BR8403441A - Processo para a obtencao de copias em relevo negativas,bem como material de copia e mistura fotossensivel para tal processo - Google Patents

Processo para a obtencao de copias em relevo negativas,bem como material de copia e mistura fotossensivel para tal processo

Info

Publication number
BR8403441A
BR8403441A BR8403441A BR8403441A BR8403441A BR 8403441 A BR8403441 A BR 8403441A BR 8403441 A BR8403441 A BR 8403441A BR 8403441 A BR8403441 A BR 8403441A BR 8403441 A BR8403441 A BR 8403441A
Authority
BR
Brazil
Prior art keywords
copies
diazide
embroidered
well
mixture material
Prior art date
Application number
BR8403441A
Other languages
English (en)
Inventor
Paul Stahlhofen
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR8403441A publication Critical patent/BR8403441A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
  • Detergent Compositions (AREA)
  • Fats And Perfumes (AREA)
BR8403441A 1983-07-11 1984-07-10 Processo para a obtencao de copias em relevo negativas,bem como material de copia e mistura fotossensivel para tal processo BR8403441A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19833325023 DE3325023A1 (de) 1983-07-11 1983-07-11 Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden

Publications (1)

Publication Number Publication Date
BR8403441A true BR8403441A (pt) 1985-06-25

Family

ID=6203718

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8403441A BR8403441A (pt) 1983-07-11 1984-07-10 Processo para a obtencao de copias em relevo negativas,bem como material de copia e mistura fotossensivel para tal processo

Country Status (10)

Country Link
US (1) US4576901A (pt)
EP (1) EP0131238B1 (pt)
JP (1) JPS6039641A (pt)
AT (1) ATE38568T1 (pt)
AU (1) AU567353B2 (pt)
BR (1) BR8403441A (pt)
CA (1) CA1242920A (pt)
DE (2) DE3325023A1 (pt)
ES (1) ES8600526A1 (pt)
ZA (1) ZA845111B (pt)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
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IE57143B1 (en) * 1984-06-01 1992-05-06 Rohm & Haas Photosensitive coating compositions,thermally stable coating prepared from them,and the use of such coatings in forming thermally stable polymer images
US4596763A (en) * 1984-10-01 1986-06-24 American Hoechst Corporation Positive photoresist processing with mid U-V range exposure
US4885232A (en) * 1985-03-11 1989-12-05 Hoechst Celanese Corporation High temperature post exposure baking treatment for positive photoresist compositions
US4929536A (en) * 1985-08-12 1990-05-29 Hoechst Celanese Corporation Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
US5256522A (en) * 1985-08-12 1993-10-26 Hoechst Celanese Corporation Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
US5217840A (en) * 1985-08-12 1993-06-08 Hoechst Celanese Corporation Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
US4931381A (en) * 1985-08-12 1990-06-05 Hoechst Celanese Corporation Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment
US4942108A (en) * 1985-12-05 1990-07-17 International Business Machines Corporation Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers
ZA872295B (pt) * 1986-03-13 1987-09-22
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
US4902785A (en) * 1986-05-02 1990-02-20 Hoechst Celanese Corporation Phenolic photosensitizers containing quinone diazide and acidic halide substituents
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US5162510A (en) * 1986-05-02 1992-11-10 Hoechst Celanese Corporation Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer
US4863827A (en) * 1986-10-20 1989-09-05 American Hoechst Corporation Postive working multi-level photoresist
EP0288533A4 (en) * 1986-10-20 1989-02-06 Macdermid Inc IMAGE INVERSION METHOD AND SYSTEM.
DE3711263A1 (de) * 1987-04-03 1988-10-13 Hoechst Ag Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung von druckformen
DE3711264A1 (de) * 1987-04-03 1988-10-13 Hoechst Ag Lichtempfindliches gemisch und hieraus hergestelltes lichtempfindliches kopiermaterial
GB8708747D0 (en) * 1987-04-11 1987-05-20 Ciba Geigy Ag Formation of image
DE3725949A1 (de) * 1987-08-05 1989-02-16 Hoechst Ag Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung von negativen reliefkopien
DE3822522A1 (de) * 1988-07-04 1990-03-22 Hoechst Ag 1,2-naphthochinon-2-diazid-sulfonsaeureamide und lichtempfindliche gemische, die diese enthalten
US5019488A (en) * 1988-09-29 1991-05-28 Hoechst Celanese Corporation Method of producing an image reversal negative photoresist having a photo-labile blocked imide
US5286609A (en) * 1988-11-01 1994-02-15 Yamatoya & Co., Ltd. Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray
GB2224362B (en) * 1988-11-01 1993-05-19 Yamatoya Shokai A process and apparatus for forming a negative resist pattern with a resist containing a diazoquinone sensitiser
DE3837500A1 (de) * 1988-11-04 1990-05-23 Hoechst Ag Neue, strahlungsempfindliche verbindungen, hiermit hergestelltes strahlungsempfindliches gemisch und aufzeichnungsmaterial
US5128232A (en) * 1989-05-22 1992-07-07 Shiply Company Inc. Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units
US5210000A (en) * 1989-05-22 1993-05-11 Shipley Company Inc. Photoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units
EP0413087A1 (en) * 1989-07-20 1991-02-20 International Business Machines Corporation Photosensitive composition and use thereof
DE3926776A1 (de) * 1989-08-12 1991-02-14 Hoechst Ag Substituierte 1,2-naphthochinon-(2)-diazid-4-sulfonsaeuren, verfahren zu ihrer herstellung und ihre verwendung
DE3926774A1 (de) * 1989-08-12 1991-02-14 Hoechst Ag 7-hydroxy-1,2-naphthochinon -(2)-diazid-4-sulfonsaeure oder ihre salze, verfahren zu ihrer herstellung und ihre verwendung
DE3940911A1 (de) * 1989-12-12 1991-06-13 Hoechst Ag Verfahren zur herstellung negativer kopien
DE4004719A1 (de) * 1990-02-15 1991-08-22 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
DE4013575C2 (de) * 1990-04-27 1994-08-11 Basf Ag Verfahren zur Herstellung negativer Reliefkopien
US5330875A (en) * 1993-05-05 1994-07-19 Sun Chemical Corporation Process for producing negative and positive original images on a bilevel printing plate utilizing non-silver halide layer and silver halide overlayer
RU2153986C2 (ru) 1996-04-23 2000-08-10 Хорселл Грэфик Индастриз Лимитед Термочувствительная композиция и способ ее применения для изготовления литографической печатной формы
US5705322A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Method of providing an image using a negative-working infrared photosensitive element
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US5858626A (en) 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
WO1999001796A2 (en) 1997-07-05 1999-01-14 Kodak Polychrome Graphics Llc Pattern-forming methods
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6800426B2 (en) 2001-12-13 2004-10-05 Kodak Polychrome Graphics Llc Process for making a two layer thermal negative plate
JP2008311474A (ja) * 2007-06-15 2008-12-25 Fujifilm Corp パターン形成方法
IT201900022233A1 (it) 2019-11-27 2021-05-27 Epta Inks S P A Inchiostro fotosensibile e embossabile

