ZA891995B - Benzophenone derivatives - Google Patents
Benzophenone derivativesInfo
- Publication number
- ZA891995B ZA891995B ZA891995A ZA891995A ZA891995B ZA 891995 B ZA891995 B ZA 891995B ZA 891995 A ZA891995 A ZA 891995A ZA 891995 A ZA891995 A ZA 891995A ZA 891995 B ZA891995 B ZA 891995B
- Authority
- ZA
- South Africa
- Prior art keywords
- group
- chem
- methyl
- benzophenone derivatives
- independently represents
- Prior art date
Links
- 150000008366 benzophenones Chemical class 0.000 title 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000004414 alkyl thio group Chemical group 0.000 abstract 1
- 150000001450 anions Chemical class 0.000 abstract 1
- 125000005110 aryl thio group Chemical group 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/385—Saturated compounds containing a keto group being part of a ring
- C07C49/457—Saturated compounds containing a keto group being part of a ring containing halogen
- C07C49/467—Saturated compounds containing a keto group being part of a ring containing halogen polycyclic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C225/00—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
- C07C225/02—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton
- C07C225/14—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated
- C07C225/16—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated and containing six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
- Y10S522/905—Benzophenone group
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB888806527A GB8806527D0 (en) | 1988-03-18 | 1988-03-18 | Benzophenone derivatives |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ZA891995B true ZA891995B (en) | 1989-10-25 |
Family
ID=10633700
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ZA891995A ZA891995B (en) | 1988-03-18 | 1989-03-16 | Benzophenone derivatives |
Country Status (17)
| Country | Link |
|---|---|
| US (1) | US4948819A (enEXAMPLES) |
| EP (1) | EP0333291B1 (enEXAMPLES) |
| JP (1) | JP2736678B2 (enEXAMPLES) |
| KR (1) | KR890014431A (enEXAMPLES) |
| CN (1) | CN1035822A (enEXAMPLES) |
| AT (1) | ATE109763T1 (enEXAMPLES) |
| AU (1) | AU609268B2 (enEXAMPLES) |
| BR (1) | BR8901202A (enEXAMPLES) |
| DE (1) | DE68917341T2 (enEXAMPLES) |
| DK (1) | DK129189A (enEXAMPLES) |
| GB (1) | GB8806527D0 (enEXAMPLES) |
| HU (1) | HU202811B (enEXAMPLES) |
| IL (1) | IL89635A0 (enEXAMPLES) |
| IN (1) | IN174634B (enEXAMPLES) |
| NZ (1) | NZ228363A (enEXAMPLES) |
| PT (1) | PT90021B (enEXAMPLES) |
| ZA (1) | ZA891995B (enEXAMPLES) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5512329A (en) * | 1982-09-29 | 1996-04-30 | Bsi Corporation | Substrate surface preparation |
| US4977511A (en) * | 1985-11-20 | 1990-12-11 | The Mead Corporation | Photosensitive materials containing ionic dye compound as initiators |
| US5484822A (en) * | 1991-06-24 | 1996-01-16 | Polaroid Corporation | Process and composition for cladding optic fibers |
| FR2715157B1 (fr) * | 1994-01-20 | 1996-03-01 | Atochem Elf Sa | Latex acryliques susceptibles de former des films photoréticulables. |
| US5998496A (en) * | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
| US5714360A (en) * | 1995-11-03 | 1998-02-03 | Bsi Corporation | Photoactivatable water soluble cross-linking agents containing an onium group |
| JP2000503053A (ja) * | 1995-12-29 | 2000-03-14 | ミネソタ マイニング アンド マニュファクチャリング カンパニー | ポリマー先駆物質の光反応性側鎖部分を使用して親水性感圧接着剤配合物を製造する方法 |
| US6086796A (en) * | 1997-07-02 | 2000-07-11 | Diamonex, Incorporated | Diamond-like carbon over-coats for optical recording media devices and method thereof |
| US7863485B2 (en) * | 2004-12-10 | 2011-01-04 | Omnitech Environmental, Llc | Additive and vehicle for inks, paints, coatings and adhesives |
| DE102009001966A1 (de) | 2009-03-30 | 2010-10-07 | Evonik Röhm Gmbh | Beschichtungszusammensetzung,(Meth)acryl-Polymer und Monomermischung zur Herstellung des(Meth)acryl-Polymers |
| CN102206293B (zh) * | 2010-03-29 | 2013-09-18 | 比亚迪股份有限公司 | 一种光引发剂,一种光固化涂料和模内装饰方法 |
| US10040893B2 (en) | 2012-05-16 | 2018-08-07 | Coloplast A/S | Polymeric photoinitiators and photoinitiator monomers |
