7217941B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
US7217940B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Collector for EUV light source
US7193228B2 (en) * 2004-03-10 2007-03-20 Cymer, Inc. EUV light source optical elements
US20060146906A1 (en) * 2004-02-18 2006-07-06 Cymer, Inc. LLP EUV drive laser
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
US8075732B2 (en) * 2004-11-01 2011-12-13 Cymer, Inc. EUV collector debris management
US7196342B2 (en) * 2004-03-10 2007-03-27 Cymer, Inc. Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
US7109503B1 (en) * 2005-02-25 2006-09-19 Cymer, Inc. Systems for protecting internal components of an EUV light source from plasma-generated debris
US7355191B2 (en) * 2004-11-01 2008-04-08 Cymer, Inc. Systems and methods for cleaning a chamber window of an EUV light source
US7372610B2 (en) 2005-02-23 2008-05-13 Sage Electrochromics, Inc. Electrochromic devices and methods
US7449703B2 (en) * 2005-02-25 2008-11-11 Cymer, Inc. Method and apparatus for EUV plasma source target delivery target material handling
US7482609B2 (en) * 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
US7846579B2 (en) * 2005-03-25 2010-12-07 Victor Krasnov Thin film battery with protective packaging
US8679674B2 (en) * 2005-03-25 2014-03-25 Front Edge Technology, Inc. Battery with protective packaging
US7365349B2 (en) * 2005-06-27 2008-04-29 Cymer, Inc. EUV light source collector lifetime improvements
US7180083B2 (en) * 2005-06-27 2007-02-20 Cymer, Inc. EUV light source collector erosion mitigation
US7141806B1 (en) 2005-06-27 2006-11-28 Cymer, Inc. EUV light source collector erosion mitigation
US7402825B2 (en) * 2005-06-28 2008-07-22 Cymer, Inc. LPP EUV drive laser input system
US20070007505A1 (en) * 2005-07-07 2007-01-11 Honeywell International Inc. Chalcogenide PVD components
US7394083B2 (en) 2005-07-08 2008-07-01 Cymer, Inc. Systems and methods for EUV light source metrology
US7453077B2 (en) * 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
US7307237B2 (en) * 2005-12-29 2007-12-11 Honeywell International, Inc. Hand-held laser welding wand nozzle assembly including laser and feeder extension tips
WO2008055824A1 (en) * 2006-11-09 2008-05-15 Sage Electrochromics, Inc. Method of making an ion-switching device without a separate lithiation step
US7862627B2 (en) * 2007-04-27 2011-01-04 Front Edge Technology, Inc. Thin film battery substrate cutting and fabrication process
KR101010716B1 (ko) * 2007-07-25 2011-01-24 지에스나노텍 주식회사 비전도성 타겟을 사용하는 스퍼터링에 의한 세라믹 박막의증착 방법 및 그를 위한 장치
US8628645B2 (en) * 2007-09-04 2014-01-14 Front Edge Technology, Inc. Manufacturing method for thin film battery
US9782949B2 (en) 2008-05-30 2017-10-10 Corning Incorporated Glass laminated articles and layered articles
US8514476B2 (en) * 2008-06-25 2013-08-20 View, Inc. Multi-pane dynamic window and method for making same
US7715082B2 (en) * 2008-06-30 2010-05-11 Soladigm, Inc. Electrochromic devices based on lithium insertion
US8842357B2 (en) 2008-12-31 2014-09-23 View, Inc. Electrochromic device and method for making electrochromic device
US8432603B2 (en) 2009-03-31 2013-04-30 View, Inc. Electrochromic devices
