US3915757A - Ion plating method and product therefrom - Google Patents

Ion plating method and product therefrom Download PDF

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Publication number
US3915757A
US3915757A US279244A US27924472A US3915757A US 3915757 A US3915757 A US 3915757A US 279244 A US279244 A US 279244A US 27924472 A US27924472 A US 27924472A US 3915757 A US3915757 A US 3915757A
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substrate
metal
ions
coating
carbon
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US279244A
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English (en)
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Niels N Engel
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Individual
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Priority to US279244A priority Critical patent/US3915757A/en
Priority to CA174,527A priority patent/CA1006844A/en
Priority to GB3032873A priority patent/GB1423412A/en
Priority to IL42599A priority patent/IL42599A/en
Priority to ZA734395A priority patent/ZA734395B/xx
Priority to IE1147/73A priority patent/IE37888B1/xx
Priority to IT51344/73A priority patent/IT989807B/it
Priority to FR7328685A priority patent/FR2195704B1/fr
Priority to CH1148473A priority patent/CH586287A5/xx
Priority to AT696173A priority patent/AT326971B/de
Priority to SE7310843A priority patent/SE401840B/xx
Priority to JP8857173A priority patent/JPS547261B2/ja
Priority to DE2340282A priority patent/DE2340282C3/de
Priority to US424672A priority patent/US3925116A/en
Priority to US05/481,486 priority patent/US3953178A/en
Application granted granted Critical
Publication of US3915757A publication Critical patent/US3915757A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/06—Surface hardening
    • C21D1/09—Surface hardening by direct application of electrical or wave energy; by particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C12/00—Solid state diffusion of at least one non-metal element other than silicon and at least one metal element or silicon into metallic material surfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C23C14/582—Thermal treatment using electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5826—Treatment with charged particles
    • C23C14/5833—Ion beam bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment

