ATA696173A - Verfahren zur herstellung eines uberzuges auf einem substrat - Google Patents

Verfahren zur herstellung eines uberzuges auf einem substrat

Info

Publication number
ATA696173A
ATA696173A AT696173A AT696173A ATA696173A AT A696173 A ATA696173 A AT A696173A AT 696173 A AT696173 A AT 696173A AT 696173 A AT696173 A AT 696173A AT A696173 A ATA696173 A AT A696173A
Authority
AT
Austria
Prior art keywords
coating
producing
substrate
Prior art date
Application number
AT696173A
Other languages
English (en)
Other versions
AT326971B (de
Original Assignee
Engel Niels Nikolaj
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Engel Niels Nikolaj filed Critical Engel Niels Nikolaj
Publication of ATA696173A publication Critical patent/ATA696173A/de
Application granted granted Critical
Publication of AT326971B publication Critical patent/AT326971B/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/06—Surface hardening
    • C21D1/09—Surface hardening by direct application of electrical or wave energy; by particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C12/00—Solid state diffusion of at least one non-metal element other than silicon and at least one metal element or silicon into metallic material surfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C23C14/582—Thermal treatment using electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5826—Treatment with charged particles
    • C23C14/5833—Ion beam bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Chemical Vapour Deposition (AREA)
AT696173A 1972-08-09 1973-08-08 Verfahren zur herstellung eines uberzuges auf einem substrat AT326971B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US279244A US3915757A (en) 1972-08-09 1972-08-09 Ion plating method and product therefrom

Publications (2)

Publication Number Publication Date
ATA696173A true ATA696173A (de) 1975-03-15
AT326971B AT326971B (de) 1976-01-12

Family

ID=23068203

Family Applications (1)

Application Number Title Priority Date Filing Date
AT696173A AT326971B (de) 1972-08-09 1973-08-08 Verfahren zur herstellung eines uberzuges auf einem substrat

Country Status (13)

Country Link
US (1) US3915757A (de)
JP (1) JPS547261B2 (de)
AT (1) AT326971B (de)
CA (1) CA1006844A (de)
CH (1) CH586287A5 (de)
DE (1) DE2340282C3 (de)
FR (1) FR2195704B1 (de)
GB (1) GB1423412A (de)
IE (1) IE37888B1 (de)
IL (1) IL42599A (de)
IT (1) IT989807B (de)
SE (1) SE401840B (de)
ZA (1) ZA734395B (de)

