AT324426B - Verfahren zum herstellen eines pnp-silizium-transistors - Google Patents
Verfahren zum herstellen eines pnp-silizium-transistorsInfo
- Publication number
- AT324426B AT324426B AT37971A AT37971A AT324426B AT 324426 B AT324426 B AT 324426B AT 37971 A AT37971 A AT 37971A AT 37971 A AT37971 A AT 37971A AT 324426 B AT324426 B AT 324426B
- Authority
- AT
- Austria
- Prior art keywords
- manufacturing
- silicon transistor
- pnp silicon
- pnp
- transistor
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/12—Diffusion of dopants within, into or out of semiconductor bodies or layers between a solid phase and a gaseous phase
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/17—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
- H10P32/171—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being group IV material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
- H10W74/43—Encapsulations, e.g. protective coatings characterised by their materials comprising oxides, nitrides or carbides, e.g. ceramics or glasses
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/928—Front and rear surface processing
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19702008319 DE2008319A1 (de) | 1970-02-23 | 1970-02-23 | Verfahren zum Herstellen eines pnp Silicium Transistors |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AT324426B true AT324426B (de) | 1975-08-25 |
Family
ID=5763100
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT37971A AT324426B (de) | 1970-02-23 | 1971-01-18 | Verfahren zum herstellen eines pnp-silizium-transistors |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3791884A (de) |
| AT (1) | AT324426B (de) |
| CH (1) | CH518007A (de) |
| DE (1) | DE2008319A1 (de) |
| FR (1) | FR2081028A1 (de) |
| GB (1) | GB1316712A (de) |
| NL (1) | NL7100179A (de) |
| SE (1) | SE356847B (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4416051A (en) * | 1979-01-22 | 1983-11-22 | Westinghouse Electric Corp. | Restoration of high infrared sensitivity in extrinsic silicon detectors |
| US4233093A (en) * | 1979-04-12 | 1980-11-11 | Pel Chow | Process for the manufacture of PNP transistors high power |
| EP0229180B1 (de) * | 1985-06-17 | 1992-01-22 | Sony Corporation | Herstellungsverfahren für halbleiteranordnungen |
| US5789308A (en) * | 1995-06-06 | 1998-08-04 | Advanced Micro Devices, Inc. | Manufacturing method for wafer slice starting material to optimize extrinsic gettering during semiconductor fabrication |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3418181A (en) * | 1965-10-20 | 1968-12-24 | Motorola Inc | Method of forming a semiconductor by masking and diffusing |
| GB1209914A (en) * | 1967-03-29 | 1970-10-21 | Marconi Co Ltd | Improvements in or relating to semi-conductor devices |
| US3669768A (en) * | 1969-12-04 | 1972-06-13 | Bell Telephone Labor Inc | Fabrication process for light sensitive silicon diode array target |
-
1970
- 1970-02-23 DE DE19702008319 patent/DE2008319A1/de active Pending
- 1970-12-16 CH CH1862570A patent/CH518007A/de not_active IP Right Cessation
-
1971
- 1971-01-07 NL NL7100179A patent/NL7100179A/xx unknown
- 1971-01-18 AT AT37971A patent/AT324426B/de not_active IP Right Cessation
- 1971-02-19 US US00116943A patent/US3791884A/en not_active Expired - Lifetime
- 1971-02-23 FR FR7106046A patent/FR2081028A1/fr not_active Withdrawn
- 1971-02-23 SE SE02303/71A patent/SE356847B/xx unknown
- 1971-04-19 GB GB2166371A patent/GB1316712A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US3791884A (en) | 1974-02-12 |
| DE2008319A1 (de) | 1971-09-09 |
| NL7100179A (de) | 1971-08-25 |
| GB1316712A (en) | 1973-05-16 |
| CH518007A (de) | 1972-01-15 |
| SE356847B (de) | 1973-06-04 |
| FR2081028A1 (de) | 1971-11-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ELJ | Ceased due to non-payment of the annual fee |