ZA849316B - Coating apparatus - Google Patents

Coating apparatus

Info

Publication number
ZA849316B
ZA849316B ZA849316A ZA849316A ZA849316B ZA 849316 B ZA849316 B ZA 849316B ZA 849316 A ZA849316 A ZA 849316A ZA 849316 A ZA849316 A ZA 849316A ZA 849316 B ZA849316 B ZA 849316B
Authority
ZA
South Africa
Prior art keywords
coating apparatus
coating
Prior art date
Application number
ZA849316A
Other languages
English (en)
Inventor
Jose Manuel Gallego
Original Assignee
Pilkington Brothers Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pilkington Brothers Plc filed Critical Pilkington Brothers Plc
Publication of ZA849316B publication Critical patent/ZA849316B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)
  • Physical Vapour Deposition (AREA)
ZA849316A 1983-12-05 1984-11-29 Coating apparatus ZA849316B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB838332394A GB8332394D0 (en) 1983-12-05 1983-12-05 Coating apparatus

Publications (1)

Publication Number Publication Date
ZA849316B true ZA849316B (en) 1986-07-30

Family

ID=10552832

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA849316A ZA849316B (en) 1983-12-05 1984-11-29 Coating apparatus

Country Status (9)

Country Link
US (1) US4592306A (xx)
EP (1) EP0144229A3 (xx)
JP (1) JPS60167420A (xx)
AU (1) AU575095B2 (xx)
ES (1) ES8606816A1 (xx)
GB (2) GB8332394D0 (xx)
IN (1) IN163503B (xx)
MX (1) MX161722A (xx)
ZA (1) ZA849316B (xx)

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ES538257A0 (es) 1985-11-01
GB2150600A (en) 1985-07-03
AU3629084A (en) 1985-06-13
GB8430313D0 (en) 1985-01-09
IN163503B (xx) 1988-10-01
EP0144229A2 (en) 1985-06-12
MX161722A (es) 1990-12-19
GB8332394D0 (en) 1984-01-11
AU575095B2 (en) 1988-07-21
GB2150600B (en) 1987-08-12
JPS60167420A (ja) 1985-08-30
ES8606816A1 (es) 1985-11-01
US4592306A (en) 1986-06-03
EP0144229A3 (en) 1988-07-27

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