US9103018B2 (en) * 2009-05-08 2015-08-11 General Plasma, Inc. Sputtering target temperature control utilizing layers having predetermined emissivity coefficients
US20100291431A1 (en) * 2009-05-13 2010-11-18 Front Edge Technology, Inc. Thin film battery with protective packaging
US8502494B2 (en) * 2009-08-28 2013-08-06 Front Edge Technology, Inc. Battery charging apparatus and method
US10303035B2 (en) 2009-12-22 2019-05-28 View, Inc. Self-contained EC IGU
US10690540B2 (en) 2015-10-06 2020-06-23 View, Inc. Multi-sensor having a light diffusing element around a periphery of a ring of photosensors
US8213074B1 (en) 2011-03-16 2012-07-03 Soladigm, Inc. Onboard controller for multistate windows
US20130271813A1 (en) 2012-04-17 2013-10-17 View, Inc. Controller for optically-switchable windows
US11592723B2 (en) 2009-12-22 2023-02-28 View, Inc. Automated commissioning of controllers in a window network
US11314139B2 (en) 2009-12-22 2022-04-26 View, Inc. Self-contained EC IGU
US9958750B2 (en) 2010-11-08 2018-05-01 View, Inc. Electrochromic window fabrication methods
US20120152727A1 (en) * 2010-11-24 2012-06-21 Applied Materials, Inc. Alkali Metal Deposition System
US9778532B2 (en) 2011-03-16 2017-10-03 View, Inc. Controlling transitions in optically switchable devices
US9454055B2 (en) 2011-03-16 2016-09-27 View, Inc. Multipurpose controller for multistate windows
US8705162B2 (en) 2012-04-17 2014-04-22 View, Inc. Controlling transitions in optically switchable devices
US10935865B2 (en) 2011-03-16 2021-03-02 View, Inc. Driving thin film switchable optical devices
US8254013B2 (en) 2011-03-16 2012-08-28 Soladigm, Inc. Controlling transitions in optically switchable devices
US9030725B2 (en) 2012-04-17 2015-05-12 View, Inc. Driving thin film switchable optical devices
US11630367B2 (en) 2011-03-16 2023-04-18 View, Inc. Driving thin film switchable optical devices
US9412290B2 (en) 2013-06-28 2016-08-09 View, Inc. Controlling transitions in optically switchable devices
US11054792B2 (en) 2012-04-13 2021-07-06 View, Inc. Monitoring sites containing switchable optical devices and controllers
US9645465B2 (en) 2011-03-16 2017-05-09 View, Inc. Controlling transitions in optically switchable devices
US20120255855A1 (en) 2011-04-07 2012-10-11 Sage Electrochromics, Inc. Method of controlling lithium uniformity
US9771646B2 (en) * 2011-04-21 2017-09-26 View, Inc. Lithium sputter targets
CN103814151B (zh) * 2011-06-27 2016-01-20 梭莱有限公司 Pvd靶材及其铸造方法
WO2013003065A2 (en) 2011-06-30 2013-01-03 Soladigm, Inc. Sputter target and sputtering methods
US8865340B2 (en) 2011-10-20 2014-10-21 Front Edge Technology Inc. Thin film battery packaging formed by localized heating
CN103987909B (zh) 2011-10-21 2017-03-22 唯景公司 减轻可着色窗中的热冲击
US10802371B2 (en) 2011-12-12 2020-10-13 View, Inc. Thin-film devices and fabrication
US11865632B2 (en) 2011-12-12 2024-01-09 View, Inc. Thin-film devices and fabrication
US10295880B2 (en) 2011-12-12 2019-05-21 View, Inc. Narrow pre-deposition laser deletion
KR102095605B1 (ko) 2011-12-12 2020-04-16 뷰, 인크. 박막 디바이스 및 제조
US20210394489A1 (en) 2011-12-12 2021-12-23 View, Inc. Thin-film devices and fabrication
US9887429B2 (en) 2011-12-21 2018-02-06 Front Edge Technology Inc. Laminated lithium battery