Definitions

  • the cutting power and edge life of knife blades depend upon the presence of a matrix structure of slightly tempered martensite of high hardness and the embedding of a sufficient number of finely and uniformly distributed carbides in this matrix.
  • the carbon content of the steel substrate has been increased in order to increase the proportion of hard chromium carbides in the structure when used as cutting materials.
  • Other carbide-forming alloying constituents such as molybdenum, tungsten, vanadium, titanium and thelike have also been added to the substrate.
  • Coated substrates provide good cutting tools and wear resistant surfaces. Since corrosion often is a factor causing cutting edges or wear resistant surfaces to decay, alloys or alloying elements increasing corrosion resistance which can be added the substrate are of great benefit.
  • Various techniques have been employed to coat the surface of a substrate with a material, including ion deposition as disclosed in the patents to Hamilton, US. Pat. No. 3,404,084, issued Oct. 1, 1968; Bucek, US. Pat. No. 2,916,409, issued Dec. 8, 1959; and Hanson, et al., US. Pat. No. 3,192,892, issued July 6, 1965.
  • none of these coating techniques included steps for producing a truly superior cutting edge.
  • the present invention includes the steps of cleaning the surface of a steel or iron containing alloy substrate; implanting a sufficient amount of ions of a metal selected from the group consisting of refractory elements (scandium, titanium, zirconium, hafnium, vanadium, columbium, tantalum, chromium, molybdenum and tungsten), the rare-earth elements (lanthanum, cerium, praseodymium, neodymium, promethium, Samarium, europium, gadolinium, terbium, dysprosium, holrnium, erbium, thulium, yttrium, ytterbium and lutetium), the actinide series (actinium, thorium, protactinium, uranium, neptunium, plutonium, americium, curium, berkelium, californium, einsteinium, fermi
  • refractory elements candium, titanium,
  • Another object of the present invention is to provide a method of implanting ions of a metal into a steel or iron containing alloy substrate to form carbides of the metal within the martensite of the hardened substrate, thereby increasing the surface hardness of the substrate to produce an improved cutting tool.
  • Another object of the present invention is to provide a method of ion plating a metal onto the surface of a substrate.
  • a further object of the present invention is to provide a method of carburizing, boriding, nitriding or metallizing an ion plated substrate.
  • a still further object of the present invention is to provide cutting and abrading tools which have superior cutting power, durability, strength and corrosion and wear resistance.
  • Another object of the present invention is to provide a method of ion implanting which is adaptable to substrates of steel or iron containing alloys.
  • An object of the present invention is to provide an iron plated product which is very resistant to thermal shock.
  • Another object of the present invention is to provide an improved cutting edge which has a low coefficient of friction.
  • Ion implanting in any metal generally cause an increase in the hardness and strength of the metal.'lon implantation into a carbon containing steel combined with a hardening treatment leads to a superhard martensite independent of the implanted material.
  • the carbon content of the substrate should range from 0.3 to 1.8% by weight, with the optimum range being from 0.5 to 0.8% by weight.
  • a substrate having a carbon content below 0.3% is called mild steel and is too soft for cutting tools and various wear resistant objects. Their coats will easily break down if the support or substrate is much softer and weaker than the coating itself. Therefore, substrates should be hard, preferably hardened steel. There is actually no maximum limit of the carbon percentage within the substrate; it depends on how brittle it is desired that the substrate be after it has been quenched as discussed below.
  • the substrate used in the present invention can be any steel or iron containing alloy.
  • the ion implantation yields the advantage that the hardened matrix is harder than martensite obtained by normal hardening methods.
  • Ion plating combined with a hardening of the ion implanted matrix constitutes a method to obtain the hardest coats on a superhard matrix, which cannot be obtained by any other method. At the same time, the adherence between coat and matrix is better than can be obtained by any other method.
  • the first step in the ion plating process of the present invention is to clean the substrate.
  • the substrate is cleaned by any suitable method and then is quickly mounted on a metal holder with the edges to be ion plated exposed.
  • the holder is transferred to a vacuum chamber for ion implantation and plating wherein the substrate forms the cathode.
  • the chamber is pumped down to a vacuum of 2 l0 rnml-Ig or better with frequent flushing with argon gas. Such a low pressure is necessary to support the plasma that is created therein as described below.
  • Argon gas is let into the chamber.
  • An electrical potential is then applied to the cathode (substrate) and is gradually increased until a pink argon plasma is formed.
  • Argon is used as it will not react with the substrate or with the ion plating material and is heavy so as to increase the impact force of the ions on the substrate whereby better cleaning action is achieved.
  • the plasma forming starts in the range of lKV and 50 mamps and can then be maintained to much lower potentials.
  • the power setting can be varied according to the needs.
  • the object to be ion plated is first ion cleaned with the argon plasma.
  • the ion plating material on a filament (such as a tungsten wire) or from a pool of melted metal heated by an electron gun forms the anode within the chamber.
  • a filament such as a tungsten wire
  • an electron gun By passing sufficient current through this filament while the argon plasma is holding, the filament (anode) is gradually heated until the material on the anode melts and, aided by the substantial vacuum within the chamber, then vaporizes.
  • These ionized particles are attracted to the cathode (object to be ion plated) due to the great potential difference (which can vary from 500V to 50,000V), and thus, ion implantation and/or plating is accomplished.
  • the first ions that strike the substrate surface are implanted within the substrate and cause a gradual transition between the substrate and the surface. As the substrate becomes saturated by the ion implantation, the remainder of the ions are deposited on the substrate surface.
