ZA965867B - Sulfonamido substituted acetal polymers and use thereof in photo-sensitive compositions and lithographic printing plates - Google Patents
Sulfonamido substituted acetal polymers and use thereof in photo-sensitive compositions and lithographic printing platesInfo
- Publication number
- ZA965867B ZA965867B ZA965867A ZA965867A ZA965867B ZA 965867 B ZA965867 B ZA 965867B ZA 965867 A ZA965867 A ZA 965867A ZA 965867 A ZA965867 A ZA 965867A ZA 965867 B ZA965867 B ZA 965867B
- Authority
- ZA
- South Africa
- Prior art keywords
- photo
- lithographic printing
- printing plates
- sensitive compositions
- acetal polymers
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/34—Introducing sulfur atoms or sulfur-containing groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
- G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19525050A DE19525050C2 (de) | 1995-07-10 | 1995-07-10 | Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA965867B true ZA965867B (en) | 1997-06-17 |
Family
ID=7766427
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA965867A ZA965867B (en) | 1995-07-10 | 1996-07-10 | Sulfonamido substituted acetal polymers and use thereof in photo-sensitive compositions and lithographic printing plates |
Country Status (6)
Country | Link |
---|---|
US (2) | US5698360A (fr) |
EP (1) | EP0757061B1 (fr) |
AT (1) | ATE196299T1 (fr) |
CA (1) | CA2180580A1 (fr) |
DE (2) | DE19525050C2 (fr) |
ZA (1) | ZA965867B (fr) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19639897A1 (de) * | 1996-09-27 | 1998-04-02 | Sun Chemical Corp | Wasserlösliche und sauerstoffsperrende Polymerschichten und deren Verwendung für lichtempfindliche Materialien |
DE19644515A1 (de) * | 1996-10-25 | 1998-06-25 | Sun Chemical Corp | Amidosubstituierte Acetalpolymere und Verwendung derselben in photoempfindlichen Zusammensetzungen und lithographischen Druckplatten |
DE19847616C2 (de) * | 1998-10-15 | 2001-05-10 | Kodak Polychrome Graphics Gmbh | Polyvinylacetale mit Imidogruppen sowie die Verwendung derselben in lichtempfindlichen Zusammensetzungen |
US7039920B2 (en) * | 2000-07-03 | 2006-05-02 | Oculus Technologies Corporation | Method and apparatus for providing a search engine for optimizing a decentralized or emergent model on a computer network |
US6777155B2 (en) * | 2000-10-03 | 2004-08-17 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic printing plate |
JP4248137B2 (ja) * | 2000-11-22 | 2009-04-02 | 富士フイルム株式会社 | ネガ型感光性平版印刷版 |
US6802258B2 (en) * | 2000-12-07 | 2004-10-12 | Agfa-Gevaert | Method of lithographic printing with a reusable substrate |
US6458503B1 (en) * | 2001-03-08 | 2002-10-01 | Kodak Polychrome Graphics Llc | Fluorinated aromatic acetal polymers and photosensitive compositions containing such polymers |
US6596456B2 (en) | 2001-05-29 | 2003-07-22 | Kodak Polychrome Graphics Llc | Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates |
US6562527B2 (en) * | 2001-08-17 | 2003-05-13 | Kodak Polychrome Graphics Llc | Imaged members and method of preparation thereof |
US6821583B2 (en) | 2002-07-03 | 2004-11-23 | Kodak Polychrome Graphics Llc | Imageable element for single fluid ink |
DE10239505B4 (de) * | 2002-08-28 | 2005-05-04 | Kodak Polychrome Graphics Gmbh | Wärmeempfindlicher positiv arbeitender Lithographie-Druckplattenvorläufer mit hoher Chemikalienbeständigkeit |
US7217502B2 (en) * | 2003-03-27 | 2007-05-15 | Eastman Kodak Company | Nanopastes for use as patterning compositions |
US7081322B2 (en) * | 2003-03-27 | 2006-07-25 | Kodak Graphics Communications Canada Company | Nanopastes as ink-jet compositions for printing plates |
US6921626B2 (en) * | 2003-03-27 | 2005-07-26 | Kodak Polychrome Graphics Llc | Nanopastes as patterning compositions for electronic parts |
US7094503B2 (en) * | 2003-03-27 | 2006-08-22 | Kodak Graphics Communications Canada Company | Nanopastes for use as patterning compositions |
CN101218263B (zh) * | 2005-06-03 | 2011-06-15 | 美洲染料资源公司 | 热反应性近红外吸收的缩醛共聚物及其制备和使用方法 |
EP2366545B1 (fr) | 2010-03-19 | 2012-12-05 | Agfa Graphics N.V. | Précurseur de plaque d'impression lithographique |
