BR8900835A - Mistura polimerizavel por radiacao e material de registro sensivel a radiacao - Google Patents

Mistura polimerizavel por radiacao e material de registro sensivel a radiacao

Info

Publication number
BR8900835A
BR8900835A BR898900835A BR8900835A BR8900835A BR 8900835 A BR8900835 A BR 8900835A BR 898900835 A BR898900835 A BR 898900835A BR 8900835 A BR8900835 A BR 8900835A BR 8900835 A BR8900835 A BR 8900835A
Authority
BR
Brazil
Prior art keywords
radiation
recording material
sensitive recording
polymerizable mixture
cycloalkyl
Prior art date
Application number
BR898900835A
Other languages
English (en)
Inventor
Ulrich Geissler
Hartmut Wiezer
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=6348022&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=BR8900835(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR8900835A publication Critical patent/BR8900835A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
    • G03C1/053—Polymers obtained by reactions involving only carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G13/00—Electrographic processes using a charge pattern

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
BR898900835A 1988-02-24 1989-02-23 Mistura polimerizavel por radiacao e material de registro sensivel a radiacao BR8900835A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3805706A DE3805706A1 (de) 1988-02-24 1988-02-24 Durch strahlung polymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial

Publications (1)

Publication Number Publication Date
BR8900835A true BR8900835A (pt) 1989-10-17

Family

ID=6348022

Family Applications (1)

Application Number Title Priority Date Filing Date
BR898900835A BR8900835A (pt) 1988-02-24 1989-02-23 Mistura polimerizavel por radiacao e material de registro sensivel a radiacao

Country Status (9)

Country Link
EP (1) EP0330059B1 (pt)
JP (1) JP2788921B2 (pt)
KR (1) KR0140880B1 (pt)
AT (1) ATE117812T1 (pt)
BR (1) BR8900835A (pt)
CA (1) CA1335914C (pt)
DE (2) DE3805706A1 (pt)
ES (1) ES2066799T3 (pt)
ZA (1) ZA891198B (pt)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH031145A (ja) * 1989-05-29 1991-01-07 Kuraray Co Ltd 感光性樹脂組成物、それを用いたパターンおよびパターン作製法
JP2648804B2 (ja) * 1990-04-24 1997-09-03 インターナショナル・ビジネス・マシーンズ・コーポレイション ドライフィルム型の水性処理可能なホトレジスト組成物
JPH0539444A (ja) * 1990-11-30 1993-02-19 Hitachi Chem Co Ltd ポジ型感光性アニオン電着塗料樹脂組成物、これを用いた電着塗装浴、電着塗装法及びプリント回路板の製造方法
JP2898143B2 (ja) * 1991-06-12 1999-05-31 三井化学株式会社 感光液組成物、感光性フィルム及び積層板
JP2013041153A (ja) * 2011-08-17 2013-02-28 Fujifilm Corp フォトスペーサ用感光性樹脂組成物およびこれを用いたフォトスペーサ

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2363806B2 (de) * 1973-12-21 1979-05-17 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
ZA757984B (en) * 1974-10-04 1976-12-29 Dynachem Corp Polymers for aqueous processed photoresists
US4239849A (en) * 1978-06-19 1980-12-16 Dynachem Corporation Polymers for aqueous processed photoresists
JPS60159743A (ja) * 1984-01-30 1985-08-21 Fuji Photo Film Co Ltd 光重合性組成物
US4629680A (en) * 1984-01-30 1986-12-16 Fuji Photo Film Co., Ltd. Photopolymerizable materials capable of being developed by a weak alkaline aqueous solution
JPH0614185B2 (ja) * 1984-04-02 1994-02-23 日立化成工業株式会社 感光性樹脂組成物及びこれを用いた積層体
JPH0642073B2 (ja) * 1984-04-10 1994-06-01 三菱レイヨン株式会社 光重合性樹脂組成物
JPS63147159A (ja) * 1986-12-11 1988-06-20 Fuji Photo Film Co Ltd 光重合性組成物
JPS64949A (en) * 1987-06-23 1989-01-05 Fuji Photo Film Co Ltd Photopolymerizable composition
JPH0820735B2 (ja) * 1987-08-26 1996-03-04 日立化成工業株式会社 感光性樹脂組成物

Also Published As

Publication number Publication date
ATE117812T1 (de) 1995-02-15
KR890013521A (ko) 1989-09-23
EP0330059A2 (de) 1989-08-30
EP0330059A3 (en) 1990-01-10
KR0140880B1 (ko) 1998-06-15
JPH025061A (ja) 1990-01-09
DE58908921D1 (de) 1995-03-09
CA1335914C (en) 1995-06-13
EP0330059B1 (de) 1995-01-25
ZA891198B (en) 1989-10-25
DE3805706A1 (de) 1989-09-07
JP2788921B2 (ja) 1998-08-20
ES2066799T3 (es) 1995-03-16

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Legal Events

Date Code Title Description
B15K Others concerning applications: alteration of classification

Ipc: G03F 7/033 (2006.01)