US8864954B2 (en) 2011-12-23 2014-10-21 Front Edge Technology Inc. Sputtering lithium-containing material with multiple targets
US11950340B2 (en) 2012-03-13 2024-04-02 View, Inc. Adjusting interior lighting based on dynamic glass tinting
US11635666B2 (en) 2012-03-13 2023-04-25 View, Inc Methods of controlling multi-zone tintable windows
US9341912B2 (en) 2012-03-13 2016-05-17 View, Inc. Multi-zone EC windows
US9257695B2 (en) 2012-03-29 2016-02-09 Front Edge Technology, Inc. Localized heat treatment of battery component films
US9077000B2 (en) 2012-03-29 2015-07-07 Front Edge Technology, Inc. Thin film battery and localized heat treatment
US11300848B2 (en) 2015-10-06 2022-04-12 View, Inc. Controllers for optically-switchable devices
US9638978B2 (en) 2013-02-21 2017-05-02 View, Inc. Control method for tintable windows
US10964320B2 (en) 2012-04-13 2021-03-30 View, Inc. Controlling optically-switchable devices
US11674843B2 (en) 2015-10-06 2023-06-13 View, Inc. Infrared cloud detector systems and methods
US10503039B2 (en) 2013-06-28 2019-12-10 View, Inc. Controlling transitions in optically switchable devices
CN104335595B (zh) 2012-04-13 2018-09-18 唯景公司 用于控制可光学切换的装置的应用
US10048561B2 (en) 2013-02-21 2018-08-14 View, Inc. Control method for tintable windows
US9159964B2 (en) 2012-09-25 2015-10-13 Front Edge Technology, Inc. Solid state battery having mismatched battery cells
US8753724B2 (en) 2012-09-26 2014-06-17 Front Edge Technology Inc. Plasma deposition on a partially formed battery through a mesh screen
US9356320B2 (en) 2012-10-15 2016-05-31 Front Edge Technology Inc. Lithium battery having low leakage anode
US11719990B2 (en) 2013-02-21 2023-08-08 View, Inc. Control method for tintable windows
US11960190B2 (en) 2013-02-21 2024-04-16 View, Inc. Control methods and systems using external 3D modeling and schedule-based computing
US11966142B2 (en) 2013-02-21 2024-04-23 View, Inc. Control methods and systems using outside temperature as a driver for changing window tint states
US10443121B2 (en) * 2013-04-24 2019-10-15 View, Inc. Sustained self-sputtering of lithium for lithium physical vapor deposition
US9885935B2 (en) 2013-06-28 2018-02-06 View, Inc. Controlling transitions in optically switchable devices
US10221612B2 (en) 2014-02-04 2019-03-05 View, Inc. Infill electrochromic windows
RU2019109013A (ru) 2014-03-05 2019-05-06 Вью, Инк. Мониторинг объектов, содержащих переключаемые оптические устройства и контроллеры
US10008739B2 (en) 2015-02-23 2018-06-26 Front Edge Technology, Inc. Solid-state lithium battery with electrolyte
TWI823168B (zh) 2015-07-07 2023-11-21 美商唯景公司 用於可著色窗戶之控制方法
WO2017011155A1 (en) 2015-07-13 2017-01-19 Albemarle Corporation Processes for low pressure, cold bonding of solid lithium to metal substrates
KR102015609B1 (ko) * 2015-07-24 2019-08-28 어플라이드 머티어리얼스, 인코포레이티드 열 민감성 접합 금속 타겟들의 냉각 및 활용도 최적화
US11255722B2 (en) 2015-10-06 2022-02-22 View, Inc. Infrared cloud detector systems and methods
WO2017075059A1 (en) 2015-10-29 2017-05-04 View, Inc. Controllers for optically-switchable devices
CN109275336A (zh) 2016-04-29 2019-01-25 唯景公司 光学可切换窗孔中电参数的校准
KR102443882B1 (ko) * 2016-08-03 2022-09-15 시그마 리튬 리미티드 금속 리튬 코팅을 형성하는 방법