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL138044C (pt) * 1961-07-28
JPS49127615A (pt) * 1973-04-07 1974-12-06
US4196003A (en) * 1974-02-01 1980-04-01 Fuji Photo Film Co., Ltd. Light-sensitive o-quinone diazide copying composition
GB1494640A (en) * 1974-12-24 1977-12-07 Fuji Photo Film Co Ltd Image-forming on light-sensitive element containing a quinone diazide
DE2529054C2 (de) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
GB1588417A (en) * 1977-03-15 1981-04-23 Agfa Gevaert Photoresist materials
JPS5590943A (en) * 1978-12-28 1980-07-10 Fuji Photo Film Co Ltd Photosensitive material and image forming method applicable thereto
JPS587054B2 (ja) * 1979-06-18 1983-02-08 富士通株式会社 レジスト・パタ−ン形成法
JPS566236A (en) * 1979-06-28 1981-01-22 Fuji Photo Film Co Ltd Photosensitive material and pattern forming method using it
JPS569740A (en) * 1979-07-05 1981-01-31 Fuji Photo Film Co Ltd Image forming method
JPS5635130A (en) * 1979-08-31 1981-04-07 Fujitsu Ltd Resist material and method for forming resist pattern
GB2082339B (en) * 1980-08-05 1985-06-12 Horsell Graphic Ind Ltd Lithographic printing plates and method for processing
AU9012082A (en) * 1981-11-06 1983-05-12 Polychrome Corp. Light sensitive composition
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol
DE3325022A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden

Also Published As

Publication number Publication date
EP0131238B1 (de) 1988-11-09
ES534178A0 (es) 1985-09-16
US4576901A (en) 1986-03-18
EP0131238A1 (de) 1985-01-16
DE3325023A1 (de) 1985-01-24
DE3475117D1 (en) 1988-12-15
ES8600526A1 (es) 1985-09-16
JPH0455501B2 (pt) 1992-09-03
AU3050284A (en) 1985-01-17
AU567353B2 (en) 1987-11-19
CA1242920A (en) 1988-10-11
ATE38568T1 (de) 1988-11-15
ZA845111B (en) 1985-02-27
JPS6039641A (ja) 1985-03-01

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Legal Events

Date Code Title Description
B21A Patent or certificate of addition expired [chapter 21.1 patent gazette]

Free format text: PATENTE EXTINTA EM 10/07/99

B15K Others concerning applications: alteration of classification

Ipc: G03F 7/022 (2006.01), G03F 7/20 (2006.0