WO2014106554A1 (fr) | 2013-01-01 | 2014-07-10 | Agfa Graphics Nv | Copolymères (éthylène, acétal vinylique) et leur utilisation dans des précurseurs de plaque d'impression lithographique |
EP2933278B1 (fr) | 2014-04-17 | 2018-08-22 | Agfa Nv | Copolymères (éthylène, acétal de vinyle) et leur utilisation dans des précurseurs de plaque d'impression lithographique |
EP2944657B1 (fr) | 2014-05-15 | 2017-01-11 | Agfa Graphics Nv | Copolymères (éthylène, acétal de vinyle) et leur utilisation dans des précurseurs de plaque d'impression lithographique |
EP2955198B8 (fr) | 2014-06-13 | 2018-01-03 | Agfa Nv | Copolymères d'éthylène et d'acétal de vinyle et leur utilisation dans des précurseurs de plaques d'impression lithographique |
EP2963496B1 (fr) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | Précurseur de plaque d'impression lithographique comprenant des copolymères (éthylène, acétal de vinyle) |
JP2020064082A (ja) | 2017-02-17 | 2020-04-23 | 富士フイルム株式会社 | ポジ型平版印刷版原版、及び、平版印刷版の作製方法 |
Family Cites Families (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2179051A (en) * | 1935-09-26 | 1939-11-07 | Shawinigan Chem Ltd | Process of making polyvinyl acetal resins |
US3043692A (en) * | 1958-12-17 | 1962-07-10 | Polaroid Corp | Photographic products and processes |
US3674464A (en) * | 1970-03-27 | 1972-07-04 | Gte Sylvania Inc | Process for removing copper from molybdenum |
US3647464A (en) * | 1970-04-22 | 1972-03-07 | Eastman Kodak Co | Sulfonated poly(vinyl alcohol) derivatives as absorbent layers in photographic processing webs |
DE2053364A1 (de) * | 1970-10-30 | 1972-05-04 | Kalle Ag, 6202 Wiesbaden-Biebrich | Lichtempfindliche Kopiermasse |
US4123276A (en) * | 1974-02-28 | 1978-10-31 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
JPS549619A (en) * | 1977-06-23 | 1979-01-24 | Oji Paper Co | Photosensitive composition |
FR2401941A1 (fr) * | 1977-08-31 | 1979-03-30 | Saint Gobain | Procede de fabrication de polyvinyl butyral et polyvinyl butyral obtenu par ce procede |
JPS564144A (en) * | 1979-06-23 | 1981-01-17 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition |
US4355096A (en) * | 1980-07-11 | 1982-10-19 | American Hoechst Corporation | Process for heating exposed and developed light-sensitive lithographic printing plates with carboxylic acid and amine moiety containing compounds on surface thereof |
DE3036077A1 (de) * | 1980-09-25 | 1982-05-06 | Hoechst Ag, 6000 Frankfurt | Lichthaertbares gemisch und damit hergestelltes lichtempfindliches kopiermaterial |
JPS58150950A (ja) * | 1982-03-03 | 1983-09-07 | Konishiroku Photo Ind Co Ltd | ハロゲン化銀カラ−写真感光材料 |
JPS5953836A (ja) * | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
US4511640A (en) * | 1983-08-25 | 1985-04-16 | American Hoechst Corporation | Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer |
DE3404366A1 (de) * | 1984-02-08 | 1985-08-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
JPH0782236B2 (ja) * | 1984-10-12 | 1995-09-06 | 三菱化学株式会社 | 感光性組成物 |
US4618562A (en) * | 1984-12-27 | 1986-10-21 | American Hoechst Corporation | Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor |
DE3678050D1 (de) * | 1985-06-07 | 1991-04-18 | Fuji Photo Film Co Ltd | Hoergeraet mit einer schwenkbaren klappe. |
US4665124A (en) * | 1985-08-02 | 1987-05-12 | American Hoechst Corporation | Resin |
US4670507A (en) * | 1985-08-02 | 1987-06-02 | American Hoechst Corporation | Resin |
CA1308595C (fr) * | 1985-11-22 | 1992-10-13 | Toshiaki Aoai | Composition photosensible |
JPH0693116B2 (ja) * | 1986-01-21 | 1994-11-16 | 富士写真フイルム株式会社 | 感光性組成物 |
US4877711A (en) * | 1986-05-19 | 1989-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group |
DE3644162A1 (de) * | 1986-12-23 | 1988-07-07 | Hoechst Ag | Polyvinylacetal, dieses enthaltendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE3644163A1 (de) * | 1986-12-23 | 1988-07-07 | Hoechst Ag | Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
JPH0727208B2 (ja) * | 1987-04-20 | 1995-03-29 | 富士写真フイルム株式会社 | 感光性組成物 |
JPH087438B2 (ja) * | 1988-03-11 | 1996-01-29 | 富士写真フイルム株式会社 | 感光性組成物 |
DE3903001A1 (de) * | 1989-02-02 | 1990-08-16 | Hoechst Ag | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