US11467464B2 (en) 2017-04-26 2022-10-11 View, Inc. Displays for tintable windows
US10957886B2 (en) 2018-03-14 2021-03-23 Front Edge Technology, Inc. Battery having multilayer protective casing
CN109402589A (zh) * 2019-01-02 2019-03-01 重庆天齐锂业有限责任公司 一种磁控溅射制备超薄金属锂薄膜的方法及系统
US11703737B2 (en) * 2020-02-12 2023-07-18 Sage Electrochromics, Inc. Forming electrochromic stacks using at most one metallic lithium deposition station
TW202206925A (zh) 2020-03-26 2022-02-16 美商視野公司 多用戶端網路中之存取及傳訊
US11631493B2 (en) 2020-05-27 2023-04-18 View Operating Corporation Systems and methods for managing building wellness

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US34469A (en) * 1862-02-18 Improved evaporating-pans for saccharine juices
US4046659A (en) * 1974-05-10 1977-09-06 Airco, Inc. Method for coating a substrate
US4709740A (en) * 1983-11-10 1987-12-01 Aluminum Company Of America Direct chill casting of aluminum-lithium alloys
US4824744A (en) * 1984-09-14 1989-04-25 Duracell Inc. Method of making cell anode
DD252205B5 (de) * 1986-09-01 1993-12-09 Fraunhofer Ges Forschung Zerstaeubungseinrichtung
JPS63128171A (ja) * 1986-11-17 1988-05-31 Matsushita Electric Ind Co Ltd スパツタリング用タ−ゲツト
US4756810A (en) * 1986-12-04 1988-07-12 Machine Technology, Inc. Deposition and planarizing methods and apparatus
US4938571A (en) * 1987-06-18 1990-07-03 Cogan Stuart F Solid state electrochromic light modulator
DE3727901A1 (de) * 1987-08-21 1989-03-02 Leybold Ag Zerstaeubungskathode nach dem magnetronprinzip
JPH02155162A (ja) * 1988-12-06 1990-06-14 Brother Ind Ltd 蓄電池
US5080471A (en) * 1990-04-06 1992-01-14 Eic Laboratories, Inc. Electrochromic material and electro-optical device using same
US5284561A (en) * 1991-11-13 1994-02-08 Materials Research Corporation Method and apparatus for sputter coating employing machine readable indicia carried by target assembly
KR100231397B1 (ko) * 1991-01-28 1999-11-15 튜그룰 야사르 음극 스퍼터링용 타겟
FR2685011B1 (fr) * 1991-12-13 1994-02-04 Elf Aquitaine Ste Nale Procede de preparation d'un element de cible pour pulverisation cathodique et cibles, notamment de grande surface, realisees a partir de cet element.
DE4202425C2 (de) * 1992-01-29 1997-07-17 Leybold Ag Verfahren und Vorrichtung zum Beschichten eines Substrats, insbesondere mit elektrisch nichtleitenden Schichten
US5370775A (en) * 1992-04-10 1994-12-06 Sun Active Glass Electrochromics, Inc. Formation of chemically reduced electrode layers
US5427669A (en) * 1992-12-30 1995-06-27 Advanced Energy Industries, Inc. Thin film DC plasma processing system
US5830336A (en) * 1995-12-05 1998-11-03 Minnesota Mining And Manufacturing Company Sputtering of lithium

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AU703062B2 (en) 1999-03-11
EP0865513A4 (en) 2001-02-21
JP4059302B2 (ja) 2008-03-12
US5830336A (en) 1998-11-03
EP0865513B1 (en) 2007-09-05
ES2293652T3 (es) 2008-03-16
JP2000509100A (ja) 2000-07-18
DE69637232D1 (de) 2007-10-18
WO1997020962A1 (en) 1997-06-12
ATE372399T1 (de) 2007-09-15
CA2238319A1 (en) 1997-06-12
DE69637232T2 (de) 2008-01-03
EP0865513A1 (en) 1998-09-23
CA2238319C (en) 2001-04-17
AU1281097A (en) 1997-06-27
KR19990071940A (ko) 1999-09-27
US6039850A (en) 2000-03-21

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