ZA965867B - Sulfonamido substituted acetal polymers and use thereof in photo-sensitive compositions and lithographic printing plates - Google Patents

Sulfonamido substituted acetal polymers and use thereof in photo-sensitive compositions and lithographic printing plates

Info

Publication number
ZA965867B
ZA965867B ZA965867A ZA965867A ZA965867B ZA 965867 B ZA965867 B ZA 965867B ZA 965867 A ZA965867 A ZA 965867A ZA 965867 A ZA965867 A ZA 965867A ZA 965867 B ZA965867 B ZA 965867B
Authority
ZA
South Africa
Prior art keywords
photo
lithographic printing
printing plates
sensitive compositions
acetal polymers
Prior art date
Application number
ZA965867A
Other languages
English (en)
Inventor
Hans-Joachim Timpe
Udo Dwars
Harald Baumann
Celin M Savariar-Hauck
Original Assignee
Sun Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sun Chemical Corp filed Critical Sun Chemical Corp
Publication of ZA965867B publication Critical patent/ZA965867B/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/34Introducing sulfur atoms or sulfur-containing groups
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0215Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
ZA965867A 1995-07-10 1996-07-10 Sulfonamido substituted acetal polymers and use thereof in photo-sensitive compositions and lithographic printing plates ZA965867B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19525050A DE19525050C2 (de) 1995-07-10 1995-07-10 Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten

Publications (1)

Publication Number Publication Date
ZA965867B true ZA965867B (en) 1997-06-17

Family

ID=7766427

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA965867A ZA965867B (en) 1995-07-10 1996-07-10 Sulfonamido substituted acetal polymers and use thereof in photo-sensitive compositions and lithographic printing plates

Country Status (6)

Country Link
US (2) US5698360A (fr)
EP (1) EP0757061B1 (fr)
AT (1) ATE196299T1 (fr)
CA (1) CA2180580A1 (fr)
DE (2) DE19525050C2 (fr)
ZA (1) ZA965867B (fr)

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DE19847616C2 (de) * 1998-10-15 2001-05-10 Kodak Polychrome Graphics Gmbh Polyvinylacetale mit Imidogruppen sowie die Verwendung derselben in lichtempfindlichen Zusammensetzungen
US7039920B2 (en) * 2000-07-03 2006-05-02 Oculus Technologies Corporation Method and apparatus for providing a search engine for optimizing a decentralized or emergent model on a computer network
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US6802258B2 (en) * 2000-12-07 2004-10-12 Agfa-Gevaert Method of lithographic printing with a reusable substrate
US6458503B1 (en) * 2001-03-08 2002-10-01 Kodak Polychrome Graphics Llc Fluorinated aromatic acetal polymers and photosensitive compositions containing such polymers
US6596456B2 (en) 2001-05-29 2003-07-22 Kodak Polychrome Graphics Llc Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates
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US6821583B2 (en) 2002-07-03 2004-11-23 Kodak Polychrome Graphics Llc Imageable element for single fluid ink
DE10239505B4 (de) * 2002-08-28 2005-05-04 Kodak Polychrome Graphics Gmbh Wärmeempfindlicher positiv arbeitender Lithographie-Druckplattenvorläufer mit hoher Chemikalienbeständigkeit
US7217502B2 (en) * 2003-03-27 2007-05-15 Eastman Kodak Company Nanopastes for use as patterning compositions
US7081322B2 (en) * 2003-03-27 2006-07-25 Kodak Graphics Communications Canada Company Nanopastes as ink-jet compositions for printing plates
US6921626B2 (en) * 2003-03-27 2005-07-26 Kodak Polychrome Graphics Llc Nanopastes as patterning compositions for electronic parts
US7094503B2 (en) * 2003-03-27 2006-08-22 Kodak Graphics Communications Canada Company Nanopastes for use as patterning compositions
CN101218263B (zh) * 2005-06-03 2011-06-15 美洲染料资源公司 热反应性近红外吸收的缩醛共聚物及其制备和使用方法
EP2366545B1 (fr) 2010-03-19 2012-12-05 Agfa Graphics N.V. Précurseur de plaque d'impression lithographique
WO2014106554A1 (fr) 2013-01-01 2014-07-10 Agfa Graphics Nv Copolymères (éthylène, acétal vinylique) et leur utilisation dans des précurseurs de plaque d'impression lithographique
EP2933278B1 (fr) 2014-04-17 2018-08-22 Agfa Nv Copolymères (éthylène, acétal de vinyle) et leur utilisation dans des précurseurs de plaque d'impression lithographique
EP2944657B1 (fr) 2014-05-15 2017-01-11 Agfa Graphics Nv Copolymères (éthylène, acétal de vinyle) et leur utilisation dans des précurseurs de plaque d'impression lithographique
EP2955198B8 (fr) 2014-06-13 2018-01-03 Agfa Nv Copolymères d'éthylène et d'acétal de vinyle et leur utilisation dans des précurseurs de plaques d'impression lithographique
EP2963496B1 (fr) 2014-06-30 2017-04-05 Agfa Graphics NV Précurseur de plaque d'impression lithographique comprenant des copolymères (éthylène, acétal de vinyle)
JP2020064082A (ja) 2017-02-17 2020-04-23 富士フイルム株式会社 ポジ型平版印刷版原版、及び、平版印刷版の作製方法

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Also Published As

Publication number Publication date
DE19525050C2 (de) 1999-11-11
EP0757061A2 (fr) 1997-02-05
US5698360A (en) 1997-12-16
CA2180580A1 (fr) 1997-01-11
EP0757061A3 (fr) 1998-04-15
DE19525050A1 (de) 1997-01-30
ATE196299T1 (de) 2000-09-15
DE69610271D1 (de) 2000-10-19
DE69610271T2 (de) 2001-01-25
EP0757061B1 (fr) 2000-09-13
US5849842A (en) 1998-12-15

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