ZA891198B - Radiation-polymerizable composition and recording material prepared therefrom - Google Patents

Radiation-polymerizable composition and recording material prepared therefrom

Info

Publication number
ZA891198B
ZA891198B ZA891198A ZA891198A ZA891198B ZA 891198 B ZA891198 B ZA 891198B ZA 891198 A ZA891198 A ZA 891198A ZA 891198 A ZA891198 A ZA 891198A ZA 891198 B ZA891198 B ZA 891198B
Authority
ZA
South Africa
Prior art keywords
radiation
recording material
polymerizable composition
material prepared
prepared therefrom
Prior art date
Application number
ZA891198A
Other languages
English (en)
Inventor
Ulrich Geissler
Geissler Ulrich
Hartmut Wiezer
Wiezer Hartmut
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=6348022&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ZA891198(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ZA891198B publication Critical patent/ZA891198B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
    • G03C1/053—Polymers obtained by reactions involving only carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G13/00—Electrographic processes using a charge pattern

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
ZA891198A 1988-02-24 1989-02-16 Radiation-polymerizable composition and recording material prepared therefrom ZA891198B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3805706A DE3805706A1 (de) 1988-02-24 1988-02-24 Durch strahlung polymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial

Publications (1)

Publication Number Publication Date
ZA891198B true ZA891198B (en) 1989-10-25

Family

ID=6348022

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA891198A ZA891198B (en) 1988-02-24 1989-02-16 Radiation-polymerizable composition and recording material prepared therefrom

Country Status (9)

Country Link
EP (1) EP0330059B1 (fr)
JP (1) JP2788921B2 (fr)
KR (1) KR0140880B1 (fr)
AT (1) ATE117812T1 (fr)
BR (1) BR8900835A (fr)
CA (1) CA1335914C (fr)
DE (2) DE3805706A1 (fr)
ES (1) ES2066799T3 (fr)
ZA (1) ZA891198B (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH031145A (ja) * 1989-05-29 1991-01-07 Kuraray Co Ltd 感光性樹脂組成物、それを用いたパターンおよびパターン作製法
JP2648804B2 (ja) * 1990-04-24 1997-09-03 インターナショナル・ビジネス・マシーンズ・コーポレイション ドライフィルム型の水性処理可能なホトレジスト組成物
JPH0539444A (ja) * 1990-11-30 1993-02-19 Hitachi Chem Co Ltd ポジ型感光性アニオン電着塗料樹脂組成物、これを用いた電着塗装浴、電着塗装法及びプリント回路板の製造方法
JP2898143B2 (ja) * 1991-06-12 1999-05-31 三井化学株式会社 感光液組成物、感光性フィルム及び積層板
JP2013041153A (ja) * 2011-08-17 2013-02-28 Fujifilm Corp フォトスペーサ用感光性樹脂組成物およびこれを用いたフォトスペーサ

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2363806B2 (de) * 1973-12-21 1979-05-17 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
ZA757984B (en) * 1974-10-04 1976-12-29 Dynachem Corp Polymers for aqueous processed photoresists
US4239849A (en) * 1978-06-19 1980-12-16 Dynachem Corporation Polymers for aqueous processed photoresists
JPS60159743A (ja) * 1984-01-30 1985-08-21 Fuji Photo Film Co Ltd 光重合性組成物
US4629680A (en) * 1984-01-30 1986-12-16 Fuji Photo Film Co., Ltd. Photopolymerizable materials capable of being developed by a weak alkaline aqueous solution
JPH0614185B2 (ja) * 1984-04-02 1994-02-23 日立化成工業株式会社 感光性樹脂組成物及びこれを用いた積層体
JPH0642073B2 (ja) * 1984-04-10 1994-06-01 三菱レイヨン株式会社 光重合性樹脂組成物
JPS63147159A (ja) * 1986-12-11 1988-06-20 Fuji Photo Film Co Ltd 光重合性組成物
JPH0820735B2 (ja) * 1987-08-26 1996-03-04 日立化成工業株式会社 感光性樹脂組成物

Also Published As

Publication number Publication date
KR0140880B1 (ko) 1998-06-15
JP2788921B2 (ja) 1998-08-20
DE58908921D1 (de) 1995-03-09
ATE117812T1 (de) 1995-02-15
BR8900835A (pt) 1989-10-17
DE3805706A1 (de) 1989-09-07
EP0330059A2 (fr) 1989-08-30
EP0330059B1 (fr) 1995-01-25
CA1335914C (fr) 1995-06-13
JPH025061A (ja) 1990-01-09
ES2066799T3 (es) 1995-03-16
KR890013521A (ko) 1989-09-23
EP0330059A3 (en) 1990-01-10

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