ZA851110B - A radiation-sensitive composition and recording material based on compounds which can be split by acid - Google Patents

A radiation-sensitive composition and recording material based on compounds which can be split by acid

Info

Publication number
ZA851110B
ZA851110B ZA851110A ZA851110A ZA851110B ZA 851110 B ZA851110 B ZA 851110B ZA 851110 A ZA851110 A ZA 851110A ZA 851110 A ZA851110 A ZA 851110A ZA 851110 B ZA851110 B ZA 851110B
Authority
ZA
South Africa
Prior art keywords
acid
radiation
sensitive composition
split
compounds
Prior art date
Application number
ZA851110A
Other languages
English (en)
Inventor
Arnold Schneller
Walter Herwig
Kurt Erbes
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=6228854&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ZA851110(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ZA851110B publication Critical patent/ZA851110B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Steroid Compounds (AREA)
  • Prostheses (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Golf Clubs (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
ZA851110A 1984-02-25 1985-02-14 A radiation-sensitive composition and recording material based on compounds which can be split by acid ZA851110B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19843406927 DE3406927A1 (de) 1984-02-25 1984-02-25 Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen

Publications (1)

Publication Number Publication Date
ZA851110B true ZA851110B (en) 1985-09-25

Family

ID=6228854

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA851110A ZA851110B (en) 1984-02-25 1985-02-14 A radiation-sensitive composition and recording material based on compounds which can be split by acid

Country Status (14)

Country Link
US (1) US4678737A (xx)
EP (1) EP0153682B1 (xx)
JP (1) JP2653374B2 (xx)
KR (1) KR910006542B1 (xx)
CN (1) CN85101459A (xx)
AT (1) ATE53917T1 (xx)
AU (1) AU577830B2 (xx)
BR (1) BR8500785A (xx)
CA (1) CA1273521A (xx)
DE (2) DE3406927A1 (xx)
ES (1) ES8607575A1 (xx)
FI (1) FI80155C (xx)
HK (1) HK76895A (xx)
ZA (1) ZA851110B (xx)

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JP3875280B2 (ja) 1997-07-15 2007-01-31 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー ミクロリソグラフィーのための改良された溶解抑制レジスト
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JP4452563B2 (ja) * 2004-06-14 2010-04-21 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP4368282B2 (ja) * 2004-09-24 2009-11-18 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JPWO2008120655A1 (ja) 2007-03-30 2010-07-15 株式会社医薬分子設計研究所 Ｉ型１１βヒドロキシステロイド脱水素酵素阻害活性を有するオキサゾリジノン誘導体
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Also Published As

Publication number Publication date
DE3577484D1 (de) 1990-06-07
KR910006542B1 (ko) 1991-08-27
US4678737A (en) 1987-07-07
FI80155B (fi) 1989-12-29
EP0153682A2 (de) 1985-09-04
ATE53917T1 (de) 1990-06-15
AU3918485A (en) 1985-09-05
CN85101459A (zh) 1987-01-17
AU577830B2 (en) 1988-10-06
FI850719L (fi) 1985-08-26
FI850719A0 (fi) 1985-02-21
JP2653374B2 (ja) 1997-09-17
BR8500785A (pt) 1985-10-08
ES540587A0 (es) 1986-06-01
EP0153682A3 (en) 1987-04-22
DE3406927A1 (de) 1985-08-29
CA1273521A (en) 1990-09-04
ES8607575A1 (es) 1986-06-01
JPS60205444A (ja) 1985-10-17
HK76895A (en) 1995-05-26
EP0153682B1 (de) 1990-05-02
KR850006232A (ko) 1985-10-02
FI80155C (fi) 1990-04-10

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