ZA845111B - Process for producing negative copies by means of a material based on 1,2-quinone diazides - Google Patents

Process for producing negative copies by means of a material based on 1,2-quinone diazides

Info

Publication number
ZA845111B
ZA845111B ZA845111A ZA845111A ZA845111B ZA 845111 B ZA845111 B ZA 845111B ZA 845111 A ZA845111 A ZA 845111A ZA 845111 A ZA845111 A ZA 845111A ZA 845111 B ZA845111 B ZA 845111B
Authority
ZA
South Africa
Prior art keywords
diazide
copies
producing negative
material based
naphthoquinone
Prior art date
Application number
ZA845111A
Other languages
English (en)
Inventor
Paul Stahlhofen
Gerhard Mack
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ZA845111B publication Critical patent/ZA845111B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Detergent Compositions (AREA)
  • Materials For Photolithography (AREA)
  • Fats And Perfumes (AREA)
ZA845111A 1983-07-11 1984-07-04 Process for producing negative copies by means of a material based on 1,2-quinone diazides ZA845111B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19833325023 DE3325023A1 (de) 1983-07-11 1983-07-11 Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden

Publications (1)

Publication Number Publication Date
ZA845111B true ZA845111B (en) 1985-02-27

Family

ID=6203718

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA845111A ZA845111B (en) 1983-07-11 1984-07-04 Process for producing negative copies by means of a material based on 1,2-quinone diazides

Country Status (10)

Country Link
US (1) US4576901A (fr)
EP (1) EP0131238B1 (fr)
JP (1) JPS6039641A (fr)
AT (1) ATE38568T1 (fr)
AU (1) AU567353B2 (fr)
BR (1) BR8403441A (fr)
CA (1) CA1242920A (fr)
DE (2) DE3325023A1 (fr)
ES (1) ES534178A0 (fr)
ZA (1) ZA845111B (fr)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3584316D1 (de) * 1984-06-01 1991-11-14 Rohm & Haas Lichtempfindliche beschichtungszusammensetzung, aus diesem hergestellte thermisch stabile beschichtungen und verfahren zur herstellung von thermisch stabilen polymerbildern.
US4596763A (en) * 1984-10-01 1986-06-24 American Hoechst Corporation Positive photoresist processing with mid U-V range exposure
US4885232A (en) * 1985-03-11 1989-12-05 Hoechst Celanese Corporation High temperature post exposure baking treatment for positive photoresist compositions
US5256522A (en) * 1985-08-12 1993-10-26 Hoechst Celanese Corporation Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
US4931381A (en) * 1985-08-12 1990-06-05 Hoechst Celanese Corporation Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment
US4929536A (en) * 1985-08-12 1990-05-29 Hoechst Celanese Corporation Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
US5217840A (en) * 1985-08-12 1993-06-08 Hoechst Celanese Corporation Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
US4942108A (en) * 1985-12-05 1990-07-17 International Business Machines Corporation Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers
ZA872295B (fr) * 1986-03-13 1987-09-22
US5162510A (en) * 1986-05-02 1992-11-10 Hoechst Celanese Corporation Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US4902785A (en) * 1986-05-02 1990-02-20 Hoechst Celanese Corporation Phenolic photosensitizers containing quinone diazide and acidic halide substituents
EP0288533A4 (fr) * 1986-10-20 1989-02-06 Macdermid Inc Procede et systeme d'inversion d'image.
US4863827A (en) * 1986-10-20 1989-09-05 American Hoechst Corporation Postive working multi-level photoresist
DE3711264A1 (de) * 1987-04-03 1988-10-13 Hoechst Ag Lichtempfindliches gemisch und hieraus hergestelltes lichtempfindliches kopiermaterial
DE3711263A1 (de) * 1987-04-03 1988-10-13 Hoechst Ag Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung von druckformen
GB8708747D0 (en) * 1987-04-11 1987-05-20 Ciba Geigy Ag Formation of image
DE3725949A1 (de) * 1987-08-05 1989-02-16 Hoechst Ag Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung von negativen reliefkopien
DE3822522A1 (de) * 1988-07-04 1990-03-22 Hoechst Ag 1,2-naphthochinon-2-diazid-sulfonsaeureamide und lichtempfindliche gemische, die diese enthalten
US5019488A (en) * 1988-09-29 1991-05-28 Hoechst Celanese Corporation Method of producing an image reversal negative photoresist having a photo-labile blocked imide
CA2001852A1 (fr) * 1988-11-01 1990-05-01 Iwao Numakura Methode et appareil de fabrication de masques de resine photosensible negative
US5286609A (en) * 1988-11-01 1994-02-15 Yamatoya & Co., Ltd. Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray
DE3837500A1 (de) * 1988-11-04 1990-05-23 Hoechst Ag Neue, strahlungsempfindliche verbindungen, hiermit hergestelltes strahlungsempfindliches gemisch und aufzeichnungsmaterial
US5128232A (en) * 1989-05-22 1992-07-07 Shiply Company Inc. Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units
US5210000A (en) * 1989-05-22 1993-05-11 Shipley Company Inc. Photoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units
EP0413087A1 (fr) * 1989-07-20 1991-02-20 International Business Machines Corporation Composition photosensible et son usage
DE3926776A1 (de) * 1989-08-12 1991-02-14 Hoechst Ag Substituierte 1,2-naphthochinon-(2)-diazid-4-sulfonsaeuren, verfahren zu ihrer herstellung und ihre verwendung
DE3926774A1 (de) * 1989-08-12 1991-02-14 Hoechst Ag 7-hydroxy-1,2-naphthochinon -(2)-diazid-4-sulfonsaeure oder ihre salze, verfahren zu ihrer herstellung und ihre verwendung
DE3940911A1 (de) * 1989-12-12 1991-06-13 Hoechst Ag Verfahren zur herstellung negativer kopien
DE4004719A1 (de) * 1990-02-15 1991-08-22 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
DE4013575C2 (de) * 1990-04-27 1994-08-11 Basf Ag Verfahren zur Herstellung negativer Reliefkopien
US5330875A (en) * 1993-05-05 1994-07-19 Sun Chemical Corporation Process for producing negative and positive original images on a bilevel printing plate utilizing non-silver halide layer and silver halide overlayer
EP0825927B1 (fr) 1996-04-23 1999-08-11 Kodak Polychrome Graphics Company Ltd. Precurseur de plaque d'impression lithographique et son utilisation pour la generation d' images par la chaleur
US5858626A (en) * 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US5705322A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Method of providing an image using a negative-working infrared photosensitive element
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
ATE204388T1 (de) 1997-07-05 2001-09-15 Kodak Polychrome Graphics Llc Bilderzeugungsverfahren
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6800426B2 (en) 2001-12-13 2004-10-05 Kodak Polychrome Graphics Llc Process for making a two layer thermal negative plate
JP2008311474A (ja) * 2007-06-15 2008-12-25 Fujifilm Corp パターン形成方法
IT201900022233A1 (it) * 2019-11-27 2021-05-27 Epta Inks S P A Inchiostro fotosensibile e embossabile