Families Citing this family (103)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT385058B (de) * 1946-07-17 1988-02-10 Vni Instrument Inst Verfahren zur verfestigung von schneidwerkzeugen
JPS51115286A (en) * 1975-04-03 1976-10-09 Anelva Corp Ornament
US4022947A (en) * 1975-11-06 1977-05-10 Airco, Inc. Transparent panel having high reflectivity for solar radiation and a method for preparing same
ES8103780A1 (es) * 1979-08-09 1981-03-16 Mitsubishi Metal Corp Procedimiento para la fabricacion de cuchillas dotadas de recubrimiento,para herramientas de corte
JPS5656636A (en) * 1979-10-13 1981-05-18 Mitsubishi Electric Corp Processing method of fine pattern
GB2075069B (en) * 1979-12-03 1984-09-12 Atomic Energy Authority Uk Wear resistance of metals
US4364969A (en) * 1979-12-13 1982-12-21 United Kingdom Atomic Energy Authority Method of coating titanium and its alloys
JPS5779169A (en) * 1980-11-06 1982-05-18 Sumitomo Electric Ind Ltd Physical vapor deposition method
US4645715A (en) * 1981-09-23 1987-02-24 Energy Conversion Devices, Inc. Coating composition and method
US4532149A (en) * 1981-10-21 1985-07-30 The United States Of America As Represented By The United States Department Of Energy Method for producing hard-surfaced tools and machine components
GB2123039B (en) * 1982-03-23 1985-10-23 Atomic Energy Authority Uk Coatings for cutting implements
AT381268B (de) * 1982-05-05 1986-09-25 Ver Edelstahlwerke Ag Werkzeug und verfahren zu dessen herstellung
GB2125442B (en) * 1982-05-24 1986-02-19 Atomic Energy Authority Uk A procedure for the hardening of materials
US4486247A (en) * 1982-06-21 1984-12-04 Westinghouse Electric Corp. Wear resistant steel articles with carbon, oxygen and nitrogen implanted in the surface thereof
US4751100A (en) * 1983-06-20 1988-06-14 Matsushita Electric Industrial Co., Ltd. Magnetic recording medium and method for making the same
JPS6115967A (ja) * 1984-06-29 1986-01-24 Sumitomo Electric Ind Ltd 表面処理方法
GB8423255D0 (en) * 1984-09-14 1984-10-17 Atomic Energy Authority Uk Surface treatment of metals
GB8512542D0 (en) * 1985-05-17 1985-06-19 Atomic Energy Authority Uk Improved cutting edges
US5250327A (en) * 1986-04-28 1993-10-05 Nissin Electric Co. Ltd. Composite substrate and process for producing the same
US4744938A (en) * 1986-08-18 1988-05-17 Westinghouse Electric Corp. Method and apparatus for producing ultralowmass fissionable deposits for reactor neutron dosimetry by recoil ion-implantation
US4737234A (en) * 1986-08-18 1988-04-12 Westinghouse Electric Corp. Method and apparatus for permanently recording high neutron fluence
AT388394B (de) * 1987-01-09 1989-06-12 Vni Instrument Inst Verfahren zur herstellung von schneidwerkzeug
US4764394A (en) * 1987-01-20 1988-08-16 Wisconsin Alumni Research Foundation Method and apparatus for plasma source ion implantation
US5088202A (en) * 1988-07-13 1992-02-18 Warner-Lambert Company Shaving razors
GB2227755B (en) * 1988-12-08 1993-03-10 Univ Hull A process for improving the wear and corrosion resistance of metallic components
US5061512A (en) * 1989-02-21 1991-10-29 General Electric Company Method of producing lubricated bearings
US5242741A (en) * 1989-09-08 1993-09-07 Taiho Kogyo Co., Ltd. Boronized sliding material and method for producing the same
JP2786283B2 (ja) * 1989-12-22 1998-08-13 株式会社日立製作所 表面改質方法およびその装置並びに表面改質基材
US5139876A (en) * 1990-03-05 1992-08-18 Cleveland State University Ceramic article having wear resistant coating