  • the penetration depth of the ion implantation into the substrate depends on the hardness of the substrate. Generally a substrate having a hardness of less than 50 Rockwell C is preferred.
  • the implanted ions react with the carbon present in the substrate, it is not known at this time whether they form a precipitate or are in solution within the crystalline lattice of the substrate. This is due to the fact that compounds formed by the implanted ions are too small to be observed by present day methods.
  • the time of ion plating can be varied from fractions of seconds to several minutes. During the ion plating process, the pressure in the chamber does drop somewhat, but should be maintained at the right level by adjusting the argon pressure or metal vaporization.
  • the above ion plating procedure can be performed on a number of steel or iron containing alloys, such as razor blades, industrial blades, band saws, files, nails, etc., as well as other metals and shapes including meat chopper plates.
  • Ion Plating Materials A wide range of elements can be ion plated onto the substrate. These include all of the refractory elements (scandium, titanium, zirconium, hafnium, vanadium, columbium, tantalum, chromium, molybdenum and tungsten) the rare-earth elements (lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium,
  • actinide series actinium, thorium, protactinium, uranium, neptunium, plutonium, americium, curium, berkelium, californium, einsteinium, fermium, rnendelevium, nobelium, and lawrencium
  • iron, cobalt, nickel and boron Some of these metals require a high powdered vaporization unit, such as an electron gun, in order to evaporate the same. In industrial production, electron gun vaporization would be preferred.
  • Carburizing, Boriding, Nitriding, and Metallizing Wear resistant and corrosion resistant cutting edges are obtained with superhard materials which can be added to the ion implanted substrate surface.
  • the hardest known materials are carbides, borides, and nitrides and compounds of transistion elements with second period elements, for example TiC, ScN, VC, Cr C TiB, B C, and EN.
  • any metal included in the above list of ion plating materials, other than the metal already plated on the substrate can be added to the ion implanted substrate surface. These materials can be added to the substrate as compounds; however, they are very stable and diflicult to evaporate. The best procedure is to ion plate the pure metal (Ti, Cr, B, Sc, etc.) onto the substrate, and then convert the metal to the respective carbide, boride or nitride.
  • carbon is the best material to react with titanium, boron with vanadium and nitrogen with scandium.
  • the carburizing, boriding, nitriding or metallizing must be accomplished in an oxygen free atmosphere, because an oxide of the metal coating on the substrate might be formed which would be more brittle then the carbide, boride or nitride of that metal.
  • Carburizing can occur in a number of ways: a gas containing carbon, such as any hydrocarbon, can be heated up with the coated substrate at a temperature ranging from 600900C (usually above 800C) whereby the carbon and the metal coating react to form a carbide, such as TiC, etc.
  • a gas containing carbon such as any hydrocarbon
  • the coated substrate can also be carburized by any other suitable means such as by any conventional box, cyanide or gas carburizing method. It can also be treated in a plasma formed by a nitrogen-propane mixture (or any other carburizing gas mixture including carbon evaporated from an arc.)
  • Hardening The last step is hardening of the carburized, borided, nitrided or metallized substrate to bring the substrat to the martensitic state.
  • Hardening can be accomplished by any conventional means, such as quenching in water (e.g., heating the substrate to the austenite range and cooling it with a super critical cooling velocity), by induction or by impulse hardening.
  • Hardening can be carried out as a separate process after alloying the coat or in a. combined process. Superior properties have been obtained by a fast heating of the cutting edge or a sawtip and quenching in a cooling agent or by using the matrix as a heat sink.
  • Thickness of Ion Implantation The penetration depth of the ions within the substrate can be controlled by a numer of factors such as speed of vaporization, time, potential, pressure and gecan therefore absorb impinging atoms to penetrate below the surface.
  • An advantage of the present invention is that it produces an adhesion between the coating and the sub- 5 eater than the stren th of the subometry.
  • the penetration depth usually runs from 1 to strata whlch 18 gr g 20 mils thick strate.
  • Glue was placed on a portion of the coated substrate.
  • either the substrate or the glue broke Knoop hardness of 850-900, with 1,000 being the apt under the tension.
  • Cutting edges or abrasive materlals treated in accordance with the resent invention tel-face never dld break p
  • the method of this invention produces a coating on have a martenslte with a Knoop hardness WhlCh 1s a substrate WhICh is very resistant to thermal shock. Exgreater than 1,200.
  • WhlCh 1s a substrate WhICh is very resistant to thermal shock. Exgreater than 1,200.
  • titanium carbide that imparts the very high either the coating or the JOIIlt. This can be obtained by hardness on the superhard martenslte matrix.
  • a coat mafi g 2: 2: 2 g iz g i g terial with a low coefficient of friction will prevent p a we heating through rubbing such as with chopper plates in tenslte obtained in mckel and H011 ion plated steel ret (H t h d Th ti l d d meat cutting.
  • a titanium carbide coat, for example, g e y a c i n e i yields both advantages simultaneously and, therefore, su Sequel! y car S ,aces cu gass mos as increases the resistance to thermal shock. well as diamonds.
  • a method of producing a coating on a substrate comprising the steps of:
  • a method as claimed in claim 1 including the step of cleaning the surface of said substrate prior to step (a).
  • a method as claimed in claim 2 including after step d, the steps of heating said substrate to the austenite range of the substrate and cooling it with a super critical cooling velocity.
  • a method of producing a coated body comprising the steps of:
  • a method of producing a coated body comprising the steps of:
  • a hardening chemical selected from the group consisting of carbon, boron, nitrogen and a selected one of the metals with which said coat is reactive other than said bombarding metal.
  • a method of producing a coated body comprising the steps of:
  • a method of producing a coating on a steel substrate comprising the steps of:
  • a method of producing a coating on a substrate comprising the steps of:

