JPS64949A - Photopolymerizable composition - Google Patents

Photopolymerizable composition

Info

Publication number
JPS64949A
JPS64949A JP15627587A JP15627587A JPS64949A JP S64949 A JPS64949 A JP S64949A JP 15627587 A JP15627587 A JP 15627587A JP 15627587 A JP15627587 A JP 15627587A JP S64949 A JPS64949 A JP S64949A
Authority
JP
Japan
Prior art keywords
photopolymerizable composition
glass transition
transition point
cutting
cold flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15627587A
Other languages
Japanese (ja)
Other versions
JPH01949A (en
Inventor
Shohei Yoshida
Sumitaka Tatsuta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP62-156275A priority Critical patent/JPH01949A/en
Priority claimed from JP62-156275A external-priority patent/JPH01949A/en
Publication of JPS64949A publication Critical patent/JPS64949A/en
Publication of JPH01949A publication Critical patent/JPH01949A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE:To obtain a photopolymerized composition having a glass transition point of <=40 deg.C and sufficient flexibility, and preventing occurrence of cutting dust at the time of cutting and cold flow during storage by incorporating a metal compound containing divalent or higher-valent metal ions in a specified photopolymerizable composition. CONSTITUTION:The photopolymerizable composition to be added having a glass transition point of <=40 deg.C comprises the copolymer having acidic groups, the addition-polymerizable unsaturated compound having at least 2 ethylenically unsaturated double bonds in one molecule, and at least one kind of photopolymerization initiator, and in addition, the metal compound having metal ions with >=2 valences, thus permitting occurrence of cold flow to be prevented without deteriorating laminability, cutting dust resistance, developing speed, and other performances.
JP62-156275A 1987-06-23 Photopolymerizable composition Pending JPH01949A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62-156275A JPH01949A (en) 1987-06-23 Photopolymerizable composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62-156275A JPH01949A (en) 1987-06-23 Photopolymerizable composition

Publications (2)

Publication Number Publication Date
JPS64949A true JPS64949A (en) 1989-01-05
JPH01949A JPH01949A (en) 1989-01-05

Family

ID=

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH025061A (en) * 1988-02-24 1990-01-09 Hoechst Ag Radiation polymerizable component and radiation sensitive recording material
JPH02222953A (en) * 1988-10-07 1990-09-05 Morton Thiokol Inc Light image forming composition and dry film formed therefrom
JPH043062A (en) * 1990-04-20 1992-01-08 Nisshinbo Ind Inc Photosensitive resin composition and formation of conductive pattern
JPH04127154A (en) * 1990-09-19 1992-04-28 Nisshinbo Ind Inc Photosensitive resin composition and formation of conductive pattern
JP2004157420A (en) * 2002-11-08 2004-06-03 Tamura Kaken Co Ltd Photosensitive resin composition and printed wiring board
JP2006142720A (en) * 2004-11-22 2006-06-08 Fuji Photo Film Co Ltd Aluminum support for lithographic printing plate and lithographic printing plate
JP2011118365A (en) * 2009-11-04 2011-06-16 Sumitomo Chemical Co Ltd Colored photosensitive resin composition

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH025061A (en) * 1988-02-24 1990-01-09 Hoechst Ag Radiation polymerizable component and radiation sensitive recording material
JPH02222953A (en) * 1988-10-07 1990-09-05 Morton Thiokol Inc Light image forming composition and dry film formed therefrom
JPH043062A (en) * 1990-04-20 1992-01-08 Nisshinbo Ind Inc Photosensitive resin composition and formation of conductive pattern
JPH04127154A (en) * 1990-09-19 1992-04-28 Nisshinbo Ind Inc Photosensitive resin composition and formation of conductive pattern
JP2004157420A (en) * 2002-11-08 2004-06-03 Tamura Kaken Co Ltd Photosensitive resin composition and printed wiring board
JP2006142720A (en) * 2004-11-22 2006-06-08 Fuji Photo Film Co Ltd Aluminum support for lithographic printing plate and lithographic printing plate
JP2011118365A (en) * 2009-11-04 2011-06-16 Sumitomo Chemical Co Ltd Colored photosensitive resin composition

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