US5167725A (en) * 1990-08-01 1992-12-01 Ultracision, Inc. Titanium alloy blade coupler coated with nickel-chrome for ultrasonic scalpel
CA2065581C (en) 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
US5393573A (en) * 1991-07-16 1995-02-28 Microelectronics And Computer Technology Corporation Method of inhibiting tin whisker growth
FR2681472B1 (fr) 1991-09-18 1993-10-29 Commissariat Energie Atomique Procede de fabrication de films minces de materiau semiconducteur.
JP3221892B2 (ja) * 1991-09-20 2001-10-22 帝国ピストンリング株式会社 ピストンリング及びその製造法
DE69220566T2 (de) * 1991-11-21 1998-02-19 Nisshin Steel Co Ltd Verfahren zur bildung einer beschichtung mittels aufdampfen
US5224249A (en) * 1992-01-21 1993-07-06 Grumman Aerospace Corporation Corrosion prevention of honeycomb core panel construction using ion implantation
US5301431A (en) * 1992-12-01 1994-04-12 Etm Corporation Hand-held cutting tool
US5347887A (en) * 1993-03-11 1994-09-20 Microsurgical Techniques, Inc. Composite cutting edge
US5445689A (en) * 1994-08-23 1995-08-29 Northrop Grumman Corporation Pulsed ion beam surface treatment process for aluminum honeycomb panels to improve corrosion resistance
FR2748851B1 (fr) * 1996-05-15 1998-08-07 Commissariat Energie Atomique Procede de realisation d'une couche mince de materiau semiconducteur
SE506949C2 (sv) * 1996-07-19 1998-03-09 Sandvik Ab Hårdmetallverktyg med borerad ytzon och användning av detta för kallbearbetningsoperationer
US6033974A (en) 1997-05-12 2000-03-07 Silicon Genesis Corporation Method for controlled cleaving process
US6291313B1 (en) 1997-05-12 2001-09-18 Silicon Genesis Corporation Method and device for controlled cleaving process
US20070122997A1 (en) 1998-02-19 2007-05-31 Silicon Genesis Corporation Controlled process and resulting device
US6155909A (en) * 1997-05-12 2000-12-05 Silicon Genesis Corporation Controlled cleavage system using pressurized fluid
US6027988A (en) * 1997-05-28 2000-02-22 The Regents Of The University Of California Method of separating films from bulk substrates by plasma immersion ion implantation
US6077572A (en) * 1997-06-18 2000-06-20 Northeastern University Method of coating edges with diamond-like carbon
US6548382B1 (en) 1997-07-18 2003-04-15 Silicon Genesis Corporation Gettering technique for wafers made using a controlled cleaving process
FR2773261B1 (fr) 1997-12-30 2000-01-28 Commissariat Energie Atomique Procede pour le transfert d'un film mince comportant une etape de creation d'inclusions
DE19827803A1 (de) * 1998-06-23 1999-12-30 Bortec Gmbh Verfahren zur Herstellung von Bornitridschichten auf metallischen und nichtmetallischen Werkstoffoberflächen und Schneidwerkzeugen
US6291326B1 (en) 1998-06-23 2001-09-18 Silicon Genesis Corporation Pre-semiconductor process implant and post-process film separation
DE19840950A1 (de) * 1998-09-08 2000-03-09 Jagenberg Papiertech Gmbh Messer zum Schneiden laufender Materialbahnen
US6338879B1 (en) * 1998-12-09 2002-01-15 Nachi-Fujikoshi Corp. Solid lubricant film for coated cutting tool and method for manufacturing same
US6200649B1 (en) * 1999-07-21 2001-03-13 Southwest Research Institute Method of making titanium boronitride coatings using ion beam assisted deposition
US6500732B1 (en) 1999-08-10 2002-12-31 Silicon Genesis Corporation Cleaving process to fabricate multilayered substrates using low implantation doses
WO2001011930A2 (en) 1999-08-10 2001-02-15 Silicon Genesis Corporation A cleaving process to fabricate multilayered substrates using low implantation doses