US5260161A (en) * | 1989-05-06 | 1993-11-09 | Konica Corporation | Photosensitive composition and photosensitive lithographic printing plate comprising in admixture a tetrapolymer and a diazo resin |
US5112743A (en) * | 1989-05-24 | 1992-05-12 | Fuji Photo Film Co., Ltd. | Light-sensitive composition and presensitized plate for use in making lithographic printing plates |
DE3920230A1 (de) * | 1989-06-21 | 1991-01-24 | Hoechst Ag | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
US5238772A (en) * | 1989-06-21 | 1993-08-24 | Hoechst Aktiengesellschaft | Photopolymerizable mixture and recording material containing free-radically polymerizable compound, photosensitive polymerization initiator and polyurethane binder grafted with vinyl alcohol and vinyl acetal units |
DE3927632A1 (de) * | 1989-08-22 | 1991-02-28 | Basf Ag | Umsetzungsprodukt, verfahren zu dessen herstellung und damit erhaltenes strahlungsempfindliches material |
DE3928825A1 (de) * | 1989-08-31 | 1991-03-07 | Hoechst Ag | Pfropfpolymerisat mit ungesaettigten seitenketten, dieses enthaltendes lichtempfindliches gemisch sowie daraus hergestelltes aufzeichnungsmaterial |
JP2739390B2 (ja) * | 1990-11-21 | 1998-04-15 | 富士写真フイルム株式会社 | 平版印刷版の製造方法 |
DE69206806T2 (de) * | 1991-07-30 | 1996-08-08 | Eastman Kodak Co | Sauere-substituierte ternaere-acetalpolymere und verwendung zu lichtempfindlichen gemischen und lithographischen druckplatten |
US5219699A (en) * | 1991-07-30 | 1993-06-15 | Eastman Kodak Company | Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymers |
US5169897A (en) * | 1991-07-30 | 1992-12-08 | Eastman Kodak Company | Binary acetal polymers useful in photosensitive compositions and lithographic printing plates |
US5262270A (en) * | 1991-07-30 | 1993-11-16 | Eastman Kodak Company | Photosensitive compositions and lithographic printing plates containing binary acetal polymers |
JPH05150453A (ja) * | 1991-11-27 | 1993-06-18 | Fuji Photo Film Co Ltd | 感光性組成物 |
US5360864A (en) * | 1992-05-04 | 1994-11-01 | Ulano Corporation | Process for preparation of photosensitive composition |
US5326669A (en) * | 1992-05-04 | 1994-07-05 | Ulano Corporation | Photosensitive compositions |
US5445916A (en) * | 1992-06-02 | 1995-08-29 | Ulano Corporation | Photosensitive compositions |
US5275907A (en) * | 1992-07-23 | 1994-01-04 | Eastman Kodak Company | Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymer and copolyester with reduced propensity to blinding |
US5316892A (en) * | 1992-07-23 | 1994-05-31 | Eastman Kodak Company | Method for developing lithographic printing plates |
DE4235151A1 (de) * | 1992-10-19 | 1994-04-21 | Hoechst Ag | Polyvinylacetale, die emulgatorfreie wäßrige Dispersionen und redispergierbare trockene Pulver bilden können, Verfahren zu ihrer Herstellung und ihre Verwendung |
US5534381A (en) * | 1995-07-06 | 1996-07-09 | Minnesota Mining And Manufacturing Company | Acetal polymers useful in photosensitive compositions |
DE19524851C2 (de) * | 1995-07-07 | 1998-05-07 | Sun Chemical Corp | Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und für lithographische Druckplatten |
-
1995
- 1995-07-10 DE DE19525050A patent/DE19525050C2/de not_active Expired - Fee Related
-
1996
- 1996-07-05 CA CA002180580A patent/CA2180580A1/fr not_active Abandoned
- 1996-07-09 AT AT96111023T patent/ATE196299T1/de active
- 1996-07-09 EP EP96111023A patent/EP0757061B1/fr not_active Expired - Lifetime
- 1996-07-09 DE DE69610271T patent/DE69610271T2/de not_active Expired - Fee Related
- 1996-07-10 US US08/677,703 patent/US5698360A/en not_active Expired - Fee Related
- 1996-07-10 ZA ZA965867A patent/ZA965867B/xx unknown
-
1997
- 1997-08-22 US US08/917,057 patent/US5849842A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE19525050C2 (de) | 1999-11-11 |
EP0757061A2 (fr) | 1997-02-05 |
US5698360A (en) | 1997-12-16 |
CA2180580A1 (fr) | 1997-01-11 |
EP0757061A3 (fr) | 1998-04-15 |
DE19525050A1 (de) | 1997-01-30 |
ATE196299T1 (de) | 2000-09-15 |
DE69610271D1 (de) | 2000-10-19 |
DE69610271T2 (de) | 2001-01-25 |
EP0757061B1 (fr) | 2000-09-13 |
US5849842A (en) | 1998-12-15 |
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