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Chemical Vapour Deposition (AREA)
US279244A 1972-08-09 1972-08-09 Ion plating method and product therefrom Expired - Lifetime US3915757A (en)

Priority Applications (15)

Application Number Priority Date Filing Date Title
US279244A US3915757A (en) 1972-08-09 1972-08-09 Ion plating method and product therefrom
CA174,527A CA1006844A (en) 1972-08-09 1973-06-20 Ion plating method and product therefrom
GB3032873A GB1423412A (en) 1972-08-09 1973-06-26 Ion plating method and product therefrom
IL42599A IL42599A (en) 1972-08-09 1973-06-26 Ion plating method and product therefrom
ZA734395A ZA734395B (en) 1972-08-09 1973-06-27 Ion plating method and product therefrom
IE1147/73A IE37888B1 (en) 1972-08-09 1973-07-06 Ion plating method and product therefrom
IT51344/73A IT989807B (it) 1972-08-09 1973-07-09 Metodo di placcatura ionica e prodotto ottenuto con esso
FR7328685A FR2195704B1 (de) 1972-08-09 1973-08-06
CH1148473A CH586287A5 (de) 1972-08-09 1973-08-08
AT696173A AT326971B (de) 1972-08-09 1973-08-08 Verfahren zur herstellung eines uberzuges auf einem substrat
SE7310843A SE401840B (sv) 1972-08-09 1973-08-08 Pleterad metallprodukt samt forfarande for framstellning av en sadan produkt
JP8857173A JPS547261B2 (de) 1972-08-09 1973-08-08
DE2340282A DE2340282C3 (de) 1972-08-09 1973-08-09 Verfahren zum Härten der Oberfläche eines Substrats durch Implantieren von Metallionen in die Oberfläche des Substrats und Aufbringen eines Metallüberzugs
US424672A US3925116A (en) 1972-08-09 1973-12-14 Superhard martensite and method of making the same
US05/481,486 US3953178A (en) 1972-08-09 1974-06-21 Coated metal product

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US279244A US3915757A (en) 1972-08-09 1972-08-09 Ion plating method and product therefrom

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US42467272A Continuation-In-Part 1972-12-14 1972-12-14
US05/481,486 Division US3953178A (en) 1972-08-09 1974-06-21 Coated metal product

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US3915757A true US3915757A (en) 1975-10-28

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US279244A Expired - Lifetime US3915757A (en) 1972-08-09 1972-08-09 Ion plating method and product therefrom

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US (1) US3915757A (de)
JP (1) JPS547261B2 (de)
AT (1) AT326971B (de)
CA (1) CA1006844A (de)
CH (1) CH586287A5 (de)
DE (1) DE2340282C3 (de)
FR (1) FR2195704B1 (de)
GB (1) GB1423412A (de)
IE (1) IE37888B1 (de)
IL (1) IL42599A (de)
IT (1) IT989807B (de)
SE (1) SE401840B (de)
ZA (1) ZA734395B (de)

Cited By (91)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4022947A (en) * 1975-11-06 1977-05-10 Airco, Inc. Transparent panel having high reflectivity for solar radiation and a method for preparing same
US4352698A (en) * 1979-12-03 1982-10-05 United Kingdom Atomic Energy Authority Method of improving the wear resistance of metals
US4377734A (en) * 1979-10-13 1983-03-22 Mitsubishi Denki Kabushiki Kaisha Method for forming patterns by plasma etching
EP0089818A2 (de) * 1982-03-23 1983-09-28 United Kingdom Atomic Energy Authority Beschichtung von Schneideklingen
US4466991A (en) * 1946-07-17 1984-08-21 Vsesojuzny Nauchno-Issledovatelsky Instrumentalny Institut Cutting tool hardening method
US4486247A (en) * 1982-06-21 1984-12-04 Westinghouse Electric Corp. Wear resistant steel articles with carbon, oxygen and nitrogen implanted in the surface thereof
US4507189A (en) * 1980-11-06 1985-03-26 Sumitomo Electric Industries, Ltd. Process of physical vapor deposition
US4532149A (en) * 1981-10-21 1985-07-30 The United States Of America As Represented By The United States Department Of Energy Method for producing hard-surfaced tools and machine components
US4634600A (en) * 1984-06-29 1987-01-06 Sumitomo Electric Industries, Ltd. Surface treatment process
US4645715A (en) * 1981-09-23 1987-02-24 Energy Conversion Devices, Inc. Coating composition and method
US4737234A (en) * 1986-08-18 1988-04-12 Westinghouse Electric Corp. Method and apparatus for permanently recording high neutron fluence
US4744938A (en) * 1986-08-18 1988-05-17 Westinghouse Electric Corp. Method and apparatus for producing ultralowmass fissionable deposits for reactor neutron dosimetry by recoil ion-implantation
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AT326971B (de) 1976-01-12
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FR2195704A1 (de) 1974-03-08
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IE37888L (en) 1974-02-09
JPS547261B2 (de) 1979-04-05
ZA734395B (en) 1974-06-26
GB1423412A (en) 1976-02-04
JPS4958031A (de) 1974-06-05
IT989807B (it) 1975-06-10
FR2195704B1 (de) 1977-08-26
IE37888B1 (en) 1977-11-09
IL42599A (en) 1977-02-28
DE2340282A1 (de) 1974-02-21
ATA696173A (de) 1975-03-15
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DE2340282B2 (de) 1978-12-21
CA1006844A (en) 1977-03-15

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