US6263941B1 (en) 1999-08-10 2001-07-24 Silicon Genesis Corporation Nozzle for cleaving substrates
US6221740B1 (en) 1999-08-10 2001-04-24 Silicon Genesis Corporation Substrate cleaving tool and method
RU2161661C1 (ru) * 1999-08-16 2001-01-10 Падеров Анатолий Николаевич Способ нанесения износостойких покрытий и повышения долговечности деталей
US7229675B1 (en) * 2000-02-17 2007-06-12 Anatoly Nikolaevich Paderov Protective coating method for pieces made of heat resistant alloys
EP1347804A4 (de) * 2000-11-30 2009-04-22 Semequip Inc Ionenimplantationssystem und kontrollverfahren
US7064491B2 (en) * 2000-11-30 2006-06-20 Semequip, Inc. Ion implantation system and control method
FR2823599B1 (fr) 2001-04-13 2004-12-17 Commissariat Energie Atomique Substrat demomtable a tenue mecanique controlee et procede de realisation
US6723177B2 (en) 2001-07-09 2004-04-20 Southwest Research Institute Life extension of chromium coating and chromium alloys
US20040112476A1 (en) * 2001-07-09 2004-06-17 Geoffrey Dearnaley Life extension of chromium coatings and chromium alloys
US6933509B1 (en) * 2001-09-11 2005-08-23 Allasso Industries, Inc. Apparatus and method using fractionated irradiation to harden metal
US20050100673A1 (en) * 2002-05-22 2005-05-12 Ulrich Schoof Method for the surface treatment of a doctor element
DE10222453A1 (de) * 2002-05-22 2003-12-04 Voith Paper Patent Gmbh Verfahren zur Oberflächenbehandlung eines Rakelelementes
US6686595B2 (en) 2002-06-26 2004-02-03 Semequip Inc. Electron impact ion source
KR100827670B1 (ko) * 2002-06-26 2008-05-07 세미이큅, 인코포레이티드 이온 소스
US20040002202A1 (en) * 2002-06-26 2004-01-01 Horsky Thomas Neil Method of manufacturing CMOS devices by the implantation of N- and P-type cluster ions
US20050246904A1 (en) * 2002-08-21 2005-11-10 Koninklijke Philips Electronics N.V. Cutting member having a superlattice coating
US8187377B2 (en) 2002-10-04 2012-05-29 Silicon Genesis Corporation Non-contact etch annealing of strained layers
FR2848336B1 (fr) 2002-12-09 2005-10-28 Commissariat Energie Atomique Procede de realisation d'une structure contrainte destinee a etre dissociee
FR2856844B1 (fr) 2003-06-24 2006-02-17 Commissariat Energie Atomique Circuit integre sur puce de hautes performances
FR2857953B1 (fr) 2003-07-21 2006-01-13 Commissariat Energie Atomique Structure empilee, et procede pour la fabriquer
FR2861497B1 (fr) 2003-10-28 2006-02-10 Soitec Silicon On Insulator Procede de transfert catastrophique d'une couche fine apres co-implantation
GB0407531D0 (en) * 2004-04-02 2004-05-05 Univ Loughborough An alloy
FR2889887B1 (fr) 2005-08-16 2007-11-09 Commissariat Energie Atomique Procede de report d'une couche mince sur un support
US9362439B2 (en) * 2008-05-07 2016-06-07 Silicon Genesis Corporation Layer transfer of films utilizing controlled shear region
US8293619B2 (en) 2008-08-28 2012-10-23 Silicon Genesis Corporation Layer transfer of films utilizing controlled propagation
US7811900B2 (en) 2006-09-08 2010-10-12 Silicon Genesis Corporation Method and structure for fabricating solar cells using a thick layer transfer process
US8993410B2 (en) 2006-09-08 2015-03-31 Silicon Genesis Corporation Substrate cleaving under controlled stress conditions
CN1966761B (zh) * 2006-11-03 2010-09-22 广东世创金属科技有限公司 离子镀稀土改性涂层中稀土的加入方法
FR2910179B1 (fr) 2006-12-19 2009-03-13 Commissariat Energie Atomique PROCEDE DE FABRICATION DE COUCHES MINCES DE GaN PAR IMPLANTATION ET RECYCLAGE D'UN SUBSTRAT DE DEPART
