JPS64949A - Photopolymerizable composition - Google Patents
Photopolymerizable compositionInfo
- Publication number
- JPS64949A JPS64949A JP15627587A JP15627587A JPS64949A JP S64949 A JPS64949 A JP S64949A JP 15627587 A JP15627587 A JP 15627587A JP 15627587 A JP15627587 A JP 15627587A JP S64949 A JPS64949 A JP S64949A
- Authority
- JP
- Japan
- Prior art keywords
- photopolymerizable composition
- glass transition
- transition point
- cutting
- cold flow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
Abstract
PURPOSE:To obtain a photopolymerized composition having a glass transition point of <=40 deg.C and sufficient flexibility, and preventing occurrence of cutting dust at the time of cutting and cold flow during storage by incorporating a metal compound containing divalent or higher-valent metal ions in a specified photopolymerizable composition. CONSTITUTION:The photopolymerizable composition to be added having a glass transition point of <=40 deg.C comprises the copolymer having acidic groups, the addition-polymerizable unsaturated compound having at least 2 ethylenically unsaturated double bonds in one molecule, and at least one kind of photopolymerization initiator, and in addition, the metal compound having metal ions with >=2 valences, thus permitting occurrence of cold flow to be prevented without deteriorating laminability, cutting dust resistance, developing speed, and other performances.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62-156275A JPH01949A (en) | 1987-06-23 | Photopolymerizable composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62-156275A JPH01949A (en) | 1987-06-23 | Photopolymerizable composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS64949A true JPS64949A (en) | 1989-01-05 |
JPH01949A JPH01949A (en) | 1989-01-05 |
Family
ID=
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH025061A (en) * | 1988-02-24 | 1990-01-09 | Hoechst Ag | Radiation polymerizable component and radiation sensitive recording material |
JPH02222953A (en) * | 1988-10-07 | 1990-09-05 | Morton Thiokol Inc | Light image forming composition and dry film formed therefrom |
JPH043062A (en) * | 1990-04-20 | 1992-01-08 | Nisshinbo Ind Inc | Photosensitive resin composition and formation of conductive pattern |
JPH04127154A (en) * | 1990-09-19 | 1992-04-28 | Nisshinbo Ind Inc | Photosensitive resin composition and formation of conductive pattern |
JP2004157420A (en) * | 2002-11-08 | 2004-06-03 | Tamura Kaken Co Ltd | Photosensitive resin composition and printed wiring board |
JP2006142720A (en) * | 2004-11-22 | 2006-06-08 | Fuji Photo Film Co Ltd | Aluminum support for lithographic printing plate and lithographic printing plate |
JP2011118365A (en) * | 2009-11-04 | 2011-06-16 | Sumitomo Chemical Co Ltd | Colored photosensitive resin composition |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH025061A (en) * | 1988-02-24 | 1990-01-09 | Hoechst Ag | Radiation polymerizable component and radiation sensitive recording material |
JPH02222953A (en) * | 1988-10-07 | 1990-09-05 | Morton Thiokol Inc | Light image forming composition and dry film formed therefrom |
JPH043062A (en) * | 1990-04-20 | 1992-01-08 | Nisshinbo Ind Inc | Photosensitive resin composition and formation of conductive pattern |
JPH04127154A (en) * | 1990-09-19 | 1992-04-28 | Nisshinbo Ind Inc | Photosensitive resin composition and formation of conductive pattern |
JP2004157420A (en) * | 2002-11-08 | 2004-06-03 | Tamura Kaken Co Ltd | Photosensitive resin composition and printed wiring board |
JP2006142720A (en) * | 2004-11-22 | 2006-06-08 | Fuji Photo Film Co Ltd | Aluminum support for lithographic printing plate and lithographic printing plate |
JP2011118365A (en) * | 2009-11-04 | 2011-06-16 | Sumitomo Chemical Co Ltd | Colored photosensitive resin composition |
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