ZA903559B - Method for preparing lithographically sensitive branched novolaks - Google Patents
Method for preparing lithographically sensitive branched novolaksInfo
- Publication number
- ZA903559B ZA903559B ZA903559A ZA903559A ZA903559B ZA 903559 B ZA903559 B ZA 903559B ZA 903559 A ZA903559 A ZA 903559A ZA 903559 A ZA903559 A ZA 903559A ZA 903559 B ZA903559 B ZA 903559B
- Authority
- ZA
- South Africa
- Prior art keywords
- preparing
- novolaks
- lithographically sensitive
- lithographically
- branched novolaks
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/10—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/351,154 US4939229A (en) | 1989-05-12 | 1989-05-12 | Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA903559B true ZA903559B (en) | 1991-01-30 |
Family
ID=23379799
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA903559A ZA903559B (en) | 1989-05-12 | 1990-05-10 | Method for preparing lithographically sensitive branched novolaks |
Country Status (14)
Country | Link |
---|---|
US (1) | US4939229A (de) |
EP (1) | EP0399691A3 (de) |
JP (1) | JPH0347820A (de) |
KR (1) | KR900018187A (de) |
CN (1) | CN1022690C (de) |
AU (1) | AU635929B2 (de) |
BR (1) | BR9001952A (de) |
CA (1) | CA2014644A1 (de) |
FI (1) | FI902376A0 (de) |
IL (1) | IL94352A0 (de) |
MY (1) | MY105698A (de) |
NO (1) | NO902062L (de) |
PH (1) | PH26861A (de) |
ZA (1) | ZA903559B (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR920005712B1 (ko) * | 1989-04-03 | 1992-07-13 | 가부시끼가이샤 도시바 | 감광성 조성물 |
CA2015721A1 (en) * | 1989-05-12 | 1990-11-12 | Karen Ann Graziano | Method of using highly branched novolaks in photoresists |
EP1035438A3 (de) * | 1999-03-12 | 2000-09-20 | Shipley Company LLC | Phenolharze und diese enthaltende Fotoresistzusammensetzungen |
TWI263861B (en) * | 1999-03-26 | 2006-10-11 | Shinetsu Chemical Co | Resist material and pattern forming method |
JP2005519345A (ja) * | 2002-03-04 | 2005-06-30 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 短波長イメージング用ネガ型フォトレジスト |
US6828383B2 (en) * | 2002-12-13 | 2004-12-07 | Occidental Petroleum | Phenolic modified resorcinolic resins for rubber compounding |
US7425402B2 (en) * | 2003-08-13 | 2008-09-16 | Agfa Graphics, N.V. | Heat-sensitive lithographic printing plate precursor |
US7205084B2 (en) * | 2003-12-18 | 2007-04-17 | Agfa-Gevaert | Heat-sensitive lithographic printing plate precursor |
CN106662819B (zh) * | 2014-08-08 | 2021-06-25 | 日产化学工业株式会社 | 包含芳香族羟甲基化合物反应而得的酚醛清漆树脂的抗蚀剂下层膜形成用组合物 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2147789A (en) * | 1936-05-29 | 1939-02-21 | Du Pont | Resins from aminophenols and formaldehyde |
US2431011A (en) * | 1941-01-29 | 1947-11-18 | Standard Oil Dev Co | Corrosive inhibited additive for mineral lubricating oil composition |
US2636019A (en) * | 1951-06-26 | 1953-04-21 | Research Corp | Ion exchange resins from a trifunctional phenol, formaldehyde and a mannich base made from a trifunctional phenol, formaldehyde and a dialkylamine, morpholine or piperidine |
JPS57102960A (en) * | 1972-09-14 | 1982-06-26 | Yoshizaki Kozo | Production of thermosetting resin paint |
DE3274354D1 (en) * | 1981-06-22 | 1987-01-08 | Hunt Chem Corp Philip A | Novolak resin and a positive photoresist composition containing the same |
JPS58101108A (ja) * | 1981-12-11 | 1983-06-16 | Unitika Ltd | キレ−ト形成基を有するフエノ−ル樹脂とその製造方法及び吸着処理方法 |
US4500691A (en) * | 1983-01-13 | 1985-02-19 | Ciba-Geigy Corporation | Phenol-novolaks containing amino groups |
US4474929A (en) * | 1983-09-30 | 1984-10-02 | The Dow Chemical Company | Polyglycidyl ethers of branched novolacs |
US4468507A (en) * | 1983-11-21 | 1984-08-28 | The Dow Chemical Company | Method of limiting rate of heat evolution during acid-catalyzed phenol/polymethylolphenol condensations |
SU1154297A1 (ru) * | 1984-01-04 | 1985-05-07 | Предприятие П/Я В-2304 | Герметизирующа порошкова композици |
US4571374A (en) * | 1984-12-27 | 1986-02-18 | Minnesota Mining And Manufacturing Company | Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive |
EP0265387B1 (de) * | 1986-10-23 | 1995-11-15 | Ciba-Geigy Ag | Bilderzeugungsverfahren |
CA2015721A1 (en) * | 1989-05-12 | 1990-11-12 | Karen Ann Graziano | Method of using highly branched novolaks in photoresists |
-
1989
- 1989-05-12 US US07/351,154 patent/US4939229A/en not_active Expired - Fee Related
-
1990
- 1990-04-17 CA CA002014644A patent/CA2014644A1/en not_active Abandoned
- 1990-04-17 PH PH40380A patent/PH26861A/en unknown
- 1990-04-26 BR BR909001952A patent/BR9001952A/pt not_active Application Discontinuation
- 1990-05-07 JP JP2117295A patent/JPH0347820A/ja active Pending
- 1990-05-09 EP EP19900304969 patent/EP0399691A3/de not_active Withdrawn
- 1990-05-10 AU AU54884/90A patent/AU635929B2/en not_active Ceased
- 1990-05-10 NO NO90902062A patent/NO902062L/no unknown
- 1990-05-10 MY MYPI90000741A patent/MY105698A/en unknown
- 1990-05-10 IL IL94352A patent/IL94352A0/xx not_active IP Right Cessation
- 1990-05-10 ZA ZA903559A patent/ZA903559B/xx unknown
- 1990-05-11 KR KR1019900006667A patent/KR900018187A/ko not_active Application Discontinuation
- 1990-05-11 FI FI902376A patent/FI902376A0/fi not_active Application Discontinuation
- 1990-05-12 CN CN90102765A patent/CN1022690C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
IL94352A0 (en) | 1991-03-10 |
KR900018187A (ko) | 1990-12-20 |
EP0399691A3 (de) | 1991-04-03 |
PH26861A (en) | 1992-11-16 |
CN1022690C (zh) | 1993-11-10 |
MY105698A (en) | 1994-11-30 |
NO902062D0 (no) | 1990-05-10 |
NO902062L (no) | 1990-11-13 |
US4939229A (en) | 1990-07-03 |
AU635929B2 (en) | 1993-04-08 |
AU5488490A (en) | 1990-11-15 |
FI902376A0 (fi) | 1990-05-11 |
CA2014644A1 (en) | 1990-11-12 |
EP0399691A2 (de) | 1990-11-28 |
JPH0347820A (ja) | 1991-02-28 |
BR9001952A (pt) | 1991-07-30 |
CN1047309A (zh) | 1990-11-28 |
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