AU2008228694B2 (en) * 2007-03-22 2012-03-08 Skaff Corporation Of America, Inc. Mechanical parts having increased wear-resistance
US20090018644A1 (en) * 2007-07-13 2009-01-15 Jan Weber Boron-Enhanced Shape Memory Endoprostheses
GB2450933A (en) * 2007-07-13 2009-01-14 Hauzer Techno Coating Bv Method of providing a hard coating
JP2009120405A (ja) * 2007-11-09 2009-06-04 Canon Inc 紫外光用ガラス組成物及びそれを用いた光学装置
FR2925221B1 (fr) 2007-12-17 2010-02-19 Commissariat Energie Atomique Procede de transfert d'une couche mince
US20090200494A1 (en) * 2008-02-11 2009-08-13 Varian Semiconductor Equipment Associates, Inc. Techniques for cold implantation of carbon-containing species
PL2276591T3 (pl) * 2008-05-05 2013-11-29 Eveready Battery Inc Sposób wytwarzania ostrza golarki
US8330126B2 (en) 2008-08-25 2012-12-11 Silicon Genesis Corporation Race track configuration and method for wafering silicon solar substrates
US8329557B2 (en) 2009-05-13 2012-12-11 Silicon Genesis Corporation Techniques for forming thin films by implantation with reduced channeling
FR2947098A1 (fr) 2009-06-18 2010-12-24 Commissariat Energie Atomique Procede de transfert d'une couche mince sur un substrat cible ayant un coefficient de dilatation thermique different de celui de la couche mince
RU2447194C1 (ru) * 2010-08-03 2012-04-10 Федеральное государственное образовательное учреждение высшего профессионального образования "Алтайский государственный аграрный университет" (АГАУ) Способ химико-термической обработки режущей кромки стального рабочего органа почвообрабатывающего орудия
US20140003959A1 (en) * 2012-06-27 2014-01-02 General Electric Company Modified rotor component and method for modifying a wear characteristic of a rotor component in a turbine system
CN103540945B (zh) * 2013-10-21 2015-07-01 哈尔滨东安发动机（集团）有限公司 薄壁零件氮化变形控制方法
CN106521406B (zh) * 2016-10-21 2018-10-02 清华大学 处理m50轴承钢的方法、强化m50轴承钢以及轴承
CN106521444B (zh) * 2016-10-21 2018-10-02 清华大学 处理M50NiL轴承钢的方法、强化M50NiL轴承钢以及轴承
JP1624793S (de) * 2018-07-24 2019-02-18
CN110042339B (zh) * 2019-06-05 2021-07-06 哈尔滨工程大学 一种降温增速的真空渗碳方法
CN111893431B (zh) * 2020-08-17 2022-12-20 中国人民解放军陆军装甲兵学院 一种具有高抗接触疲劳性能的20Cr2Ni4A渗碳钢及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH277400A (de) * 1948-01-08 1951-08-31 Boehler & Co Ag Geb Verfahren zur Erhöhung des Widerstandes der Oberfläche von Stahlteilen gegen Verschleiss, insbesondere bei hohen Temperaturen.
CH342980A (de) * 1950-11-09 1959-12-15 Berghaus Elektrophysik Anst Verfahren zur Diffusionsbehandlung von Rohren aus Eisen und Stahl oder deren Legierungen
US3341352A (en) * 1962-12-10 1967-09-12 Kenneth W Ehlers Process for treating metallic surfaces with an ionic beam
US3573098A (en) * 1968-05-09 1971-03-30 Boeing Co Ion beam deposition unit
GB1380583A (en) * 1971-01-21 1975-01-15 Gillette Co Cutting edges

Also Published As

Publication number Publication date
CH586287A5 (de) 1977-03-31
AT326971B (de) 1976-01-12
SE401840B (sv) 1978-05-29
FR2195704A1 (de) 1974-03-08
DE2340282C3 (de) 1979-08-23
IE37888L (en) 1974-02-09
JPS547261B2 (de) 1979-04-05
ZA734395B (en) 1974-06-26
GB1423412A (en) 1976-02-04
JPS4958031A (de) 1974-06-05
IT989807B (it) 1975-06-10
US3915757A (en) 1975-10-28
FR2195704B1 (de) 1977-08-26
IE37888B1 (en) 1977-11-09
IL42599A (en) 1977-02-28
DE2340282A1 (de) 1974-02-21
IL42599A0 (en) 1973-08-29
DE2340282B2 (de) 1978-12-21
CA1006844A (en) 1977-03-15

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