| MX2015007211A (es) | 2012-12-11 | 2015-10-29 | Nano Safe Coatings Inc | Antimicrobianos de amonio cuaternario con terminacion de benzofenona curados por uv para superficies. |
| CN103926794B (zh) * | 2014-04-29 | 2017-11-14 | 常州强力电子新材料股份有限公司 | 一种含有二苯甲酮衍生物光引发剂的光固化组合物 |
| US10301399B2 (en) * | 2015-01-05 | 2019-05-28 | Igm Malta Limited | LED-curable low migration photoinitiators |
| CN108430967B (zh) | 2015-08-27 | 2024-12-13 | 纳米安全涂层公司(佛罗里达公司3P14000024914) | 含磺胺的抗微生物剂和含磺胺的抗微生物剂的基质处理组合物的制备 |
| CA3014721C (en) | 2016-02-19 | 2020-08-11 | Eric L. Bartholomew | Two stage methods for processing adhesives and related compositions |
| US10640595B2 (en) | 2016-10-25 | 2020-05-05 | Avery Dennison Corporation | Controlled architecture polymerization with photoinitiator groups in backbone |
| MX2020006626A (es) | 2017-12-19 | 2020-09-14 | Avery Dennison Corp | Funcionalizacion posterior a la polimerizacion de grupos funcionales colgantes. |
| CN119242187B (zh) * | 2024-08-30 | 2025-08-08 | 盛鼎高新材料有限公司 | 一种安全玻璃用离子型中间膜及其制备方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4011259A (en) * | 1969-10-20 | 1977-03-08 | The Kendall Company | Monomeric emulsion stabilizers |
| JPS5495691A (en) * | 1978-01-13 | 1979-07-28 | Toyo Ink Mfg Co Ltd | Photocurable resin composition |
| DE2831263A1 (de) * | 1978-07-15 | 1980-01-31 | Basf Ag | Benzoinderivate mit quartaerer ammoniumgruppe |
| US4310687A (en) * | 1980-07-10 | 1982-01-12 | Gaf Corporation | Copolymerizable ultraviolet light absorber monomers which are acrylate esters of 2-hydroxy, alkoxy, methylol benzophenones |
| DE3331474A1 (de) * | 1983-09-01 | 1985-03-21 | Basf Ag, 6700 Ludwigshafen | Photopolymerisierbare mischungen mit speziellen diaminobenzophenon-verbindungen |
| US4859727A (en) * | 1986-08-22 | 1989-08-22 | Mitsubishi Rayon Company Ltd. | Antistatic thermoplastic resin composition |
| GB8703606D0 (en) * | 1987-02-17 | 1987-03-25 | Ward Blenkinsop & Co Ltd | Benzophenone derivatives |
-
1988
- 1988-03-18 GB GB888806527A patent/GB8806527D0/en active Pending
-
1989
- 1989-02-27 US US07/315,599 patent/US4948819A/en not_active Expired - Fee Related
- 1989-03-14 EP EP89200652A patent/EP0333291B1/en not_active Expired - Lifetime
- 1989-03-14 DE DE68917341T patent/DE68917341T2/de not_active Expired - Fee Related
- 1989-03-14 AT AT89200652T patent/ATE109763T1/de not_active IP Right Cessation
- 1989-03-15 KR KR1019890003218A patent/KR890014431A/ko not_active Withdrawn
- 1989-03-15 CN CN89101369A patent/CN1035822A/zh active Pending
- 1989-03-16 DK DK129189A patent/DK129189A/da not_active Application Discontinuation
- 1989-03-16 PT PT90021A patent/PT90021B/pt not_active IP Right Cessation
- 1989-03-16 IL IL89635A patent/IL89635A0/xx unknown
- 1989-03-16 JP JP1062373A patent/JP2736678B2/ja not_active Expired - Lifetime
- 1989-03-16 IN IN250DE1989 patent/IN174634B/en unknown
- 1989-03-16 NZ NZ228363A patent/NZ228363A/xx unknown
- 1989-03-16 BR BR898901202A patent/BR8901202A/pt unknown
- 1989-03-16 HU HU891241A patent/HU202811B/hu not_active IP Right Cessation
- 1989-03-16 ZA ZA891995A patent/ZA891995B/xx unknown
- 1989-03-16 AU AU31358/89A patent/AU609268B2/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| US4948819A (en) | 1990-08-14 |
| AU609268B2 (en) | 1991-04-26 |
| JP2736678B2 (ja) | 1998-04-02 |
| EP0333291B1 (en) | 1994-08-10 |
| EP0333291A3 (en) | 1990-11-28 |
| JPH024745A (ja) | 1990-01-09 |
| KR890014431A (ko) | 1989-10-23 |
| IN174634B (enEXAMPLES) | 1995-01-28 |
| PT90021A (pt) | 1989-11-10 |
| DE68917341T2 (de) | 1995-01-05 |
| HUT50094A (en) | 1989-12-28 |
| PT90021B (pt) | 1994-06-30 |
| GB8806527D0 (en) | 1988-04-20 |
| HU202811B (en) | 1991-04-29 |
| IL89635A0 (en) | 1989-09-28 |
| AU3135889A (en) | 1989-09-21 |
| CN1035822A (zh) | 1989-09-27 |
| ATE109763T1 (de) | 1994-08-15 |
| DK129189D0 (da) | 1989-03-16 |
| NZ228363A (en) | 1991-01-29 |
| BR8901202A (pt) | 1989-10-31 |
| EP0333291A2 (en) | 1989-09-20 |
| DE68917341D1 (de) | 1994-09-15 |
| DK129189A (da) | 1989-09-19 |
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