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL280959A (fr) * 1961-07-28
JPS49127615A (fr) * 1973-04-07 1974-12-06
US4196003A (en) * 1974-02-01 1980-04-01 Fuji Photo Film Co., Ltd. Light-sensitive o-quinone diazide copying composition
GB1494640A (en) * 1974-12-24 1977-12-07 Fuji Photo Film Co Ltd Image-forming on light-sensitive element containing a quinone diazide
DE2529054C2 (de) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
GB1588417A (en) * 1977-03-15 1981-04-23 Agfa Gevaert Photoresist materials
JPS5590943A (en) * 1978-12-28 1980-07-10 Fuji Photo Film Co Ltd Photosensitive material and image forming method applicable thereto
JPS587054B2 (ja) * 1979-06-18 1983-02-08 富士通株式会社 レジスト・パタ−ン形成法
JPS566236A (en) * 1979-06-28 1981-01-22 Fuji Photo Film Co Ltd Photosensitive material and pattern forming method using it
JPS569740A (en) * 1979-07-05 1981-01-31 Fuji Photo Film Co Ltd Image forming method
JPS5635130A (en) * 1979-08-31 1981-04-07 Fujitsu Ltd Resist material and method for forming resist pattern
GB2082339B (en) * 1980-08-05 1985-06-12 Horsell Graphic Ind Ltd Lithographic printing plates and method for processing
AU9012082A (en) * 1981-11-06 1983-05-12 Polychrome Corp. Light sensitive composition
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol
DE3325022A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden

Also Published As

Publication number Publication date
US4576901A (en) 1986-03-18
DE3475117D1 (en) 1988-12-15
ATE38568T1 (de) 1988-11-15
EP0131238B1 (fr) 1988-11-09
CA1242920A (fr) 1988-10-11
AU3050284A (en) 1985-01-17
ES8600526A1 (es) 1985-09-16
EP0131238A1 (fr) 1985-01-16
DE3325023A1 (de) 1985-01-24
JPS6039641A (ja) 1985-03-01
BR8403441A (pt) 1985-06-25
JPH0455501B2 (fr) 1992-09-03
AU567353B2 (en) 1987-11-19
ES534178A0 (es) 1985-09-16

Similar Documents

Publication Publication Date Title
ZA845111B (en) Process for producing negative copies by means of a material based on 1,2-quinone diazides
ZA845110B (en) Process for producing negative copies by means of a material based on 1,2-quinone diazides
DE3274022D1 (en) Process for producing relief images
JPS6455553A (en) Photosensitive composition, photosensitive copying material produced therefrom and making of negative relief copy
ZA857887B (en) A light-sensitive material and a process for producing negative copies utilizing the material
EP0321161A3 (fr) Matériau photosensible, procédé de formation d'image et appareil à cet effet
FR2440350A1 (fr) Procede de fabrication de l'acide parahydroxymandelique racemique
JPS57157243A (en) Processing method for photographic sensitive silver halide material
AU7768081A (en) Producing relief copies by heating a light hardenable layer
DE3666638D1 (en) Process for the production of photoresist patterns
ES8704275A1 (es) Camara para fichas de pelicula
JPS5636648A (en) Photosensitive material and pattern forming method using it
JPS6478249A (en) Photosensitive material and image forming method
GB1467774A (en) Process for forming vesicular photographic image
JPS6480957A (en) Defect inspection method
EP0297583A3 (fr) Matériau photosensible et procédé pour la formation de l'image avec ce matériau
JPS5448653A (en) Etching of metal plate
IT1255551B (it) Composizione fotosensibile per materiale da stampa positiva-negativa.
JPS54145332A (en) Electroforming method
JPS6478250A (en) Negative image forming method